FR1272510A - Electrolytic deposition of nickel - Google Patents
Electrolytic deposition of nickelInfo
- Publication number
- FR1272510A FR1272510A FR820112A FR820112A FR1272510A FR 1272510 A FR1272510 A FR 1272510A FR 820112 A FR820112 A FR 820112A FR 820112 A FR820112 A FR 820112A FR 1272510 A FR1272510 A FR 1272510A
- Authority
- FR
- France
- Prior art keywords
- nickel
- electrolytic deposition
- electrolytic
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/06—Benzimidazoles; Hydrogenated benzimidazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/28—Radicals substituted by singly-bound oxygen or sulphur atoms
- C07D213/32—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/12—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US79621159A | 1959-03-02 | 1959-03-02 | |
| US83339859A | 1959-08-13 | 1959-08-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR1272510A true FR1272510A (en) | 1961-09-29 |
Family
ID=31950307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR820112A Expired FR1272510A (en) | 1959-03-02 | 1960-03-02 | Electrolytic deposition of nickel |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE1150855B (en) |
| FR (1) | FR1272510A (en) |
| GB (1) | GB942802A (en) |
| NL (1) | NL248907A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2171114A (en) * | 1985-02-06 | 1986-08-20 | Canning W Materials Ltd | Trivalent chromium electroplating baths and rejuvenation thereof |
| JP3007497B2 (en) | 1992-11-11 | 2000-02-07 | 三菱電機株式会社 | Semiconductor integrated circuit device, its manufacturing method, and its mounting method |
-
0
- NL NL248907D patent/NL248907A/xx unknown
-
1960
- 1960-02-10 GB GB475560A patent/GB942802A/en not_active Expired
- 1960-02-26 DE DE1960H0038769 patent/DE1150855B/en active Pending
- 1960-03-02 FR FR820112A patent/FR1272510A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE1150855B (en) | 1963-06-27 |
| NL248907A (en) | |
| GB942802A (en) | 1963-11-27 |
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