FR1153617A - Nouvelle composition photosensible et ses applications - Google Patents

Nouvelle composition photosensible et ses applications

Info

Publication number
FR1153617A
FR1153617A FR1153617DA FR1153617A FR 1153617 A FR1153617 A FR 1153617A FR 1153617D A FR1153617D A FR 1153617DA FR 1153617 A FR1153617 A FR 1153617A
Authority
FR
France
Prior art keywords
applications
photosensitive composition
new photosensitive
new
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Application granted granted Critical
Publication of FR1153617A publication Critical patent/FR1153617A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
FR1153617D 1956-02-02 1955-12-27 Nouvelle composition photosensible et ses applications Expired FR1153617A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB333256A GB824282A (en) 1956-02-02 1956-02-02 Photosensitive compositions for lithography

Publications (1)

Publication Number Publication Date
FR1153617A true FR1153617A (fr) 1958-03-19

Family

ID=9756314

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1153617D Expired FR1153617A (fr) 1956-02-02 1955-12-27 Nouvelle composition photosensible et ses applications

Country Status (3)

Country Link
BE (1) BE552780A (cg-RX-API-DMAC7.html)
FR (1) FR1153617A (cg-RX-API-DMAC7.html)
GB (1) GB824282A (cg-RX-API-DMAC7.html)

Also Published As

Publication number Publication date
GB824282A (en) 1959-11-25
BE552780A (cg-RX-API-DMAC7.html)

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