EP4357488A1 - Additive for composite plating solutions - Google Patents

Additive for composite plating solutions Download PDF

Info

Publication number
EP4357488A1
EP4357488A1 EP22824733.4A EP22824733A EP4357488A1 EP 4357488 A1 EP4357488 A1 EP 4357488A1 EP 22824733 A EP22824733 A EP 22824733A EP 4357488 A1 EP4357488 A1 EP 4357488A1
Authority
EP
European Patent Office
Prior art keywords
additive
nickel
plating solution
fine particles
occurred
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22824733.4A
Other languages
German (de)
French (fr)
Inventor
Kana Shibata
Kenichi Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JCU Corp
Original Assignee
JCU Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JCU Corp filed Critical JCU Corp
Publication of EP4357488A1 publication Critical patent/EP4357488A1/en
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/52Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02Combined electrolytic and electrophoretic processes with charged materials
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • C25D21/14Controlled addition of electrolyte components
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/18Regeneration of process solutions of electrolytes

Definitions

  • the present invention relates to a technique for causing an additive containing non-conductive fine particles used in a composite plating solution to become a liquid.
  • Plating that has a non-shiny uniform semi-bright or almost matte appearance is called satin nickel.
  • a method for obtaining a satin-like appearance includes composite plating in which non-conductive fine particles are suspended in a liquid and codeposited with nickel (NPL 1).
  • plating utilizing similar non-conductive fine particles includes microporous plating used for a base for chrome plating used as decorative plating for an automobile part, a faucet fitting, or the like.
  • microporous plating film With this microporous plating film, a large number of invisible tiny pores can be formed in the surface layer of chrome plating, and corrosion resistance can be improved by dispersing a corrosion current (PTL 1).
  • This microporous plating is also a type of composite plating.
  • the fine particles used to form a satin-like appearance or micropores have a very small particle diameter, and therefore scatter into the atmosphere when added to the plating solution, are exposed to a worker or adhere to the surroundings in working, and a liquid additive form has long been desired.
  • NPL 1 Electroplating & Chemical Plating Guide Book, 1987 Edition, Tokyo Plating Material Cooperative Association, P. 151
  • an object of the invention is to provide an additive for a composite plating solution, which is a liquid containing non-conductive fine particles, does not require preparation of special fine particles, and has high stability.
  • the present inventors conducted intensive studies to solve the above problems, and as a result, they found that the above problems can be solved by incorporating nickel ions for dispersing non-conductive fine particles in a liquid, and thus completed the invention.
  • the invention is directed to an additive for a composite plating solution characterized by containing non-conductive fine particles, nickel ions, and water.
  • the invention is directed to a method for preventing solidification of a precipitate of non-conductive fine particles in an additive for a composite plating solution, characterized by incorporating nickel ions in an additive for a composite plating solution containing non-conductive fine particles and water.
  • the additive for a composite plating solution of the invention can prevent sedimentation of non-conductive fine particles (separation between a suspension layer of non-conductive fine particles and a supernatant is delayed: a time until formation of a precipitate is slow), and prevent solidification of a precipitate (non-conductive fine particles do not re-disperse even if shaking is performed), and can maintain a stable state as a liquid additive.
  • the additive for a composite plating solution of the invention can be used stably without scattering into the atmosphere when added to the plating solution, or exposure to a worker or adhesion to the surroundings in working.
  • the additive for a composite plating solution of the invention contains non-conductive fine particles, nickel ions, and water.
  • the non-conductive fine particles used in the additive of the invention are not particularly limited, and examples thereof include oxides, nitrides, sulfides, and inorganic salts of metals such as silicon, barium, zirconium, aluminum and titanium.
  • oxides, nitrides, sulfides, and inorganic salts of silicon, barium, zirconium, and aluminum are preferred in terms of effect, and oxides such as silica (silicon dioxide) and zirconia (zirconium dioxide), and inorganic salts such as barium sulfate are particularly preferred.
  • these non-conductive fine particles one type or two or more types can be used.
  • non-conductive fine particles for example, commercially available products such as MP POWDER 308 and MP POWDER 309A of JCU CORPORATION can also be used.
  • the average particle diameter of these non-conductive fine particles is not particularly limited, but is, for example, 0.1 to 10 um, and preferably 1.0 to 3.0 um.
  • the average particle diameter is a value measured by a zeta potential/particle diameter/molecular weight measurement system ELSZ-2000 manufactured by Otsuka Electronics Co., Ltd.
  • the content of the non-conductive fine particles in the additive of the invention is not particularly limited, but is, for example, 0.01 to 20 wt% (hereinafter simply referred to as "%"), and preferably 0.05 to 10%.
  • the content of the non-conductive fine particles in the additive of the invention can also be set to a concentration higher than when the non-conductive fine particles are used in an ordinary composite plating solution. In this case, the content is, for example, 5 to 50%, and preferably 10 to 40%.
  • the content of nickel ions in the additive of the invention is not particularly limited, but is, for example, 0.01 to 12%, and preferably 0.05 to 10%.
  • the nickel ion supply source of the nickel ions is not particularly limited as long as nickel ions are generated when it is dissolved in water.
  • Examples thereof include nickel sulfate, nickel chloride, nickel sulfamate, and nickel acetate. These can be used in the form of a hydrate or an anhydride. Among these, nickel sulfate hexahydrate is preferred in terms of cost and containing no halogens.
  • nickel ion supply sources one type or two or more types can be used.
  • the mass ratio of the non-conductive fine particles and the nickel ions in the additive of the invention may be appropriately set according to the type of non-conductive fine particles, but for example, when silicon dioxide is used as the non-conductive fine particles, the mass ratio is 1:0.001 to 1:3, and preferably 1:0.003 to 1:2.
  • the water used in the additive of the invention is not particularly limited, and for example, distilled water, ion-exchanged water, ultrapure water, city water, or the like may be used.
  • the pH of the additive of the invention is not particularly limited, but is preferably neutral or acidic, and in particular, since a hydroxide of nickel is generated at pH 6 or higher, it is more preferably pH 6 or lower.
  • an inorganic acid such as sulfuric acid, hydrochloric acid, or nitric acid
  • an organic acid such as acetic acid, sulfamic acid, or the like may be used.
  • the additive of the invention can prevent sedimentation of the non-conductive fine particles and solidification of a precipitate thereof in the additive for composite plating solution containing water and the non-conductive fine particles by the action of nickel ions described above, and can maintain a stable state as a liquid additive, but may further contain one type or two or more types selected from a charge imparting agent, a surfactant, and a brightener.
  • Examples of the charge imparting agent include aluminum ions.
  • the supply source of the aluminum ions is not particularly limited, but when it is added to a composite plating solution containing a Watts bath in which nickel sulfate or nickel chloride is used as a base, use of polyaluminum chloride or aluminum sulfate has little effect on sulfate ions or chlorine ions.
  • polyaluminum chloride in the form of a powder may be added, or for example, a commercially available product in the form of an aqueous solution of about 10% in terms of aluminum oxide such as PAC of Nankai Chemical Industry Co., Ltd. or TAIPAC series of Taimei Chemicals Co., Ltd. may be added.
  • Such polyaluminum chloride may be added as it is or after being appropriately diluted or the like.
  • the content of polyaluminum chloride in the additive of the invention is not particularly limited, but is, for example, 0.01 to 50.0%, and preferably 0.1 to 30% in terms of aluminum oxide (for example, 0.002 to 15%, and preferably 0.02 to 7% in terms of aluminum).
  • aluminum sulfate in the form of a powder may be added, or aluminum sulfate in the form of a liquid may be added.
  • a commercially available product such as an aluminum sulfate solution for tap water or an aluminum sulfate solution for general use of Taimei Chemical Co., Ltd. may be added.
  • the surfactant is not particularly limited, but examples thereof include nonionic surfactants such as polyethylene glycol, anionic surfactants such as sodium polyoxyethylene alkyl ether sulfates, cationic surfactants such as benzethonium chloride, stearylamine acetate, and dodecyltrimethylammonium chloride, and amphoteric surfactants such as lauryl betaine, lauryl dimethylamino acetate betaine, amidopropyl dimethylamino acetate betaine laurate, and lauryl dimethylamine oxide.
  • nonionic surfactants such as polyethylene glycol
  • anionic surfactants such as sodium polyoxyethylene alkyl ether sulfates
  • cationic surfactants such as benzethonium chloride, stearylamine acetate, and dodecyltrimethylammonium chloride
  • amphoteric surfactants such as lauryl betaine, lauryl dimethylamino acetate betaine
  • a cationic surfactant that is positively charged or an amphoteric surfactant that exhibits cationic in a pH range where it is used is preferred. With the use of such a surfactant, the dispersibility is further maintained.
  • the content of the surfactant in the additive of the invention is not particularly limited, but is, for example, 0.001 to 5%, and preferably 0.001 to 2%.
  • the brightener is not particularly limited, and examples thereof include a primary brightener and a secondary brightener that are used in an ordinary composite plating solution.
  • the primary brightener include sulfonamides, sulfonimides, benzenesulfonic acid, and alkylsulfonic acids.
  • MP333 manufactured by JCU CORPORATION
  • the secondary brightener include 1,4-butynediol and coumarin.
  • #810 manufactured by JCU CORPORATION
  • These primary brighteners and secondary brighteners may be used alone or a plurality thereof may be used in combination.
  • the content of the brightener in the additive of the invention is not particularly limited, but for example, the primary brightener is preferably added in an amount of 0.1 to 900 mL/L, and the secondary brightener is preferably added in an amount of about 0.1 to 900 mL/L.
  • the additive of the invention contains non-conductive fine particles, nickel ions, and water, and therefore, an electrolytic nickel solution that is used for a composite plating solution such as a Watts bath or a sulfamate bath may be utilized as one containing nickel ions and water.
  • the composition of the Watts bath includes the following composition. This Watts bath may be diluted as appropriate.
  • the additive of the invention becomes one containing non-conductive fine particles and the Watts bath.
  • composition of the sulfamate bath includes the following composition. This sulfamate bath may be diluted as appropriate.
  • the additive of the invention becomes one containing non-conductive fine particles and the sulfamate bath.
  • Examples of the additive of the invention include those containing non-conductive fine particles, nickel ions, and water as described above, but the following ones may also be used.
  • the additive of the invention described above can be prepared by stirring and mixing the above-mentioned components until homogeneity.
  • a composite plating solution such as a satin nickel plating solution or a microporous nickel plating solution by adding the additive of the invention to a composite plating solution base.
  • a microporous nickel plating solution base it is possible to perform microporous plating with a good number of micropores as in a conventional case.
  • the composite plating solution base refers to a base containing some or all of the components other than the non-conductive fine particles in the composite plating solution, and becoming the composite plating solution by adding the additive of the invention thereto.
  • the screw tube bottles were sealed in a state where the additives of Examples 1 to 21 and Comparative Examples 1 to 6 were placed therein, and shaking was performed until homogeneity, and then, the state of each additive was investigated after 24 hours passed. When precipitation occurred, shaking was performed again and redispersibility of the non-conductive fine particles was investigated. In the shaking, the screw tube bottle was shaken up and down 30 times. After shaking, it was visually evaluated whether precipitation occurred in the additive after 24 hours passed, and further redispersibility after shaking was performed again was evaluated according to the following criteria. The results are shown in Table 1.
  • the screw tube bottles were sealed in a state where the additives of Examples 1 to 21 and Comparative Examples 1 to 6 were placed therein, and shaking was performed until homogeneity, and then, the state of each additive was investigated after 168 hours passed. When precipitation occurred, shaking was performed again and redispersibility of the non-conductive fine particles was investigated. In the shaking, the screw tube bottle was shaken up and down 30 times. After shaking, it was visually evaluated whether precipitation occurred in the additive after 168 hours passed, and redispersibility after shaking was performed again was evaluated according to the same criteria as in Test Example 1. The results are shown in Table 2.
  • Example 1 occurred A Example 15 occurred A Example 2 occurred A Example 16 occurred A Example 3 occurred A Example 17 occurred A Example 4 occurred A Example 18 occurred A Example 5 occurred A Example 19 occurred A Example 6 occurred A Example 20 occurred A Example 7 occurred A Example 21 occurred A Example 8 occurred A Example 9 occurred A Comparative Example 1 occurred B Example 10 occurred A Comparative Example 2 occurred A Example 11 occurred A Comparative Example 3 occurred B Example 12 occurred A Comparative Example 4 occurred B Example 13 occurred A Comparative Example 5 occurred A Example 14 occurred A Comparative Example 6 occurred B
  • Example 1 The additive prepared in Example 1 was added in an amount of 0.5 mL/L to a plating bath having the following composition, thereby preparing a microporous plating solution.
  • a microporous plated product was produced as a test piece according to the following steps using a bent cathode test piece (brass: manufactured by Yamamoto-MS Co., Ltd.) having a shape shown in FIG. 7 .
  • test piece was treated with SK-144 (manufactured by JCU CORPORATION) for 5 minutes for degreasing, and then treated with V-345 (manufactured by JCU CORPORATION) for 30 seconds for acid activation.
  • test piece subjected to the degreasing and acid activation treatments above were plated in the following nickel plating solution at 4 A/dm 2 for 3 minutes.
  • test piece subjected to bright plating was plated in the microporous plating solution prepared above at 3 A/dm 2 for 3 minutes.
  • test piece subjected to microporous nickel plating above was plated in a hexavalent chromium plating solution having the following composition at 10 A/dm 2 for 3 minutes.
  • test piece after chrome plating was immersed in a copper sulfate plating solution having the following composition for 3 minutes, and then plated in the copper sulfate plating solution at 0.5 A/dm 2 for 3 minutes.
  • the expected number of micropores could be obtained even when a microporous nickel plating solution was prepared by adding non-conductive fine particles in a liquid state.
  • the additive of the invention can be utilized for preparing a composite plating solution.

Abstract

An additive for a composite plating solution characterized by containing non-conductive fine particles, nickel ions, and water is a liquid containing the non-conductive fine particles, does not require preparation of special fine particles, and has high stability.

Description

    Technical Field
  • The present invention relates to a technique for causing an additive containing non-conductive fine particles used in a composite plating solution to become a liquid.
  • Background Art
  • Plating that has a non-shiny uniform semi-bright or almost matte appearance is called satin nickel. A method for obtaining a satin-like appearance includes composite plating in which non-conductive fine particles are suspended in a liquid and codeposited with nickel (NPL 1).
  • In addition, plating utilizing similar non-conductive fine particles includes microporous plating used for a base for chrome plating used as decorative plating for an automobile part, a faucet fitting, or the like. With this microporous plating film, a large number of invisible tiny pores can be formed in the surface layer of chrome plating, and corrosion resistance can be improved by dispersing a corrosion current (PTL 1). This microporous plating is also a type of composite plating.
  • The fine particles used to form a satin-like appearance or micropores have a very small particle diameter, and therefore scatter into the atmosphere when added to the plating solution, are exposed to a worker or adhere to the surroundings in working, and a liquid additive form has long been desired.
  • However, as for an additive in which water is used as a solvent, when non-conductive fine particles such as silica particles were added thereto, a phenomenon in which the non-conductive fine particles sediment, precipitate, and then solidify after several hours was observed, and it was unsuitable as a stable fine particle liquid additive.
  • Incidentally, as a technique for forming micropores during plating, it is known to perform electroplating using a plating solution containing non-conductive particles such as silica particles that are positively charged using aluminum hydroxide (PTL 2) .
  • However, if positively charged non-conductive fine particles are prepared in advance as an additive by such a conventional technique, the particles will solidify, so that it is necessary to add the particles separately each time when used, which made it unsuitable as a stable fine particle liquid additive.
  • Citation List Patent Literature
    • PTL 1: JPH03-291395A
    • PTL 2: JPH04-371597A
    Non Patent Literature
  • NPL 1: Electroplating & Chemical Plating Guide Book, 1987 Edition, Tokyo Plating Material Cooperative Association, P. 151
  • Summary of Invention Technical Problem
  • Therefore, an object of the invention is to provide an additive for a composite plating solution, which is a liquid containing non-conductive fine particles, does not require preparation of special fine particles, and has high stability.
  • Solution to Problem
  • The present inventors conducted intensive studies to solve the above problems, and as a result, they found that the above problems can be solved by incorporating nickel ions for dispersing non-conductive fine particles in a liquid, and thus completed the invention.
  • That is, the invention is directed to an additive for a composite plating solution characterized by containing non-conductive fine particles, nickel ions, and water.
  • In addition, the invention is directed to a method for preventing solidification of a precipitate of non-conductive fine particles in an additive for a composite plating solution, characterized by incorporating nickel ions in an additive for a composite plating solution containing non-conductive fine particles and water.
  • Advantageous Effects of Invention
  • The additive for a composite plating solution of the invention can prevent sedimentation of non-conductive fine particles (separation between a suspension layer of non-conductive fine particles and a supernatant is delayed: a time until formation of a precipitate is slow), and prevent solidification of a precipitate (non-conductive fine particles do not re-disperse even if shaking is performed), and can maintain a stable state as a liquid additive.
  • Therefore, the additive for a composite plating solution of the invention can be used stably without scattering into the atmosphere when added to the plating solution, or exposure to a worker or adhesion to the surroundings in working.
  • Brief Description of Drawings
    • [FIG. 1] FIG. 1 is a view showing a state of an additive of Comparative Example 1 after being left for 168 hours in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 2] FIG. 2 is a view showing a state of an additive of Example 1 after being left for 168 hours in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 3] FIG. 3 is a view showing a state of an additive of Example 2 after being left for 168 hours in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 4] FIG. 4 is a view showing a state of an additive of Comparative Example 1 after being left for 168 hours and then being shaken in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 5] FIG. 5 is a view showing a state of an additive of Example 1 after being left for 168 hours and then being shaken in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 6] FIG. 6 is a view showing a state of an additive of Example 2 after being left for 168 hours and then being shaken in Test Example 2 (the left and right views are the same, and the right view has an explanation added to the left view).
    • [FIG. 7] FIG. 7 is a view showing an appearance of a test piece used in Test Example 3.
    Description of Embodiments
  • The additive for a composite plating solution of the invention (hereinafter referred to as "the additive of the invention") contains non-conductive fine particles, nickel ions, and water.
  • The non-conductive fine particles used in the additive of the invention are not particularly limited, and examples thereof include oxides, nitrides, sulfides, and inorganic salts of metals such as silicon, barium, zirconium, aluminum and titanium. Among these, oxides, nitrides, sulfides, and inorganic salts of silicon, barium, zirconium, and aluminum are preferred in terms of effect, and oxides such as silica (silicon dioxide) and zirconia (zirconium dioxide), and inorganic salts such as barium sulfate are particularly preferred. Among these non-conductive fine particles, one type or two or more types can be used.
  • In addition, as the non-conductive fine particles, for example, commercially available products such as MP POWDER 308 and MP POWDER 309A of JCU CORPORATION can also be used.
  • The average particle diameter of these non-conductive fine particles is not particularly limited, but is, for example, 0.1 to 10 um, and preferably 1.0 to 3.0 um. The average particle diameter is a value measured by a zeta potential/particle diameter/molecular weight measurement system ELSZ-2000 manufactured by Otsuka Electronics Co., Ltd.
  • The content of the non-conductive fine particles in the additive of the invention is not particularly limited, but is, for example, 0.01 to 20 wt% (hereinafter simply referred to as "%"), and preferably 0.05 to 10%. In addition, the content of the non-conductive fine particles in the additive of the invention can also be set to a concentration higher than when the non-conductive fine particles are used in an ordinary composite plating solution. In this case, the content is, for example, 5 to 50%, and preferably 10 to 40%.
  • The content of nickel ions in the additive of the invention is not particularly limited, but is, for example, 0.01 to 12%, and preferably 0.05 to 10%.
  • The nickel ion supply source of the nickel ions is not particularly limited as long as nickel ions are generated when it is dissolved in water. Examples thereof include nickel sulfate, nickel chloride, nickel sulfamate, and nickel acetate. These can be used in the form of a hydrate or an anhydride. Among these, nickel sulfate hexahydrate is preferred in terms of cost and containing no halogens. Among these nickel ion supply sources, one type or two or more types can be used.
  • The mass ratio of the non-conductive fine particles and the nickel ions in the additive of the invention may be appropriately set according to the type of non-conductive fine particles, but for example, when silicon dioxide is used as the non-conductive fine particles, the mass ratio is 1:0.001 to 1:3, and preferably 1:0.003 to 1:2.
  • The water used in the additive of the invention is not particularly limited, and for example, distilled water, ion-exchanged water, ultrapure water, city water, or the like may be used.
  • The pH of the additive of the invention is not particularly limited, but is preferably neutral or acidic, and in particular, since a hydroxide of nickel is generated at pH 6 or higher, it is more preferably pH 6 or lower. In order to adjust the pH, for example, an inorganic acid such as sulfuric acid, hydrochloric acid, or nitric acid, an organic acid such as acetic acid, sulfamic acid, or the like may be used.
  • The additive of the invention can prevent sedimentation of the non-conductive fine particles and solidification of a precipitate thereof in the additive for composite plating solution containing water and the non-conductive fine particles by the action of nickel ions described above, and can maintain a stable state as a liquid additive, but may further contain one type or two or more types selected from a charge imparting agent, a surfactant, and a brightener.
  • Examples of the charge imparting agent include aluminum ions. The supply source of the aluminum ions is not particularly limited, but when it is added to a composite plating solution containing a Watts bath in which nickel sulfate or nickel chloride is used as a base, use of polyaluminum chloride or aluminum sulfate has little effect on sulfate ions or chlorine ions.
  • When polyaluminum chloride is incorporated in the additive of the invention, polyaluminum chloride in the form of a powder may be added, or for example, a commercially available product in the form of an aqueous solution of about 10% in terms of aluminum oxide such as PAC of Nankai Chemical Industry Co., Ltd. or TAIPAC series of Taimei Chemicals Co., Ltd. may be added. Such polyaluminum chloride may be added as it is or after being appropriately diluted or the like.
  • The content of polyaluminum chloride in the additive of the invention is not particularly limited, but is, for example, 0.01 to 50.0%, and preferably 0.1 to 30% in terms of aluminum oxide (for example, 0.002 to 15%, and preferably 0.02 to 7% in terms of aluminum).
  • Further, when aluminum sulfate is incorporated in the additive of the invention, aluminum sulfate in the form of a powder may be added, or aluminum sulfate in the form of a liquid may be added. To aluminum sulfate in the form of a liquid, a commercially available product such as an aluminum sulfate solution for tap water or an aluminum sulfate solution for general use of Taimei Chemical Co., Ltd. may be added.
  • The surfactant is not particularly limited, but examples thereof include nonionic surfactants such as polyethylene glycol, anionic surfactants such as sodium polyoxyethylene alkyl ether sulfates, cationic surfactants such as benzethonium chloride, stearylamine acetate, and dodecyltrimethylammonium chloride, and amphoteric surfactants such as lauryl betaine, lauryl dimethylamino acetate betaine, amidopropyl dimethylamino acetate betaine laurate, and lauryl dimethylamine oxide. Among these surfactants, one type or two or more types can be used. Among these surfactants, a cationic surfactant that is positively charged or an amphoteric surfactant that exhibits cationic in a pH range where it is used is preferred. With the use of such a surfactant, the dispersibility is further maintained.
  • The content of the surfactant in the additive of the invention is not particularly limited, but is, for example, 0.001 to 5%, and preferably 0.001 to 2%.
  • The brightener is not particularly limited, and examples thereof include a primary brightener and a secondary brightener that are used in an ordinary composite plating solution. Examples of the primary brightener include sulfonamides, sulfonimides, benzenesulfonic acid, and alkylsulfonic acids. As the primary brightener, for example, MP333 (manufactured by JCU CORPORATION) or the like is commercially available and therefore may be used. Examples of the secondary brightener include 1,4-butynediol and coumarin. The secondary brightener is an organic compound having a functional group as follows (C=O, C=C, C=C, C=N, C=N, N-C=S, N=N, -CH2-CH-O). As the secondary brightener, for example, #810 (manufactured by JCU CORPORATION) is commercially available and therefore may be used. These primary brighteners and secondary brighteners may be used alone or a plurality thereof may be used in combination.
  • The content of the brightener in the additive of the invention is not particularly limited, but for example, the primary brightener is preferably added in an amount of 0.1 to 900 mL/L, and the secondary brightener is preferably added in an amount of about 0.1 to 900 mL/L.
  • It is only necessary that the additive of the invention contains non-conductive fine particles, nickel ions, and water, and therefore, an electrolytic nickel solution that is used for a composite plating solution such as a Watts bath or a sulfamate bath may be utilized as one containing nickel ions and water.
  • The composition of the Watts bath includes the following composition. This Watts bath may be diluted as appropriate.
    • Nickel sulfate (NiSO4·6H2O): 1 to 450 g/L
    • Nickel chloride (NiCl2·6H2O): 0.1 to 45 g/L
    • Boric acid (H3BO3) : 0.1 to 45 g/L
    • Water: balance
  • When the Watts bath is utilized in this manner, the additive of the invention becomes one containing non-conductive fine particles and the Watts bath.
  • The composition of the sulfamate bath includes the following composition. This sulfamate bath may be diluted as appropriate.
    • Nickel sulfamate (Ni(SO3NH2)2·4H2O): 1 to 600 g/L
    • Nickel chloride (NiCl2·6H2O): 0 to 15 g/L
    • Boric acid (H3BO3) : 0.1 to 40 g/L
    • Water: balance
  • When the sulfamate bath is utilized in this manner, the additive of the invention becomes one containing non-conductive fine particles and the sulfamate bath.
  • Examples of the additive of the invention include those containing non-conductive fine particles, nickel ions, and water as described above, but the following ones may also be used.
    1. (1) An additive for a composite plating solution characterized by containing non-conductive fine particles, nickel ions, and water.
    2. (2) The additive for a composite plating solution according to (1), wherein the composite plating solution is a satin nickel plating solution or a microporous nickel plating solution.
    3. (3) The additive for a composite plating solution according to (1) or (2), wherein the non-conductive fine particles are one or more types selected from oxides, nitrides, sulfides, and inorganic salts of silicon, barium, zirconium, aluminum, and titanium.
    4. (4) The additive for a composite plating solution according to any one of (1) to (3), wherein the supply source of nickel ions is one type or two or more types selected from nickel sulfate hexahydrate, nickel chloride, and nickel sulfamate.
    5. (5) An additive for a composite plating solution characterized by containing:
      • non-conductive fine particles;
      • nickel ions; and
      • one or more types selected from a charge imparting agent, a surfactant, and a brightener.
    6. (6) An additive for a composite plating solution characterized by containing:
      • non-conductive fine particles; and
      • a Watts bath or a sulfamate bath.
    7. (7) An additive for a composite plating solution characterized by containing:
      • non-conductive fine particles;
      • a Watts bath or a sulfamate bath; and
      • one or more types selected from a charge imparting agent, a surfactant, and a brightener.
    8. (8) A method for preventing solidification of a precipitate of non-conductive fine particles in an additive for a composite plating solution, characterized by incorporating nickel ions in an additive for a composite plating solution containing non-conductive fine particles and water.
  • The additive of the invention described above can be prepared by stirring and mixing the above-mentioned components until homogeneity.
  • Then, it is possible to prevent sedimentation of the non-conductive fine particles of the invention or solidification of a precipitate thereof, and maintain a stable state as a liquid additive.
  • It is possible to prepare a composite plating solution such as a satin nickel plating solution or a microporous nickel plating solution by adding the additive of the invention to a composite plating solution base. In particular, by adding the additive of the invention to a microporous nickel plating solution base to prepare a microporous nickel plating solution, it is possible to perform microporous plating with a good number of micropores as in a conventional case. The composite plating solution base refers to a base containing some or all of the components other than the non-conductive fine particles in the composite plating solution, and becoming the composite plating solution by adding the additive of the invention thereto.
  • Examples
  • Hereinafter, the invention will be described in detail with reference to Examples, but the invention is by no means limited to these Examples or the like. In the preparation of additives in Examples and Comparative Examples, a 110 mL glass screw tube bottle (9-852-10, manufactured by AS ONE Co., Ltd.) (hereinafter referred to as a screw tube bottle) was used.
  • Example 1 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 500 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 5.31).
  • Example 2 Preparation of Additive Using Watts Bath:
  • In a screw tube bottle, 100 mL of a Watts bath prepared with the following composition and 6 g of a powder of silicon dioxide (average particle diameter: 1.5 um) were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.69).
  • <Watts Bath>
    • Nickel sulfate (NiSO4·6H2O): 250 g/L
    • Nickel chloride (NiCl2·6H2O): 40 g/L
    • Boric acid (H3BO3) : 40 g/L
    Example 3 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 500 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further polyaluminum chloride (PAC, Nankai Chemical Co., Ltd.) in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.92).
  • Example 4 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 60 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.99).
  • Example 5 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 10 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 4.05).
  • Example 6 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 1 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.86).
  • Example 7 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 450 g/L of nickel sulfate, 40 g/L of nickel chloride, and 40 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.62).
  • Example 8 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 250 g/L of nickel sulfate, 40 g/L of nickel chloride, and 40 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.74).
  • Example 9 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 10 g/L of nickel sulfate, 1.6 g/L of nickel chloride, and 1.6 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.96).
  • Example 10 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 1 g/L of nickel sulfate, 0.16 g/L of nickel chloride, and 0.16 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further polyaluminum chloride in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.85) .
  • Example 11 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 500 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.31).
  • Example 12 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 60 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.24).
  • Example 13 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 10 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.41).
  • Example 14 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of a 1 g/L aqueous solution of nickel sulfate and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.31).
  • Example 15 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 450 g/L of nickel sulfate, 40 g/L of nickel chloride, and 40 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.08).
  • Example 16 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 250 g/L of nickel sulfate, 40 g/L of nickel chloride, and 40 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.00).
  • Example 17 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 10 g/L of nickel sulfate, 1.6 g/L of nickel chloride, and 1.6 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.30).
  • Example 18 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 1 g/L of nickel sulfate, 0.16 g/L of nickel chloride, and 0.16 g/L of boric acid, and 6 g of a powder of silicon dioxide, and further aluminum sulfate in an amount of 0.07 g in terms of aluminum were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.30) .
  • Example 19 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 100 g/L of nickel sulfate and 6 g of a powder of silicon dioxide were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 5.63).
  • Example 20 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 100 g/L of nickel sulfate and 6 g of a powder of titanium dioxide (average particle diameter: 0.01 um) were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 4.94).
  • Example 21 Preparation of Additive Using Nickel Salt:
  • In a screw tube bottle, 100 mL of an aqueous solution adjusted to 100 g/L of nickel sulfate and 6 g of a powder of zirconium silicate (average particle diameter: 1.1 um) were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 5.64).
  • As Comparative Examples, cases where nickel ions were not contained in the dispersion solvent for the non-conductive fine particles, and water was substantially used as the main solvent will be described below.
  • Comparative Example 1 Preparation of Additive Prepared with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of silicon dioxide were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 7.17) .
  • Comparative Example 2 Preparation of Additive Prepared with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of titanium dioxide were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 7.61) .
  • Comparative Example 3 Preparation of Additive Prepared with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of zirconium silicate were placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 6.91) .
  • Comparative Example 4 Preparation of Additive Prepared with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of silicon dioxide were placed, followed by stirring and mixing until homogeneity, and an additive adjusted to pH 3 or lower with a small amount of sulfuric acid was obtained (pH 2.34) .
  • Comparative Example 5 Preparation of Additive Prepared with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of silicon dioxide were placed, and further, polyaluminum chloride in an amount of 0.07 g in terms of aluminum was placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.36).
  • Comparative Example 6 Preparation of Additive with Only Water:
  • In a screw tube bottle, 100 mL of pure water and 6 g of a powder of silicon dioxide were placed, and further, aluminum sulfate in an amount of 0.07 g in terms of aluminum was placed, followed by stirring and mixing until homogeneity, thereby obtaining an additive (pH 3.84).
  • Test Example 1 Dispersibility Test:
  • The screw tube bottles were sealed in a state where the additives of Examples 1 to 21 and Comparative Examples 1 to 6 were placed therein, and shaking was performed until homogeneity, and then, the state of each additive was investigated after 24 hours passed. When precipitation occurred, shaking was performed again and redispersibility of the non-conductive fine particles was investigated. In the shaking, the screw tube bottle was shaken up and down 30 times. After shaking, it was visually evaluated whether precipitation occurred in the additive after 24 hours passed, and further redispersibility after shaking was performed again was evaluated according to the following criteria. The results are shown in Table 1.
  • <Redispersibility Evaluation Criteria> Evaluation Contents
    • A: Homogeneity is achieved when shaking is performed.
    • B: Homogeneity is not achieved even when shaking is performed.
    [Table 1]
    Precipitation Redispersibility Precipitation Redispersibility
    Example 1 slightly occurred A Example 15 slightly occurred A
    Example 2 occurred A Example 16 occurred A
    Example 3 occurred A Example 17 occurred A
    Example 4 occurred A Example 18 occurred A
    Example 5 occurred A Example 19 occurred A
    Example 6 occurred A Example 20 occurred A
    Example 7 slightly occurred A Example 21 occurred A
    Example 8 slightly occurred A
    Example 9 slightly occurred A Comparative Example 1 occurred B
    Example 10 slightly occurred A Comparative Example 2 occurred A
    Example 11 slightly occurred A Comparative Example 3 occurred B
    Example 12 occurred A Comparative Example 4 occurred B
    Example 13 occurred A Comparative Example 5 occurred A
    Example 14 occurred A Comparative Example 6 occurred A
  • With respect to Examples 1 to 21, although precipitation occurred, when shaking was performed again, the precipitate easily redispersed, and homogeneous dispersibility could be verified.
  • On the other hand, with respect to Comparative Examples 1, 3, and 4, precipitation occurred, and even after shaking was performed again, the precipitate solidified and did not redisperse. Further, with respect to Comparative Examples 2, 5, and 6, although precipitation occurred, when shaking was performed again, the precipitate easily redispersed, and homogeneous dispersibility could be verified.
  • Test example 2 Dispersibility Test After Long-Term Storage:
  • The screw tube bottles were sealed in a state where the additives of Examples 1 to 21 and Comparative Examples 1 to 6 were placed therein, and shaking was performed until homogeneity, and then, the state of each additive was investigated after 168 hours passed. When precipitation occurred, shaking was performed again and redispersibility of the non-conductive fine particles was investigated. In the shaking, the screw tube bottle was shaken up and down 30 times. After shaking, it was visually evaluated whether precipitation occurred in the additive after 168 hours passed, and redispersibility after shaking was performed again was evaluated according to the same criteria as in Test Example 1. The results are shown in Table 2.
  • Further, the results of the additive of Comparative Example 1 are shown in FIGS. 1 and 4, the results of the additive of Example 1 are shown in FIGS. 2 and 5, and the results of the additive of Example 2 are shown in FIGS. 3 and 6. [Table 2]
    Precipitation Redispersibility Precipitation Redispersibility
    Example 1 occurred A Example 15 occurred A
    Example 2 occurred A Example 16 occurred A
    Example 3 occurred A Example 17 occurred A
    Example 4 occurred A Example 18 occurred A
    Example 5 occurred A Example 19 occurred A
    Example 6 occurred A Example 20 occurred A
    Example 7 occurred A Example 21 occurred A
    Example 8 occurred A
    Example 9 occurred A Comparative Example 1 occurred B
    Example 10 occurred A Comparative Example 2 occurred A
    Example 11 occurred A Comparative Example 3 occurred B
    Example 12 occurred A Comparative Example 4 occurred B
    Example 13 occurred A Comparative Example 5 occurred A
    Example 14 occurred A Comparative Example 6 occurred B
  • With respect to Examples 1 to 21, although precipitation occurred, when shaking was performed again, the precipitate easily redispersed, and homogeneous dispersibility could be verified.
  • On the other hand, with respect to Comparative Examples 1, 3, 4, and 5, precipitation occurred, and even after shaking was performed again, the precipitate solidified and did not redisperse. Further, with respect to Comparative Examples 2 and 5, although precipitation occurred, when shaking was performed again, the precipitate easily redispersed, and homogeneous dispersibility could be verified.
  • From the results of Test Examples 1 and 2, it was found that in order to form a liquid state with good dispersibility without causing precipitation of the non-conductive fine particles and solidification of the precipitate thereof, incorporation of nickel ions together with the non-conductive fine particles has an effect on redispersibility.
  • Test Example 3 Plating Test:
  • The additive prepared in Example 1 was added in an amount of 0.5 mL/L to a plating bath having the following composition, thereby preparing a microporous plating solution.
  • <Plating Bath>
    • Nickel sulfate (NiSO4·6H2O): 260 g/L
    • Nickel chloride (NiCl2·6H2O): 45 g/L
    • Boric acid (H3BO3) : 45 g/L
    • Brightener #810*: 3 mL/L
    • Brightener MP333*: 10 mL/L
    • Polyaluminum chloride: 0.3 mg/L (in terms of aluminum)
    • Bath temperature: 55°C
    • Specific gravity: 1.205
    • *: manufactured by JCU CORPORATION
  • Subsequently, a microporous plated product was produced as a test piece according to the following steps using a bent cathode test piece (brass: manufactured by Yamamoto-MS Co., Ltd.) having a shape shown in FIG. 7.
  • (Degreasing/Acid Activation)
  • The test piece was treated with SK-144 (manufactured by JCU CORPORATION) for 5 minutes for degreasing, and then treated with V-345 (manufactured by JCU CORPORATION) for 30 seconds for acid activation.
  • (Bright Nickel Plating)
  • The test piece subjected to the degreasing and acid activation treatments above were plated in the following nickel plating solution at 4 A/dm2 for 3 minutes.
  • <Bright Nickel Plating Bath>
    • Nickel sulfate (NiSO4·6H2O): 260 g/L
    • Nickel chloride (NiCl2·6H2O): 45 g/L
    • Boric acid (H3BO3) : 45 g/L
    • Brightener #810*: 3 mL/L
    • Brightener #83*: 10 mL/L
    • *: manufactured by JCU CORPORATION
    (Microporous Plating)
  • The test piece subjected to bright plating was plated in the microporous plating solution prepared above at 3 A/dm2 for 3 minutes.
  • (Chrome Plating)
  • The test piece subjected to microporous nickel plating above was plated in a hexavalent chromium plating solution having the following composition at 10 A/dm2 for 3 minutes.
  • <Hexavalent Chromium Plating Bath>
    • Chromic anhydride (CrO3): 250 g/L
    • Sulfuric acid (H2SO4) : 1 g/L
    • Additive ECR 300LN*: 10 mL/L
    • MISTSHUT NP*: 0.1 mL/L
    • *: manufactured by JCU CORPORATION
    (Procedure 1 for Measuring Number of Micropores)
  • The test piece after chrome plating was immersed in a copper sulfate plating solution having the following composition for 3 minutes, and then plated in the copper sulfate plating solution at 0.5 A/dm2 for 3 minutes.
  • <Copper Sulfate Plating Bath>
    • Copper sulfate (CuSO4·5H2O): 220 g /L
    • Sulfuric acid (H2SO4): 50 g/L
    • Hydrochloric acid (HCl): 0.15 mL/L
    (Procedure 2 for Measuring Number of Micropores)
  • After copper sulfate plating, the test piece was gently washed with water, air-dried, and then, the number of micropores in the plating film was measured. The measurement of the number of micropores was performed for the evaluation surface of the test piece using a microscope VHX-200 manufactured by KEYENCE CORPORATION. The measurement result of the number of micropores is shown in Table 3. [Table 3]
    Number of micropores in evaluation surface (micropores/cm2) 30440
  • With the use of the additive of the invention, the expected number of micropores could be obtained even when a microporous nickel plating solution was prepared by adding non-conductive fine particles in a liquid state.
  • Industrial Applicability
  • The additive of the invention can be utilized for preparing a composite plating solution.

Claims (6)

  1. An additive for a composite plating solution, characterized by comprising non-conductive fine particles, nickel ions, and water.
  2. The additive for a composite plating solution according to claim 1, wherein the composite plating solution is a satin nickel plating solution or a microporous nickel plating solution.
  3. The additive for a composite plating solution according to claim 1 or 2, wherein the non-conductive fine particles are one type or two or more types of oxides, nitrides, sulfides, or inorganic salts of a metal selected from the group consisting of silicon, barium, zirconium, aluminum, and titanium.
  4. The additive for a composite plating solution according to any one of claims 1 to 3, which contains one type or two or more types selected from the group consisting of hydrates of nickel sulfate, nickel chloride, nickel sulfamate, and nickel acetate and anhydrides of nickel sulfate, nickel chloride, nickel sulfamate, and nickel acetate.
  5. The additive for a composite plating solution according to any one of claims 1 to 4, further comprising one type or two or more types selected from a charge imparting agent, a surfactant, and a brightener.
  6. A method for preventing solidification of a precipitate of non-conductive fine particles in an additive for a composite plating solution, characterized by incorporating nickel ions in an additive for a composite plating solution containing non-conductive fine particles and water.
EP22824733.4A 2021-06-16 2022-05-18 Additive for composite plating solutions Pending EP4357488A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021100239A JP6945761B1 (en) 2021-06-16 2021-06-16 Additives for composite plating solutions
PCT/JP2022/020620 WO2022264739A1 (en) 2021-06-16 2022-05-18 Additive for composite plating solutions

Publications (1)

Publication Number Publication Date
EP4357488A1 true EP4357488A1 (en) 2024-04-24

Family

ID=77915202

Family Applications (1)

Application Number Title Priority Date Filing Date
EP22824733.4A Pending EP4357488A1 (en) 2021-06-16 2022-05-18 Additive for composite plating solutions

Country Status (4)

Country Link
EP (1) EP4357488A1 (en)
JP (1) JP6945761B1 (en)
CN (1) CN115478307A (en)
WO (1) WO2022264739A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727818Y2 (en) * 1976-07-02 1982-06-17
JP2962598B2 (en) * 1991-06-20 1999-10-12 荏原ユージライト株式会社 Microporous chrome plating method
BRPI0924283B1 (en) * 2009-02-13 2019-11-12 Atotech Deutschland Gmbh chrome part and method of manufacturing it
JP5435477B2 (en) * 2010-01-22 2014-03-05 アイテック株式会社 Composite plating solution in which fine diamond particles are dispersed and method for producing the same
EP3940119A4 (en) * 2019-03-12 2022-08-10 JCU Corporation Microporous plating solution and method of using this plating solution to perform microporous plating on object to be plated

Also Published As

Publication number Publication date
JP2022191792A (en) 2022-12-28
JP6945761B1 (en) 2021-10-06
WO2022264739A1 (en) 2022-12-22
CN115478307A (en) 2022-12-16

Similar Documents

Publication Publication Date Title
TW200923138A (en) A copper plating bath formulation
JP6951465B2 (en) Trivalent chrome plating solution and chrome plating method using this
TW200944624A (en) Composite coatings for whisker reduction
TWI548782B (en) Cyanide-free acidic matte silver electroplating compositions and methods
KR20230095905A (en) Platinum electrolytic plating bath and platinum plated product
JP5452458B2 (en) Nickel plating solution and nickel plating method
EP4357488A1 (en) Additive for composite plating solutions
TWI674341B (en) Environmentally friendly nickel electroplating compositions and methods
Kasach et al. Electrodeposition of Cu-Sn alloy from oxalic acid electrolyte in the presence of amine-containing surfactants
EP3940119A1 (en) Microporous plating solution and method of using this plating solution to perform microporous plating on object to be plated
CN118028922A (en) Additive for composite plating solution
Eroglu et al. Effect of a cationic polymer, polyethyleneimine, on Ni/SiC co-deposition
EP3543378A1 (en) Deposition of wear resistant nickel-tungsten plating systems
US3342566A (en) Process for the electrodeposition of a decorative corrosion resistant nickel-chromium coating and products thereof
JP2016060918A (en) Decorative trivalent chromium plating solution and decorative chromium plating method utilizing the same
TWI824497B (en) Cyanide-free electrolytic gold plating solution
TWI761212B (en) Silver/tin electroplating bath and method of using the same
Rudnik et al. Studies on the codeposition of SiC nanopowder with nickel, cobalt, and Co-Ni alloys
TWI467065B (en) Electrolytic deposition of metal-based composite coatings comprising nano-particles
Bernasconi et al. Electrodeposition of Equiatomic FePt Permanent Magnets from Non-Aqueous Electrolytes Based on Ethylene Glycol
JPH0575837B2 (en)
PL153032B1 (en) Bath for electrodepositing bright coatings of nickel and/or cobalt containing tin alloys
KR20170133007A (en) Cu-Sn Alloy Plating Solution
KR20040037488A (en) An Additive And A Zn Electrolyte Chloride Bath Composition For Zn Electrodeposition And A Steel Sheet Prepared By Using The Same

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20231227

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR