FI920457A0 - ANORDNING FOER ATT BESTRYKA ETT SUBSTRAT, FOERETRAEDESVIS ETT PLANGLAS, MED ETT INDIUM-TENNOXIDSKIKT. - Google Patents

ANORDNING FOER ATT BESTRYKA ETT SUBSTRAT, FOERETRAEDESVIS ETT PLANGLAS, MED ETT INDIUM-TENNOXIDSKIKT.

Info

Publication number
FI920457A0
FI920457A0 FI920457A FI920457A FI920457A0 FI 920457 A0 FI920457 A0 FI 920457A0 FI 920457 A FI920457 A FI 920457A FI 920457 A FI920457 A FI 920457A FI 920457 A0 FI920457 A0 FI 920457A0
Authority
FI
Finland
Prior art keywords
ett
tennoxidskikt
planglas
bestryka
foeretraedesvis
Prior art date
Application number
FI920457A
Other languages
Finnish (fi)
Other versions
FI920457A (en
Inventor
Michael Schanz
Rudolf Latz
Michael Scherer
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of FI920457A0 publication Critical patent/FI920457A0/en
Publication of FI920457A publication Critical patent/FI920457A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3421—Cathode assembly for sputtering apparatus, e.g. Target using heated targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FI920457A 1991-03-04 1992-02-03 ANORDNING FOER ATT BESTRYKA ETT SUBSTRAT, FOERETRAEDESVIS ETT PLANGLAS, MED ETT INDIUM-TENNOXIDSKIKT FI920457A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19914106771 DE4106771A1 (en) 1991-03-04 1991-03-04 Flat glass coating - has gap between target and cathode in vapour deposition appts. to prevent pimple formation on the deposited layer

Publications (2)

Publication Number Publication Date
FI920457A0 true FI920457A0 (en) 1992-02-03
FI920457A FI920457A (en) 1992-09-05

Family

ID=6426381

Family Applications (1)

Application Number Title Priority Date Filing Date
FI920457A FI920457A (en) 1991-03-04 1992-02-03 ANORDNING FOER ATT BESTRYKA ETT SUBSTRAT, FOERETRAEDESVIS ETT PLANGLAS, MED ETT INDIUM-TENNOXIDSKIKT

Country Status (5)

Country Link
JP (1) JPH0565632A (en)
BE (1) BE1006649A3 (en)
CH (1) CH684000A5 (en)
DE (1) DE4106771A1 (en)
FI (1) FI920457A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10018842C2 (en) * 2000-04-14 2002-03-21 Ardenne Anlagentech Gmbh Process for applying TCO layers on substrates
EP2360290A1 (en) * 2010-02-11 2011-08-24 Applied Materials, Inc. Method for producing an ITO layer and sputtering system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1365492A (en) * 1971-02-05 1974-09-04 Triplex Safety Glass Co Metal oxide films
US4318796A (en) * 1980-07-15 1982-03-09 Murata Manufacturing Co., Ltd. Sputtering apparatus
DE3210351A1 (en) * 1982-03-20 1983-09-22 Leybold-Heraeus GmbH, 5000 Köln Process and device for producing magnetic recording films

Also Published As

Publication number Publication date
CH684000A5 (en) 1994-06-30
JPH0565632A (en) 1993-03-19
FI920457A (en) 1992-09-05
DE4106771A1 (en) 1992-09-10
BE1006649A3 (en) 1994-11-08

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