ES2522907B1 - System, optical mask and method for marking an object by irradiation, and system uses - Google Patents
System, optical mask and method for marking an object by irradiation, and system uses Download PDFInfo
- Publication number
- ES2522907B1 ES2522907B1 ES201330703A ES201330703A ES2522907B1 ES 2522907 B1 ES2522907 B1 ES 2522907B1 ES 201330703 A ES201330703 A ES 201330703A ES 201330703 A ES201330703 A ES 201330703A ES 2522907 B1 ES2522907 B1 ES 2522907B1
- Authority
- ES
- Spain
- Prior art keywords
- marking
- optical mask
- irradiation
- analog
- marked
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
Abstract
Sistema, máscara óptica y método para el marcado de un objeto mediante irradiación, y usos del sistema.#El sistema comprende:#- una fuente de radiación de luz (B); y#- una máscara óptica (E) que define un dibujo (P) a marcar en el objeto (G), interpuesta entre la fuente de radiación de luz (B) y el área a marcar del objeto (G), y constituida con un material con distintos niveles de atenuación de la energía irradiada sobre el material que define todo el dibujo (P), variando de manera continua entre sí, sin saltos discretos, de manera que permiten realizar un marcado analógico y tridimensional del objeto (G).#La máscara está adaptada para su inclusión en el sistema del primer aspecto.#El método comprende efectuar un marcado analógico y tridimensional de un objeto.#Los usos del sistema son para generar holografías de seguridad y marcas analógicas complejas de forma repetitiva.System, optical mask and method for marking an object by irradiation, and uses of the system. # The system comprises: # - a source of light radiation (B); and # - an optical mask (E) defining a drawing (P) to be marked on the object (G), interposed between the light radiation source (B) and the area to be marked on the object (G), and constituted with a material with different levels of attenuation of the irradiated energy on the material that defines the whole drawing (P), varying continuously with each other, without discrete jumps, so as to allow an analog and three-dimensional marking of the object (G). # The mask is adapted for inclusion in the first aspect system. # The method involves performing an analog and three-dimensional marking of an object. # The uses of the system are to generate security holographs and complex analog marks in a repetitive manner.
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES201330703A ES2522907B1 (en) | 2013-05-17 | 2013-05-17 | System, optical mask and method for marking an object by irradiation, and system uses |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES201330703A ES2522907B1 (en) | 2013-05-17 | 2013-05-17 | System, optical mask and method for marking an object by irradiation, and system uses |
Publications (2)
Publication Number | Publication Date |
---|---|
ES2522907A1 ES2522907A1 (en) | 2014-11-19 |
ES2522907B1 true ES2522907B1 (en) | 2015-09-25 |
Family
ID=51894266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES201330703A Expired - Fee Related ES2522907B1 (en) | 2013-05-17 | 2013-05-17 | System, optical mask and method for marking an object by irradiation, and system uses |
Country Status (1)
Country | Link |
---|---|
ES (1) | ES2522907B1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003019576A (en) * | 2001-07-06 | 2003-01-21 | Hitachi Constr Mach Co Ltd | Laser marking device and method |
CN202225553U (en) * | 2011-08-29 | 2012-05-23 | 浙江龙游道明光学有限公司 | Mask for laser marking |
JP5556774B2 (en) * | 2011-09-16 | 2014-07-23 | ウシオ電機株式会社 | Exposure equipment |
-
2013
- 2013-05-17 ES ES201330703A patent/ES2522907B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ES2522907A1 (en) | 2014-11-19 |
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