FR2105361A5 - Copper chloride etchant regeneration plant - is automatically functioning and self contained - Google Patents

Copper chloride etchant regeneration plant - is automatically functioning and self contained

Info

Publication number
FR2105361A5
FR2105361A5 FR7031978A FR7031978A FR2105361A5 FR 2105361 A5 FR2105361 A5 FR 2105361A5 FR 7031978 A FR7031978 A FR 7031978A FR 7031978 A FR7031978 A FR 7031978A FR 2105361 A5 FR2105361 A5 FR 2105361A5
Authority
FR
France
Prior art keywords
etchant
chloride etchant
copper chloride
self contained
regeneration plant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7031978A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemcut Corp
Original Assignee
Chemcut Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemcut Corp filed Critical Chemcut Corp
Priority to FR7031978A priority Critical patent/FR2105361A5/en
Application granted granted Critical
Publication of FR2105361A5 publication Critical patent/FR2105361A5/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

Plant for the regeneration of Cu chloride etchant for Cu and its alloys comprises storage tanks for H2O2 and HCl, a reaction tank with the reagent into which dips a redox electrode for controlling the amount of H2O2 and HCl additions which may be required depending on the state of the etchant, circulation pump, valves and pipe connections and in - and outlets for the regenerated etchant. The plant is for printed circuit manufacture and ensures a continuous supply of full strength Cu-chloride etchant.
FR7031978A 1970-09-02 1970-09-02 Copper chloride etchant regeneration plant - is automatically functioning and self contained Expired FR2105361A5 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7031978A FR2105361A5 (en) 1970-09-02 1970-09-02 Copper chloride etchant regeneration plant - is automatically functioning and self contained

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7031978A FR2105361A5 (en) 1970-09-02 1970-09-02 Copper chloride etchant regeneration plant - is automatically functioning and self contained

Publications (1)

Publication Number Publication Date
FR2105361A5 true FR2105361A5 (en) 1972-04-28

Family

ID=9060832

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7031978A Expired FR2105361A5 (en) 1970-09-02 1970-09-02 Copper chloride etchant regeneration plant - is automatically functioning and self contained

Country Status (1)

Country Link
FR (1) FR2105361A5 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108467054A (en) * 2018-06-08 2018-08-31 广州科城环保科技有限公司 A kind of method and its application of waste printed circuit board remanufacture feed grade basic copper chloride

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108467054A (en) * 2018-06-08 2018-08-31 广州科城环保科技有限公司 A kind of method and its application of waste printed circuit board remanufacture feed grade basic copper chloride

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Legal Events

Date Code Title Description
ST Notification of lapse