FR1551548A - - Google Patents

Info

Publication number
FR1551548A
FR1551548A FR1551548DA FR1551548A FR 1551548 A FR1551548 A FR 1551548A FR 1551548D A FR1551548D A FR 1551548DA FR 1551548 A FR1551548 A FR 1551548A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1551548A publication Critical patent/FR1551548A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Catalysts (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR1551548D 1967-01-18 1968-01-17 Expired FR1551548A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEF0051271 1967-01-18

Publications (1)

Publication Number Publication Date
FR1551548A true FR1551548A (fr) 1968-12-27

Family

ID=7104477

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1551548D Expired FR1551548A (fr) 1967-01-18 1968-01-17

Country Status (4)

Country Link
US (1) US3620733A (fr)
DE (1) DE1547864A1 (fr)
FR (1) FR1551548A (fr)
GB (1) GB1216232A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0004014A2 (fr) * 1978-03-07 1979-09-19 Hoechst Aktiengesellschaft Procédé et solution de développement de couches de reproduction photosensibles exposées

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001016A (en) * 1971-05-25 1977-01-04 Agfa-Gevaert, A.G. Polymers which can be cross-linked by photopolymerization
US3867142A (en) * 1973-04-16 1975-02-18 Krause Offset System Kg Photosensitive materials for producing printing plates
US5225315A (en) * 1991-09-19 1993-07-06 Dymax Corporation Water soluble formulation for masking and the like, and method utilizing the same
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US8541498B2 (en) 2010-09-08 2013-09-24 Biointeractions Ltd. Lubricious coatings for medical devices

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2831768A (en) * 1956-01-19 1958-04-22 Eastman Kodak Co Polymeric light-sensitive photographic elements
US3120564A (en) * 1960-01-13 1964-02-04 American Cyanamid Co Alkenoylamino benzophenones
BE630088A (fr) * 1962-03-27 1900-01-01
US3341493A (en) * 1962-09-17 1967-09-12 Nat Starch Chem Corp Ethylenically unsaturated derivatives of 2, 4-dihydroxybenzophenone
US3330656A (en) * 1963-08-14 1967-07-11 Polaroid Corp Novel photographic products and processes
US3183219A (en) * 1963-10-29 1965-05-11 Polaroid Corp 2-benzoyl-5-methoxyphenyl acrylate and polymers thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0004014A2 (fr) * 1978-03-07 1979-09-19 Hoechst Aktiengesellschaft Procédé et solution de développement de couches de reproduction photosensibles exposées
EP0004014A3 (en) * 1978-03-07 1979-10-03 Hoechst Aktiengesellschaft Method and solution for the development of exposed light-sensitive reproduction layers

Also Published As

Publication number Publication date
GB1216232A (en) 1970-12-16
DE1547864A1 (de) 1969-12-04
US3620733A (en) 1971-11-16

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Legal Events

Date Code Title Description
ST Notification of lapse