ES2522907B1 - System, optical mask and method for marking an object by irradiation, and system uses - Google Patents

System, optical mask and method for marking an object by irradiation, and system uses Download PDF

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Publication number
ES2522907B1
ES2522907B1 ES201330703A ES201330703A ES2522907B1 ES 2522907 B1 ES2522907 B1 ES 2522907B1 ES 201330703 A ES201330703 A ES 201330703A ES 201330703 A ES201330703 A ES 201330703A ES 2522907 B1 ES2522907 B1 ES 2522907B1
Authority
ES
Spain
Prior art keywords
marking
optical mask
irradiation
analog
marked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
ES201330703A
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Spanish (es)
Other versions
ES2522907A1 (en
Inventor
Francisco Manuel ORÓN SALVADOR
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
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Filing date
Publication date
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Priority to ES201330703A priority Critical patent/ES2522907B1/en
Publication of ES2522907A1 publication Critical patent/ES2522907A1/en
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Publication of ES2522907B1 publication Critical patent/ES2522907B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Credit Cards Or The Like (AREA)
  • Printing Methods (AREA)
  • Illuminated Signs And Luminous Advertising (AREA)

Abstract

Sistema, máscara óptica y método para el marcado de un objeto mediante irradiación, y usos del sistema.#El sistema comprende:#- una fuente de radiación de luz (B); y#- una máscara óptica (E) que define un dibujo (P) a marcar en el objeto (G), interpuesta entre la fuente de radiación de luz (B) y el área a marcar del objeto (G), y constituida con un material con distintos niveles de atenuación de la energía irradiada sobre el material que define todo el dibujo (P), variando de manera continua entre sí, sin saltos discretos, de manera que permiten realizar un marcado analógico y tridimensional del objeto (G).#La máscara está adaptada para su inclusión en el sistema del primer aspecto.#El método comprende efectuar un marcado analógico y tridimensional de un objeto.#Los usos del sistema son para generar holografías de seguridad y marcas analógicas complejas de forma repetitiva.System, optical mask and method for marking an object by irradiation, and uses of the system. # The system comprises: # - a source of light radiation (B); and # - an optical mask (E) defining a drawing (P) to be marked on the object (G), interposed between the light radiation source (B) and the area to be marked on the object (G), and constituted with a material with different levels of attenuation of the irradiated energy on the material that defines the whole drawing (P), varying continuously with each other, without discrete jumps, so as to allow an analog and three-dimensional marking of the object (G). # The mask is adapted for inclusion in the first aspect system. # The method involves performing an analog and three-dimensional marking of an object. # The uses of the system are to generate security holographs and complex analog marks in a repetitive manner.

Description



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Claims (1)



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ES201330703A 2013-05-17 2013-05-17 System, optical mask and method for marking an object by irradiation, and system uses Expired - Fee Related ES2522907B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES201330703A ES2522907B1 (en) 2013-05-17 2013-05-17 System, optical mask and method for marking an object by irradiation, and system uses

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES201330703A ES2522907B1 (en) 2013-05-17 2013-05-17 System, optical mask and method for marking an object by irradiation, and system uses

Publications (2)

Publication Number Publication Date
ES2522907A1 ES2522907A1 (en) 2014-11-19
ES2522907B1 true ES2522907B1 (en) 2015-09-25

Family

ID=51894266

Family Applications (1)

Application Number Title Priority Date Filing Date
ES201330703A Expired - Fee Related ES2522907B1 (en) 2013-05-17 2013-05-17 System, optical mask and method for marking an object by irradiation, and system uses

Country Status (1)

Country Link
ES (1) ES2522907B1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003019576A (en) * 2001-07-06 2003-01-21 Hitachi Constr Mach Co Ltd Laser marking device and method
CN202225553U (en) * 2011-08-29 2012-05-23 浙江龙游道明光学有限公司 Mask for laser marking
JP5556774B2 (en) * 2011-09-16 2014-07-23 ウシオ電機株式会社 Exposure equipment

Also Published As

Publication number Publication date
ES2522907A1 (en) 2014-11-19

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