ES399239A1 - Naphthoquinone diazide compounds and light-sensitive reproduction materials containing them - Google Patents
Naphthoquinone diazide compounds and light-sensitive reproduction materials containing themInfo
- Publication number
- ES399239A1 ES399239A1 ES399239A ES399239A ES399239A1 ES 399239 A1 ES399239 A1 ES 399239A1 ES 399239 A ES399239 A ES 399239A ES 399239 A ES399239 A ES 399239A ES 399239 A1 ES399239 A1 ES 399239A1
- Authority
- ES
- Spain
- Prior art keywords
- light
- materials containing
- naphthoquinone diazide
- diazide compounds
- sensitive reproduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
A process for the manufacture of a printing form or printing plate, in which a printing plate having a support material and a photosensitive layer containing, as a photosensitive constituent, a di- or trimethylphenyl ester of naphthoquinon acid (1,2) -diazido-sulfonic acid, is exposed to light under an original and is treated with an alkaline solution to remove the light-affected naphthoquinone-diazido-sulfonic acid ester. (Machine-translation by Google Translate, not legally binding)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB558371 | 1971-02-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES399239A1 true ES399239A1 (en) | 1974-12-16 |
Family
ID=9798845
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES399239A Expired ES399239A1 (en) | 1971-02-26 | 1972-01-27 | Naphthoquinone diazide compounds and light-sensitive reproduction materials containing them |
Country Status (8)
Country | Link |
---|---|
BE (1) | BE779865A (en) |
CH (1) | CH565392A5 (en) |
DE (1) | DE2208699A1 (en) |
ES (1) | ES399239A1 (en) |
FR (1) | FR2127814A5 (en) |
GB (1) | GB1350773A (en) |
IT (1) | IT951096B (en) |
NL (1) | NL7202321A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2616992A1 (en) * | 1976-04-17 | 1977-11-03 | Agfa Gevaert Ag | Photopolymer printing plate and photoresist compsn. - contain alkyl-phenol novolak giving elasticity and stability towards alkali |
-
1971
- 1971-02-26 GB GB1350773D patent/GB1350773A/en not_active Expired
-
1972
- 1972-01-18 IT IT6715572A patent/IT951096B/en active
- 1972-01-20 CH CH81972A patent/CH565392A5/xx not_active IP Right Cessation
- 1972-01-27 ES ES399239A patent/ES399239A1/en not_active Expired
- 1972-02-22 NL NL7202321A patent/NL7202321A/xx unknown
- 1972-02-24 DE DE19722208699 patent/DE2208699A1/en active Pending
- 1972-02-25 FR FR7206556A patent/FR2127814A5/fr not_active Expired
- 1972-02-25 BE BE779865A patent/BE779865A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CH565392A5 (en) | 1975-08-15 |
IT951096B (en) | 1973-06-30 |
DE2208699A1 (en) | 1972-10-19 |
FR2127814A5 (en) | 1972-10-13 |
GB1350773A (en) | 1974-04-24 |
BE779865A (en) | 1972-08-25 |
NL7202321A (en) | 1972-08-29 |
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