EP4288394A2 - Revêtement à faible émissivité comprenant de l'argent double et présentant une transmittance élevée et une résistance mécanique accrue - Google Patents
Revêtement à faible émissivité comprenant de l'argent double et présentant une transmittance élevée et une résistance mécanique accrueInfo
- Publication number
- EP4288394A2 EP4288394A2 EP22746366.8A EP22746366A EP4288394A2 EP 4288394 A2 EP4288394 A2 EP 4288394A2 EP 22746366 A EP22746366 A EP 22746366A EP 4288394 A2 EP4288394 A2 EP 4288394A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- thickness
- dielectric layer
- range
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 73
- 239000011248 coating agent Substances 0.000 title claims abstract description 71
- 229910052709 silver Inorganic materials 0.000 title claims description 14
- 238000002834 transmittance Methods 0.000 title description 17
- 239000004332 silver Substances 0.000 title description 4
- 239000011521 glass Substances 0.000 claims abstract description 66
- 230000004888 barrier function Effects 0.000 claims description 42
- 229910003087 TiOx Inorganic materials 0.000 claims description 40
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 40
- 229910020776 SixNy Inorganic materials 0.000 claims description 36
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 26
- 229910007667 ZnOx Inorganic materials 0.000 claims description 22
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 22
- 229910001120 nichrome Inorganic materials 0.000 claims description 22
- -1 ZnSnOx Inorganic materials 0.000 claims description 14
- 229910010421 TiNx Inorganic materials 0.000 claims description 8
- 229910008328 ZrNx Inorganic materials 0.000 claims description 8
- 229910003134 ZrOx Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 281
- 238000012360 testing method Methods 0.000 description 23
- 238000010438 heat treatment Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005201 scrubbing Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000005200 wet scrubbing Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- VGLYDBMDZXTCJA-UHFFFAOYSA-N aluminum zinc oxygen(2-) tin(4+) Chemical compound [O-2].[Al+3].[Sn+4].[Zn+2] VGLYDBMDZXTCJA-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 230000032798 delamination Effects 0.000 description 1
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- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
Definitions
- the present invention relates to a low-emission (low-e) coating with solar control characteristic with infrared reflective layers used as visible transmittance and thermal insulation glass.
- One of the factors that differentiate the optical properties of the glasses is the coating applications made on the glass surface.
- One of the coating applications is the magnetic field-supported sputtering method in a vacuum environment. It is a frequently used method in the production of architectural and automotive coatings with low-e properties. Transmittance and reflection values in the visible, near- infrared, and infrared region of the glasses coated with said method can be obtained at the targeted levels.
- the invention with publication number US9499899 discloses systems, methods and apparatus for forming low-emission panels, which may comprise a base and a reflective layer formed on the base. Panels with low-emission may additionally comprise an upper dielectric layer formed on the reflective layer, thereby forming a reflective layer between the upper dielectric layer and the base.
- the upper dielectric layer may comprise a triple metal oxide, such as zinc tin aluminum oxide.
- the upper dielectric layer may also comprise aluminum.
- the concentration of aluminum can be between 1% atomic and 15% atomic or between 2% atomic and 10% atomic.
- the atomic ratio of zinc to tin in the upper dielectric layer can be between 0.67 and 1 .5 and between 0.9 and 1.1.
- the present invention relates to a glass having low-e coating with solar control characteristic in order to bring new advantages to the related technical field.
- Another object of the invention is to provide a glass having low-e coating with high transmittance with improved neutrality.
- a second seed layer selected from NiCr, NiCrO x , Ti, TiO x , ZnAI, ZnSn, ZnSnO x , SiAl, SiAIN, SiAIO x N y ,ZnO x
- a third dielectric layer selected from Si x N y , TiN x , ZrN x , ZnSnO x , ZnAIO x , SiO x N y , TiO x , ZnO x ;
- a fourth dielectric layer selected from Si x N y , TiN x , ZrN x , ZnSnOx, ZnAIOx, SiO x N y , TiO x , ZnO x ;
- a third seed layer selected from NiCr, NiCrOx, TiO x , ZnAIOx, ZnSnOx, ZnO x ;
- a second infrared reflective layer selected from NiCr, NiCrOx, TiO x , ZnAIOx, ZnSnOx, ZnO x ;
- a second barrier layer selected from NiCr, NiCrOx, Ti, TiO x , ZnAIOx, ZnO x
- the glass having low-e coating according to a preferred embodiment of the invention is characterized in that it comprises the following;
- a first dielectric layer comprising Si x N y ;
- a first seed layer comprising ZnAIO x ;
- a second seed layer comprising NiCr
- a first infrared reflective layer comprising Ag
- a first barrier layer comprising NiCrO x ;
- a third dielectric layer comprising ZnAIO x ;
- a fourth dielectric layer comprising Si x N y ;
- a second barrier layer comprising NiCrO x ;
- a fifth dielectric layer comprising ZnAIO x ;
- the glass having low-e coating is characterized in that said low-e coating is as follows from the glass outwardly, respectively; the first dielectric layer comprising Si x N y is in the thickness range of 10 nm - 18 nm; the second dielectric layer comprising TiO x is in the thickness range of 2 nm - 6 nm; the first seed layer comprising ZnAIO x is in the thickness range of 19 nm - 27 nm; the second seed layer comprising NiCr is in the thickness range of 0.3 nm - 1 .0 nm; the first infrared reflective layer comprising Ag is in the thickness range of 7 nm - 19 nm; the first barrier layer comprising NiCrO x is in the thickness range of 1 .7 nm - 2.4 nm; the third dielectric layer comprising ZnAIO x is in the thickness range of 13 nm - 24 nm; the fourth dielectric layer comprising Si
- Figure 1 shows the general view of the low-e layer sequence.
- the production of glasses (10) having low-e coating (101) for architecture and automotive is carried out by the “sputtering” method.
- the present invention generally relates to double silver glasses (10) having low-e coating (101 ) with high heat treatment resistance used as visible transmittance and thermal insulation glass (10), the content and application of said low-e coating (101).
- the glass (10) having low-e coating (101) of the invention can be used in heat glass units and laminated structures for the architectural and automotive sectors.
- a low-e coating (101) consisting of a plurality of metal, metal oxide and/or metal nitride/oxynitride layers located on the surface of the glass (10) using the sputtering method was developed to obtain a glass (10) having low-e coating (101 ) with a high level of visible light transmittance, heat treatable design and solar control characteristic to be applied to the surface of a glass (10) in this invention.
- Said layers are deposited on each other in a vacuum, respectively.
- As heat treatment at least one and/or several of the other heat treatments can be used together, including but not limited to tempering, partial tempering, annealing, bending, lamination, laser and instantaneous beam radiation (flashlamp).
- the glass (10) having low-e coating (101) with solar control characteristic of the invention can be used as an architectural and automotive glass (10).
- the following data were determined as a result of experimental studies in order to improve a low-e coating (101 ) sequence with heat treatable, solar control characteristic both in terms of ease of production and optical properties.
- the solar energy spectrum is a first infrared reflective layer (22) and a second infrared reflective layer (25) that allows to pass the visible region (hereinafter referred to as T ViS %) at the targeted level and reflect (by passing less) the thermal radiation in the infrared region in the low-e coating (101 ) of the invention.
- the Ag layer is used as the first infrared reflective layer (22) and the second infrared reflective layer (25), and the heat emission is low.
- the refractive indices of all layers were determined by using computational methods over the optical constants obtained from the single layer measurements in the glass (10) having low-e coating (101 ) of the invention. Said refractive indices are refractive index data at 550 nm.
- a first dielectric layer (201 ) is used as the lowest layer in said under dielectric structure (20).
- Said first dielectric layer (201 ) comprises at least one of Si x N y , SiOxN y , ZnSnOx, TiO x , TiN x , ZrN x materials.
- the first dielectric layer (201 ) comprises Si x N y in the preferred embodiment.
- the first dielectric layer (201 ) comprising Si x N y serves the purpose of inhibiting the migration of alkali ions facilitated at high temperature by acting as a diffusion barrier.
- the first dielectric layer (201 ) comprising Si x N y supports the resistance of the low-e coating (101 ) to the heat treatment processes.
- the change interval for the refractive index of the first dielectric layer (201 ) comprising Si x N y is between 2.00 and 2.15.
- the change interval for the refractive index of the first dielectric layer (201 ) comprising Si x N y is 2.02 to 2.12 in the preferred structure.
- the thickness of the first dielectric layer (201 ) comprising Si x N y is between 10 nm - 20 nm.
- the thickness of the first dielectric layer (201 ) comprising Si x N y is between 10 nm - 18 nm in the preferred embodiment.
- the thickness of the first dielectric layer (201 ) comprising Si x N y is between 12 nm - 17 nm in an even more preferred embodiment.
- At least one seed structure (21 ) is positioned between the under dielectric structure (20) and the Ag layer, which is the first infrared reflective layer (22).
- Said seed structure (21 ) comprises a first seed layer (21 1 ) and a second seed layer (212).
- the second seed layer (212) is in contact with the first infrared reflective layer (22).
- Said first seed layer (21 1 ) comprises at least one of NiCr, NiCrO x , TiO x , ZnSnOx, ZnAIOx, ZnO x .
- the first seed layer (211 ) comprises ZnAIOx in the preferred embodiment.
- the thickness of the first seed layer (21 1 ) between from 18 nm - 30 nm.
- the thickness of the first seed layer (211 ) is between 19 nm - 27 nm in the preferred embodiment.
- the thickness of the first seed layer (21 1 ) is between 20 nm - 25 nm in an even more preferred
- a second dielectric layer (202) is positioned between the first seed layer (211 ) and the first dielectric layer (201 ) comprising Si x N y .
- Said second dielectric layer (202) comprises at least one of the TiO x , ZrO x , NbO x layers.
- TiO x is used as the second dielectric layer (202) in the preferred embodiment. Since TiO x is a material with a high refractive index, it provides the same optical performance with less total physical thickness and plays a role in increasing the Tvis % value of low-e coating (101 ).
- the refractive index of the TiO x layer is between 2.40 and 2.60. It was determined as 2.45 - 2.55 in the preferred embodiment.
- the first dielectric layer (201 ) comprising Si x N y , and the TiO x layer, the second dielectric layer (202), which are the first and second layers after the glass are used together, optimum performance can be optimized by using the first dielectric layer (201 ) comprising the thinner Si x N y , thanks to the high refractive index of the TiO x layer, the second dielectric layer (202).
- the first dielectric layer (201 ) comprising the thinner Si x N y thanks to the high refractive index of the TiO x layer, the second dielectric layer (202).
- significant changes are observed in the color and optical performance of the glass (10) having low-e coating (101 ).
- a second seed layer (212) is positioned between the first seed layer (21 1 ) and the first infrared reflective layer (22).
- Said second seed layer (212) comprises at least one of the materials NiCr, NiCrOx, Ti, TiO x , ZnAI, ZnSn, ZnSnOx, SiAl, SiAIN, SiAIO x N y , ZnO x .
- NiCr with metallic structure is used as the second seed layer (212) in the preferred embodiment.
- the thickness of NiCr layer, the second seed layer (212) is in the range of 0.3 nm - 1.2 nm.
- the thickness of NiCr layer, the second seed layer (212), is in the range of 0.3 nm - 1.0 nm. Thus, it is easier to provide high transmittance in the final product after heat treatment. Most preferably, the thickness of NiCr layer, the second seed layer (212), is between 0.4 nm - 0.9 nm. Thus, it is easier to increase the mechanical resistance of the glass (10) having low-e coating (101 ) after heat treatment at a sufficient level in addition to obtaining it with high transmittance.
- the intermediate dielectric structure (24) that separates the first infrared reflective layer (22) and the second infrared reflective layer (25) by positioning between the first infrared reflective layer (22) and the second infrared reflective layer (25) and ensures that the sequence of low-e layer (101 ) reaches the targeted performance.
- the intermediate dielectric structure (24) comprises at least one dielectric layer.
- the third seed layer (243) comprises at least one of the materials NiCr, NiCrOx, TiO x , ZnSnOx, ZnAIOx, ZnO x .
- the third seed layer (243) comprises ZnAIOx.
- the intermediate dielectric layer structure (24) comprises at least two dielectric layers selected from Si x N y , TiN x , ZrN x , ZnSnOx, ZnAIOx, SiAIN x , SiAIO x N y , SiO x N y , TiO x , ZnO x in the preferred embodiment of the invention.
- the two selected dielectric layers are in contact with each other.
- the intermediate dielectric structure (24) comprises a third dielectric layer (241 ), a fourth dielectric layer (242), and a third seed layer (243) together.
- the intermediate dielectric structure (24) is positioned to directly contact the second infrared reflective layer
- the preferred embodiment of the invention comprises ZnAIOx as the third dielectric layer (241 ) and Si x N y as the fourth dielectric layer (242).
- the thickness of the layer comprising ZnAIOx, the third dielectric layer (241 ) is between 1 1 nm - 27 nm.
- the thickness of the layer comprising ZnAIOx, the third dielectric layer (241 ) is between 13 nm - 24 nm in the preferred embodiment.
- the thickness of the layer comprising ZnAIOx, the third dielectric layer (241 ) is in the range of 15 nm - 20 nm in an even more preferred embodiment.
- the thickness of the fourth dielectric layer (242) comprising Si x N y is between 35 nm - 55 nm.
- the thickness of the fourth dielectric layer (242) comprising Si x N y is between 40 nm - 52 nm in the preferred embodiment.
- the thickness of the fourth dielectric layer (242) comprising Si x N y is between 43 nm - 50 nm in an even more preferred embodiment.
- the thickness of layer comprising ZnAIOx, the third seed layer (243), is between 18 nm - 30 nm.
- the thickness of the layer comprising ZnAIOx, the third seed layer (243), is between 19 nm - 27 nm in the preferred embodiment.
- the thickness of layer comprising ZnAIOx, the third seed layer (243) is between 20 nm - 25 nm in an even more preferred embodiment.
- the glass (10) side and the coating side reflectance and color values create more options for obtaining the targeted values by optimizing separately the thicknesses and structures of the dielectric layers comprised in said intermediate dielectric structure (24).
- the intermediate dielectric structure (24) being in sandwich form is necessary to optimize the targeted reflection and color values, as well as to improve the optoelectronic properties of the second infrared reflective layer (25), the Ag layer.
- the fourth dielectric layer (242) comprising Si x N y in the amorphous structure contacts the other surface of the third seed layer (243) comprising ZnAIOx. If the intermediate dielectric structure (24) consists of a third seed layer (243) comprising a single, thick ZnAIOx, the surface roughness of the third seed layer (243) that is the crystal will be increased. Increased surface roughness will contribute positively to the mechanical resistance of the glass (10) having low-e coating (101 ), but will reduce the rate of infrared reflectance of the second infrared reflective layer (25) located on the third seed layer (243).
- the layer thicknesses, layer contents, and sequence order in the low-e coating (101) need to be optimized as described in this invention in order to obtain all of the mechanical and optical properties for this reason.
- a problem such as the mismatch of the crystal and therefore the crystallization of the structure of the third seed layer (243) is affected and the possibility of unwanted residual stress are reduced.
- the sensitivity of the third seed layer (243) enables the second infrared reflective layer (25) to grow in the crystallographic orientation it should be.
- the intermediate dielectric structure (24) has a total thickness between 64 nm - 112 nm.
- the intermediate dielectric structure (24) has a total thickness between 72 nm - 103 nm in the preferred embodiment. Even more preferably, the intermediate dielectric structure (24) has a total thickness between 78 nm - 95 nm.
- the thickness of the first barrier layer (23) comprising NiCrOx and the second barrier layer (26) comprising NiCrOx are in the range of 1.7 nm - 2.4 nm in the preferred embodiment.
- the thickness of the first barrier layer (23) comprising NiCrOx and the second barrier layer (26) comprising NiCrOx are between 1.8 nm - 2.3 nm in the preferred embodiment.
- the first barrier layer (23) comprising NiCrOx and the second barrier layer (26) comprising NiCrOx are used to prevent the Ag layers from being affected by the process gases used for the production of the subsequent layers from the Ag layers, which are the first infrared reflective layer (22) and the second infrared reflective layer (25).
- NiCrOx layers eliminate the possible adhesion weakness before heat treatment by providing structural harmony in the metallic and dielectric transition between the dielectric layers that will come after the Ag layers.
- NiCrOx layers are primarily oxidized in heat treatment processes such as tempering, bending, etc. and thus prevent the Ag layers from being oxidized and subjected to structural deterioration.
- the upper dielectric structure (27) is positioned on the second barrier layer (26).
- the upper dielectric structure (27) comprises a fifth dielectric layer (271 ) and an upper dielectric layer (272).
- the fifth dielectric layer (271 ) comprises at least one of ZnSnO x , ZnAIO x , SiO x N y , ZrOx, SiOx, SixNy, TiO x , ZnO x .
- the upper dielectric layer (272) comprising SiO x N y is used in direct contact with the second barrier layer (26) comprising NiCrOx, said layers exhibit incompatible behavior, poor mechanical, and heat treatment resistance.
- a fifth dielectric layer (271 ) is added between the second barrier layer (26) comprising NiCrOx and the upper dielectric layer (272) comprising SiOxN y to in low-e coating (101 ) of the patent ensure that the low-e coating (101 ) exhibits stable heat treatment behavior for this purpose.
- the fifth dielectric layer (271 ) comprises ZnAIOx.
- the thickness of the fifth dielectric layer (271 ) comprising ZnAIOx is between 14 nm - 29 nm.
- the thickness of the fifth dielectric layer (271 ) comprising ZnAIOx is between 16 nm - 27 nm in the preferred embodiment.
- the thickness of the fifth dielectric layer (271 ) comprising ZnAIOx is between 18 nm - 25 nm in an even more preferred embodiment.
- the properties of the upper dielectric layer (272) of the low-e coating (101) are very important in terms of the storage life, heat treatability, resistance and visual aesthetics of the glass (10) having low-e coating (101) since it determines the character of the coated glass (10) during heat treatment.
- a further role of the first barrier layer (23) and the second barrier layer (26) is that the optoelectronic properties of the first infrared reflective layer (22) and the second infrared reflective layer (25) of the low-e coating (101) are stable throughout the secondary operations and lifetime.
- the coating conditions of the first barrier layer (23) and the second barrier layer (26) of the low-e coating (101) are another critical parameter that determines the character of the coated glass (10) during heat treatment and affects the opto-electronic properties of the glass (10) having low-e coating (101).
- the absorption behavior of the first barrier layer (23) and the second barrier layer (26) in the low-e coating (101) should be minimized by improving the material property for the targeted T ViS % value.
- the glass (10) having low-e coating (101 ) defined above allows obtaining thermal insulation units with neutral color values.
- the reflection a* and b* values remain between 0 and -10, ensuring neutrality when the surface normality on the uncoated side of the glass (10) having low-e coating (101) obtained after heat treatment is examined with 0° in the CIELAB color space.
- the glass (10) having low-e coating (101) defined above preserves the neutral color values at different observation angles.
- the reflection a* and b* values vary at most ⁇ 2 degrees at the observation angles up to -60° from the surface normal on the uncoated side of the glass (10) having low-e coating (101) obtained after heat treatment in the CIELAB color space.
- the above-mentioned neutrality is also preserved in different observation angles in this way.
- Band test, brush test and scrubbing test are used as mechanical adhesion and scratch tests.
- the band test is performed according to ASTM 3359 standards.
- the test is a test in which deformations on the coating surface are measured as a result of adhering the 3M Scotch adhesive tape to the coating in 15 mm x 100 mm dimensions and removing it at once in line with the surface normal after a certain period of time.
- Brush test is a test in which deformations on the surface are measured by passing the glass (10) having low-e coating (101) under the brush in the glass washing machines at once and keeping it brushed for 1 minute.
- Scrubbing test is a test in which the deformations on the surface are measured by scrubbing the same area of the powder-free paper on which isopropyl alcohol is applied on the coated glass surface for a certain time and repetition, preferably 10 repetitions.
- Samples taken from the coated glass were subjected to an automated test to observe the scratch and peel resistance of the coating. It is ensured that the printing piece placed on an arm end capable of reciprocating movement on the horizontal axis moves on the coated glass samples by placing a certain weight on it. Between the printing piece and the coated glass surface, a SDC Enterprises cloth is placed made of cotton fabric known as “cotton lawn rubbing fabric” in the art in accordance with ISO105-F9 standard. 2 ml of distilled water is dripped on the coated glass surface subject to the test and the reciprocating movement is performed 50 times by applying 0.126N/mm 2 pressure. This test, which is defined, is called “automatic wet scrubbing test”. Scratches and protrusions in the coating are analyzed visually as a result of the test.
- the low-e coating (101) In order for the low-e coating (101) to be mechanically resistant to the processes during the secondary processes, it must have successfully passed these tests. A small number of capillary scratches are allowed on the coating surface viewed from a distance of maximum of 30 cm under a strong light source in the scrubbing, band, brush and automatic wet scrubbing tests performed after the product has been tempered.
- the acceptance criterion for the coated samples to pass the test is that no scratches are formed when all the results obtained after repeated tests are evaluated. The sample cannot pass the tests in case of any peeling, tearing and delamination.
- Glass (10) having low e-coating (101 ) cannot successfully pass the tests described above when the second seed layer (212) is used below the above-mentioned thickness value.
- the second seed layer (212) located under the first infrared reflective layer (22) is used in the specified thickness ranges, provided that all the above-mentioned layers related to the glass (10) having low e-coating (101) of the invention are used in the specified order and thickness ranges, the double silver glass (10) having low e-coating (101) of the invention can pass these tests successfully.
- the use of the second seed layer (212) is of importance for the mechanical resistance of the glass (10) having low e-coating (101) of the invention.
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Abstract
L'invention concerne un verre à faible émissivité qui transmet efficacement la région visible du spectre d'énergie solaire tout en réfléchissant efficacement la région proche infrarouge et infrarouge.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TR2021/01223A TR202101223A2 (tr) | 2021-01-27 | 2021-01-27 | Yüksek geçi̇rgen özelli̇kte, mekani̇k dayanimi arttirilmiş çi̇ft gümüş i̇çeren bi̇r low-e kaplama |
PCT/TR2022/050016 WO2022164407A2 (fr) | 2021-01-27 | 2022-01-10 | Revêtement à faible émissivité comprenant de l'argent double et présentant une transmittance élevée et une résistance mécanique accrue |
Publications (1)
Publication Number | Publication Date |
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EP4288394A2 true EP4288394A2 (fr) | 2023-12-13 |
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Application Number | Title | Priority Date | Filing Date |
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EP22746366.8A Pending EP4288394A2 (fr) | 2021-01-27 | 2022-01-10 | Revêtement à faible émissivité comprenant de l'argent double et présentant une transmittance élevée et une résistance mécanique accrue |
Country Status (3)
Country | Link |
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EP (1) | EP4288394A2 (fr) |
TR (1) | TR202101223A2 (fr) |
WO (1) | WO2022164407A2 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TR2022014362A2 (tr) * | 2022-09-16 | 2022-10-21 | Tuerkiye Sise Ve Cam Fabrikalari Anonim Sirketi | Açisal renk deği̇şi̇mi̇ azaltilmiş bi̇r low-e kaplamali cam |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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NZ564166A (en) | 2005-05-12 | 2011-05-27 | Agc Flat Glass Na Inc | Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same |
US9499899B2 (en) | 2013-03-13 | 2016-11-22 | Intermolecular, Inc. | Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy |
TR201718310A2 (tr) | 2017-11-20 | 2017-12-21 | Tuerkiye Sise Ve Cam Fabrikalari Anonim Sirketi | Isil i̇şlenebi̇li̇r bi̇r low-e kaplama ve üreti̇m yöntemi̇ |
WO2019209200A2 (fr) | 2018-01-11 | 2019-10-31 | Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi | Verre à couche à faible émissivité à régulation thermique et solaire efficaces |
-
2021
- 2021-01-27 TR TR2021/01223A patent/TR202101223A2/tr unknown
-
2022
- 2022-01-10 WO PCT/TR2022/050016 patent/WO2022164407A2/fr active Application Filing
- 2022-01-10 EP EP22746366.8A patent/EP4288394A2/fr active Pending
Also Published As
Publication number | Publication date |
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TR202101223A2 (tr) | 2022-08-22 |
WO2022164407A3 (fr) | 2022-09-01 |
WO2022164407A2 (fr) | 2022-08-04 |
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