ES2989589T3 - Procedimiento de funcionamiento de un sistema de revestimiento para la producción de sistemas de capas - Google Patents
Procedimiento de funcionamiento de un sistema de revestimiento para la producción de sistemas de capas Download PDFInfo
- Publication number
- ES2989589T3 ES2989589T3 ES19845695T ES19845695T ES2989589T3 ES 2989589 T3 ES2989589 T3 ES 2989589T3 ES 19845695 T ES19845695 T ES 19845695T ES 19845695 T ES19845695 T ES 19845695T ES 2989589 T3 ES2989589 T3 ES 2989589T3
- Authority
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- Prior art keywords
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- simulation
- soll
- ist
- actual
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000576 coating method Methods 0.000 title claims abstract description 298
- 239000011248 coating agent Substances 0.000 title claims abstract description 264
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 238000011017 operating method Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims abstract description 141
- 238000004590 computer program Methods 0.000 claims abstract description 12
- 239000010410 layer Substances 0.000 claims description 506
- 238000004088 simulation Methods 0.000 claims description 233
- 238000005259 measurement Methods 0.000 claims description 202
- 230000003287 optical effect Effects 0.000 claims description 99
- 239000000758 substrate Substances 0.000 claims description 67
- 230000003595 spectral effect Effects 0.000 claims description 54
- 239000002356 single layer Substances 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 47
- 238000005457 optimization Methods 0.000 claims description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 230000008859 change Effects 0.000 claims description 19
- 230000000875 corresponding effect Effects 0.000 claims description 16
- 238000004364 calculation method Methods 0.000 claims description 13
- 230000001276 controlling effect Effects 0.000 claims description 12
- 238000012937 correction Methods 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 9
- 238000013461 design Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 7
- 238000010187 selection method Methods 0.000 claims description 6
- 229910052681 coesite Inorganic materials 0.000 claims description 4
- 229910052906 cristobalite Inorganic materials 0.000 claims description 4
- 229910052682 stishovite Inorganic materials 0.000 claims description 4
- 229910052905 tridymite Inorganic materials 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 3
- 230000002596 correlated effect Effects 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 10
- 238000009434 installation Methods 0.000 abstract description 8
- 230000008569 process Effects 0.000 description 51
- 238000002310 reflectometry Methods 0.000 description 26
- 235000012239 silicon dioxide Nutrition 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000002346 layers by function Substances 0.000 description 7
- -1 siloxanes Chemical class 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 5
- 238000004422 calculation algorithm Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 5
- 101100055113 Caenorhabditis elegans aho-3 gene Proteins 0.000 description 4
- 239000005083 Zinc sulfide Substances 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 229910052984 zinc sulfide Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910007998 ZrF4 Inorganic materials 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000012625 in-situ measurement Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012804 iterative process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- URROIMSKGFJNKC-UHFFFAOYSA-N oxygen(2-) praseodymium(3+) titanium(4+) Chemical compound [O-2].[Ti+4].[Pr+3] URROIMSKGFJNKC-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000000275 quality assurance Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018133187.8A DE102018133187A1 (de) | 2018-12-20 | 2018-12-20 | Verfahren zum Betreiben einer Beschichtungsanlage zur Herstellung von Schichtsystemen |
| PCT/EP2019/085810 WO2020127394A1 (de) | 2018-12-20 | 2019-12-17 | Verfahren zum betreiben einer beschichtungsanlage zur herstellung von schichtsystemen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2989589T3 true ES2989589T3 (es) | 2024-11-27 |
Family
ID=69375310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES19845695T Active ES2989589T3 (es) | 2018-12-20 | 2019-12-17 | Procedimiento de funcionamiento de un sistema de revestimiento para la producción de sistemas de capas |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US12234547B2 (de) |
| EP (2) | EP4451039A3 (de) |
| JP (1) | JP2022513882A (de) |
| CN (1) | CN113272622B (de) |
| BR (1) | BR112021011616A2 (de) |
| CL (1) | CL2021001579A1 (de) |
| DE (1) | DE102018133187A1 (de) |
| ES (1) | ES2989589T3 (de) |
| IL (1) | IL283986B2 (de) |
| MX (1) | MX2021007133A (de) |
| PH (1) | PH12021551399A1 (de) |
| WO (1) | WO2020127394A1 (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115449771B (zh) * | 2022-09-21 | 2025-01-28 | 华中科技大学 | 模具涂层生成方法、装置、设备、存储介质和程序产品 |
| CN116045791B (zh) * | 2023-04-03 | 2023-07-21 | 成都飞机工业（集团）有限责任公司 | 一种金属漆涂层厚度评估方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011053573A (ja) * | 2009-09-04 | 2011-03-17 | Konica Minolta Opto Inc | 薄膜形成方法 |
| EP2826883B1 (de) * | 2013-07-17 | 2018-10-03 | Applied Materials, Inc. | Inline-Ablagerungssteuerungsvorrichtung und Verfahren zur Inline-Ablagerungssteuerung |
| DE102015100091A1 (de) | 2015-01-07 | 2016-07-07 | Rodenstock Gmbh | Schichtsystem und optisches Element mit einem Schichtsystem |
| JP6869648B2 (ja) * | 2016-06-07 | 2021-05-12 | 日東電工株式会社 | 多層膜の成膜方法 |
| EP3346023A1 (de) * | 2017-01-05 | 2018-07-11 | Essilor International | Verfahren zur schichtweisen optimierung einer dünnschicht |
-
2018
- 2018-12-20 DE DE102018133187.8A patent/DE102018133187A1/de active Pending
-
2019
- 2019-12-17 WO PCT/EP2019/085810 patent/WO2020127394A1/de not_active Ceased
- 2019-12-17 BR BR112021011616-8A patent/BR112021011616A2/pt unknown
- 2019-12-17 EP EP24192101.4A patent/EP4451039A3/de active Pending
- 2019-12-17 EP EP19845695.6A patent/EP3899422B1/de active Active
- 2019-12-17 JP JP2021534251A patent/JP2022513882A/ja active Pending
- 2019-12-17 MX MX2021007133A patent/MX2021007133A/es unknown
- 2019-12-17 PH PH1/2021/551399A patent/PH12021551399A1/en unknown
- 2019-12-17 CN CN201980086583.5A patent/CN113272622B/zh active Active
- 2019-12-17 ES ES19845695T patent/ES2989589T3/es active Active
- 2019-12-17 US US17/414,652 patent/US12234547B2/en active Active
-
2021
- 2021-06-14 IL IL283986A patent/IL283986B2/en unknown
- 2021-06-16 CL CL2021001579A patent/CL2021001579A1/es unknown
-
2025
- 2025-01-17 US US19/029,478 patent/US20250163567A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| MX2021007133A (es) | 2021-11-03 |
| BR112021011616A2 (pt) | 2021-08-31 |
| EP3899422C0 (de) | 2024-08-07 |
| IL283986B2 (en) | 2025-11-01 |
| EP4451039A2 (de) | 2024-10-23 |
| EP4451039A3 (de) | 2024-12-25 |
| US20220049347A1 (en) | 2022-02-17 |
| DE102018133187A1 (de) | 2020-06-25 |
| EP3899422B1 (de) | 2024-08-07 |
| US20250163567A1 (en) | 2025-05-22 |
| CL2021001579A1 (es) | 2022-02-04 |
| EP3899422A1 (de) | 2021-10-27 |
| IL283986A (en) | 2021-07-29 |
| US12234547B2 (en) | 2025-02-25 |
| CN113272622A (zh) | 2021-08-17 |
| PH12021551399A1 (en) | 2022-05-11 |
| WO2020127394A1 (de) | 2020-06-25 |
| CN113272622B (zh) | 2023-12-26 |
| JP2022513882A (ja) | 2022-02-09 |
| IL283986B1 (en) | 2025-07-01 |
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