FR1161192A - Method for electrolytic treatment of bodies of semiconductor material - Google Patents

Method for electrolytic treatment of bodies of semiconductor material

Info

Publication number
FR1161192A
FR1161192A FR1161192DA FR1161192A FR 1161192 A FR1161192 A FR 1161192A FR 1161192D A FR1161192D A FR 1161192DA FR 1161192 A FR1161192 A FR 1161192A
Authority
FR
France
Prior art keywords
bodies
semiconductor material
electrolytic treatment
electrolytic
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Space Systems Loral LLC
Original Assignee
Philco Ford Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philco Ford Corp filed Critical Philco Ford Corp
Application granted granted Critical
Publication of FR1161192A publication Critical patent/FR1161192A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/12—Etching of semiconducting materials
FR1161192D 1955-10-11 1956-10-10 Method for electrolytic treatment of bodies of semiconductor material Expired FR1161192A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US847927XA 1955-10-11 1955-10-11

Publications (1)

Publication Number Publication Date
FR1161192A true FR1161192A (en) 1958-08-22

Family

ID=22187228

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1161192D Expired FR1161192A (en) 1955-10-11 1956-10-10 Method for electrolytic treatment of bodies of semiconductor material

Country Status (2)

Country Link
FR (1) FR1161192A (en)
GB (1) GB847927A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1223222B (en) * 1960-07-05 1966-08-18 Siemens Ag Process for the electrolytic deposition of thin layers
FR2513273A1 (en) * 1981-07-24 1983-03-25 Inoue Japax Res METHOD AND APPARATUS FOR ELECTRO-DEPOSITION OF A METAL ON A WORKPIECE USING A LASER BEAM OR AN ANALOGUE THERMAL LIGHT BEAM

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USB436421I5 (en) * 1965-01-27
US4283259A (en) * 1979-05-08 1981-08-11 International Business Machines Corporation Method for maskless chemical and electrochemical machining
US4379022A (en) * 1979-05-08 1983-04-05 International Business Machines Corporation Method for maskless chemical machining
US4351706A (en) * 1980-03-27 1982-09-28 International Business Machines Corporation Electrochemically eroding semiconductor device
US4369099A (en) * 1981-01-08 1983-01-18 Bell Telephone Laboratories, Incorporated Photoelectrochemical etching of semiconductors
DE3477590D1 (en) * 1983-05-30 1989-05-11 Inoue Japax Res Method of and apparatus for machining ceramic materials
GB2188774B (en) * 1986-04-02 1990-10-31 Westinghouse Electric Corp Method of forming a conductive pattern on a semiconductor surface

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1223222B (en) * 1960-07-05 1966-08-18 Siemens Ag Process for the electrolytic deposition of thin layers
FR2513273A1 (en) * 1981-07-24 1983-03-25 Inoue Japax Res METHOD AND APPARATUS FOR ELECTRO-DEPOSITION OF A METAL ON A WORKPIECE USING A LASER BEAM OR AN ANALOGUE THERMAL LIGHT BEAM

Also Published As

Publication number Publication date
GB847927A (en) 1960-09-14

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