ES321622A1 - A procedure for nickel electrolytic deposition. (Machine-translation by Google Translate, not legally binding) - Google Patents

A procedure for nickel electrolytic deposition. (Machine-translation by Google Translate, not legally binding)

Info

Publication number
ES321622A1
ES321622A1 ES0321622A ES321622A ES321622A1 ES 321622 A1 ES321622 A1 ES 321622A1 ES 0321622 A ES0321622 A ES 0321622A ES 321622 A ES321622 A ES 321622A ES 321622 A1 ES321622 A1 ES 321622A1
Authority
ES
Spain
Prior art keywords
translation
procedure
machine
legally binding
google translate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES0321622A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inco Ltd
Original Assignee
Inco Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inco Ltd filed Critical Inco Ltd
Publication of ES321622A1 publication Critical patent/ES321622A1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

A procedure for the electrolytic deposition of nickel on a cathode from a nickel-plating bath containing chloride with the use of a pure nickel anode not surrounded by an anode bag, by the passage of a direct current in which it overlaps the current Continues an alternating current of a frequency no greater than 20 cycles per second with a current ratio of alternating current to direct current of at least 4: 1. (Machine-translation by Google Translate, not legally binding)
ES0321622A 1965-01-12 1966-01-11 A procedure for nickel electrolytic deposition. (Machine-translation by Google Translate, not legally binding) Expired ES321622A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US425012A US3349016A (en) 1965-01-12 1965-01-12 Process for employing an auxiliary anode made of high purity nickel

Publications (1)

Publication Number Publication Date
ES321622A1 true ES321622A1 (en) 1966-07-01

Family

ID=23684775

Family Applications (1)

Application Number Title Priority Date Filing Date
ES0321622A Expired ES321622A1 (en) 1965-01-12 1966-01-11 A procedure for nickel electrolytic deposition. (Machine-translation by Google Translate, not legally binding)

Country Status (8)

Country Link
US (1) US3349016A (en)
AT (1) AT264241B (en)
BE (1) BE675013A (en)
CH (1) CH439907A (en)
ES (1) ES321622A1 (en)
GB (1) GB1059899A (en)
LU (1) LU50239A1 (en)
NL (1) NL6600324A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450605A (en) * 1966-10-25 1969-06-17 United Aircraft Corp Minimization of anode passivation in electroplating processes
ITTO20070704A1 (en) * 2007-10-05 2009-04-06 Create New Technology S R L SYSTEM AND METHOD OF PLATING METAL ALLOYS BY GALVANIC TECHNOLOGY
JP4989541B2 (en) * 2008-03-31 2012-08-01 ルネサスエレクトロニクス株式会社 Plating method, semiconductor device manufacturing method, and plating processing system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2274056A (en) * 1940-05-29 1942-02-24 Int Nickel Co Extruded anode
NL72938C (en) * 1947-07-09
US2706170A (en) * 1951-11-15 1955-04-12 Sperry Corp Electroforming low stress nickel
US2951978A (en) * 1957-05-29 1960-09-06 Thor P Ulvestad Reverse pulse generator

Also Published As

Publication number Publication date
US3349016A (en) 1967-10-24
AT264241B (en) 1968-08-26
GB1059899A (en) 1967-02-22
CH439907A (en) 1967-07-15
LU50239A1 (en) 1966-03-24
NL6600324A (en) 1966-07-13
BE675013A (en) 1966-07-12

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