CN202225553U - Mask for laser marking - Google Patents
Mask for laser marking Download PDFInfo
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- CN202225553U CN202225553U CN2011203164679U CN201120316467U CN202225553U CN 202225553 U CN202225553 U CN 202225553U CN 2011203164679 U CN2011203164679 U CN 2011203164679U CN 201120316467 U CN201120316467 U CN 201120316467U CN 202225553 U CN202225553 U CN 202225553U
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- mask
- layer
- total reflection
- reflection layer
- laser marking
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Abstract
Disclosed is a mask for laser marking, comprising a quartz vitreous lamella and a total reflection layer, wherein the total reflection layer, being a metal film, covers the surface of the quartz vitreous lamella. The total reflection is metal film capable of bearing the high temperature of 500 DEG C or above. The mask of the utility model, with simple making technology, is suitable for batch production. The mask can bear high temperature with long service lifetime. The quartz glass applied to the mask substantially improves the making precision. The mask can be cleaned off with organic chemical solvent after being used and can be repeatedly used, thereby substantially cutting the cost.
Description
Technical field
The utility model relates to a kind of laser mask, relates in particular to the mask that a kind of laser marking is used.
Background technology
The mask that laser marking of the prior art is used is generally foil; On foil, engrave signs such as pattern or literal as required; Lose support in order to prevent that part remaining after pattern or the literal hollow out is unsettled, with fine rule the remaining part of hollow out is connected and be fixed up.Its weak point is: 1. this mask is to utilize the method for hollow out to make mask, therefore, just can't carry out Mold Making for very fine, complicated patterns or lines etc., and the mark applicable scope has limitation; 2. owing to the remaining part connection of hollow out is fixed up with fine rule; Therefore see through mask and when acting on the workpiece at laser; The sign of being got has the marking of obviously visible connection fine rule, and sign such as pattern of on workpiece, being up to or literal is not only very not attractive in appearance but also untrue; 3. this mask is on foil, to engrave pattern or words identification, and this mask making method bothers and not can manufacture, and can not reuse.
Open day be that the application for a patent for invention that on 05 04th, 2011, publication number CN102043179A, name are called " based on the laser direct-writing gray scale mask preparation method of bimetallic sensitive layer " has disclosed a kind of mask making method, its method is to select for use quartz glass to make substrate, at its surface plating bimetallic film; Form the proportional bimetallic sensitive layer of thicknesses of layers, described bimetallic film is Zn/Al bimetallic film or Zn/Sn bimetallic film, and described method at the substrate surface plated film adopts magnetron sputtering method; Or electron-beam vapor deposition method; Or atomic layer deposition method, the mask of making through this method also has its defective, is in particular in: on quartz glass, plate the bimetallic film; Could form a certain proportion of bimetallic sensitive layer; And its manufacture craft trouble of plating double layer of metal film, waste material, production cost is high; Because laser marking machine laser accumulation in continuous mark process causes mold surface temperature can reach more than 500 degrees centigrade; Therefore; The material of common non-high-temperature resistant can't tolerate this high temperature, and simultaneously, the fusing point of ZN, Al, three kinds of metals of Sn is all less than 500 degrees centigrade; Therefore; The Zn/Al bimetallic film or the Zn/Sn bimetallic film that are formed by them, in mask being applied to workpiece mark process, this mask can be vaporized and can't form required sign at the metallic film of hot conditions lower surface.
Summary of the invention
The utility model is not high to the making precision of mask in the prior art, mask die life not length, mask total reflection layer complex manufacturing technology, the not high defective of production efficiency, the mask that provides a kind of laser marking to use.
In order to solve technique scheme, the utility model is realized through following technical scheme:
The mask that a kind of laser marking is used comprises quartz glass layer and total reflection layer, and described total reflection layer is the layer of metal film, and total reflection layer is plated on the quartz glass laminar surface.Plating layer of metal film makes manufacture craft simple, and economical with materials is practiced thrift cost and can also be enhanced productivity.
The mask that above-mentioned described a kind of laser marking is used also comprises the layer of metal protective layer, and described coat of metal is plated on the total reflection layer surface.It is in order to protect described resistant to elevated temperatures metallic film, like this, can to prevent in mask placement or use, to cause to draw to decrease that described metallic film surface is coated with the layer of metal protective layer.
The mask that above-mentioned described a kind of laser marking is used also comprises one deck black enamelled coating, and described black enamelled coating is coated in the metal coating laminar surface.This is because black light-absorbing property is strong, is easy to make laser action to etch the mask of required sign at mask surface like this.
The mask that above-mentioned described a kind of laser marking is used also comprises one deck black enamelled coating, and described black enamelled coating is coated in the total reflection layer surface.This is because black light-absorbing property is strong, is easy to make laser action to etch the mask of required sign at mask surface like this.
The mask that above-mentioned described a kind of laser marking is used, described total reflection layer are the anti-metallic film of high temperature more than 500 ℃ of one deck.Metallic film is selected resistant to elevated temperatures metal for use, makes the said mask can withstand high temperatures, increases the service life.
The mask that above-mentioned described a kind of laser marking is used, described total reflection layer are the metallic film that argent forms, described quartz glass layer be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.Because the metal silver point is high, can tolerate the high temperature in the mark process, makes mask have practicality.
The mask that above-mentioned described a kind of laser marking is used, described quartz glass layer are the anti-transparency silica glass of high temperature more than 500 ℃.Select the thermostable transparent optical quartz glass of such refractive index and thickness for use, can make light that less refraction takes place when seeing through quartz glass, thereby improve the making precision of mask greatly.
The mask that above-mentioned described a kind of laser marking is used, the metal coating layer material is a metallic copper since the metallic copper cost low, be difficult for oxidation, damage resistant and can be by laser ablation.
The utlity model has following beneficial effect:
The mask that a kind of laser marking that the utility model provides is used is different with prior art; Be coated with one deck total reflection layer on the quartz glass substrate, and total reflection layer only needs the layer of metal film just can realize economical with materials; Practicing thrift cost can also enhance productivity, and can produce in batches.
Description of drawings
Fig. 1 is the structural representation of the utility model embodiment 1;
Fig. 2 is the structural representation of the utility model embodiment 2;
Fig. 3 is the structural representation of the utility model embodiment 3;
Fig. 4 is the structural representation of the utility model embodiment 4.
The specific embodiment
Below in conjunction with the specific embodiment and accompanying drawing the utility model is described in further detail, but they are not the restrictions to the utility model:
Mask as shown in Figure 1, that a kind of laser marking that the utility model provides is used comprises quartz glass layer 1 and total reflection layer 2, and total reflection layer 2 is the layer of metal film, and total reflection layer 2 is plated on quartz glass layer 1 surface.
Necessary wiped clean before the quartz glass of stating in the use; Can use 10% hydrofluoric acid dips; Use the high purity water clean again, the mask mould that quartz glass is cut into the mask machine is big or small, then in quartz glass surface plating layer of metal reflecting layer 2; Metal cladding can adopt modes such as vacuum evaporation, magnetron sputtering, electron beam evaporation, chemical plating, promptly is made into the mask that laser marking is used.
In the process of the required sign mask of concrete making: above-mentioned mask is put on the workbench of semiconductor laser marking; The adoptable model of semiconductor laser marking is F-DPS-50; Wavelength Nd:YAG/1064nm; Power output 50W opens computer and accesses required mark identification document, the technical parameter of debugging semiconductor laser marking; Make the focussed laser beam of computer control high-energy-density act on said total reflection layer 2 surfaces, etch signs such as required literal or pattern and form required mask mould by projected path.
When signs such as another kind of literal of needs mark or pattern, can the described mask of making be cleaned with the organic chemistry solvent, remove the silver layer on surface, remaining quartz glass can be reused and make new mask mould.
As preferably, total reflection layer 2 is the anti-metallic film of high temperature more than 500 ℃ of one deck, total reflection layer 2 select for use one deck anti-more than 700 ℃ the metallic film effect of high temperature better.
As preferably, total reflection layer 2 is the metallic film that argent forms.
As preferably, quartz glass layer 1 be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.
As preferably, described quartz glass layer 1 is the anti-transparency silica glass of high temperature more than 500 ℃, quartz glass layer 1 select for use anti-more than 700 ℃ the transparency silica glass of high temperature better.
As shown in Figure 2; The mask that a kind of laser marking of the utility model is used; Comprise quartz glass layer 1 and total reflection layer 2, total reflection layer 2 is the layer of metal film, and total reflection layer 2 is plated on quartz glass layer 1 surface; Also comprise layer of metal protective layer 3, described coat of metal 3 is plated on total reflection layer 2 surfaces.
As preferably, total reflection layer 2 is the anti-metallic film of high temperature more than 500 ℃ of one deck, total reflection layer 2 select for use one deck anti-more than 700 ℃ the metallic film effect of high temperature better.
As preferably, total reflection layer 2 is the metallic film that argent forms.
As preferably, quartz glass layer 1 be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.
As preferably, described quartz glass layer 1 is the anti-transparency silica glass of high temperature more than 500 ℃, quartz glass layer 1 select for use anti-more than 700 ℃ the transparency silica glass of high temperature better.
In order to protect above-mentioned mask, prevent in mask placement or use, to cause to draw to decrease, on described metallic film, be coated with layer of metal protective layer 3; This layer coat of metal 3 selected for use and is difficult for oxidation; Damage resistant and can be by the metal material of laser ablation, this layer coat of metal 3 is copper-plated metal level, adopts the mode of above-mentioned metal-coated films equally; Utilize the electron beam filming equipment on metallic reflector 2, to plate layer of metal protective layer 3, promptly be made into the mask that laser marking is used.
Concrete process of making required sign mask is with embodiment 1.
Mask as shown in Figure 3, that a kind of laser marking of the utility model is used comprises quartz glass layer 1 and total reflection layer 2; Total reflection layer 2 is the layer of metal film; Total reflection layer 2 is plated on quartz glass layer 1 surface, also comprises layer of metal protective layer 3, and described coat of metal 3 is plated on total reflection layer 2 surfaces; Also comprise one deck black enamelled coating 4, described black enamelled coating 4 is coated in coat of metal 3 surfaces.
As preferably, total reflection layer 2 is the anti-metallic film of high temperature more than 500 ℃ of one deck, total reflection layer 2 select for use one deck anti-more than 700 ℃ the metallic film effect of high temperature better.
As preferably, total reflection layer 2 is the metallic film that argent forms.
As preferably, quartz glass layer 1 be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.
As preferably, described quartz glass layer 1 is the anti-transparency silica glass of high temperature more than 500 ℃, quartz glass layer 1 select for use anti-more than 700 ℃ the transparency silica glass of high temperature better.
As preferably, described coat of metal 3 materials are metallic copper.
Concrete process of making required sign mask is with embodiment 1.
As shown in Figure 4; The mask that a kind of laser marking of the utility model is used; Comprise quartz glass layer 1 and total reflection layer 2, total reflection layer 2 is the layer of metal film, and total reflection layer 2 is plated on quartz glass layer 1 surface; Also comprise one deck black enamelled coating 4, described black enamelled coating 4 is coated in total reflection layer 2 surfaces.
Because black light-absorbing property is the strongest, under the situation that does not need coat of metal 3, directly scribbles one deck black enamelled coating 4 on above-mentioned total reflection layer 2 surfaces.
As preferably, total reflection layer 2 is the anti-metallic film of high temperature more than 500 ℃ of one deck, total reflection layer 2 select for use one deck anti-more than 700 ℃ the metallic film effect of high temperature better.
As preferably, total reflection layer 2 is the metallic film that argent forms.
As preferably, quartz glass layer 1 be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.
As preferably, described quartz glass layer 1 is the anti-transparency silica glass of high temperature more than 500 ℃, quartz glass layer 1 select for use anti-more than 700 ℃ the transparency silica glass of high temperature better.
Concrete process of making required sign mask is with embodiment 1.
In a word, the above is merely the preferred embodiment of the utility model, and the equalization that all scopes of applying for a patent according to the utility model are done changes and modifies, and all should belong to the covering scope of the utility model.
Claims (8)
1. the mask that laser marking is used comprises quartz glass layer (1) and total reflection layer (2), and it is characterized in that: described total reflection layer (2) is the layer of metal film, and described total reflection layer (2) is plated on quartz glass layer (1) surface.
2. the mask that a kind of laser marking according to claim 1 is used is characterized in that: also comprise layer of metal protective layer (3), described coat of metal (3) is plated on total reflection layer (2) surface.
3. the mask that a kind of laser marking according to claim 2 is used is characterized in that: also comprise one deck black enamelled coating (4), described black enamelled coating (4) is coated in coat of metal (3) surface.
4. the mask that a kind of laser marking according to claim 1 is used is characterized in that: also comprise one deck black enamelled coating (4), described black enamelled coating (4) is coated in total reflection layer (2) surface.
5. the mask of using according to the described a kind of laser marking of each claim in the claim 1 to 4 is characterized in that: described total reflection layer (2) is the anti-metallic film of high temperature more than 500 ℃ of one deck.
6. the mask that a kind of laser marking according to claim 5 is used; It is characterized in that: the metallic film that described total reflection layer (2) forms for argent; Described quartz glass layer (1) be refractive index less than 1.55, thickness is less than the transparency silica glass of 3mm.
7. the mask that a kind of laser marking according to claim 6 is used is characterized in that: described quartz glass layer (1) is the anti-transparency silica glass of high temperature more than 500 ℃.
8. the mask of using according to claim 2 or 3 described a kind of laser markings, it is characterized in that: described coat of metal (3) material is a metallic copper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203164679U CN202225553U (en) | 2011-08-29 | 2011-08-29 | Mask for laser marking |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203164679U CN202225553U (en) | 2011-08-29 | 2011-08-29 | Mask for laser marking |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202225553U true CN202225553U (en) | 2012-05-23 |
Family
ID=46076157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203164679U Expired - Fee Related CN202225553U (en) | 2011-08-29 | 2011-08-29 | Mask for laser marking |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202225553U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104070289A (en) * | 2013-03-27 | 2014-10-01 | 江苏犇银贵金属有限公司 | Laser marking method for enhancing scanning recognition rate on silver surface |
| ES2522907A1 (en) * | 2013-05-17 | 2014-11-19 | Francisco Manuel ORÓN SALVADOR | System, optical mask and method for marking an object by irradiation, and uses of the system (Machine-translation by Google Translate, not legally binding) |
-
2011
- 2011-08-29 CN CN2011203164679U patent/CN202225553U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104070289A (en) * | 2013-03-27 | 2014-10-01 | 江苏犇银贵金属有限公司 | Laser marking method for enhancing scanning recognition rate on silver surface |
| CN104070289B (en) * | 2013-03-27 | 2016-03-30 | 梅照付 | A kind of laser marking method in silver surface enhanced scanning recognition rate |
| ES2522907A1 (en) * | 2013-05-17 | 2014-11-19 | Francisco Manuel ORÓN SALVADOR | System, optical mask and method for marking an object by irradiation, and uses of the system (Machine-translation by Google Translate, not legally binding) |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120523 Termination date: 20190829 |