FR2077263A1 - - Google Patents
Info
- Publication number
- FR2077263A1 FR2077263A1 FR7047128A FR7047128A FR2077263A1 FR 2077263 A1 FR2077263 A1 FR 2077263A1 FR 7047128 A FR7047128 A FR 7047128A FR 7047128 A FR7047128 A FR 7047128A FR 2077263 A1 FR2077263 A1 FR 2077263A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P30/00—Ion implantation into wafers, substrates or parts of devices
- H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
- H10P30/22—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
- H10P14/6314—Formation by oxidation, e.g. oxidation of the substrate of a metallic layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/064—Manufacture or treatment of conductive parts of the interconnections by modifying the conductivity of conductive parts, e.g. by alloying
- H10W20/065—Manufacture or treatment of conductive parts of the interconnections by modifying the conductivity of conductive parts, e.g. by alloying by making at least a portion of the conductive part non-conductive, e.g. by oxidation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US496670A | 1970-01-22 | 1970-01-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2077263A1 true FR2077263A1 (https=) | 1971-10-22 |
| FR2077263B1 FR2077263B1 (https=) | 1975-02-21 |
Family
ID=21713436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7047128A Expired FR2077263B1 (https=) | 1970-01-22 | 1970-12-17 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3681147A (https=) |
| JP (1) | JPS5435075B1 (https=) |
| DE (1) | DE2100224C3 (https=) |
| FR (1) | FR2077263B1 (https=) |
| GB (1) | GB1270227A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3882000A (en) * | 1974-05-09 | 1975-05-06 | Bell Telephone Labor Inc | Formation of composite oxides on III-V semiconductors |
| US4038107B1 (en) * | 1975-12-03 | 1995-04-18 | Samsung Semiconductor Tele | Method for making transistor structures |
| JPS5676539A (en) * | 1979-11-28 | 1981-06-24 | Sumitomo Electric Ind Ltd | Formation of insulating film on semiconductor substrate |
| US4517734A (en) * | 1982-05-12 | 1985-05-21 | Eastman Kodak Company | Method of passivating aluminum interconnects of non-hermetically sealed integrated circuit semiconductor devices |
| NL8303268A (nl) * | 1983-09-23 | 1985-04-16 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd door toepassing van een dergelijke werkwijze. |
| ATE67897T1 (de) * | 1985-10-22 | 1991-10-15 | Siemens Ag | Integrierte halbleiterschaltung mit einem elektrisch leitenden flaechenelement. |
| DE10332725A1 (de) * | 2003-07-18 | 2005-02-24 | Forschungszentrum Jülich GmbH | Verfahren zur selbstjustierenden Verkleinerung von Strukturen |
| TWI683351B (zh) * | 2017-12-14 | 2020-01-21 | 新唐科技股份有限公司 | 半導體裝置及其形成方法 |
-
1970
- 1970-01-22 US US4966A patent/US3681147A/en not_active Expired - Lifetime
- 1970-12-17 JP JP11259270A patent/JPS5435075B1/ja active Pending
- 1970-12-17 FR FR7047128A patent/FR2077263B1/fr not_active Expired
-
1971
- 1971-01-04 GB GB267/71A patent/GB1270227A/en not_active Expired
- 1971-01-05 DE DE2100224A patent/DE2100224C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2100224C3 (de) | 1979-05-31 |
| FR2077263B1 (https=) | 1975-02-21 |
| US3681147A (en) | 1972-08-01 |
| DE2100224B2 (de) | 1978-09-28 |
| JPS5435075B1 (https=) | 1979-10-31 |
| GB1270227A (en) | 1972-04-12 |
| DE2100224A1 (de) | 1971-07-29 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |