FR1522201A - Method for manufacturing junction semiconductor devices - Google Patents

Method for manufacturing junction semiconductor devices

Info

Publication number
FR1522201A
FR1522201A FR867167A FR867167A FR1522201A FR 1522201 A FR1522201 A FR 1522201A FR 867167 A FR867167 A FR 867167A FR 867167 A FR867167 A FR 867167A FR 1522201 A FR1522201 A FR 1522201A
Authority
FR
France
Prior art keywords
semiconductor devices
junction semiconductor
manufacturing junction
manufacturing
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR867167A
Other languages
French (fr)
Inventor
Georges Rapp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to FR867167A priority Critical patent/FR1522201A/en
Application granted granted Critical
Publication of FR1522201A publication Critical patent/FR1522201A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR867167A 1961-07-06 1961-07-06 Method for manufacturing junction semiconductor devices Expired FR1522201A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR867167A FR1522201A (en) 1961-07-06 1961-07-06 Method for manufacturing junction semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR867167A FR1522201A (en) 1961-07-06 1961-07-06 Method for manufacturing junction semiconductor devices

Publications (1)

Publication Number Publication Date
FR1522201A true FR1522201A (en) 1968-04-26

Family

ID=8758784

Family Applications (1)

Application Number Title Priority Date Filing Date
FR867167A Expired FR1522201A (en) 1961-07-06 1961-07-06 Method for manufacturing junction semiconductor devices

Country Status (1)

Country Link
FR (1) FR1522201A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2402303A1 (en) * 1977-09-03 1979-03-30 Semikron Gleichrichterbau SURFACE TREATMENT FOR STABILIZATION OF SEMICONDUCTOR BODIES

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2402303A1 (en) * 1977-09-03 1979-03-30 Semikron Gleichrichterbau SURFACE TREATMENT FOR STABILIZATION OF SEMICONDUCTOR BODIES

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