FR2033713A5 - PROCEDURE FOR OBTAINING RECURRING PHOTOGRAPHIC MATRIX OF ANY DESIRED SIZE AND ARRANGED IN A FIELD OF HIDDEN SHIFTS IN A DEFINED MANNER WITH RESPECT TO A FIXED POINT, AND PROVIDES - Google Patents

PROCEDURE FOR OBTAINING RECURRING PHOTOGRAPHIC MATRIX OF ANY DESIRED SIZE AND ARRANGED IN A FIELD OF HIDDEN SHIFTS IN A DEFINED MANNER WITH RESPECT TO A FIXED POINT, AND PROVIDES

Info

Publication number
FR2033713A5
FR2033713A5 FR6945459A FR6945459A FR2033713A5 FR 2033713 A5 FR2033713 A5 FR 2033713A5 FR 6945459 A FR6945459 A FR 6945459A FR 6945459 A FR6945459 A FR 6945459A FR 2033713 A5 FR2033713 A5 FR 2033713A5
Authority
FR
France
Prior art keywords
recurring
hidden
shifts
procedure
obtaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR6945459A
Other languages
French (fr)
Inventor
Reinhard Springer
Kurt Prescher
Eberhard Jahn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MOLEKULARELEKTRONIK
Original Assignee
MOLEKULARELEKTRONIK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MOLEKULARELEKTRONIK filed Critical MOLEKULARELEKTRONIK
Application granted granted Critical
Publication of FR2033713A5 publication Critical patent/FR2033713A5/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
FR6945459A 1969-03-19 1969-12-30 PROCEDURE FOR OBTAINING RECURRING PHOTOGRAPHIC MATRIX OF ANY DESIRED SIZE AND ARRANGED IN A FIELD OF HIDDEN SHIFTS IN A DEFINED MANNER WITH RESPECT TO A FIXED POINT, AND PROVIDES Expired FR2033713A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13867369 1969-03-19

Publications (1)

Publication Number Publication Date
FR2033713A5 true FR2033713A5 (en) 1970-12-04

Family

ID=5481050

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6945459A Expired FR2033713A5 (en) 1969-03-19 1969-12-30 PROCEDURE FOR OBTAINING RECURRING PHOTOGRAPHIC MATRIX OF ANY DESIRED SIZE AND ARRANGED IN A FIELD OF HIDDEN SHIFTS IN A DEFINED MANNER WITH RESPECT TO A FIXED POINT, AND PROVIDES

Country Status (2)

Country Link
DE (1) DE2012360A1 (en)
FR (1) FR2033713A5 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0037663A2 (en) * 1980-04-02 1981-10-14 General Signal Corporation Method and apparatus for positioning a wafer on a flat bed

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4134066A (en) * 1977-03-24 1979-01-09 International Business Machines Corporation Wafer indexing system using a grid pattern and coding and orientation marks in each grid cell
DE3142025C2 (en) * 1981-10-23 1985-03-21 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Method and device for the production of exposure masks for the production of a recording medium with a recording of high information density

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0037663A2 (en) * 1980-04-02 1981-10-14 General Signal Corporation Method and apparatus for positioning a wafer on a flat bed
EP0037663A3 (en) * 1980-04-02 1981-11-18 General Signal Corporation Positioning system

Also Published As

Publication number Publication date
DE2012360A1 (en) 1970-10-01

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