FR2027696A1 - - Google Patents

Info

Publication number
FR2027696A1
FR2027696A1 FR7000086A FR7000086A FR2027696A1 FR 2027696 A1 FR2027696 A1 FR 2027696A1 FR 7000086 A FR7000086 A FR 7000086A FR 7000086 A FR7000086 A FR 7000086A FR 2027696 A1 FR2027696 A1 FR 2027696A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7000086A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
COLLEGE NORTH, University of
Original Assignee
COLLEGE NORTH, University of
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by COLLEGE NORTH, University of filed Critical COLLEGE NORTH, University of
Publication of FR2027696A1 publication Critical patent/FR2027696A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
FR7000086A 1969-01-02 1970-01-02 Withdrawn FR2027696A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB38069 1969-01-02
GB5695969 1969-11-20

Publications (1)

Publication Number Publication Date
FR2027696A1 true FR2027696A1 (es) 1970-10-02

Family

ID=26235885

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7000086A Withdrawn FR2027696A1 (es) 1969-01-02 1970-01-02

Country Status (4)

Country Link
US (1) US3691053A (es)
DE (1) DE2000054A1 (es)
FR (1) FR2027696A1 (es)
GB (1) GB1301653A (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0511733A1 (en) * 1991-04-30 1992-11-04 Applied Materials, Inc. Removable shutter apparatus for a semiconductor process chamber

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
US3904503A (en) * 1974-05-31 1975-09-09 Western Electric Co Depositing material on a substrate using a shield
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
DE3569265D1 (en) * 1985-01-17 1989-05-11 Ibm Deutschland Process for the production of low-resistance contacts
DE3811599A1 (de) * 1988-04-07 1989-10-19 Battelle Institut E V Vorrichtung zur beschichtung der innenwand eines kunststoff-kraftfahrzeugtanks mit einer sperrschicht
US4961832A (en) * 1989-03-14 1990-10-09 Shagun Vladimir A Apparatus for applying film coatings onto substrates in vacuum
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
JP4344019B2 (ja) * 1997-05-28 2009-10-14 キヤノンアネルバ株式会社 イオン化スパッタ方法
WO2003027352A1 (en) * 2001-09-27 2003-04-03 E.I. Du Pont De Nemours And Company Dual-source, single-chamber method and apparatus for sputter deposition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0511733A1 (en) * 1991-04-30 1992-11-04 Applied Materials, Inc. Removable shutter apparatus for a semiconductor process chamber

Also Published As

Publication number Publication date
DE2000054A1 (de) 1971-03-04
GB1301653A (es) 1973-01-04
US3691053A (en) 1972-09-12

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Legal Events

Date Code Title Description
ST Notification of lapse