FR1086257A - Nouvelle composition photosensible et ses applications - Google Patents
Nouvelle composition photosensible et ses applicationsInfo
- Publication number
- FR1086257A FR1086257A FR1086257DA FR1086257A FR 1086257 A FR1086257 A FR 1086257A FR 1086257D A FR1086257D A FR 1086257DA FR 1086257 A FR1086257 A FR 1086257A
- Authority
- FR
- France
- Prior art keywords
- applications
- photosensitive composition
- new photosensitive
- new
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/112—Cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US207049A US2670285A (en) | 1951-01-20 | 1951-01-20 | Photosensitization of polymeric cinnamic acid esters |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1086257A true FR1086257A (fr) | 1955-02-10 |
Family
ID=22768997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1086257D Expired FR1086257A (fr) | 1951-01-20 | 1952-01-19 | Nouvelle composition photosensible et ses applications |
Country Status (3)
Country | Link |
---|---|
US (1) | US2670285A (fr) |
FR (1) | FR1086257A (fr) |
GB (1) | GB717712A (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE534483A (fr) * | 1953-12-30 | |||
US2969731A (en) * | 1954-05-24 | 1961-01-31 | Unexposed area | |
US3080232A (en) * | 1957-11-29 | 1963-03-05 | Sanders Associates Inc | Method for photographically producing electrical conductor patterns inside a hollow object |
US3052042A (en) * | 1958-02-26 | 1962-09-04 | Allen M Feder | Radar simulation plate and fabricating process therefor |
US3508923A (en) * | 1966-09-21 | 1970-04-28 | Ball Corp | Bimetal planographic plate and method of preparation |
US3568597A (en) * | 1967-07-03 | 1971-03-09 | Eastman Kodak Co | Lithographic printing plate and process |
US3894163A (en) * | 1971-03-08 | 1975-07-08 | Western Electric Co | Additives to negative photoresists which increase the sensitivity thereof |
US4083725A (en) * | 1973-06-02 | 1978-04-11 | Mitsubishi Chemical Industries Ltd. | Photosensitive composition |
DE2558812A1 (de) * | 1975-12-27 | 1977-07-07 | Hoechst Ag | Lichtempfindliche kopiermassen und darin enthaltene photoinitiatoren |
US4147552A (en) * | 1976-05-21 | 1979-04-03 | Eastman Kodak Company | Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers |
DE2720560A1 (de) * | 1977-05-07 | 1978-11-09 | Basf Ag | Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1880808A (en) * | 1927-03-28 | 1932-10-04 | Eastman Kodak Co | Process of making cellulose esters of carboxylic acids |
US1965710A (en) * | 1931-01-21 | 1934-07-10 | Eastman Kodak Co | Photomechanical resist |
US2118864A (en) * | 1932-03-05 | 1938-05-31 | Ig Farbenindustrie Ag | Polymerization products from vinyl esters |
US2273891A (en) * | 1939-02-18 | 1942-02-24 | Pittsburgh Plate Glass Co | Method of polymerizing polymerizable materials containing more than one polymerizable grouping |
US2318959A (en) * | 1940-04-04 | 1943-05-11 | Pittsburgh Plate Glass Co | Artificial glass |
US2332900A (en) * | 1940-07-23 | 1943-10-26 | Gen Electric | Synthetic composition comprising hydrolyzed, acetalized, and/or ketalized polymers of allyl esters |
GB618181A (en) * | 1946-10-30 | 1949-02-17 | Bakelite Ltd | Improvements in or relating to screens or stencils |
-
1951
- 1951-01-20 US US207049A patent/US2670285A/en not_active Expired - Lifetime
-
1952
- 1952-01-19 FR FR1086257D patent/FR1086257A/fr not_active Expired
- 1952-01-21 GB GB1700/52A patent/GB717712A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US2670285A (en) | 1954-02-23 |
GB717712A (en) | 1954-11-03 |
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