FI98740C - Förfarande och anordning för plasmadetonationsbehandling av föremål - Google Patents
Förfarande och anordning för plasmadetonationsbehandling av föremål Download PDFInfo
- Publication number
- FI98740C FI98740C FI925429A FI925429A FI98740C FI 98740 C FI98740 C FI 98740C FI 925429 A FI925429 A FI 925429A FI 925429 A FI925429 A FI 925429A FI 98740 C FI98740 C FI 98740C
- Authority
- FI
- Finland
- Prior art keywords
- reaction chamber
- fed
- hardness
- mpa
- layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 138
- 238000005474 detonation Methods 0.000 title claims description 37
- 238000011282 treatment Methods 0.000 title claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 138
- 239000007789 gas Substances 0.000 claims description 83
- 239000000203 mixture Substances 0.000 claims description 54
- 150000001875 compounds Chemical class 0.000 claims description 49
- 238000002485 combustion reaction Methods 0.000 claims description 33
- 239000004215 Carbon black (E152) Substances 0.000 claims description 30
- 229930195733 hydrocarbon Natural products 0.000 claims description 30
- 150000002430 hydrocarbons Chemical class 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 239000012254 powdered material Substances 0.000 claims description 24
- 230000000737 periodic effect Effects 0.000 claims description 21
- 239000000843 powder Substances 0.000 claims description 19
- 230000000977 initiatory effect Effects 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 5
- 239000012212 insulator Substances 0.000 claims description 3
- 239000000567 combustion gas Substances 0.000 claims 2
- 239000010410 layer Substances 0.000 description 117
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 112
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 87
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 46
- 229910052757 nitrogen Inorganic materials 0.000 description 43
- 229910052799 carbon Inorganic materials 0.000 description 36
- 239000000047 product Substances 0.000 description 22
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 20
- 229910052796 boron Inorganic materials 0.000 description 20
- 229910052782 aluminium Inorganic materials 0.000 description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 19
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 15
- 229910052580 B4C Inorganic materials 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 13
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 13
- 229910052750 molybdenum Inorganic materials 0.000 description 13
- 239000011733 molybdenum Substances 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 229910052721 tungsten Inorganic materials 0.000 description 11
- 239000010937 tungsten Substances 0.000 description 11
- 229910021480 group 4 element Inorganic materials 0.000 description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 9
- 229910002804 graphite Inorganic materials 0.000 description 9
- 239000010439 graphite Substances 0.000 description 9
- 229910052726 zirconium Inorganic materials 0.000 description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- HOWJQLVNDUGZBI-UHFFFAOYSA-N butane;propane Chemical compound CCC.CCCC HOWJQLVNDUGZBI-UHFFFAOYSA-N 0.000 description 8
- 229910052804 chromium Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 8
- 229910021478 group 5 element Inorganic materials 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229910021476 group 6 element Inorganic materials 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 7
- 229910052727 yttrium Inorganic materials 0.000 description 7
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 6
- 229910052758 niobium Inorganic materials 0.000 description 6
- 239000010955 niobium Substances 0.000 description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- -1 boron carbide compound Chemical class 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- MBMLMWLHJBBADN-UHFFFAOYSA-N Ferrous sulfide Chemical class [Fe]=S MBMLMWLHJBBADN-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- GVEHJMMRQRRJPM-UHFFFAOYSA-N chromium(2+);methanidylidynechromium Chemical compound [Cr+2].[Cr]#[C-].[Cr]#[C-] GVEHJMMRQRRJPM-UHFFFAOYSA-N 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000013532 laser treatment Methods 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910003470 tongbaite Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-OUBTZVSYSA-N Ammonia-15N Chemical compound [15NH3] QGZKDVFQNNGYKY-OUBTZVSYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 238000005269 aluminizing Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- VNWKTOKETHGBQD-YPZZEJLDSA-N carbane Chemical compound [10CH4] VNWKTOKETHGBQD-YPZZEJLDSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000001309 chloro group Chemical class Cl* 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical class [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000006163 transport media Substances 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/0006—Spraying by means of explosions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/126—Detonation spraying
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Chemical Vapour Deposition (AREA)
Claims (4)
1. Förfarande för plasma-detonationsbehandling av metallföremäl, vilket förfarande omfattar steg där man 5. matar ett pulveraktigt material och en brännbar gasblandning in i en reaktionskammare (1), och detonationsförbränner den brännbara gasbland- ningen, kännetecknat av att 10 före detonationsförbränningen av den brännbara gas- blandningen mätäs in i reaktionskammaren (1) ätminstone ett grundämne som valts ur grupperna III, IV, V, IV i det periodiska systemet och/eller en förening av detsamma och en elektrisk Ström leds genom det matade grundämnet 15 och/eller föreningen och genom förbränningsprodukterna av den brännbara gasblandningen, varvid initieringen av detonationsförbränningen av den brännbara gasblandningen sker ytterom reaktionskammaren (1).
2. Förfarande enligt patentkrav 1, k ä n n e -20 tecknat av att kolvätegas mätäs in i reaktionskammaren (1) samtidigt med det ätminstone ena grundämnet som valts ur grupperna III, IV, V, VI i det periodiska systemet och/eller dess förening.
3. Apparat för plasma-detonationsbehandling av me-25 tallföremäl, vilken apparat uppvisar - en reaktionskammare (1), som omfattar en kanal (19) för matning av pulveraktigt material, - en förbränningskammare (15), som är kopplad tili reaktionskammaren (1) medelst en kanal (16), och 30. ett organ för initiering av en detonation, vilket organ är i form av ett tändstift (18), kännetecknad av att - i reaktionskammaren (1) har pä en isolator (13), som fungerar som kammarens (1) botten monterats en elekt- 35 rod (2, 25) för att leda elektrisk Ström, vilken elektrod (2, 15) har kopplats som anod i en elektrisk krets hos en 39 98740 strömförsörjningskälla (11), varvid reaktionskammarens väggar (1) fungerar som katod, och - reaktionskammarens (1) vägg uppvisar ett muns-tycke (4), som är anpassat att mata in i reaktionskammaren 5 (1) minst ett tilläggsgrundämne som valts ur grupperna III, IV, V, VI i det periodiska systemet och/eller en fö-rening av grundämnet.
4. Apparat enligt patentkrav 3, känneteck-n a d av att elektroden (25) omfattar pä dess insida 10 längs dess egna axel ett genomflödesmunstycke (24), som är anpassat att mata ätminstone ett grundämne som valts ur grupperna III, IV, V, VI i det periodiska systemet och/eller en förening av grundämnet, som är ett pulver, en gas eller ett fast ämne in i reaktionskammaren (1). 15
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/SU1991/000051 WO1992017619A1 (fr) | 1991-03-27 | 1991-03-27 | Procede et dispositif pour usiner par detonation au plasma des articles metalliques |
| SU9100051 | 1991-03-27 |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| FI925429A7 FI925429A7 (sv) | 1992-11-27 |
| FI925429A0 FI925429A0 (sv) | 1992-11-27 |
| FI98740B FI98740B (sv) | 1997-04-30 |
| FI98740C true FI98740C (sv) | 1997-08-11 |
Family
ID=21617738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI925429A FI98740C (sv) | 1991-03-27 | 1992-11-27 | Förfarande och anordning för plasmadetonationsbehandling av föremål |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0531527B1 (sv) |
| DE (1) | DE69128715D1 (sv) |
| FI (1) | FI98740C (sv) |
| WO (1) | WO1992017619A1 (sv) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU1425297A (en) * | 1995-12-26 | 1997-07-17 | Aerostar Coatings, S.L. | Method and apparatus for applying multi-layered coatings by detonation |
| IL120140A (en) * | 1997-02-04 | 2001-01-11 | Israel Atomic Energy Comm | Thermal spray coating element and method and apparatus for using same |
| RU2155822C1 (ru) * | 1999-08-25 | 2000-09-10 | Оао "Компат" | Способ плазменного нанесения покрытий |
| CN111926366B (zh) * | 2020-08-18 | 2023-03-31 | 南昌航空大学 | 一种烧结钕铁硼磁体表面耐蚀性涂层及其制备方法 |
| CN116083871A (zh) * | 2022-12-22 | 2023-05-09 | 江西省科学院应用物理研究所 | 一种在大气环境中实现金属材料表面渗入合金元素的方法 |
| CN117568734B (zh) * | 2023-11-16 | 2026-04-24 | 浙江巴顿焊接技术研究院 | 一种电场辅助爆炸喷涂设备和方法 |
| CN117587365A (zh) * | 2023-11-20 | 2024-02-23 | 浙江巴顿焊接技术研究院 | 一种筒体内表面改性装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1935123C3 (de) * | 1969-07-10 | 1978-04-13 | Nippon Tungsten Co. Ltd., Fukuoka (Japan) | Verfahren zum Beschichten von Oberflächen metallischer Gegenstände mit metallischen Werkstoffen |
| US4172558A (en) * | 1977-04-19 | 1979-10-30 | Bondarenko Alexandr S | Apparatus for explosive application of coatings |
| SU747010A1 (ru) * | 1978-09-08 | 1989-11-07 | Научно-исследовательский институт технологии автомобильной промышленности | Способ детонационного нанесени покрытий и устройство дл его осуществлени |
| US4258091A (en) * | 1979-02-06 | 1981-03-24 | Dudko Daniil A | Method for coating |
| IL74360A (en) * | 1984-05-25 | 1989-01-31 | Wedtech Corp | Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase |
| US4830702A (en) * | 1987-07-02 | 1989-05-16 | General Electric Company | Hollow cathode plasma assisted apparatus and method of diamond synthesis |
| JPH03502779A (ja) * | 1988-12-26 | 1991-06-27 | ノボシビルスキー、ゴスダルストウェンヌイ、ユニベルシテト、イメーニ、レニンスコボ、コムソモラ | ガス爆発により被覆を施す装置 |
| DE3903888C2 (de) * | 1989-02-10 | 1998-04-16 | Castolin Sa | Vorrichtung zum Flammspritzen |
-
1991
- 1991-03-27 DE DE69128715T patent/DE69128715D1/de not_active Expired - Lifetime
- 1991-03-27 EP EP91907287A patent/EP0531527B1/en not_active Expired - Lifetime
- 1991-03-27 WO PCT/SU1991/000051 patent/WO1992017619A1/ru not_active Ceased
-
1992
- 1992-11-27 FI FI925429A patent/FI98740C/sv active
Also Published As
| Publication number | Publication date |
|---|---|
| EP0531527A4 (en) | 1994-05-18 |
| FI98740B (sv) | 1997-04-30 |
| WO1992017619A1 (fr) | 1992-10-15 |
| EP0531527B1 (en) | 1998-01-14 |
| DE69128715D1 (de) | 1998-02-19 |
| EP0531527A1 (en) | 1993-03-17 |
| FI925429A7 (sv) | 1992-11-27 |
| FI925429A0 (sv) | 1992-11-27 |
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