FR2058385B1 - - Google Patents
Info
- Publication number
- FR2058385B1 FR2058385B1 FR7022206A FR7022206A FR2058385B1 FR 2058385 B1 FR2058385 B1 FR 2058385B1 FR 7022206 A FR7022206 A FR 7022206A FR 7022206 A FR7022206 A FR 7022206A FR 2058385 B1 FR2058385 B1 FR 2058385B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
- H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
- H10W10/13—Isolation regions comprising dielectric materials formed using local oxidation of silicon [LOCOS], e.g. sealed interface localised oxidation [SILO] or side-wall mask isolation [SWAMI]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US85159869A | 1969-08-20 | 1969-08-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2058385A1 FR2058385A1 (en) | 1971-05-28 |
| FR2058385B1 true FR2058385B1 (en:Method) | 1974-02-01 |
Family
ID=25311171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7022206A Granted FR2058385A1 (en) | 1969-08-20 | 1970-06-17 | Diode with schottky barrier |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4916231B1 (en:Method) |
| BE (1) | BE752537A (en:Method) |
| CA (1) | CA934477A (en:Method) |
| DE (1) | DE2040434C3 (en:Method) |
| FR (1) | FR2058385A1 (en:Method) |
| NL (1) | NL7012158A (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5267961A (en) * | 1975-12-03 | 1977-06-06 | Mitsubishi Electric Corp | Electrode formation of semiconductor unit |
| JPH0211485U (en:Method) * | 1988-07-07 | 1990-01-24 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE63253C (de) * | L. RITTER in Grabow, Mecklenburg-Schwerin | Maischdauer-Kontrollapparat | ||
| NL153374B (nl) * | 1966-10-05 | 1977-05-16 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze. |
| US3621344A (en) * | 1967-11-30 | 1971-11-16 | William M Portnoy | Titanium-silicon rectifying junction |
-
1970
- 1970-06-17 FR FR7022206A patent/FR2058385A1/fr active Granted
- 1970-06-25 BE BE752537D patent/BE752537A/xx unknown
- 1970-07-28 CA CA089298A patent/CA934477A/en not_active Expired
- 1970-08-14 DE DE2040434A patent/DE2040434C3/de not_active Expired
- 1970-08-18 NL NL7012158A patent/NL7012158A/xx unknown
- 1970-08-20 JP JP45072477A patent/JPS4916231B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2040434B2 (de) | 1977-08-04 |
| NL7012158A (en:Method) | 1971-02-23 |
| CA934477A (en) | 1973-09-25 |
| FR2058385A1 (en) | 1971-05-28 |
| DE2040434A1 (de) | 1971-02-25 |
| DE2040434C3 (de) | 1978-04-06 |
| BE752537A (fr) | 1970-12-01 |
| JPS4916231B1 (en:Method) | 1974-04-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TP | Transmission of property | ||
| ST | Notification of lapse |