FR1350324A - Matériaux photosensibles - Google Patents
Matériaux photosensiblesInfo
- Publication number
- FR1350324A FR1350324A FR927324A FR927324A FR1350324A FR 1350324 A FR1350324 A FR 1350324A FR 927324 A FR927324 A FR 927324A FR 927324 A FR927324 A FR 927324A FR 1350324 A FR1350324 A FR 1350324A
- Authority
- FR
- France
- Prior art keywords
- photosensitive materials
- photosensitive
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/54—Diazonium salts or diazo anhydrides
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR927324A FR1350324A (fr) | 1962-03-09 | 1963-03-08 | Matériaux photosensibles |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK46130A DE1182063B (de) | 1962-03-09 | 1962-03-09 | Lichtpausmaterial |
FR927324A FR1350324A (fr) | 1962-03-09 | 1963-03-08 | Matériaux photosensibles |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1350324A true FR1350324A (fr) | 1964-01-24 |
Family
ID=25983545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR927324A Expired FR1350324A (fr) | 1962-03-09 | 1963-03-08 | Matériaux photosensibles |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1350324A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0008472A2 (fr) * | 1978-08-22 | 1980-03-05 | Aerni-Leuch Ag | Sels de benzènediazonium sensibles à la lumière et matériau de diazotypie utilisant lesdits sels |
-
1963
- 1963-03-08 FR FR927324A patent/FR1350324A/fr not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0008472A2 (fr) * | 1978-08-22 | 1980-03-05 | Aerni-Leuch Ag | Sels de benzènediazonium sensibles à la lumière et matériau de diazotypie utilisant lesdits sels |
EP0008472A3 (en) * | 1978-08-22 | 1980-03-19 | Aerni Leuch Ag | Benzoldiazonium salts and diazotype material using same |
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