EP4139496A1 - High vacuum pumps their method of manufacture and use - Google Patents

High vacuum pumps their method of manufacture and use

Info

Publication number
EP4139496A1
EP4139496A1 EP21721160.6A EP21721160A EP4139496A1 EP 4139496 A1 EP4139496 A1 EP 4139496A1 EP 21721160 A EP21721160 A EP 21721160A EP 4139496 A1 EP4139496 A1 EP 4139496A1
Authority
EP
European Patent Office
Prior art keywords
vacuum pump
high vacuum
coating
pump
pumping chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21721160.6A
Other languages
German (de)
French (fr)
Inventor
Oliver James RUDGE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Publication of EP4139496A1 publication Critical patent/EP4139496A1/en
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/042—Turbomolecular vacuum pumps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00—Details, component parts, or accessories
    • F04D29/02—Selection of particular materials
    • F04D29/023—Selection of particular materials especially adapted for elastic fluid pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2230/00—Manufacture
    • F05D2230/90—Coating; Surface treatment

Definitions

  • the field of the invention relates to high vacuum pumps, to their method of manufacture and to the evacuation of a chamber using such pumps.
  • a first aspect provides a high vacuum pump with low outgassing characteristics, said high vacuum pump comprising: an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet; at least a portion of an inner surface of said at least one pumping chamber comprising an atomic layer deposition coating, said coating having a thickness of between 10 and 90nm.
  • ALD atomic layer deposition
  • ALD coatings provides a surface with low outgassing characteristics and that this property can be achieved with a thinner layer than the layer required for corrosion resistance.
  • Conventionally corrosion resistance requires a coating of several hundred nanometres.
  • using a thin coating of between 10 to 90 nm to coat at least a portion of the inner surface of a vacuum pump provides a vacuum pump where the amount of outgassing from the surface is significantly reduced. This allows the conventional requirement for an initial bakeout stage of a pump in order to obtain a high vacuum to be dispensed with, as outgassing levels are significantly reduced by the coating.
  • a high vacuum pump is a pump configured to pump to pressures in the high vacuum range which is below 1mbar.
  • said coating has a thickness of between 20 and 70nm.
  • thicknesses between 20 and 70 nm can also provide good protection against outgassing.
  • a coating of between 20 and 50 nm will provide good protection and have a very low effect on tolerances and clearances.
  • said coating comprises an AL2O3 coating.
  • An AL2O3 coating is effective at sealing much of the surface, reducing the number of pores and thus, the amount of outgassing.
  • said high vacuum pump comprises an ultra-high vacuum pump configured to pump to pressures below 10 8 mbar, preferably below 10 9 mbar.
  • Embodiments are particularly effective for ultra-high vacuum pumps where outgassing of surfaces is a particular problem.
  • Such pumps may also have particularly tight clearances.
  • coatings that are thin and thus, do not unduly affect the clearances and yet provide protection against outgassing may be particularly effective in such pumps.
  • the thinness of the coating may allow this to be used on existing designs of pumps without the need for the pumps to be re-designed to accommodate the coating.
  • these coatings can be used in a number of pumps, they are particularly effective on turbomolecular pumps.
  • coatings of even a portion of the inner surface may improve performance, in some embodiments coating at least 80% of the inner surfaces may be preferred, while in other embodiments, coating substantially all of the inner surface will provide a particularly effective pump.
  • a second aspect provides a method of manufacturing a high vacuum pump with reduced outgassing characteristics, said high vacuum pump comprising an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet, said method comprising: using atomic layer deposition to coat to a thickness of between 10 and 90nm at least some portions of components forming said vacuum pump, said at least some portions forming at least a portion of an inner surface of said at least one pumping chamber when said vacuum pump is assembled; and assembling said components to form said high vacuum pump.
  • said coating has a thickness of between 20 and 70nm.
  • said step of coating comprises using atomic layer deposition to form an AL2O3 coating.
  • said at least a portion comprises at least 80% of said inner surface.
  • said at least a portion comprises substantially all of said inner surface.
  • a third aspect provides a method of evacuating a chamber comprising attaching a high vacuum pump with low outgassing characteristics according to a first aspect to a vacuum chamber; attaching at least one backing pump to said high vacuum pump; initiating pumping of said chamber by said at least one backing pump and when a first predetermined vacuum is reached, starting pumping with said high vacuum pump to generate a high vacuum without performing an initial bakeout step of heating said high vacuum pump.
  • chambers can be evacuated to a high vacuum or an ultra-high vacuum such as to pressures below 10 8 mbar and in some case down to 10 9 mbar without the need to perform an initial heating or bakeout step to perform outgassing of the vacuum pump. This allows the time for evacuation of a chamber to be significantly reduced and also reduces the number of components and complexity of control required for the system.
  • Figure 1 shows a turbomolecular pump according to an embodiment
  • Figure 2 shows a method of manufacture of a vacuum pump according to an embodiment.
  • a thin ALD coating similar to, but thinner than one conventionally used for corrosion resistance, on the inner surfaces of the pumping chamber of a vacuum pump provides a surface for which outgassing is reduced and thus, a bakeout step is not required to reach ultra high vacuum levels. This is because the coating effectively seals the surfaces and stops hydrogen passing through the materials which is the primary concern when looking at low pressures particularly those below 1X10 9 mbar. Additionally the speed at which these low pressures are reached is increased.
  • FIG. 1 shows a turbomolecular pump 5 according to an embodiment.
  • Turbomolecular pump 5 has a pumping chamber between inlet 20 and outlet 30.
  • the pumping chamber comprises rotor blades 14 and stator blades 10.
  • Stator blades 10 are spaced apart by spacers 12.
  • the surfaces of stator blades 10, spacer 12 and rotor blades 14 that form the inner surface of the pumping chamber are coated using atomic layered deposition with an AL2O3 coating of 60 nm thickness. This coating effectively seals the surfaces and inhibits gas molecules, even small molecule gasses such as hydrogen, being adsorbed by the material and then later released at lower pressures.
  • a high vacuum pump with low outgassing where the time taken to evacuate to ultra-high vacuums is reduced and a bakeout step can be dispensed with.
  • the surface is hydrophobic to a degree, which helps to limit the amount of humidity or moisture within the pump.
  • FIG. 2 schematically shows steps in a method for manufacturing such a pump.
  • a first step S10 atomic layer deposition is used to coat to a thickness of between 10 and 90 nm, in this case 50 nm, the surfaces of the components of the vacuum pump that will form the inner surfaces of the pumping chamber.
  • a vacuum pump 5 such as that shown in Figure 1
  • the outer surfaces of the stator blades 10 the inner surface of spacer 12 and the outer surface of rotor blades 14 are all coated using atomic layer deposition with a coating that provides effective sealing of these surfaces.
  • the vacuum pump does not need to be redesigned but can be formed of the same design and using the same components as a standard high vacuum pump, there is simply an additional step where atomic layer deposition is used to provide the inner surfaces of the pumping chamber with a thin coating. These components forming the pump are then assembled in a second step S20, and a high vacuum pump according to an embodiment is provided.
  • This turbomolecular pump can then be used to evacuate a chamber to an ultra high vacuum.
  • the turbomolecular pump inlet is attached to the chamber and a backing pump is attached to the pump outlet.
  • the backing pump evacuates down to a first pressure and then the turbomolecular pump can be turned on and the chamber can be evacuated to the high or ultra high vacuum.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Non-Positive Displacement Air Blowers (AREA)

Abstract

A high vacuum pump with low outgassing characteristics, its method of manufacture and use is disclosed. The high vacuum pump comprises: an inlet and an outlet and at least one pumping chamber located between the inlet and the outlet. At least a portion of an inner surface of the at least one pumping chamber comprises an atomic layer deposition coating, the coating having a thickness of between 10 and 90nm.

Description

HIGH VACUUM PUMPS THEIR METHOD OF MANUFACTURE AND USE
FIELD OF THE INVENTION
The field of the invention relates to high vacuum pumps, to their method of manufacture and to the evacuation of a chamber using such pumps.
BACKGROUND
Generating high vacuums can be challenging. One problem encountered when pumping down to high a vacuum arises due to outgassing of materials forming the pump. At higher pressures, when a pump is exposed to air, or during the pump down process, molecules of gases at these higher pressures diffuse into the surface or become adsorbed on the walls of the pumping chamber and these molecules may then be released as the pressure drops in an outgassing process. Such outgassing makes it harder, and increases the time required, to achieve a high vacuum. Hydrogen molecules can be a particular problem as they are easily adsorbed and difficult to pump effectively.
Conventionally outgassing has been addressed by an initial bakeout process where the pump is heated such that the increase in temperature releases many of the adsorbed molecules from the surfaces prior to the lower pressures being reached. Although bakeout is effective at reducing outgassing it can increase the time and hardware required to achieve a high vacuum.
SUMMARY
A first aspect provides a high vacuum pump with low outgassing characteristics, said high vacuum pump comprising: an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet; at least a portion of an inner surface of said at least one pumping chamber comprising an atomic layer deposition coating, said coating having a thickness of between 10 and 90nm. Although ALD (atomic layer deposition) coatings have been considered for use to provide corrosion resistance in pumps in general, they have generally not been adopted for use as a coating in vacuum pumps as they are expensive. Furthermore, the thickness used to inhibit corrosion is of the order of a few hundred nanometres which means that pumps which have high tolerances and low clearances would need to be redesigned to accommodate these coatings.
It was recognised that an additional property of ALD coatings is that it provides a surface with low outgassing characteristics and that this property can be achieved with a thinner layer than the layer required for corrosion resistance. Conventionally corrosion resistance requires a coating of several hundred nanometres. Thus, using a thin coating of between 10 to 90 nm to coat at least a portion of the inner surface of a vacuum pump provides a vacuum pump where the amount of outgassing from the surface is significantly reduced. This allows the conventional requirement for an initial bakeout stage of a pump in order to obtain a high vacuum to be dispensed with, as outgassing levels are significantly reduced by the coating.
A high vacuum pump is a pump configured to pump to pressures in the high vacuum range which is below 1mbar.
In some embodiments, said coating has a thickness of between 20 and 70nm.
Although, a thickness of between 10 and 90 nm has been found to be effective, thicknesses between 20 and 70 nm can also provide good protection against outgassing. In this regard, in some cases a coating of between 20 and 50 nm will provide good protection and have a very low effect on tolerances and clearances.
Although, different coatings may be applicable, in some embodiments said coating comprises an AL2O3 coating. An AL2O3 coating is effective at sealing much of the surface, reducing the number of pores and thus, the amount of outgassing.
In some embodiments, said high vacuum pump comprises an ultra-high vacuum pump configured to pump to pressures below 108 mbar, preferably below 109 mbar.
Embodiments are particularly effective for ultra-high vacuum pumps where outgassing of surfaces is a particular problem. Such pumps may also have particularly tight clearances. Thus, coatings that are thin and thus, do not unduly affect the clearances and yet provide protection against outgassing may be particularly effective in such pumps. Furthermore, the thinness of the coating may allow this to be used on existing designs of pumps without the need for the pumps to be re-designed to accommodate the coating.
Although, these coatings can be used in a number of pumps, they are particularly effective on turbomolecular pumps.
Although, coatings of even a portion of the inner surface may improve performance, in some embodiments coating at least 80% of the inner surfaces may be preferred, while in other embodiments, coating substantially all of the inner surface will provide a particularly effective pump.
A second aspect provides a method of manufacturing a high vacuum pump with reduced outgassing characteristics, said high vacuum pump comprising an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet, said method comprising: using atomic layer deposition to coat to a thickness of between 10 and 90nm at least some portions of components forming said vacuum pump, said at least some portions forming at least a portion of an inner surface of said at least one pumping chamber when said vacuum pump is assembled; and assembling said components to form said high vacuum pump. In some embodiments, said coating has a thickness of between 20 and 70nm.
In some embodiments, said step of coating comprises using atomic layer deposition to form an AL2O3 coating.
In some embodiments, said at least a portion comprises at least 80% of said inner surface.
In some embodiments, said at least a portion comprises substantially all of said inner surface.
A third aspect provides a method of evacuating a chamber comprising attaching a high vacuum pump with low outgassing characteristics according to a first aspect to a vacuum chamber; attaching at least one backing pump to said high vacuum pump; initiating pumping of said chamber by said at least one backing pump and when a first predetermined vacuum is reached, starting pumping with said high vacuum pump to generate a high vacuum without performing an initial bakeout step of heating said high vacuum pump.
One advantage of an aspect is that chambers can be evacuated to a high vacuum or an ultra-high vacuum such as to pressures below 10 8 mbar and in some case down to 109 mbar without the need to perform an initial heating or bakeout step to perform outgassing of the vacuum pump. This allows the time for evacuation of a chamber to be significantly reduced and also reduces the number of components and complexity of control required for the system.
Further particular and preferred aspects are set out in the accompanying independent and dependent claims. Features of the dependent claims may be combined with features of the independent claims as appropriate, and in combinations other than those explicitly set out in the claims. Where an apparatus feature is described as being operable to provide a function, it will be appreciated that this includes an apparatus feature which provides that function or which is adapted or configured to provide that function.
BRIEF DESCRIPTION OF THE DRAWINGS
Embodiments of the present invention will now be described further, with reference to the accompanying drawings, in which:
Figure 1 shows a turbomolecular pump according to an embodiment; and Figure 2 shows a method of manufacture of a vacuum pump according to an embodiment.
DESCRIPTION OF THE EMBODIMENTS
Before discussing the embodiments in any more detail, first an overview will be provided.
Using a thin ALD coating, similar to, but thinner than one conventionally used for corrosion resistance, on the inner surfaces of the pumping chamber of a vacuum pump provides a surface for which outgassing is reduced and thus, a bakeout step is not required to reach ultra high vacuum levels. This is because the coating effectively seals the surfaces and stops hydrogen passing through the materials which is the primary concern when looking at low pressures particularly those below 1X109mbar. Additionally the speed at which these low pressures are reached is increased.
Figure 1 shows a turbomolecular pump 5 according to an embodiment. Turbomolecular pump 5 has a pumping chamber between inlet 20 and outlet 30. The pumping chamber comprises rotor blades 14 and stator blades 10. Stator blades 10 are spaced apart by spacers 12. In this embodiment, the surfaces of stator blades 10, spacer 12 and rotor blades 14 that form the inner surface of the pumping chamber are coated using atomic layered deposition with an AL2O3 coating of 60 nm thickness. This coating effectively seals the surfaces and inhibits gas molecules, even small molecule gasses such as hydrogen, being adsorbed by the material and then later released at lower pressures. Thus, a high vacuum pump with low outgassing is provided where the time taken to evacuate to ultra-high vacuums is reduced and a bakeout step can be dispensed with. Furthermore, the surface is hydrophobic to a degree, which helps to limit the amount of humidity or moisture within the pump.
Figure 2 schematically shows steps in a method for manufacturing such a pump. In this method in a first step S10 atomic layer deposition is used to coat to a thickness of between 10 and 90 nm, in this case 50 nm, the surfaces of the components of the vacuum pump that will form the inner surfaces of the pumping chamber. Thus, for a vacuum pump 5 such as that shown in Figure 1 the outer surfaces of the stator blades 10, the inner surface of spacer 12 and the outer surface of rotor blades 14 are all coated using atomic layer deposition with a coating that provides effective sealing of these surfaces. As the coating used is of a low thickness, the vacuum pump does not need to be redesigned but can be formed of the same design and using the same components as a standard high vacuum pump, there is simply an additional step where atomic layer deposition is used to provide the inner surfaces of the pumping chamber with a thin coating. These components forming the pump are then assembled in a second step S20, and a high vacuum pump according to an embodiment is provided.
This turbomolecular pump can then be used to evacuate a chamber to an ultra high vacuum. The turbomolecular pump inlet is attached to the chamber and a backing pump is attached to the pump outlet. The backing pump evacuates down to a first pressure and then the turbomolecular pump can be turned on and the chamber can be evacuated to the high or ultra high vacuum. There is no need for an initial pump heating or bakeout step as the turbomolecular pump has the thin ALD coating that inhibits outgassing.
Although illustrative embodiments of the invention have been disclosed in detail herein, with reference to the accompanying drawings, it is understood that the invention is not limited to the precise embodiment and that various changes and modifications can be effected therein by one skilled in the art without departing from the scope of the invention as defined by the appended claims and their equivalents.
REFERENCE SIGNS
5 turbomolecular pump
10 stator blade 12 spacer
14 rotor blade 20 inlet 30 outlet

Claims

1. A high vacuum pump, said high vacuum pump comprising: an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet; at least a portion of an inner surface of said at least one pumping chamber comprising an atomic layer deposition coating, said coating having a thickness of between 10 and 90nm.
2. A high vacuum pump according to claim 1 , wherein said coating has a thickness of between 20 and 70nm.
3. A high vacuum pump according to claim 1 or 2, wherein said coating comprises an AL2O3 coating.
4. A high vacuum pump according to any preceding claim, wherein said high vacuum pump comprises an ultra high vacuum pump configured to pump to pressures below 10_8mbar, preferably below 10-9 mbar.
5. A high vacuum pump according to any preceding claim, wherein said vacuum pump comprises a turbomolecular pump.
6. A high vacuum pump according to any preceding claim wherein said at least a portion of said inner surface of said at least one pumping chamber comprises at least 80% of said inner surface.
7. A high vacuum pump according to claim 6, wherein said at least a portion of said inner surface of said at least one pumping chamber comprises substantially all of said inner surface.
8. A method of manufacturing a high vacuum pump, said high vacuum pump comprising an inlet and an outlet and at least one pumping chamber located between said inlet and said outlet, said method comprising: using atomic layer deposition to coat to a thickness of between 10 and 90nm at least some portions of components forming said vacuum pump, said at least some portions forming at least a portion of an inner surface of said at least one pumping chamber when said vacuum pump is assembled; and assembling said components to form said high vacuum pump.
9. A method of manufacturing a vacuum pump according to claim 8, wherein said coating has a thickness of between 20 and 70nm.
10. A method of manufacturing a vacuum pump according to claim 8 or 9, wherein said step of coating comprises using atomic layer deposition to form an AL2O3 coating.
11. A method of manufacturing a vacuum pump according to any one of claims 8 to 10, wherein said at least a portion comprises at least 80% of said inner surface.
12. A method of manufacturing a vacuum pump according to claim 11 , wherein said at least a portion comprises substantially all of said inner surface.
13. A method of evacuating a chamber comprising attaching a high vacuum pump according to any one of claims 1 to 7 to a vacuum chamber; attaching at least one backing pump to said high vacuum pump; initiating pumping of said chamber by said at least one backing pump and when a first predetermined vacuum is reached, starting pumping with said high vacuum pump to generate a high vacuum without performing an initial bakeout step of heating said high vacuum pump.
EP21721160.6A 2020-04-23 2021-04-14 High vacuum pumps their method of manufacture and use Pending EP4139496A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB2005964.8A GB2594314B (en) 2020-04-23 2020-04-23 High vacuum pumps their method of manufacture and use
PCT/GB2021/050897 WO2021214427A1 (en) 2020-04-23 2021-04-14 High vacuum pumps their method of manufacture and use

Publications (1)

Publication Number Publication Date
EP4139496A1 true EP4139496A1 (en) 2023-03-01

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EP21721160.6A Pending EP4139496A1 (en) 2020-04-23 2021-04-14 High vacuum pumps their method of manufacture and use

Country Status (3)

Country Link
EP (1) EP4139496A1 (en)
GB (1) GB2594314B (en)
WO (1) WO2021214427A1 (en)

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Publication number Priority date Publication date Assignee Title
EP4390130B1 (en) * 2022-12-21 2025-03-19 Pfeiffer Vacuum Technology AG Pump and method for forming a coating

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2527398B2 (en) * 1992-06-05 1996-08-21 財団法人真空科学研究所 Turbo molecular pump
KR20060034393A (en) * 2004-10-19 2006-04-24 삼성전자주식회사 Turbomolecular pump
DE102016123146A1 (en) * 2016-06-03 2017-12-07 Movatec Gmbh Vacuum apparatus and method for coating components

Also Published As

Publication number Publication date
GB202005964D0 (en) 2020-06-10
GB2594314A (en) 2021-10-27
WO2021214427A1 (en) 2021-10-28
GB2594314B (en) 2022-06-08

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