FR1004922A - Composition photosensible et ses applications - Google Patents

Composition photosensible et ses applications

Info

Publication number
FR1004922A
FR1004922A FR1004922DA FR1004922A FR 1004922 A FR1004922 A FR 1004922A FR 1004922D A FR1004922D A FR 1004922DA FR 1004922 A FR1004922 A FR 1004922A
Authority
FR
France
Prior art keywords
applications
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Application granted granted Critical
Publication of FR1004922A publication Critical patent/FR1004922A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR1004922D 1948-11-03 1949-10-28 Composition photosensible et ses applications Expired FR1004922A (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5808448A 1948-11-03 1948-11-03
US207048A US2690966A (en) 1948-11-03 1951-01-20 Photomechanical resist
US31247452A 1952-10-01 1952-10-01

Publications (1)

Publication Number Publication Date
FR1004922A true FR1004922A (fr) 1952-04-04

Family

ID=27369386

Family Applications (2)

Application Number Title Priority Date Filing Date
FR1004922D Expired FR1004922A (fr) 1948-11-03 1949-10-28 Composition photosensible et ses applications
FR65362D Expired FR65362E (fr) 1948-11-03 1952-01-19 Composition photosensible et ses applications

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR65362D Expired FR65362E (fr) 1948-11-03 1952-01-19 Composition photosensible et ses applications

Country Status (3)

Country Link
US (2) US2690966A (fr)
FR (2) FR1004922A (fr)
GB (4) GB695262A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2080889A1 (fr) * 1969-12-10 1971-11-26 Nippon Oil Seal Ind Co Ltd

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2980533A (en) * 1953-03-06 1961-04-18 Photoceramics Inc Translucent objects decorated with designs or images
US2856284A (en) * 1955-01-07 1958-10-14 Eastman Kodak Co Photomagnetic printing process
US2823999A (en) * 1955-01-07 1958-02-18 Eastman Kodak Co Photomagnetic composition and printing process
BE549816A (fr) * 1955-07-29
US2811443A (en) * 1955-09-15 1957-10-29 Eastman Kodak Co Photographic reproduction process using light sensitive polymeric stilbazoles and quaternary salts thereof
US3047422A (en) * 1956-01-09 1962-07-31 Miehle Goss Dexter Inc Coating material and method of drying same
US3052042A (en) * 1958-02-26 1962-09-04 Allen M Feder Radar simulation plate and fabricating process therefor
FR1316465A (fr) * 1961-01-05 1963-02-01 Kodak Pathe Nouveau procédé de reproduction photographique utilisant des résines photodurcissables et nouvelles images obtenues
US3255002A (en) * 1961-03-09 1966-06-07 Polaroid Corp Color photographic process and product
US3306744A (en) * 1962-12-17 1967-02-28 Polaroid Corp Copying process using dithioxamides, heavy metal salts and photopolymerizable monomers and photocross linkable polymers
US3268333A (en) * 1963-12-30 1966-08-23 Ibm High gain dry photographic system
BE682303A (fr) * 1965-06-09 1966-11-14
US3474718A (en) * 1966-02-08 1969-10-28 Sperry Rand Corp Photosensitive method for depositing thin uniform glass films on substrates
US3678850A (en) * 1966-05-02 1972-07-25 Xerox Corp Porous printing plate prepared from particulate photosensitive resinous material
US3493380A (en) * 1966-07-01 1970-02-03 Eastman Kodak Co Photoresist composition
DE1669723A1 (de) * 1967-09-22 1971-06-09 Basf Ag Indigoide Farbstoffe enthaltende Platten,Folien oder Filme aus photopolymerisierbaren Massen
US3647447A (en) * 1969-03-03 1972-03-07 Eastman Kodak Co Dyed photoresist compositions
US3650761A (en) * 1969-12-15 1972-03-21 Powers Chemco Inc Photosensitive resist
DE2203732C2 (de) * 1972-01-27 1983-06-01 Hoechst Ag, 6230 Frankfurt Mischpolymerisate und diese enthaltende lichtempfindliche Kopiermassen
US3909930A (en) * 1972-05-23 1975-10-07 Motorola Inc Method for fabricating a liquid crystal display device
US4184872A (en) * 1975-02-13 1980-01-22 Chester Davis Additive system of color photography based on iridescent pigments
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4152159A (en) * 1977-06-03 1979-05-01 Eastman Kodak Company Acid-resistant copolymer and photographic element incorporating same
EP0441638B1 (fr) 1990-02-08 1999-10-13 Konica Corporation Plaque d'impression lithographique sensible à la lumière
US5279917A (en) * 1991-05-09 1994-01-18 Konica Corporation Light-sensitive composition comprising a fluorine copolymer surfactant
US5464932A (en) * 1994-04-15 1995-11-07 The Penn State Research Foundation Photocrosslinkable polyphosphazenes and their use as microencapsulation materials
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
FR2838334B1 (fr) * 2002-04-16 2006-05-26 Polymerexpert Sa Activateur non toxique de polymerisation radicalaire pour ciments osseux ou dentaires
DE102004004865B4 (de) * 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie
US8778568B2 (en) * 2010-12-14 2014-07-15 General Electric Company Optical data storage media and methods for using the same
US8580463B2 (en) * 2011-11-17 2013-11-12 General Electric Company Reactants for optical data storage media and methods for use

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US223762A (en) * 1880-01-20 emilb salvy
US1241738A (en) * 1914-07-02 1917-10-02 Chem Fab Greisheim Elektron Plastic composition and process of producing it.
BE332469A (fr) * 1922-11-24
US1655127A (en) * 1925-08-28 1928-01-03 Wadsworth Watch Case Co Photographic and etching process and product
US1880808A (en) * 1927-03-28 1932-10-04 Eastman Kodak Co Process of making cellulose esters of carboxylic acids
US1965710A (en) * 1931-01-21 1934-07-10 Eastman Kodak Co Photomechanical resist
US1963074A (en) * 1931-11-11 1934-06-19 Du Pont Vinylethinyl carbinol polymers and processes for preparing same
US2118864A (en) * 1932-03-05 1938-05-31 Ig Farbenindustrie Ag Polymerization products from vinyl esters
US2063348A (en) * 1936-03-10 1936-12-08 Eastman Kodak Co Method of making a colored photographic image
US2195362A (en) * 1936-05-21 1940-03-26 Ellis Foster Co Glycol-maleic acid resin and process of making same
FR49315E (fr) * 1938-03-21 1939-02-17 Kodak Pathe Soc Produit et procédé photographiques
US2273891A (en) * 1939-02-18 1942-02-24 Pittsburgh Plate Glass Co Method of polymerizing polymerizable materials containing more than one polymerizable grouping
US2318959A (en) * 1940-04-04 1943-05-11 Pittsburgh Plate Glass Co Artificial glass
US2332896A (en) * 1940-05-29 1943-10-26 Gen Electric Synthetic composition comprising hydrolyzed acetalized copolymers of vinyl esters and unsaturated organic esters
US2472128A (en) * 1947-05-03 1949-06-07 Eastman Kodak Co Coloring ceramic objects
US2544905A (en) * 1948-10-23 1951-03-13 Eastman Kodak Co Method of making photographic relief images
FR65803E (fr) * 1950-03-09 1956-03-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2080889A1 (fr) * 1969-12-10 1971-11-26 Nippon Oil Seal Ind Co Ltd

Also Published As

Publication number Publication date
GB695262A (en) 1953-08-05
FR65362E (fr) 1956-02-09
US2732297A (en) 1956-01-24
GB717709A (en) 1954-11-03
US2690966A (en) 1954-10-05
GB695197A (en) 1953-08-05
GB717711A (en) 1954-11-03

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