FI103696B1 - Process for producing printing plates or photoresists using imaging irradiation of a photopolymerizable recording material - Google Patents

Process for producing printing plates or photoresists using imaging irradiation of a photopolymerizable recording material

Info

Publication number
FI103696B1
FI103696B1 FI911979A FI911979A FI103696B1 FI 103696 B1 FI103696 B1 FI 103696B1 FI 911979 A FI911979 A FI 911979A FI 911979 A FI911979 A FI 911979A FI 103696 B1 FI103696 B1 FI 103696B1
Authority
FI
Finland
Prior art keywords
photoresists
recording material
printing plates
producing printing
photopolymerizable recording
Prior art date
Application number
FI911979A
Other languages
Finnish (fi)
Swedish (sv)
Other versions
FI911979L (en
FI103696B (en
FI911979A0 (en
Inventor
Rudolf Zertani
Dieter Mohr
Peter-J Matthiessen
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of FI911979A0 publication Critical patent/FI911979A0/en
Publication of FI911979L publication Critical patent/FI911979L/en
Application granted granted Critical
Publication of FI103696B1 publication Critical patent/FI103696B1/en
Publication of FI103696B publication Critical patent/FI103696B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
FI911979A 1990-04-26 1991-04-24 Process for the preparation of printing plates or photoresists using imaging irradiation of a photopolymerizable recording material FI103696B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4013358A DE4013358A1 (en) 1990-04-26 1990-04-26 METHOD FOR THE PRODUCTION OF PRINTING FORMS OR PHOTORESISTS BY IMPROPER IRRADIATION OF A PHOTOPOLYMERIZABLE RECORDING MATERIAL
DE4013358 1990-04-26

Publications (4)

Publication Number Publication Date
FI911979A0 FI911979A0 (en) 1991-04-24
FI911979L FI911979L (en) 1991-10-27
FI103696B1 true FI103696B1 (en) 1999-08-13
FI103696B FI103696B (en) 1999-08-13

Family

ID=6405164

Family Applications (1)

Application Number Title Priority Date Filing Date
FI911979A FI103696B (en) 1990-04-26 1991-04-24 Process for the preparation of printing plates or photoresists using imaging irradiation of a photopolymerizable recording material

Country Status (9)

Country Link
EP (1) EP0453953B1 (en)
JP (1) JP3118520B2 (en)
KR (1) KR0180737B1 (en)
BR (1) BR9101676A (en)
CA (1) CA2041191A1 (en)
DE (2) DE4013358A1 (en)
ES (1) ES2106039T3 (en)
FI (1) FI103696B (en)
IE (1) IE911389A1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2273101B (en) * 1992-11-10 1997-03-05 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
IL106619A0 (en) * 1993-08-08 1993-12-08 Scitex Corp Ltd Apparatus and method for exposing a photosensitive substrate
JPH07134409A (en) * 1993-11-09 1995-05-23 Nippon Kayaku Co Ltd Resin composition for photo-molding
DE4418645C1 (en) 1994-05-27 1995-12-14 Sun Chemical Corp Photosensitive mixture and recording material which can be produced therefrom
JPH08240908A (en) * 1994-12-29 1996-09-17 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition, photosensitive planographic printing plate using the same and production of printing plate material for planographic printing
US7074546B2 (en) 2002-06-24 2006-07-11 Konica Corporation Light sensitive planographic printing plate precursor and its processing method
DE10255667B4 (en) 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Radiation-sensitive elements with excellent storage stability
US20110123929A1 (en) 2007-01-23 2011-05-26 Fujifilm Corporation Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element
EP2144876B1 (en) 2007-05-11 2012-09-12 Basf Se Oxime ester photoinitiators
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
JP6038033B2 (en) 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
DE102011006189A1 (en) * 2011-03-28 2012-06-06 Carl Zeiss Smt Gmbh Method for exposing photosensitive layer for projection exposure system, involves supplementary-exposing photosensitive layer with supplementary exposure radiation with wavelength for producing intensity distribution on photosensitive layer
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester photoinitiator
CN105198793B (en) 2012-05-09 2019-08-13 巴斯夫欧洲公司 Oxime ester photoinitiators
EP2909165B1 (en) 2012-10-19 2018-05-30 IGM Group B.V. Hybrid photoinitiators
CN105358527B (en) 2013-07-08 2018-09-25 巴斯夫欧洲公司 Oxime ester photoinitiator
CN107075000B (en) 2014-09-04 2020-01-31 Igm集团公司 Polycyclic photoinitiators
ES2831086T3 (en) 2016-09-02 2021-06-07 Igm Group B V Polycyclic glyoxylates as photoinitiators

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3784378A (en) * 1971-10-18 1974-01-08 Du Pont Double-exposure method for producing reverse images in photopolymers
DE3832032A1 (en) * 1988-09-21 1990-03-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREOF

Also Published As

Publication number Publication date
BR9101676A (en) 1991-12-10
ES2106039T3 (en) 1997-11-01
JPH04261544A (en) 1992-09-17
DE59108857D1 (en) 1997-10-30
DE4013358A1 (en) 1991-10-31
KR0180737B1 (en) 1999-04-01
EP0453953A3 (en) 1992-12-02
FI911979L (en) 1991-10-27
EP0453953B1 (en) 1997-09-24
EP0453953A2 (en) 1991-10-30
IE911389A1 (en) 1991-11-06
CA2041191A1 (en) 1991-10-27
FI103696B (en) 1999-08-13
JP3118520B2 (en) 2000-12-18
KR910018851A (en) 1991-11-30
FI911979A0 (en) 1991-04-24

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Legal Events

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Owner name: AGFA-GEVAERT AG