FR1455657A - Procédé de dopage de corps semiconducteurs - Google Patents

Procédé de dopage de corps semiconducteurs

Info

Publication number
FR1455657A
FR1455657A FR40144A FR40144A FR1455657A FR 1455657 A FR1455657 A FR 1455657A FR 40144 A FR40144 A FR 40144A FR 40144 A FR40144 A FR 40144A FR 1455657 A FR1455657 A FR 1455657A
Authority
FR
France
Prior art keywords
semiconductor bodies
doping semiconductor
doping
bodies
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR40144A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Schuckertwerke AG
Siemens AG
Original Assignee
Siemens Schuckertwerke AG
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Schuckertwerke AG, Siemens AG filed Critical Siemens Schuckertwerke AG
Application granted granted Critical
Publication of FR1455657A publication Critical patent/FR1455657A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2252Diffusion into or out of group IV semiconductors using predeposition of impurities into the semiconductor surface, e.g. from a gaseous phase
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/08Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state the diffusion materials being a compound of the elements to be diffused
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR40144A 1964-12-05 1965-11-29 Procédé de dopage de corps semiconducteurs Expired FR1455657A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0094470 1964-12-05

Publications (1)

Publication Number Publication Date
FR1455657A true FR1455657A (fr) 1966-04-01

Family

ID=7518715

Family Applications (1)

Application Number Title Priority Date Filing Date
FR40144A Expired FR1455657A (fr) 1964-12-05 1965-11-29 Procédé de dopage de corps semiconducteurs

Country Status (3)

Country Link
DE (1) DE1544255A1 (fr)
FR (1) FR1455657A (fr)
GB (1) GB1054360A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2178751B1 (fr) * 1972-04-05 1974-10-18 Radiotechnique Compelec
US4804634A (en) * 1981-04-24 1989-02-14 National Semiconductor Corporation Integrated circuit lateral transistor structure

Also Published As

Publication number Publication date
DE1544255A1 (de) 1970-07-02
GB1054360A (fr)

Similar Documents

Publication Publication Date Title
BR6460494D0 (pt) Fabricacao de dispositivos semi-condutores
FR1379636A (fr) Procédé de construction de dômes stéréométriques
SU435616A3 (ru) Способ безобжигового упрочнения окатышей
FR1455657A (fr) Procédé de dopage de corps semiconducteurs
BE603265A (fr) Procédé de formation de jonctions
FR1441314A (fr) Fabrication de corps semi-conducteurs allongés
FR1436298A (fr) Procédé de fabrication de 2-alcoyl- et de 2-aryl-delta2-oxazolines
FR1462591A (fr) Procédé de dopage de régions dans des corps semi-conducteurs
FR1420287A (fr) Procédé de dédoublement direct de n-benzoyl-dl-sérine
FR1490480A (fr) Procédé de fabrication de 2-imidazolidinones substituées
BE614058A (fr) Procédé de formation de corps semiconducteurs.
FR1329928A (fr) Procédé de formation de corps semi-conducteurs
CH424589A (de) Betonbereitungsanlage
FR1368121A (fr) Procédé de construction perfectionné
FR1378045A (fr) Modification de polyodéfines
FR1486828A (fr) Procédé de fabrication de supports de magnétogrammes
FR1400084A (fr) Procédé de revêtement de semiconducteurs
FR1367012A (fr) Procédé de métallisation
FR1284090A (fr) Procédé de construction
FR1499019A (fr) Procédé de fabrication de supports de magnétogrammes
FR1415131A (fr) Production de dihydrodicyclopentadiénylamine
FR86377E (fr) Procédé de fabrication de corps semiconducteurs monocristallins
FR1382206A (fr) Procédé de construction
FR85554E (fr) Procédé de fabrication de corps semi-conducteurs monocristallins
FR1373055A (fr) Procédé de fabrication de corps semi-conducteurs monocristallins