FR2084956A5 - - Google Patents

Info

Publication number
FR2084956A5
FR2084956A5 FR7109878A FR7109878A FR2084956A5 FR 2084956 A5 FR2084956 A5 FR 2084956A5 FR 7109878 A FR7109878 A FR 7109878A FR 7109878 A FR7109878 A FR 7109878A FR 2084956 A5 FR2084956 A5 FR 2084956A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7109878A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Whittaker Corp
Original Assignee
Whittaker Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Whittaker Corp filed Critical Whittaker Corp
Application granted granted Critical
Publication of FR2084956A5 publication Critical patent/FR2084956A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
FR7109878A 1970-03-20 1971-03-19 Expired FR2084956A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2128270A 1970-03-20 1970-03-20

Publications (1)

Publication Number Publication Date
FR2084956A5 true FR2084956A5 (en) 1971-12-17

Family

ID=21803338

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7109878A Expired FR2084956A5 (en) 1970-03-20 1971-03-19

Country Status (5)

Country Link
DE (1) DE2113375A1 (en)
ES (1) ES389693A1 (en)
FR (1) FR2084956A5 (en)
GB (1) GB1341759A (en)
ZA (1) ZA711702B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008634A1 (en) * 1978-07-08 1980-03-19 Wolfgang Kieferle Method and apparatus for depositing a layer of a metal or an alloy on an electrically conductive workpiece
WO1988010321A1 (en) * 1987-06-25 1988-12-29 University Of Houston-University Park Process for the deposition of diamond films
EP0304201A1 (en) * 1987-08-19 1989-02-22 The Regents Of The University Of California Process for making diamond doped diamond and diamond-cubic boron nitride composite films

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5957416A (en) * 1982-09-27 1984-04-03 Konishiroku Photo Ind Co Ltd Formation of compound semiconductor layer
US4486286A (en) * 1982-09-28 1984-12-04 Nerken Research Corp. Method of depositing a carbon film on a substrate and products obtained thereby
CH664163A5 (en) * 1985-03-01 1988-02-15 Balzers Hochvakuum METHOD FOR REACTIVELY VAPORIZING LAYERS OF OXIDES, NITRIDS, OXYNITRIDES AND CARBIDS.
GB2178061B (en) * 1985-07-01 1989-04-26 Atomic Energy Authority Uk Coating improvements
GB2182350B (en) * 1985-07-01 1989-04-26 Atomic Energy Authority Uk Coating improvements
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
GB2213501A (en) * 1987-12-11 1989-08-16 Plessey Co Plc Production of superconducting thin films by ion beam sputtering from a single ceramic target
US7608151B2 (en) * 2005-03-07 2009-10-27 Sub-One Technology, Inc. Method and system for coating sections of internal surfaces

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008634A1 (en) * 1978-07-08 1980-03-19 Wolfgang Kieferle Method and apparatus for depositing a layer of a metal or an alloy on an electrically conductive workpiece
WO1988010321A1 (en) * 1987-06-25 1988-12-29 University Of Houston-University Park Process for the deposition of diamond films
EP0304201A1 (en) * 1987-08-19 1989-02-22 The Regents Of The University Of California Process for making diamond doped diamond and diamond-cubic boron nitride composite films

Also Published As

Publication number Publication date
GB1341759A (en) 1973-12-25
ZA711702B (en) 1971-12-29
DE2113375A1 (en) 1971-10-07
ES389693A1 (en) 1974-03-01

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Legal Events

Date Code Title Description
ST Notification of lapse