FR2075468A5 - - Google Patents

Info

Publication number
FR2075468A5
FR2075468A5 FR7100859A FR7100859A FR2075468A5 FR 2075468 A5 FR2075468 A5 FR 2075468A5 FR 7100859 A FR7100859 A FR 7100859A FR 7100859 A FR7100859 A FR 7100859A FR 2075468 A5 FR2075468 A5 FR 2075468A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7100859A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2075468A5 publication Critical patent/FR2075468A5/fr
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H18/00—Winding webs
    • B65H18/02—Supporting web roll
    • B65H18/021—Multiple web roll supports
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • C23C14/3478—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Discharge Heating (AREA)
  • Plasma Technology (AREA)
FR7100859A 1970-01-22 1971-01-07 Expired FR2075468A5 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US482570A 1970-01-22 1970-01-22

Publications (1)

Publication Number Publication Date
FR2075468A5 true FR2075468A5 (enExample) 1971-10-08

Family

ID=21712710

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7100859A Expired FR2075468A5 (enExample) 1970-01-22 1971-01-07

Country Status (5)

Country Link
US (1) US3707452A (enExample)
JP (1) JPS4926837B1 (enExample)
DE (1) DE2102334A1 (enExample)
FR (1) FR2075468A5 (enExample)
GB (1) GB1318141A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136364A1 (de) * 1983-09-23 1985-04-10 Ibm Deutschland Gmbh Verfahren und Anordnung zum selektiven, selbstjustierten Aufbringen von Metallschichten und Verwendung des Verfahrens

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area
US4268374A (en) * 1979-08-09 1981-05-19 Bell Telephone Laboratories, Incorporated High capacity sputter-etching apparatus
US4478701A (en) * 1983-12-30 1984-10-23 Rca Corporation Target support adjusting fixture
US5935411A (en) * 1997-05-16 1999-08-10 Ethicon, Inc. Continuous process for electropolishing surgical needles
US7504011B2 (en) * 2005-10-24 2009-03-17 Guardian Industries Corp. Sputtering target and method/apparatus for cooling the target
CN103849840B (zh) * 2012-12-06 2016-02-10 北京北方微电子基地设备工艺研究中心有限责任公司 物理气相沉积设备
KR20200135569A (ko) * 2016-01-13 2020-12-02 어플라이드 머티어리얼스, 인코포레이티드 기판을 홀딩하기 위한 홀딩 어레인지먼트, 기판을 지지하기 위한 캐리어, 진공 프로세싱 시스템, 기판을 홀딩하기 위한 방법, 및 기판을 릴리스하기 위한 방법
US11670490B2 (en) 2017-09-29 2023-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit fabrication system with adjustable gas injector
US20200316239A1 (en) * 2017-12-30 2020-10-08 3M Innovative Properties Company Plasma sterilization and drying system and methods
US10748740B2 (en) * 2018-08-21 2020-08-18 Fei Company X-ray and particle shield for improved vacuum conductivity
EP3927865A1 (en) * 2019-02-20 2021-12-29 Oerlikon Surface Solutions AG, Pfäffikon Optimized system and method for transporting and moving substrates in a modular coating facility

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136364A1 (de) * 1983-09-23 1985-04-10 Ibm Deutschland Gmbh Verfahren und Anordnung zum selektiven, selbstjustierten Aufbringen von Metallschichten und Verwendung des Verfahrens

Also Published As

Publication number Publication date
GB1318141A (en) 1973-05-23
DE2102334A1 (de) 1971-07-29
JPS4926837B1 (enExample) 1974-07-12
US3707452A (en) 1972-12-26

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Legal Events

Date Code Title Description
ST Notification of lapse