ES2197768B1 - INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION. - Google Patents

INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION.

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Publication number
ES2197768B1
ES2197768B1 ES200102020A ES200102020A ES2197768B1 ES 2197768 B1 ES2197768 B1 ES 2197768B1 ES 200102020 A ES200102020 A ES 200102020A ES 200102020 A ES200102020 A ES 200102020A ES 2197768 B1 ES2197768 B1 ES 2197768B1
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Spain
Prior art keywords
metal
deposition
situ
intermediate layers
steel
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Expired - Fee Related
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ES200102020A
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Spanish (es)
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ES2197768A1 (en
Inventor
Gustavo Adolfo Zambrano Romero
Pedro Prieto Pulido
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Individual
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Individual
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Priority to ES200102020A priority Critical patent/ES2197768B1/en
Publication of ES2197768A1 publication Critical patent/ES2197768A1/en
Application granted granted Critical
Publication of ES2197768B1 publication Critical patent/ES2197768B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

Instalación para deposición de películas de carbono tipo diamante sobre substratos de acero o de metal endurecido "in situ" usando recubrimientos duros de metal/carburo de ese metal como capas intermedias para el mejoramiento de la adherencia entre películas y substrato. La invención está relacionada con un método de deposición "in situ" de multicapas de recubrimientos duros de W/WC/DLC (tungsteno/carburo de tungsteno/carbono tipo diamante) por el método PVD (Physical Vapor Deposition) de pulverización catódica reactiva asistida por campo magnético (magnetrón sputtering), a partir de un sólo blanco binario de forma circular mitad tungsteno (99.99%) y mitad de carbono (99.99%). La deposición de las multicapas de W/WC/DLC a partir de este blanco binario único se obtiene con variación gradual del porcentaje de CH4 (Metano) en la mezcla Ar/CH4 (Argón/Metano) que se introduce en la cámara donde se genera el plasma de la descarga luminiscente que da lugar a la deposición de las multicapas. Este método produce un mejoramiento de la adherencia del DLC a los substratos de aceros al usar las películas de W/WC como capas intermedias.Installation for deposition of diamond-type carbon films on steel or hardened metal substrates "in situ" using hard metal / carbide coatings of that metal as intermediate layers for improved adhesion between films and substrate. The invention relates to a method of "in situ" deposition of multilayers of hard coatings of W / WC / DLC (tungsten / tungsten carbide / diamond carbon) by the PVD (Physical Vapor Deposition) method of reactive sputtering assisted by magnetic field (magnetron sputtering), from a single binary white circular shape half tungsten (99.99%) and half carbon (99.99%). The deposition of the multilayers of W / WC / DLC from this unique binary target is obtained with gradual variation of the percentage of CH4 (Methane) in the Ar / CH4 (Argon / Methane) mixture that is introduced into the chamber where it is generated the plasma of the luminescent discharge that results in the deposition of the multilayers. This method results in improved adhesion of DLC to steel substrates by using W / WC films as intermediate layers.

ES200102020A 2001-09-06 2001-09-06 INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION. Expired - Fee Related ES2197768B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES200102020A ES2197768B1 (en) 2001-09-06 2001-09-06 INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES200102020A ES2197768B1 (en) 2001-09-06 2001-09-06 INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION.

Publications (2)

Publication Number Publication Date
ES2197768A1 ES2197768A1 (en) 2004-01-01
ES2197768B1 true ES2197768B1 (en) 2005-03-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
ES200102020A Expired - Fee Related ES2197768B1 (en) 2001-09-06 2001-09-06 INSTALLATION FOR DEPOSITION OF DIAMOND TYPE CARBON FILMS ON STEEL OR METAL SUBSTRATES AND THE CORRESPONDING METHOD IN SITU USING HARD METAL / CARBIDE COATS OF THAT METAL AS INTERMEDIATE LAYERS FOR THE ADHERATION OF THE ADHESION.

Country Status (1)

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ES (1) ES2197768B1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5135808A (en) * 1990-09-27 1992-08-04 Diamonex, Incorporated Abrasion wear resistant coated substrate product
JPH06279185A (en) * 1993-03-25 1994-10-04 Canon Inc Forming method of diamond crystal and diamond crystal film

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