FR2090380A1 - - Google Patents

Info

Publication number
FR2090380A1
FR2090380A1 FR7119564A FR7119564A FR2090380A1 FR 2090380 A1 FR2090380 A1 FR 2090380A1 FR 7119564 A FR7119564 A FR 7119564A FR 7119564 A FR7119564 A FR 7119564A FR 2090380 A1 FR2090380 A1 FR 2090380A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7119564A
Other languages
French (fr)
Other versions
FR2090380B1 (xx
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of FR2090380A1 publication Critical patent/FR2090380A1/fr
Application granted granted Critical
Publication of FR2090380B1 publication Critical patent/FR2090380B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR7119564A 1970-05-29 1971-05-28 Expired FR2090380B1 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7007827A NL7007827A (xx) 1970-05-29 1970-05-29

Publications (2)

Publication Number Publication Date
FR2090380A1 true FR2090380A1 (xx) 1972-01-14
FR2090380B1 FR2090380B1 (xx) 1973-06-08

Family

ID=19810192

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7119564A Expired FR2090380B1 (xx) 1970-05-29 1971-05-28

Country Status (4)

Country Link
DE (1) DE2127080A1 (xx)
FR (1) FR2090380B1 (xx)
GB (1) GB1339663A (xx)
NL (1) NL7007827A (xx)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0141400A2 (de) * 1983-11-08 1985-05-15 Hoechst Aktiengesellschaft Lichtempfindliches Gemisch und Verfahren zur Herstellung von negativen Reliefkopien
EP0162691A2 (en) * 1984-05-25 1985-11-27 W.R. Grace & Co. Water-developable, negative-working, lithographic printing plate
EP0172525A2 (de) * 1984-08-21 1986-02-26 Hoechst Aktiengesellschaft Verfahren zur Reduzierung von Unterstrahlungen bei der Bestrahlung von Reproduktionsschichten
EP0316618A2 (de) * 1987-10-31 1989-05-24 BASF Aktiengesellschaft Mehrschichtiges, flächenförmiges, lichtempfindliches Aufzeichnungsmaterial

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR850001415B1 (ko) * 1980-07-04 1985-09-30 가부시기가이샤 히다찌 세이사꾸쇼 감광성 조성물(感光性組成物)
DE3433911A1 (de) * 1984-09-15 1986-03-27 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0141400A2 (de) * 1983-11-08 1985-05-15 Hoechst Aktiengesellschaft Lichtempfindliches Gemisch und Verfahren zur Herstellung von negativen Reliefkopien
EP0141400A3 (en) * 1983-11-08 1987-05-06 Hoechst Aktiengesellschaft Light-sensitive composition and process for the preparation of relief copies
EP0162691A2 (en) * 1984-05-25 1985-11-27 W.R. Grace & Co. Water-developable, negative-working, lithographic printing plate
EP0162691A3 (en) * 1984-05-25 1987-04-15 W.R. Grace & Co. Water-developable, negative-working, lithographic printing plate
EP0172525A2 (de) * 1984-08-21 1986-02-26 Hoechst Aktiengesellschaft Verfahren zur Reduzierung von Unterstrahlungen bei der Bestrahlung von Reproduktionsschichten
EP0172525A3 (de) * 1984-08-21 1987-10-07 Hoechst Aktiengesellschaft Verfahren zur Reduzierung von Unterstrahlungen bei der Bestrahlung von Reproduktionsschichten
EP0316618A2 (de) * 1987-10-31 1989-05-24 BASF Aktiengesellschaft Mehrschichtiges, flächenförmiges, lichtempfindliches Aufzeichnungsmaterial
EP0316618A3 (de) * 1987-10-31 1991-03-20 BASF Aktiengesellschaft Mehrschichtiges, flächenförmiges, lichtempfindliches Aufzeichnungsmaterial

Also Published As

Publication number Publication date
NL7007827A (xx) 1971-12-01
GB1339663A (en) 1973-12-05
DE2127080A1 (de) 1972-12-07
FR2090380B1 (xx) 1973-06-08

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Legal Events

Date Code Title Description
ST Notification of lapse