ES515367A0 - Un aparato para producir silicio de gran pureza - Google Patents

Un aparato para producir silicio de gran pureza

Info

Publication number
ES515367A0
ES515367A0 ES515367A ES515367A ES515367A0 ES 515367 A0 ES515367 A0 ES 515367A0 ES 515367 A ES515367 A ES 515367A ES 515367 A ES515367 A ES 515367A ES 515367 A0 ES515367 A0 ES 515367A0
Authority
ES
Spain
Prior art keywords
high purity
produce high
purity silicon
silicon
produce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES515367A
Other languages
English (en)
Other versions
ES8306678A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AEROCHEM RES LAB
Aerochem Research Laboratories Inc
Original Assignee
AEROCHEM RES LAB
Aerochem Research Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AEROCHEM RES LAB, Aerochem Research Laboratories Inc filed Critical AEROCHEM RES LAB
Publication of ES515367A0 publication Critical patent/ES515367A0/es
Publication of ES8306678A1 publication Critical patent/ES8306678A1/es
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/005—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out at high temperatures, e.g. by pyrolysis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/033—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by reduction of silicon halides or halosilanes with a metal or a metallic alloy as the only reducing agents
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00054—Controlling or regulating the heat exchange system
    • B01J2219/00056—Controlling or regulating the heat exchange system involving measured parameters
    • B01J2219/00058—Temperature measurement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00132—Controlling the temperature using electric heating or cooling elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/0015—Controlling the temperature by thermal insulation means
    • B01J2219/00153—Vacuum spaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
ES515367A 1980-10-20 1982-08-30 Un aparato para producir silicio de gran pureza Expired ES8306678A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19910080A 1980-10-20 1980-10-20

Publications (2)

Publication Number Publication Date
ES515367A0 true ES515367A0 (es) 1983-06-01
ES8306678A1 ES8306678A1 (es) 1983-06-01

Family

ID=22736211

Family Applications (2)

Application Number Title Priority Date Filing Date
ES506319A Expired ES8301837A1 (es) 1980-10-20 1981-10-16 Un metodo para producir silicio de gran pureza.
ES515367A Expired ES8306678A1 (es) 1980-10-20 1982-08-30 Un aparato para producir silicio de gran pureza

Family Applications Before (1)

Application Number Title Priority Date Filing Date
ES506319A Expired ES8301837A1 (es) 1980-10-20 1981-10-16 Un metodo para producir silicio de gran pureza.

Country Status (7)

Country Link
EP (1) EP0050324B1 (es)
JP (1) JPS57100912A (es)
AU (1) AU7616781A (es)
CA (1) CA1198581A (es)
DE (1) DE3175801D1 (es)
DK (1) DK460981A (es)
ES (2) ES8301837A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
JP4926377B2 (ja) * 2004-03-05 2012-05-09 新日鉄マテリアルズ株式会社 シリコンの精錬装置及びその精錬方法
JP2010535149A (ja) * 2007-08-01 2010-11-18 ボストン・シリコン・マテリアルズ・エルエルシー 高純度元素シリコンの製造方法
JP5142211B2 (ja) * 2008-10-02 2013-02-13 国立大学法人東北大学 シリコン結晶の製造方法および太陽電池膜の製造方法
WO2012158600A1 (en) * 2011-05-16 2012-11-22 Boston Silicon Materials, Llc Manufacturing and applications of silicon metal

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3041145A (en) * 1957-07-15 1962-06-26 Robert S Aries Production of pure silicon
US2912311A (en) * 1957-11-20 1959-11-10 Allied Chem Apparatus for production of high purity elemental silicon
US4102765A (en) * 1977-01-06 1978-07-25 Westinghouse Electric Corp. Arc heater production of silicon involving alkali or alkaline-earth metals
US4102767A (en) * 1977-04-14 1978-07-25 Westinghouse Electric Corp. Arc heater method for the production of single crystal silicon
US4150248A (en) * 1978-03-09 1979-04-17 Westinghouse Electric Corp. Arc heater with silicon lined reactor
US4188368A (en) * 1978-03-29 1980-02-12 Nasa Method of producing silicon

Also Published As

Publication number Publication date
ES506319A0 (es) 1983-01-01
JPH0131451B2 (es) 1989-06-26
CA1198581A (en) 1985-12-31
DK460981A (da) 1982-04-21
ES8301837A1 (es) 1983-01-01
DE3175801D1 (en) 1987-02-12
AU7616781A (en) 1982-04-29
JPS57100912A (en) 1982-06-23
ES8306678A1 (es) 1983-06-01
EP0050324B1 (en) 1987-01-07
EP0050324A1 (en) 1982-04-28

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