FR1418609A - Procédé de fabrication d'un élément transistor et élément obtenu - Google Patents

Procédé de fabrication d'un élément transistor et élément obtenu

Info

Publication number
FR1418609A
FR1418609A FR999685A FR999685A FR1418609A FR 1418609 A FR1418609 A FR 1418609A FR 999685 A FR999685 A FR 999685A FR 999685 A FR999685 A FR 999685A FR 1418609 A FR1418609 A FR 1418609A
Authority
FR
France
Prior art keywords
manufacturing
transistor
transistor element
element obtained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR999685A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US333882A external-priority patent/US3283223A/en
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to FR999685A priority Critical patent/FR1418609A/fr
Application granted granted Critical
Publication of FR1418609A publication Critical patent/FR1418609A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
FR999685A 1963-12-27 1964-12-23 Procédé de fabrication d'un élément transistor et élément obtenu Expired FR1418609A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR999685A FR1418609A (fr) 1963-12-27 1964-12-23 Procédé de fabrication d'un élément transistor et élément obtenu

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US333882A US3283223A (en) 1963-12-27 1963-12-27 Transistor and method of fabrication to minimize surface recombination effects
FR999685A FR1418609A (fr) 1963-12-27 1964-12-23 Procédé de fabrication d'un élément transistor et élément obtenu

Publications (1)

Publication Number Publication Date
FR1418609A true FR1418609A (fr) 1965-11-19

Family

ID=26211975

Family Applications (1)

Application Number Title Priority Date Filing Date
FR999685A Expired FR1418609A (fr) 1963-12-27 1964-12-23 Procédé de fabrication d'un élément transistor et élément obtenu

Country Status (1)

Country Link
FR (1) FR1418609A (fr)

Similar Documents

Publication Publication Date Title
CH490268A (fr) Procédé de fabrication d'un élément de rembourrage
FR1434929A (fr) Procédé de fabrication d'un écran courbe et écran ainsi obtenu
FR89249E (fr) Procédé de fabrication d'un volant de direction et volant ainsi obtenu
FR1513060A (fr) Procédé de fabrication d'un élément de construction
FR1458019A (fr) Procédé de fabrication d'un transistor à base métallique
CH431655A (fr) Procédé de fabrication d'un dispositif de connexion
FR1513645A (fr) Procédé de fabrication d'un transistor
BE605638A (fr) Procédé de fabrication d'un élément superconducteur
CH438743A (fr) Procédé de fabrication d'un copolymère
FR1418609A (fr) Procédé de fabrication d'un élément transistor et élément obtenu
FR1323870A (fr) Procédé de fabrication d'un élément de frottement
FR1499015A (fr) Procédé de fabrication d'un bobinage
CH421403A (fr) Procédé de fabrication d'un bigoudi auto-fixant et bigoudi obtenu par ce procédé
FR83371E (fr) Procédé de fabrication d'un livret de famille et livret fabriqué suivant ce procédé
FR86315E (fr) élément semi-conducteur et procédé pour sa fabrication
CH388234A (fr) Procédé de fabrication d'un article à ailettes et article à ailettes obtenu par ce procédé
LU45931A1 (fr) Procédé de fabrication d'un éjecto-convecteur double et éjecto-convecteur double fabriqué selon de procédé
FR1364954A (fr) Procédé de fabrication d'un boîtier calorifuge
FR1531539A (fr) Procédé de fabrication d'un transistor
CH394921A (fr) Procédé de fabrication d'un élément en béton et élément obtenu au moyen de ce procédé
FR87109E (fr) Procédé de fabrication d'un écran courbe et écran ainsi obtenu
FR1425087A (fr) Procédé de fabrication d'un transistor
FR1354558A (fr) Procédé de fabrication d'un élément semi-conducteur
FR1390405A (fr) Procédé de fabrication d'un élément de liaison et élément ainsi obtenu
FR1537645A (fr) Procédé de fabrication d'un transistor planaire