FR1109512A - Further training in junction transistors and their manufacturing processes - Google Patents
Further training in junction transistors and their manufacturing processesInfo
- Publication number
- FR1109512A FR1109512A FR1109512DA FR1109512A FR 1109512 A FR1109512 A FR 1109512A FR 1109512D A FR1109512D A FR 1109512DA FR 1109512 A FR1109512 A FR 1109512A
- Authority
- FR
- France
- Prior art keywords
- manufacturing processes
- further training
- junction transistors
- transistors
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1024639X | 1954-07-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1109512A true FR1109512A (en) | 1956-01-30 |
Family
ID=9578963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1109512D Expired FR1109512A (en) | 1954-07-28 | 1954-07-28 | Further training in junction transistors and their manufacturing processes |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1024639B (en) |
FR (1) | FR1109512A (en) |
GB (1) | GB793809A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1125551B (en) * | 1956-05-04 | 1962-03-15 | Philco Corp | Process for producing an alloyed pn junction with very low penetration depth in a semiconductor body |
-
1954
- 1954-07-28 FR FR1109512D patent/FR1109512A/en not_active Expired
-
1955
- 1955-07-20 DE DEC11578A patent/DE1024639B/en active Pending
- 1955-07-28 GB GB21879/55A patent/GB793809A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1125551B (en) * | 1956-05-04 | 1962-03-15 | Philco Corp | Process for producing an alloyed pn junction with very low penetration depth in a semiconductor body |
Also Published As
Publication number | Publication date |
---|---|
DE1024639B (en) | 1958-02-20 |
GB793809A (en) | 1958-04-23 |
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