FI20095125A0 - Sulkujärjestely, tuotantolinja ja menetelmä - Google Patents

Sulkujärjestely, tuotantolinja ja menetelmä

Info

Publication number
FI20095125A0
FI20095125A0 FI20095125A FI20095125A FI20095125A0 FI 20095125 A0 FI20095125 A0 FI 20095125A0 FI 20095125 A FI20095125 A FI 20095125A FI 20095125 A FI20095125 A FI 20095125A FI 20095125 A0 FI20095125 A0 FI 20095125A0
Authority
FI
Finland
Prior art keywords
procedure
production line
locking arrangement
locking
arrangement
Prior art date
Application number
FI20095125A
Other languages
English (en)
Swedish (sv)
Other versions
FI20095125A (fi
FI122880B (fi
Inventor
Pekka Soininen
Jarmo Skarp
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095125A priority Critical patent/FI122880B/fi
Publication of FI20095125A0 publication Critical patent/FI20095125A0/fi
Priority to PCT/FI2010/050079 priority patent/WO2010089460A1/en
Priority to CN2010800068038A priority patent/CN102308023A/zh
Publication of FI20095125A publication Critical patent/FI20095125A/fi
Application granted granted Critical
Publication of FI122880B publication Critical patent/FI122880B/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
FI20095125A 2009-02-09 2009-02-09 Sulkujärjestely, tuotantolinja ja menetelmä FI122880B (fi)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FI20095125A FI122880B (fi) 2009-02-09 2009-02-09 Sulkujärjestely, tuotantolinja ja menetelmä
PCT/FI2010/050079 WO2010089460A1 (en) 2009-02-09 2010-02-08 Gate arrangement, production line and method
CN2010800068038A CN102308023A (zh) 2009-02-09 2010-02-08 闸装置、生产线和方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20095125A FI122880B (fi) 2009-02-09 2009-02-09 Sulkujärjestely, tuotantolinja ja menetelmä
FI20095125 2009-02-09

Publications (3)

Publication Number Publication Date
FI20095125A0 true FI20095125A0 (fi) 2009-02-09
FI20095125A FI20095125A (fi) 2010-08-10
FI122880B FI122880B (fi) 2012-08-15

Family

ID=40404628

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095125A FI122880B (fi) 2009-02-09 2009-02-09 Sulkujärjestely, tuotantolinja ja menetelmä

Country Status (3)

Country Link
CN (1) CN102308023A (fi)
FI (1) FI122880B (fi)
WO (1) WO2010089460A1 (fi)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9938617B2 (en) * 2010-10-22 2018-04-10 Agc Glass Europe Modular coater separation

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1289512C (en) * 1985-07-29 1991-09-24 Vincent D. Cannella Depositing an electrical insulator with unidirectional gas flow in series of chambers
JP3673584B2 (ja) * 1996-01-16 2005-07-20 キヤノン株式会社 ロール・ツー・ロール処理方法および装置
EP1582832B1 (de) * 2004-03-15 2007-04-18 Applied Materials GmbH & Co. KG Vakuumbehandlungsanlage mit Umsetzbarem Wartungsventil

Also Published As

Publication number Publication date
FI20095125A (fi) 2010-08-10
WO2010089460A1 (en) 2010-08-12
CN102308023A (zh) 2012-01-04
FI122880B (fi) 2012-08-15

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