FI946015A - Electroless-kontaktinystynmuodostusmenetelmä - Google Patents
Electroless-kontaktinystynmuodostusmenetelmä Download PDFInfo
- Publication number
- FI946015A FI946015A FI946015A FI946015A FI946015A FI 946015 A FI946015 A FI 946015A FI 946015 A FI946015 A FI 946015A FI 946015 A FI946015 A FI 946015A FI 946015 A FI946015 A FI 946015A
- Authority
- FI
- Finland
- Prior art keywords
- contact pins
- training contact
- electroless
- procedure
- electroless procedure
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/03—Manufacturing methods
- H01L2224/039—Methods of manufacturing bonding areas involving a specific sequence of method steps
- H01L2224/03912—Methods of manufacturing bonding areas involving a specific sequence of method steps the bump being used as a mask for patterning the bonding area
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
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- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/1147—Manufacturing methods using a lift-off mask
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
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- H01L2924/01022—Titanium [Ti]
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- H01L2924/01061—Promethium [Pm]
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- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
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- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemically Coating (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI946015A FI946015A (fi) | 1994-07-08 | 1994-12-21 | Electroless-kontaktinystynmuodostusmenetelmä |
PCT/FI1995/000392 WO1996002122A1 (en) | 1994-07-08 | 1995-07-06 | Electroless method of forming contact bumps |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI943276A FI943276A0 (fi) | 1994-07-08 | 1994-07-08 | Elektroless-foerfarande foer bildning av kontaktstudsar |
FI946015A FI946015A (fi) | 1994-07-08 | 1994-12-21 | Electroless-kontaktinystynmuodostusmenetelmä |
Publications (2)
Publication Number | Publication Date |
---|---|
FI946015A0 FI946015A0 (fi) | 1994-12-21 |
FI946015A true FI946015A (fi) | 1996-01-09 |
Family
ID=26159774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI946015A FI946015A (fi) | 1994-07-08 | 1994-12-21 | Electroless-kontaktinystynmuodostusmenetelmä |
Country Status (2)
Country | Link |
---|---|
FI (1) | FI946015A (fi) |
WO (1) | WO1996002122A1 (fi) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI954922A (fi) * | 1995-10-16 | 1997-04-17 | Picopak Oy | Valmistusmenetelmä sekä kontaktinystyrakenne puolijohdepalojen tiheitä pintaliitoksia varten |
US5989993A (en) * | 1996-02-09 | 1999-11-23 | Elke Zakel | Method for galvanic forming of bonding pads |
DE19616373A1 (de) * | 1996-04-24 | 1997-08-14 | Fraunhofer Ges Forschung | Herstellung galvanisch abgeformter Kontakthöcker |
DE102004019445A1 (de) * | 2004-04-19 | 2005-11-03 | Siemens Ag | Mit planarer Verbindungstechnik auf einem insbesondere elektrischleitendem Substrat aufgebaute Schaltung |
DE102004047730B4 (de) | 2004-09-30 | 2017-06-22 | Advanced Micro Devices, Inc. | Ein Verfahren zum Dünnen von Halbleitersubstraten zur Herstellung von dünnen Halbleiterplättchen |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4182781A (en) * | 1977-09-21 | 1980-01-08 | Texas Instruments Incorporated | Low cost method for forming elevated metal bumps on integrated circuit bodies employing an aluminum/palladium metallization base for electroless plating |
US5226232A (en) * | 1990-05-18 | 1993-07-13 | Hewlett-Packard Company | Method for forming a conductive pattern on an integrated circuit |
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1994
- 1994-12-21 FI FI946015A patent/FI946015A/fi unknown
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1995
- 1995-07-06 WO PCT/FI1995/000392 patent/WO1996002122A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
FI946015A0 (fi) | 1994-12-21 |
WO1996002122A1 (en) | 1996-01-25 |
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