FI802420A7 - Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer - Google Patents

Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer

Info

Publication number
FI802420A7
FI802420A7 FI802420A FI802420A FI802420A7 FI 802420 A7 FI802420 A7 FI 802420A7 FI 802420 A FI802420 A FI 802420A FI 802420 A FI802420 A FI 802420A FI 802420 A7 FI802420 A7 FI 802420A7
Authority
FI
Finland
Prior art keywords
tunnfilmer
genomfoeringar
electriskt
ledande
foerfarande foer
Prior art date
Application number
FI802420A
Other languages
English (en)
Other versions
FI61588C (fi
FI61588B (fi
Inventor
Jorma Olavi Antson
Original Assignee
Lohja Ab Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lohja Ab Oy filed Critical Lohja Ab Oy
Priority to FI802420A priority Critical patent/FI61588C/fi
Priority to GB8121027A priority patent/GB2081517B/en
Priority to US06/281,668 priority patent/US4380867A/en
Priority to DE19813127356 priority patent/DE3127356A1/de
Priority to FR8114236A priority patent/FR2488045A1/fr
Priority to JP56118576A priority patent/JPS5761285A/ja
Priority to DD81232271A priority patent/DD201627A5/de
Publication of FI802420A7 publication Critical patent/FI802420A7/fi
Application granted granted Critical
Publication of FI61588B publication Critical patent/FI61588B/fi
Publication of FI61588C publication Critical patent/FI61588C/fi

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4076—Through-connections; Vertical interconnect access [VIA] connections by thin-film techniques
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
    • H10D86/85—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Illuminated Signs And Luminous Advertising (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FI802420A 1980-08-01 1980-08-01 Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer FI61588C (fi)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FI802420A FI61588C (fi) 1980-08-01 1980-08-01 Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer
GB8121027A GB2081517B (en) 1980-08-01 1981-07-08 Method for making electrically conductive penetrations into thin films
US06/281,668 US4380867A (en) 1980-08-01 1981-07-09 Method for making electrically conductive penetrations into thin films
DE19813127356 DE3127356A1 (de) 1980-08-01 1981-07-10 Verfahren zum bilden elektrisch leitender durchdringungen in duennfilmen
FR8114236A FR2488045A1 (fr) 1980-08-01 1981-07-22 Procede pour l'obtention d'inclusions electriquement conductrices dans des films minces
JP56118576A JPS5761285A (en) 1980-08-01 1981-07-30 Method of rorming electrically conductive buried member in thin film
DD81232271A DD201627A5 (de) 1980-08-01 1981-07-31 Verfahren zum bilden elektrisch leitender durchdringungen in duennfilmen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI802420 1980-08-01
FI802420A FI61588C (fi) 1980-08-01 1980-08-01 Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer

Publications (3)

Publication Number Publication Date
FI802420A7 true FI802420A7 (fi) 1982-02-02
FI61588B FI61588B (fi) 1982-04-30
FI61588C FI61588C (fi) 1982-08-10

Family

ID=8513660

Family Applications (1)

Application Number Title Priority Date Filing Date
FI802420A FI61588C (fi) 1980-08-01 1980-08-01 Foerfarande foer utfoerande av elektriskt ledande genomfoeringar i tunnfilmer

Country Status (7)

Country Link
US (1) US4380867A (fi)
JP (1) JPS5761285A (fi)
DD (1) DD201627A5 (fi)
DE (1) DE3127356A1 (fi)
FI (1) FI61588C (fi)
FR (1) FR2488045A1 (fi)
GB (1) GB2081517B (fi)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63122155A (ja) * 1986-11-11 1988-05-26 Matsushita Electric Ind Co Ltd 半導体チツプの接続バンプ
US20070166875A1 (en) * 2005-12-29 2007-07-19 Intel Corporation Method of forming a microelectronic package and microelectronic package formed according to the method
US9524945B2 (en) 2010-05-18 2016-12-20 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with L-shaped non-metal sidewall protection structure
US8841766B2 (en) 2009-07-30 2014-09-23 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with non-metal sidewall protection structure
US8377816B2 (en) * 2009-07-30 2013-02-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming electrical connections
US8324738B2 (en) 2009-09-01 2012-12-04 Taiwan Semiconductor Manufacturing Company, Ltd. Self-aligned protection layer for copper post structure
US8659155B2 (en) 2009-11-05 2014-02-25 Taiwan Semiconductor Manufacturing Company, Ltd. Mechanisms for forming copper pillar bumps
US8610270B2 (en) 2010-02-09 2013-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and semiconductor assembly with lead-free solder
US8441124B2 (en) 2010-04-29 2013-05-14 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with non-metal sidewall protection structure
US9018758B2 (en) 2010-06-02 2015-04-28 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with non-metal sidewall spacer and metal top cap
US8546254B2 (en) 2010-08-19 2013-10-01 Taiwan Semiconductor Manufacturing Company, Ltd. Mechanisms for forming copper pillar bumps using patterned anodes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2842831A (en) * 1956-08-30 1958-07-15 Bell Telephone Labor Inc Manufacture of semiconductor devices
US3323956A (en) * 1964-03-16 1967-06-06 Hughes Aircraft Co Method of manufacturing semiconductor devices
US4182781A (en) * 1977-09-21 1980-01-08 Texas Instruments Incorporated Low cost method for forming elevated metal bumps on integrated circuit bodies employing an aluminum/palladium metallization base for electroless plating

Also Published As

Publication number Publication date
DE3127356A1 (de) 1982-04-22
DD201627A5 (de) 1983-07-27
GB2081517A (en) 1982-02-17
US4380867A (en) 1983-04-26
FR2488045A1 (fr) 1982-02-05
JPS5761285A (en) 1982-04-13
FI61588C (fi) 1982-08-10
GB2081517B (en) 1984-04-26
FI61588B (fi) 1982-04-30

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Legal Events

Date Code Title Description
MM Patent lapsed

Owner name: OY LOHJA AB