ES2040989T3 - Procedimiento para la obtencion de un sensor multifuncional de membrana selectiva a los iones. - Google Patents

Procedimiento para la obtencion de un sensor multifuncional de membrana selectiva a los iones.

Info

Publication number
ES2040989T3
ES2040989T3 ES198989203254T ES89203254T ES2040989T3 ES 2040989 T3 ES2040989 T3 ES 2040989T3 ES 198989203254 T ES198989203254 T ES 198989203254T ES 89203254 T ES89203254 T ES 89203254T ES 2040989 T3 ES2040989 T3 ES 2040989T3
Authority
ES
Spain
Prior art keywords
preparation
deposition
light
rays
different
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198989203254T
Other languages
English (en)
Inventor
Massimo Battilotti
Giuseppina Mazzamurro
Matteo Giongo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eni Tecnologie SpA
Original Assignee
Eniricerche SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eniricerche SpA filed Critical Eniricerche SpA
Application granted granted Critical
Publication of ES2040989T3 publication Critical patent/ES2040989T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403Cells and electrode assemblies
    • G01N27/414Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Immunology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Silicon Polymers (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Polyurethanes Or Polyureas (AREA)

Abstract

SE DESCRIBE UN PROCEDIMIENTO PARA OBTENER UN DETECTOR MULTIFUNCIONAL, DE MEMBRANAS IONISELECTIVAS, CUYO PROCEDIMIENTO COMPRENDE LAS SIGUIENTES FASES: A)PREPARACION DE UN PREPOLIMERO SILOXANICO, SEGUIDO DE UNA O MAS DEPOSICIONES DE PREPOLIMERO SILOXANICO SOBRE UN DISPOSITIVO DEL TIPO MOS O ISFET; B)PREPARACION DE UNA SOLUCION QUE CONTIENE UN IONOFORO, UN MONOMERO DE UNA OLEFINA POLIMERIZABLE, 2,4-TOLUENO DISOCIANATO Y UN DIALCOHOL, O UNA DIAMINA, O UN GLICOL, O UN TRIALCOHOL, O UNA TRIAMINA, CUYA PREPARACION SE SIGUE, DESPUES DE QUE DICHA SOLUCION SE HA MANTENIDO AGITADA DURANTE, AL MENOS, 48 HORAS A LA TEMPERATURA AMBIENTE, POR LA DEPOSICION DE LA MISMA SOBRE PREPOLIMERO SILOXANICO, CUYA DEPOSICION SE REALIZA POR MEDIO DE UNA CENTRIFUGADORA; C)TRATAMIENTO FOTOQUIMICO EN PRESENCIA DE UN FOTOLIMITADOR, POR MEDIO DE LUZ UV (RAYOS ULTRAVIOLETA), UTILIZANDOSE UNA MASCARA ADECUADA, QUE PERMITE LA EXPOSICION A LA LUZ DE TALES RAYOS, QUE TIENE LUGAR EN UNA PUERTA SOLAMENTE; D)LAVADO QUIMICO DEL DETECTOR, MEDIANTE UN DISOLVENTE ORGANICO; E)TRATAMIENTO TERMICO ("CURADO TERMICO"), PARA COMPLETAR LAS REACCIONES DE POLIMERIZACION; F)PREPARACION Y DEPOSICION DE OTRA SOLUCION SOBRE EL POLIMERO SILOXANICO, O DE UNA PLURALIDAD DE OTRAS SOLUCIONES, MEDIANTE LA EJECUCION EN FORMA SIMILAR QUE LA FASE ANTERIOR (B), CON SOLUCIONES QUE CONTIENEN UN IONOFORO DIFERENTE DE LOS ANTERIORES, CUYA DEPOSICION VA SEGUIDA DE LAS FASES (C), (D) Y (E), UTILIZANDOSE UNA MASCARA, QUE ES DIFERENTE DE LAS MASCARAS ANTERIORES, QUE HACE POSIBLE LA EXPOSICION A LA LUZ DE LOS RAYOS UV, PARA LLEVARSE A CABO EN UNA PUERTA DIFERENTE DE LAS ANTERIORES.
ES198989203254T 1988-12-23 1989-12-20 Procedimiento para la obtencion de un sensor multifuncional de membrana selectiva a los iones. Expired - Lifetime ES2040989T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8823105A IT1228120B (it) 1988-12-23 1988-12-23 Procedimento per ottenere un sensore multifunzionale a membrana ionoselettiva

Publications (1)

Publication Number Publication Date
ES2040989T3 true ES2040989T3 (es) 1993-11-01

Family

ID=11203833

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198989203254T Expired - Lifetime ES2040989T3 (es) 1988-12-23 1989-12-20 Procedimiento para la obtencion de un sensor multifuncional de membrana selectiva a los iones.

Country Status (6)

Country Link
US (1) US5130265A (es)
EP (1) EP0375070B1 (es)
AT (1) ATE87740T1 (es)
DE (1) DE68905784T2 (es)
ES (1) ES2040989T3 (es)
IT (1) IT1228120B (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2666930B1 (fr) * 1990-09-14 1992-12-18 Lyon Ecole Centrale Procede et realisation d'une surface-grille d'un capteur electrochimique integre, constitue d'un transistor a effet de champ et sensible aux especes alcalino-terreuses et capteur obtenu.
CH683874A5 (fr) * 1990-10-02 1994-05-31 Suisse Electronique Microtech Dispositif semi-conducteur comportant une membrane possédant une sensibilité sélective aux ions et procédé de réalisation de la membrane.
ES2114436B1 (es) * 1995-03-31 1999-04-01 Consejo Superior Investigacion Encapsulacion automatizada de sensores quimicos de estado solido empleando fotopolimeros que contienen resinas epoxi y poliuretanos acrilatos.
US5854863A (en) * 1996-03-15 1998-12-29 Erb; Judith Surface treatment and light injection method and apparatus
DE19829413A1 (de) * 1998-07-01 2000-01-13 Michael Glaeser Verfahren zur Herstellung von ionensensitiven und Membrane darstellende Schichten auf einem Träger und Verwendung mindestens einer Drucktechnik zur Herstellung von Anordnungen zur qualitativen und/oder quantitativen Bestimmung von Ionen oder Stoffen in Lösungen
US6387724B1 (en) 1999-02-26 2002-05-14 Dynamics Research Corporation Method of fabricating silicon-on-insulator sensor having silicon oxide sensing surface
EP1258035A4 (en) * 2000-02-01 2008-12-24 Analog Devices Inc PROCESS FOR MACHINING AT WAFER LEVEL TO REDUCE THE ADHESION AND PASSIVATE MICRO-WORKING SURFACES AND COMPOSITIONS USED THEREFROM
TW465055B (en) 2000-07-20 2001-11-21 Univ Nat Yunlin Sci & Tech Method and apparatus for measurement of temperature parameter of ISFET using amorphous silicon hydride as sensor membrane
GB0024294D0 (en) * 2000-10-04 2000-11-15 Univ Cambridge Tech Solid state embossing of polymer devices
TW544752B (en) 2002-05-20 2003-08-01 Univ Nat Yunlin Sci & Tech Method for producing SnO2 gate ion sensitive field effect transistor (ISFET), and method and device for measuring the temperature parameters, drift and hysteresis values thereof
US8586149B2 (en) * 2003-06-18 2013-11-19 Ford Global Technologies, Llc Environmentally friendly reactive fixture to allow localized surface engineering for improved adhesion to coated and non-coated substrates
TWI241020B (en) * 2004-03-31 2005-10-01 Univ Nat Yunlin Sci & Tech Method of manufacturing TiO2 sensing film, ISFET having TiO2 sensing film, and methods and apparatus for measuring the temperature parameter, drift, and hysteresis thereof
TWI244702B (en) * 2005-04-04 2005-12-01 Univ Nat Yunlin Sci & Tech Titanium oxide thin film for extended gate field effect transistor using reactive sputtering
US7517561B2 (en) * 2005-09-21 2009-04-14 Ford Global Technologies, Llc Method of coating a substrate for adhesive bonding
TWI295729B (en) * 2005-11-01 2008-04-11 Univ Nat Yunlin Sci & Tech Preparation of a ph sensor, the prepared ph sensor, systems comprising the same, and measurement using the systems
US7744984B2 (en) * 2006-06-28 2010-06-29 Ford Global Technologies, Llc Method of treating substrates for bonding
TW200815750A (en) * 2006-09-19 2008-04-01 Univ Nat Yunlin Sci & Tech System of measuring pH values of solutions and method for reducing time-drift effects of sensors thereof
US20100151236A1 (en) * 2008-12-11 2010-06-17 Ford Global Technologies, Llc Surface treatment for polymeric part adhesion

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466194A (en) * 1977-11-04 1979-05-28 Kuraray Co Fet sensor
DE2750807C3 (de) * 1977-11-14 1982-05-19 Dr. Eduard Fresenius, Chemisch-pharmazeutische Industrie KG Apparatebau KG, 6380 Bad Homburg Membran mit ionenselektiven Eigenschaften
JPS5825221B2 (ja) * 1977-12-12 1983-05-26 株式会社クラレ Fet比較電極
US4505799A (en) * 1983-12-08 1985-03-19 General Signal Corporation ISFET sensor and method of manufacture
NL8400916A (nl) * 1984-03-22 1985-10-16 Stichting Ct Voor Micro Elektr Werkwijze voor het vervaardigen van een isfet en een aldus vervaardigde isfet.
DE3526348A1 (de) * 1985-07-23 1987-02-05 Fraunhofer Ges Forschung Sensoren fuer die selektive bestimmung von komponenten in fluessiger oder gasfoermiger phase
IT1198226B (it) * 1986-12-04 1988-12-21 Eniricerche Spa Dispositivo sensibile agli ioni
IT1222121B (it) * 1987-07-24 1990-08-31 Eniricerche Spa Sensore per ioni contenente una membrana organica selettiva
US4874499A (en) * 1988-05-23 1989-10-17 Massachusetts Institute Of Technology Electrochemical microsensors and method of making such sensors

Also Published As

Publication number Publication date
EP0375070B1 (en) 1993-03-31
DE68905784T2 (de) 1993-10-28
IT1228120B (it) 1991-05-28
EP0375070A1 (en) 1990-06-27
ATE87740T1 (de) 1993-04-15
IT8823105A0 (it) 1988-12-23
US5130265A (en) 1992-07-14
DE68905784D1 (de) 1993-05-06

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