FR1542334A - Composition photosensible développable par un alcali - Google Patents

Composition photosensible développable par un alcali

Info

Publication number
FR1542334A
FR1542334A FR127119A FR127119A FR1542334A FR 1542334 A FR1542334 A FR 1542334A FR 127119 A FR127119 A FR 127119A FR 127119 A FR127119 A FR 127119A FR 1542334 A FR1542334 A FR 1542334A
Authority
FR
France
Prior art keywords
alkali
photosensitive composition
composition developable
developable
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR127119A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Priority to FR127119A priority Critical patent/FR1542334A/fr
Application granted granted Critical
Publication of FR1542334A publication Critical patent/FR1542334A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
FR127119A 1967-07-07 1967-11-06 Composition photosensible développable par un alcali Expired FR1542334A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR127119A FR1542334A (fr) 1967-07-07 1967-11-06 Composition photosensible développable par un alcali

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65170067A 1967-07-07 1967-07-07
FR127119A FR1542334A (fr) 1967-07-07 1967-11-06 Composition photosensible développable par un alcali

Publications (1)

Publication Number Publication Date
FR1542334A true FR1542334A (fr) 1968-10-11

Family

ID=26180559

Family Applications (1)

Application Number Title Priority Date Filing Date
FR127119A Expired FR1542334A (fr) 1967-07-07 1967-11-06 Composition photosensible développable par un alcali

Country Status (1)

Country Link
FR (1) FR1542334A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products

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