EP4256102A1 - Couches de protection contre la corrosion al-si - Google Patents

Couches de protection contre la corrosion al-si

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Publication number
EP4256102A1
EP4256102A1 EP21819720.0A EP21819720A EP4256102A1 EP 4256102 A1 EP4256102 A1 EP 4256102A1 EP 21819720 A EP21819720 A EP 21819720A EP 4256102 A1 EP4256102 A1 EP 4256102A1
Authority
EP
European Patent Office
Prior art keywords
layer
substrate
functional layer
functional
layer system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21819720.0A
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German (de)
English (en)
Inventor
Jürgen RAMM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Surface Solutions AG Pfaeffikon
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Application filed by Oerlikon Surface Solutions AG Pfaeffikon filed Critical Oerlikon Surface Solutions AG Pfaeffikon
Publication of EP4256102A1 publication Critical patent/EP4256102A1/fr
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Definitions

  • the present invention relates to components that are exposed to high temperatures, such as turbine blades of gas turbines, but also to other components of energy conversion systems that are exposed to high surface temperatures and that need to be protected against wear from oxidation and other chemical degradation.
  • These components can be made of different materials, such as high- and low-alloy steel, Ni-Cr alloys such as Inconel and Hastelloy, Ni- and Co-based super alloys, Ti- and TiAI-based materials and ceramic matrix composite material based on SiC and carbon and also oxide fiber reinforced oxide composite materials (Ox/Ox materials).
  • Ni-Cr alloys such as Inconel and Hastelloy
  • Ni- and Co-based super alloys Ni- and Co-based super alloys
  • Ti- and TiAI-based materials and ceramic matrix composite material based on SiC and carbon and also oxide fiber reinforced oxide composite materials (Ox/Ox materials).
  • All of these components are exposed to corrosion processes that lead to the wear and tear of these components.
  • the corrosion processes generally lead to the loss of material or to a weakening of the mechanical properties of the components.
  • erosion processes caused by particles in the atmosphere can lead to the erosion of the components.
  • Gaseous components such as chlorine or sulfur compounds can also attack the surface of components.
  • oxidation can also occur, which in many cases leads to material loss. This is particularly true for reactions at very high temperatures, where water vapor is activated in such a way that silicon-containing components volatilize the silicon.
  • coatings that are deposited from the gas phase are used here.
  • TiN/Ti, TiN/TiAIN and TiAIN layer systems are used. These show improved resistance to erosion, but insufficient corrosion resistance, for example when used on steel substrates with a high chromium content.
  • the components consist of more temperature-stable materials, for example Inconel or Ti-Al materials, thin oxides are formed on the surface of these layer systems, which are not mechanically stable and in turn lead to wear.
  • SiC-based CMC Chemical Matrix
  • CONFIRMATION COPY Composites which form silicon-volatile compounds at high temperatures in an oxygen atmosphere and water vapor and consequently also wear out.
  • DE102015212588 represents a further development with regard to corrosion resistance through the application of layers.
  • This describes a layer system for a corrosively stressed steel substrate with a surface comprising at least a first, second and third layer in which
  • the first layer arranged between the surface of the substrate and the second layer is designed as an adhesion promoter layer
  • the second layer is a ductile metallic layer with a columnar structure
  • the third layer arranged on the side of the second layer facing away from the substrate is a ceramic oxide layer with a hardness of at least 20 GPa.
  • the hardness specification in the unit GPa refers to the pressure that the coating can oppose the penetration of an object.
  • the formation of the first layer according to the prior art as an adhesion promoter layer ensures greater adhesion between the base material and the second layer of the layer system.
  • the second layer protects the substrate cathodically through its function as a sacrificial anode.
  • the ductility of the second layer serves to absorb strains under oscillating loading without cracks appearing in the layer.
  • the columnar structure of the second layer is used to compensate for internal stresses caused by the third layer.
  • the third layer of the layer system preferably has aluminum oxide and/or chromium oxide and/or an aluminum-chromium oxide in a mixed-crystal structure. It can also consist entirely of these oxides. Due to the oxides, the third layer is resistant to oxidation, since it already consists of at least one oxide and can therefore be used at high temperatures.
  • the third layer has a very dense structure.
  • the third layer acts, among other things, as a corrosion protection for the second layer. Furthermore, due to its ceramic nature, the third layer has an insulating effect, which advantageously prevents galvanic effects. Furthermore, the third layer is significantly harder than the base material and therefore has an advantageous effect on the underlying layers and the base material as protection against erosion, especially against drop impact and particle erosion.
  • the hardness of the third layer is about 25 GPa.
  • a method for producing a layer system for a corrosively stressed substrate comprising three layers corresponding to the layer system according to the invention, the material of all layers being applied by physical vapor deposition (PVD).
  • PVD physical vapor deposition
  • the method is advantageous because heat treatment is not required.
  • layers applied by PVD have an advantageous surface roughness, which brings about good aerodynamic properties.
  • the PVD layers of the layer system are applied by cathodic spark vaporization and/or by sputtering.
  • This layer system comprising three layers according to the prior art is suitable for many applications. However, it shows adhesion problems if the substrate is a Si-C based material or contains significant amounts of titanium, such as is the case with titanium aluminides. In addition, it is advantageous if, for a specific application, a layer system is sought which is intended as a substrate for a silicate, for example, but not by way of limitation, an aluminum silicate or hafnium silicate.
  • the inventors have found that, in order to solve the problem, it makes sense in these cases to start from a substrate containing Si, i.e. from a layer system that includes, for example, Si, Si-O, Si-O-N or a mixture of these components other oxides, e.g. Al-O. Better layer adhesion is also achieved for components that consist of oxides or contain oxides, as is the case with oxide fiber-reinforced oxide composite materials (Ox/Ox materials), if the coating consists of layer systems that contain silicon, aluminum, oxygen and include nitrogen.
  • a substrate containing Si i.e. from a layer system that includes, for example, Si, Si-O, Si-O-N or a mixture of these components other oxides, e.g. Al-O.
  • Better layer adhesion is also achieved for components that consist of oxides or contain oxides, as is the case with oxide fiber-reinforced oxide composite materials (Ox/Ox materials), if the coating consists of layer systems that contain silicon, aluminum
  • a layer system is produced on a component, which contains silicon as an essential element (greater than 10 at.%).
  • the layer system contains Al as the second essential element (greater than 10 at.%). Another object of this invention is that this layer system protects the component from corrosion because the layer prevents the corrosion processes on the substrate materials of the components.
  • Another object of this invention is to prevent or greatly slow down reactions with oxygen and water vapor of the surface of gas turbine components at high temperatures.
  • Another object of this invention is to improve the mechanical strength of component surfaces at elevated temperatures, particularly with respect to particle erosion and volatilization in water vapor.
  • Another object of this invention is to provide a method which allows a siliceous film to be deposited at a high rate simultaneously or sequentially with cathodic spark evaporation coating.
  • Figure 1 shows the substrate or the component coated according to the invention with an intermediate layer and functional layer.
  • FIG. 2 shows the spectrum that was determined using energy-dispersive X-ray spectroscopy (EDX analysis) on a first Al-Si-0 functional layer according to the invention and indicates a chemical composition of Al0.24Si0.15O0.6i.
  • EDX analysis energy-dispersive X-ray spectroscopy
  • Figure 3 shows the X-ray spectrum of a SiC substrate coated with the same Al-Si-0 layer system that was analyzed with EDX in Figure 2 with three curves 3A to 3C.
  • the X-ray spectrum was measured at 2° grazing incidence to reduce the intensity of the moissanite peaks of the SiC substrate used. Nevertheless, the substrate peaks could not be completely suppressed: 3A spectrum after coating, 3B spectrum after aging at 1000°C, 3C spectrum after aging at 1400°C.
  • Figure 4 shows the X-ray spectrum of a steel substrate coated with the same Al-Si-0 coating system analyzed with EDX in Figure 2.
  • the X-ray Spectrum was measured after coating at grazing incidence of 2° to avoid the moissanite peaks and clarify other peaks and the location of the amorphous background.
  • Figure 5 shows a photograph of the fracture cross-section on a sample of the same Al-Si-0 layer system analyzed with EDX in Figure 2.
  • the coating took place on a Ti-Al substrate.
  • a Si (approx. 2 pm) - SiO2 (approx. 2 pm) layer was chosen as the intermediate layer (ZW) and the functional layer is said Al-Si-0 (approx. 3 pm) layer.
  • the circles in the fracture cross-section image mark the areas with droplets of elemental aluminum as also found in the XRD analysis.
  • Figure 6 shows the spectrum that was determined using energy-dispersive X-ray spectroscopy (EDX analysis) on a second Al-Si-O-N functional layer according to the invention and indicates a chemical composition of Al0.27Si0.20O0.11 N0.42.
  • EDX analysis energy-dispersive X-ray spectroscopy
  • Figure 7 shows with the spectra 7A to 7C the X-ray spectrum of a SiC substrate coated with the same Al-Si-O-N layer system that was analyzed with EDX in Figure 6.
  • the X-ray spectrum was measured at 2° grazing incidence to reduce the intensity of the moissanite peaks of the substrate used. Nevertheless, the substrate peaks could not be completely suppressed: 3A spectrum after coating, 3B spectrum after aging at 800°C, 3C spectrum after aging at 1000°C.
  • Figure 8 shows the X-ray spectrum of a steel substrate coated with the same Al-Si-O-N layer system analyzed with EDX in Figure 6.
  • the X-ray spectrum was measured after coating at 2° grazing incidence to avoid the moissanite peaks and clarify other peaks and the location of the amorphous background.
  • Figure 9 shows the spectrum that was determined using energy-dispersive X-ray spectroscopy (EDX analysis) on a third Al-Si-N functional layer according to the invention and indicates a chemical composition of Al0.33Si0.i6N0.51.
  • EDX analysis energy-dispersive X-ray spectroscopy
  • Figure 10 shows the X-ray spectrum of a SiC substrate coated with the same Al-Si-N layer system analyzed with EDX in Figure 9.
  • the X-ray spectrum was measured at 2° grazing incidence to reduce the intensity of the moissanite peaks of the substrate used. Nevertheless, the substrate peaks could not be completely suppressed: 3A spectrum after coating, 3B spectrum after aging at 1200°C, 3C spectrum after aging at 1400°C.
  • Figure 11 shows the X-ray spectrum of a steel substrate coated with the same Al-Si-N layer system analyzed with EDX in Figure 9.
  • the X-ray spectrum was measured after coating at 2° grazing incidence to avoid the moissanite peaks and clarify other peaks and the location of the amorphous background.
  • FIG. 12 (A) shows the recording of the fracture cross section on a coated Ti-Al substrate without an intermediate layer and the functional layer according to the invention made of Al-Si-N with a thickness of about 5.8 ⁇ m.
  • the coated sample was aged at 800°C in an ambient atmosphere for 20 hours.
  • the chemical composition is given along the fracture cross-section, the so-called EDX line scan. From this profile one can conclude that there is no oxygen in the layer since only the signals from Al, Si and N can be seen.
  • the weak intensity of the oxygen signal in the area of the substrate is due to the sample preparation, since both components of the substrate material, Al and Ti, oxidize slightly on their surface during preparation.
  • the coating process is a combination of Physical Vapor Deposition (PVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD), ie both methods are used if necessary, in particular simultaneously, in order to realize the layer synthesis.
  • PVD Physical Vapor Deposition
  • PECVD Plasma-Enhanced Chemical Vapor Deposition
  • electron beam evaporation, sputtering and/or cathodic spark evaporation can be used as PVD methods.
  • the CVD methods are essentially based on additional gas inlets with which the various gaseous precursors can be admitted into the coating system used, which are then broken down and excited in the plasma.
  • the same coating system is advantageously used for the PVD methods and for the CVD methods.
  • the plasma required for the CVD methods can be generated by means of the plasma source that is present as a result of the PVD method, ie for example by the cathodic spark source. However, it can also be generated in other ways, for example by a separate low-voltage arc discharge. These methods are known to those skilled in this technological field.
  • the sequence in the production of the layer system according to the invention according to FIG. 1 is described, ie the application of a layer containing Al—Si on a substrate consisting of an intermediate layer and a functional layer.
  • the holders are mounted on a substrate holder system, which is stationary and/or can be rotated one, two and/or three times during the coating process.
  • the coating system is pumped down to a pressure of about 10-5 mbar or less.
  • the substrates are pretreated. These are heated to a desired temperature of typically 100° C. to 600° C., for example by means of radiant heaters, and substrate pretreatment is carried out in the system, for example cleaning of the substrate surface by sputtering with argon gas ions.
  • a negative voltage substrate bias
  • a DC voltage is used for this, but it is also possible to carry out this step with a bipolar pulsed voltage or with an RF voltage.
  • a bipolar pulsed bias is applied to the substrates in the example described here, for example with a pulse characteristic from negative to positive bias (substrate to ground) of, for example, 90ps/10ps or 36ps/4ps or 20ps/20ps or 10ps/10ps or one other value useful for the layers to be made.
  • the reason for choosing the bipolar bias is the possible small, but definitely desirable, electrical conductivity of the layers to be produced, which can even be completely insulating. With such layers, the bipolar operation guarantees the effectiveness of the bias on the layer-forming ions.
  • the bipolar substrate bias on the bias supply is set to -40V/+40V for a pulse characteristic of 36ps/4ps and this bias is maintained throughout the coating.
  • the synthesis of a Si/Al-Si-0 layer in the method according to the invention from a combination of PVD and CVD process is now described as an example of an aluminum-silicon-containing layer system.
  • the Si layer forms the intermediate layer
  • the Al-Si-0 layer forms the functional layer.
  • the coating begins with the ignition of an auxiliary plasma, for example a low-voltage arc discharge in argon (approx. 150 A discharge current at approx. 5x10' 3 mbar).
  • silane is introduced with a flow of 90 sccm, which is effectively decomposed in such a kind of plasma, and silicon is deposited on the substrate surface, which forms the intermediate layer.
  • the thickness of the silicon interface is only limited to around 0.5 pm to 1 pm.
  • this can also be selected to be thinner, for example less than 0.1 ⁇ m, but also significantly thicker, for example 30 ⁇ m.
  • the evaporation of the aluminum is started by igniting the cathodic spark discharge on the aluminum target.
  • This procedure can also be performed in reverse order if required: first igniting the cathodic spark discharge and then admitting the silane into the coating chamber, with this sequence no auxiliary plasma is required since the cathodic spark discharge already creates a dense plasma .
  • Oxygen is then admitted as a reactive gas at the same time or with a short time offset.
  • An inert gas or an inert gas mixture can also be admitted as a support.
  • the spark discharge is operated with a source current of 140 A in this example, but discharge currents in the range between 50 A and 400 A can also be used.
  • the oxygen flow in the example selected here is 250 sccm.
  • the substrates are coated with an Al-Si-O layer, the chemical composition of this layer being controllable over a wide range via the evaporation rate of the Al target (ie via the size of the spark current), the silane flow and the oxygen flow and consequently the chemical composition of the layer can be adjusted and also depth-dependently adjusted within the layer itself.
  • FIG. 2 shows the EDX spectrum of this layer system.
  • This composition corresponds approximately to that of a mullite compound.
  • Figure 3A shows the XRD spectrum of this layer on a SiC substrate after coating, which was measured at an X-ray incidence angle of 2°, i.e.
  • FIG 4 another XRD spectrum for the Si/Al-Si-0 layer system is shown, where this layer was deposited in the same process as that of figure 3, but not on the SiC substrate but on a steel substrate.
  • the substrate-typical moissanite peak overlaps with the aluminum peak, which proves an essential property of the Al-Si-0 layer, namely the existence of Al areas within the layer.
  • the figure shows another layer property more clearly than can be seen from the XRD spectrum in figure 3, namely that the position of the maximum intensity of the amorphous peak is between 2Theta 20° and 24°.
  • Figure 5 also shows an SEM image of a layer cross-section, in which the areas of the aluminum regions in the layer, which essentially appear as droplets, are circled in white.
  • the layer composition can be regulated via the evaporation rate of the aluminum and via the silane and oxygen flow.
  • these influencing parameters were examined and layers with an Al to Si ratio (in atomic percentages, at.%) Al/Si between 2 and 5, comprising mullite and/or aluminum oxide and/or silicon oxide, could be produced.
  • Important properties of the Al- Si-0 layers that guarantee their temperature stability and resistance to oxidation.
  • Indentation hardnesses were measured in the range between 9 GPa and 15 GPa. These are significantly smaller than the 20 to 30 GPa that were measured on the Al-Cr-0 layers mentioned at the outset in the prior art, which are produced by means of cathodic spark vaporization.
  • the layer hardness is also important, as is required for anti-erosion layers, for example, it is advantageous to increase the layer hardness of Al-Si-O layers .
  • a further aim of the invention is therefore to extend the good corrosion and oxidation resistance of the Al-Si-0 layers towards greater hardness. This was achieved by adding nitrogen as an additional process gas to the silane and oxygen flow.
  • Figure 6 shows the EDX spectrum of an Al-Si-O-N layer that was produced with a 90 sccm silane flow, 50 sccm oxygen flow and a nitrogen flow of 470 sccm. The EDX analysis for this layer ( Figure 6) provides the values 27/20/11/42 for the ratio of Al/Si/O/N, measured in at.%, i.e. a layer with the formula AI0.27Si0 .20O0.11N0.42 can be written.
  • FIG. 9 shows the EDX spectrum for such a layer.
  • the EDX analysis for this layer provides the values 33/16/51 for the ratio of Al/Si/N, measured in at.%, i.e. a layer that can be described with the formula AI0.33Si0.i6N0.51.
  • the layer stoichiometry can be controlled by adjusting the Al evaporation rate and by choosing the silane and nitrogen flow. It was found that these layers, which were produced without oxygen, have a hardness of between 27 and 35 GPa, which in turn means an improvement with regard to this layer property.
  • the XRD spectrum of the AI0.33Si0.i6N0.51 layer is shown in Figure 10 on the SiC substrate and in Figure 11 on the steel substrate.
  • the film immediately after coating shows only the peaks attributable to the SiC substrate, indicating an amorphous or finely crystalline Al-Si-N film.
  • Figure 11 On the steel substrate ( Figure 11) one can again see the peaks of the elemental Al and Si, whereby again it is not possible to distinguish between the Al peak and the peak for cubic AlN.
  • This spectrum is also characterized by a clear amorphous background, the maximum of which lies between 2Theta 34° and 37° and indicates the SiN.
  • Ti-Al substrate materials are particularly susceptible to oxidative wear. This is mainly due to the diffusion processes that lead to Ti oxidizing on the surface and forming a mechanically unstable, non-adherent oxide. Such processes impair the mechanical properties of the substrate even at temperatures of 700°C. Therefore, again as an example, a Ti-Al substrate was coated with an Al-Si-N layer, which can be described by a layer with the chemical composition Alo.35Sio.13No.52 based on the EDX analysis.
  • Figure 12 shows the recording of the fracture cross section on the coated Ti-Al substrate without an intermediate layer and the functional layer according to the invention made of Al-Si-N with a thickness of about 5.8 ⁇ m.
  • the coated sample was aged at 800°C in an ambient atmosphere for 20 hours.
  • the chemical composition is given along the fracture cross-section, the so-called EDX Line Scan. From this profile one can conclude that there is no oxygen in the layer since only the signals from Al, Si and N can be seen.
  • the weak intensity of the oxygen signal in the area of the substrate is due to the sample preparation, since both components of the substrate material, Al and Ti, oxidize easily on their surface during preparation.
  • Al-Si-N layers i.e. layers without oxygen content, are also characterized by temperature stability well over 1000°C and increased hardness.
  • the combination of PVD and CVD processes also allows the synthesis of layers with a higher silicon content, for example Al-Si-0 layers with an Al to Si ratio (in atomic percent, at.%) Al/Si between 0.1 and 1.5.
  • These layers all show an amorphous or finely crystalline structure immediately after coating, but this then turns into crystalline SiO2 layers (e.g. crystoballite) when exposed to the atmosphere. This transition takes place at temperatures above 1000°C and usually leads to layer destruction. Below this temperature, however, these layers are stable and are preferably suitable for anti-corrosion layers because of their amorphous structure.
  • Layer systems in a multilayer structure can also be advantageously produced using the method described above, for example by varying the silane flow, the oxygen flow or the nitrogen flow alone or in combination over time, which then leads to a Multi-layer structure, in which the chemical composition of each individual layer is determined according to the set gas flow (and of course the AI evaporation rate).
  • the layer according to the invention is free of chromium, which is desired for many applications and is even prescribed by law for some areas.
  • PVD and CVD methods also leads to a significant increase in the deposition rate, which is mainly due to the fact that, in addition to the Al portion originating from the cathodic spark evaporation, another Si portion originating from the silane gas source in the layer is built in, so it contributes directly to the layer thickness.
  • the aim of the present invention is therefore in particular to extend the service life of components such as turbine blades in gas turbines by reducing the wear on them and at the same time increasing the times between necessary service intervals.
  • the components whose surfaces are to be protected can be made of different materials, for example high- and low-alloy steel, Ni-Cr alloys such as Inconel and Hastelloy, Ni- and Co-based superalloys, Ti- and TiAl-based materials and ceramic Matrix composite material based on SiC and carbon and also oxide fiber reinforced oxide composite materials (Ox/Ox materials).
  • Ni-Cr alloys such as Inconel and Hastelloy
  • Ni- and Co-based superalloys Ni- and TiAl-based materials
  • ceramic Matrix composite material based on SiC and carbon and also oxide fiber reinforced oxide composite materials (Ox/Ox materials).
  • the layer according to the invention is intended to increase the erosion resistance of the base material to the impact of solid particles, to drop impact and also to blistering.
  • the layer according to the invention is intended to increase the corrosion resistance to gases which contain, for example, sulfur and chlorine, and to improve the corrosion resistance to molten deposits such as CMAS ash or molten glass-like substances.
  • the coating according to the invention should prevent or at least drastically reduce the reaction with water vapor and the associated volatilization of the base material.
  • a very important aspect of the layer according to the invention is the protection against oxidative wear of the various materials from which the components are made, especially at high operating temperatures, which are classified as "high” according to the substrate materials, e.g. 600°C for stainless steel, 800° C for Inconel or Hastelloy, 800°C for Ti-Al compounds, 1000°C for Ni or Co based superalloys, 1100°C for superalloys with MCrAlY coating or 1000°C for SiC based CMC materials.
  • the object is achieved by a component according to claim 1.
  • the component according to the invention has an erosion and corrosion-resistant coating with a functional layer and an intermediate layer which is arranged between the component surface and the functional layer.
  • the intermediate layer can be a layer system that includes silicon and aluminum and that can also include elements made from the material of the component.
  • the functional layer essentially comprises the elements AI, Si, O and N.
  • the functional layer can be a monolayer or a multilayer.
  • the functional layer is a multilayer structure, it is advantageous if the Al/Si ratio and/or the O/N ratio change periodically over at least part of the layer thickness and/or change aperiodically over at least part of the layer thickness.
  • the ratio of Al to Si (Al/Si) atoms in the functional layer is particularly preferably between 2 and 5.
  • the functional layer is characterized by AI droplets, which are in the layer in the "as deposited” state and which contribute to diffusion processes and the formation of mullite structures during the aging process.

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Abstract

L'invention concerne un système de couches revêtu sur un substrat, le système de couches comprenant une couche fonctionnelle et une couche intermédiaire et la couche intermédiaire étant disposée entre le substrat et la couche fonctionnelle, la couche fonctionnelle comprenant à la fois les éléments aluminium et silicium mais pas nécessairement sous forme élémentaire, et la couche fonctionnelle comprenant de l'oxygène ou de l'azote ou les deux, caractérisé en ce que la couche intermédiaire comprend, mesurée en % en poids atomique, un pourcentage plus élevé de silicium et/ou un pourcentage plus élevé d'aluminium que la couche fonctionnelle.
EP21819720.0A 2020-12-02 2021-11-18 Couches de protection contre la corrosion al-si Pending EP4256102A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102020007352 2020-12-02
PCT/EP2021/000144 WO2022117220A1 (fr) 2020-12-02 2021-11-18 Couches de protection contre la corrosion al-si

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EP (1) EP4256102A1 (fr)
JP (1) JP2023554247A (fr)
KR (1) KR20230116003A (fr)
CN (1) CN116547406A (fr)
CA (1) CA3199347A1 (fr)
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US6444335B1 (en) * 2000-04-06 2002-09-03 General Electric Company Thermal/environmental barrier coating for silicon-containing materials
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
ES2644838T3 (es) * 2015-04-10 2017-11-30 MTU Aero Engines AG Material cerámico compuesto con capa protectora contra la corrosión y procedimiento para la producción
DE102015212588A1 (de) 2015-07-06 2017-01-12 Oerlikon Surface Solutions Ag, Trübbach Konturtreue Schutzschicht für Verdichterbauteile von Gasturbinen

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CA3199347A1 (fr) 2022-06-09
KR20230116003A (ko) 2023-08-03
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US20240003015A1 (en) 2024-01-04
WO2022117220A1 (fr) 2022-06-09

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