FR1432750A - Procédé d'oxydation du silicium - Google Patents

Procédé d'oxydation du silicium

Info

Publication number
FR1432750A
FR1432750A FR5129A FR5129A FR1432750A FR 1432750 A FR1432750 A FR 1432750A FR 5129 A FR5129 A FR 5129A FR 5129 A FR5129 A FR 5129A FR 1432750 A FR1432750 A FR 1432750A
Authority
FR
France
Prior art keywords
oxidation process
silicon oxidation
silicon
oxidation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR5129A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
CSF Compagnie Generale de Telegraphie sans Fil SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CSF Compagnie Generale de Telegraphie sans Fil SA filed Critical CSF Compagnie Generale de Telegraphie sans Fil SA
Priority to FR5129A priority Critical patent/FR1432750A/fr
Priority to GB5753/66A priority patent/GB1129465A/en
Priority to DE19661496762 priority patent/DE1496762A1/de
Priority to NL6601694A priority patent/NL6601694A/xx
Application granted granted Critical
Publication of FR1432750A publication Critical patent/FR1432750A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Formation Of Insulating Films (AREA)
FR5129A 1965-02-11 1965-02-11 Procédé d'oxydation du silicium Expired FR1432750A (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR5129A FR1432750A (fr) 1965-02-11 1965-02-11 Procédé d'oxydation du silicium
GB5753/66A GB1129465A (en) 1965-02-11 1966-02-09 Method for oxidizing silicon
DE19661496762 DE1496762A1 (de) 1965-02-11 1966-02-10 Verfahren zur Oberflaechenoxydation eines Siliciumgegenstands
NL6601694A NL6601694A (cs) 1965-02-11 1966-02-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR5129A FR1432750A (fr) 1965-02-11 1965-02-11 Procédé d'oxydation du silicium

Publications (1)

Publication Number Publication Date
FR1432750A true FR1432750A (fr) 1966-03-25

Family

ID=8570672

Family Applications (1)

Application Number Title Priority Date Filing Date
FR5129A Expired FR1432750A (fr) 1965-02-11 1965-02-11 Procédé d'oxydation du silicium

Country Status (4)

Country Link
DE (1) DE1496762A1 (cs)
FR (1) FR1432750A (cs)
GB (1) GB1129465A (cs)
NL (1) NL6601694A (cs)

Also Published As

Publication number Publication date
NL6601694A (cs) 1966-08-12
DE1496762A1 (de) 1969-08-07
GB1129465A (en) 1968-10-09

Similar Documents

Publication Publication Date Title
FR1542295A (fr) Procédé d'oxydation d'hydrocarbures
FR1420965A (fr) Procédé d'oxydation d'aldéhydes
FR1428064A (fr) Procédé d'oxydation de cyclohexane
FR1463011A (fr) Procédé d'oxydation d'hydrocarbures
FR1466528A (fr) Procédé d'oxydation de cycloalcanes
CH441365A (fr) Procédé d'oxydation d'hydrazoamides en azoamides
FR1507137A (fr) Procédé d'oxydation d'hydrocarbures oléfiniques
FR1432750A (fr) Procédé d'oxydation du silicium
FR1442535A (fr) Procédé d'attaque sélective du silicium
FR1448752A (fr) Procédé d'oxydation des hydrocarbures
FR1530986A (fr) Procédé d'oxydation d'hydrocarbures
FR1478662A (fr) Procédé de production d'oxynitrure de silicium
FR1453991A (fr) Procédé de préparation d'aldéhydes alpha-éthyléniques
FR1438499A (fr) Procédé d'oxydation du propylène
FR1375000A (fr) Procédé d'oxydation des hydrazoamides
FR1370970A (fr) Procédé d'oxydation de 19-hydroxystéroïdes
BE706330A (fr) Procédé d'oxydation des hydrocarbures
CH456559A (fr) Procédé pour l'oxydation d'oléfines
FR92372E (fr) Procédé d'oxydation de polyacroléines
FR1505805A (fr) Procédé d'oxydation de polyacroléines
FR1487138A (fr) Procédé d'oxydation de l'acétoxypivaldéhyde
FR1367025A (fr) Procédé d'oxydation de p-xylène
FR1494800A (fr) Procédé d'oxydation du tellure
FR1491872A (fr) Procédé d'oxydation de delta5-3-hydroxystéroïde
FR1515932A (fr) Procédé d'oxydation d'hydrocarbures