EP4075182A1 - Optischer scanner - Google Patents
Optischer scanner Download PDFInfo
- Publication number
- EP4075182A1 EP4075182A1 EP22165973.3A EP22165973A EP4075182A1 EP 4075182 A1 EP4075182 A1 EP 4075182A1 EP 22165973 A EP22165973 A EP 22165973A EP 4075182 A1 EP4075182 A1 EP 4075182A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- front face
- mirror
- face
- scanner according
- pivot axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 12
- 230000005855 radiation Effects 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims description 28
- 230000000737 periodic effect Effects 0.000 claims description 6
- 230000000284 resting effect Effects 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000000708 deep reactive-ion etching Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- NCGICGYLBXGBGN-UHFFFAOYSA-N 3-morpholin-4-yl-1-oxa-3-azonia-2-azanidacyclopent-3-en-5-imine;hydrochloride Chemical compound Cl.[N-]1OC(=N)C=[N+]1N1CCOCC1 NCGICGYLBXGBGN-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 241001639412 Verres Species 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/42—Simultaneous measurement of distance and other co-ordinates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4817—Constructional features, e.g. arrangements of optical elements relating to scanning
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
- G02B5/045—Prism arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
Definitions
- the present invention relates to the field of optical and/or optronic systems. More particularly, the invention relates to the field of imaging, for example of scenes, or of detection.
- the invention relates to an optical scanner provided with a mirror provided with a structuring on the rear face and intended to impose a deflection on radiation transmitted by said rear face with respect to radiation incident on the front face.
- Micro-mirrors are now widely present in the field of MEMS (Micro Electromechanical Systems) and in particular in LIDAR type devices (“Light Detection And Ranging systems”, i.e. “laser detection and distance estimation”).
- the latter make it possible in particular to scan a surface or a target with light radiation for detection or imaging purposes.
- the micro-mirrors are arranged to oscillate along one or two pivot axis(es), at a predetermined scanning frequency, so as to reflect incident radiation in different directions.
- the scanning frequency of the micro-mirrors can vary from a few Hz to several kHz, and their size can be of the order of several tens of micrometers to several millimeters (for example a few millimeters in diameter for disc-shaped micro-mirrors ), and may in particular be between 500 ⁇ m and 10 mm.
- the figure 1 illustrates a first possible architecture of a device provided with two micro-mirrors, respectively called first micro-mirror 1 1 and second micro-mirror 2 1 , arranged to pivot around, respectively, a first pivot axis X 1 X 1 'and a second pivot axis Y 1 Y 1 ' that are not parallel.
- these two micro-mirrors 1 1 and 2 1 are arranged so that a light beam emitted by a light source 3 1 is reflected by the first micro-mirror 1 1 in the direction of the second micro-mirror 2 1 which thinks in turn in the direction, for example, of a screen 4 1 .
- the rotation of each of the micro-mirrors 11 and 21 about their respective pivot axis thus makes it possible to perform a scanning of a surface with the light beam, for example, for imaging or detection purposes.
- this architecture requires a precise alignment of the two micro-mirrors, and is, consequently, difficult to achieve.
- a second architecture illustrated in figure 2 (extracted from document [1] cited at the end of the description), can be envisaged.
- the latter implements a single micro-mirror 1 2 pivotally mounted around two non-parallel pivot axes X 2 X 2 'and Y 2 Y 2 '.
- the oscillation of this micro-mirror 1 2 around one and the other of the two pivot axes X 2 X 2 'and Y 2 Y 2 ' thus makes it possible to scan the surface of a screen 4 2 by means of a light beam coming from a light source 3 2 and reflected by said micro-mirror 1 2 .
- An object of the present invention is to propose a new reflector device and in particular a device capable of scanning a surface of greater extent than the devices known from the state of the art.
- the first pivot axis extends in a first direction parallel to a main plane of the front face.
- said scanner further comprises a first actuator intended to impose a rotation of the mirror around the first pivot axis.
- the mirror is also mounted to pivot about a second pivot axis perpendicular to the first pivot axis, the second axis extending in a second direction parallel to said main plane of the front face.
- said scanner further comprises a second actuator intended to impose a rotation of the mirror around the second pivot axis.
- the rear face has a concave shape.
- the at least one facet comprises a plurality of facets arranged in a row.
- the facets are arranged so as to form a periodic sawtooth profile, advantageously the periodicity of the periodic sawtooth profile is between 50 ⁇ m and 100 ⁇ m, and with a depth of teeth comprised between 5 ⁇ m and 10 ⁇ m.
- the front face is partially reflective so that the light radiation likely to be emitted by the light source is partly reflected by said front face and partly transmitted by the rear face.
- the front face is covered with a partially reflecting layer which comprises a Bragg stack, the Bragg stack comprising at least one elementary Bragg stack.
- an elementary Bragg stack comprises a stack of two dielectric and/or semiconductor layers of different indexes, advantageously an elementary Bragg stack comprises an amorphous silicon layer and a silicon oxide layer.
- the Bragg stack is limited to one or two elementary Bragg stacks.
- the transparent or partially transparent zone comprises a support substrate forming said rear face, and in which the front face is formed of an openwork reflective layer provided with at least one opening revealing the support substrate or is formed of a reflective layer resting on a part of an upper face of the support substrate.
- the mirror comprises silicon.
- the light radiation likely to be emitted by the light source has a wavelength equal to 1550 nm.
- the present invention relates to an optical scanner provided with a mirror which has an essentially planar front face, this front face thus extends along a given plane P called the “main plane” and a structured rear face (opposite to the front face).
- the structuring of the rear face of the mirror is adapted so that radiation passing through the mirror from the front face to the rear face undergoes a deflection with respect to the angle of incidence of said radiation on the front face.
- the structuring can comprise at least one facet that is essentially planar and inclined with respect to the front face and therefore to the main plane P.
- the Figure 3A is a schematic representation of an optical scanner 100 according to an exemplary embodiment of the present invention.
- the optical scanner 100 notably comprises a mirror 200 mounted to pivot around a first pivot axis XX'.
- the mirror 200 comprises in this respect a front face 210, essentially planar, and a rear face 220 opposite the front face 210.
- the optical scanner 100 further comprises a light source 300 intended to emit incident light radiation on the front face 210 of the mirror 200.
- the light source 300 can advantageously be a monochromatic source, for example a laser source or a light-emitting diode.
- the wavelength of the radiation emitted by the light source can for example be equal to 1550 nm.
- the mirror 200 is partially transparent to the light radiation emitted by the light source 300.
- on the front face 210 of the mirror 200 passes through the latter from the front face 210 and comes out, in the form of transmitted radiation (denoted "RT"), by the rear face 220.
- RT transmitted radiation
- front face 210 can be partially reflective so that the reflection of the incident radiation also produces reflected radiation RR ( Figure 3A ).
- the mirror 200 can comprise a partially reflective layer 230 resting on a main face of a support substrate 240. One face of the partially reflective layer 230 then forms the front face 210 of the mirror. More particularly, the mirror 200 can comprise from its front face 210 towards its rear face 220, the partially reflective layer 230 and a support substrate 240.
- the partially reflective layer 230 and the support substrate 240 can each have an absorption coefficient negligible, or even zero, in the wavelength range covered by the incident radiation.
- the partially reflecting layer 230 can itself comprise a Bragg stack (or Bragg mirror) formed by at least one elementary Bragg stack.
- Bragg stack means a periodic succession of transparent or partially transparent layers with different refractive indices.
- An elementary Bragg stack comprises a stack of two dielectric and/or semiconducting layers.
- the mirror 200 can be formed, from its front face 210 towards its rear face 220, of the partially reflective layer 230 and of the support substrate 240, the partially reflective layer 230 and the support substrate 240 possibly each having a coefficient negligible, or even zero, absorption in the wavelength range covered by the incident radiation.
- the elementary Bragg stack can comprise a layer of silicon dioxide with a thickness 268 nm (whose refractive index at 1550 nm is 1.45) covered with a layer of amorphous silicon 113 nm thick (whose refractive index at 1550 nm is 3.42).
- a Bragg stack comprising a single elementary Bragg stack, has, for an incidence between 0° and 20°, a reflection coefficient equal to 88.8% and a transmission coefficient equal to 11% opposite a main light beam of wavelength equal to 1550 nm.
- This stack is, moreover, only slightly or not at all absorbent, and will consequently present almost zero heating.
- the dimensioning of the elementary Bragg stack makes it possible to adjust the reflectivity in the range of wavelengths covered by the incident light radiation.
- the mirror 200 can comprise an openwork reflective layer 250 resting on a portion of an upper face of the support substrate 240 made of a material transparent to the incident wavelength.
- the reflective layer 250 thus comprises one or more openings revealing the support substrate 240 whose coefficient absorption is negligible in the wavelength range covered by the incident radiation.
- a central opening 254 passes through the reflective layer 250 and extends to the upper face of the support substrate 240. According to a variant (not shown), several openings pass through the reflective layer 250 and reveal the support substrate 240.
- the reflective layer 250 can be made of a metallic material such as, for example, gold or aluminum.
- the mirror 200 comprises a reflective layer 250 resting on only a portion of the upper face of the support substrate 240 made of a material transparent to the incident wavelength ( Fig. 3C ).
- the support substrate 240 can, for its part, comprise a semiconductor material and more particularly silicon.
- the front face 210 of the mirror 200 is formed by the reflective layer 250.
- the rear face 220 of the mirror can be formed by the lower face of the support substrate 240 opposite to said upper face of the latter.
- the mirror 200 is provided with at least one zone transparent or partially transparent to light radiation arranged between the front face and the rear face of the mirror.
- this transparent or partially transparent zone is formed by the layer 230 and the substrate 240 and extends from the front face 210 to the rear face 230 of the mirror.
- the transparent or partially transparent zone can extend from a region situated between the front face and the rear face, as far as towards the rear face.
- this zone is thus formed by the substrate 240.
- the rear face 220 is structured to impose a deflection on the transmitted radiation RT with respect to the incident radiation RI.
- the structuring can comprise at least one essentially flat facet 220i inclined at an angle ⁇ with respect to the front face 210.
- the incident radiation RI incident on the front face 210 at an angle of incidence ⁇ i relative to the normal N1 of the front face 200, undergoes a first refraction when it crosses the front face 210 to form refracted radiation RR1.
- This same refracted radiation RR1 forms an angle ⁇ 2 with respect to the normal N2 of the rear face 220, and an angle ⁇ 2+ ⁇ with the direction N1′ parallel to the normal N1.
- the refracted radiation RR1 is, in turn, refracted by the rear face 220 to form the transmitted radiation RT.
- This transmitted radiation RT forms an angle ⁇ 3 with the normal N2, and an angle ⁇ 4 with the direction N1'.
- ⁇ t denotes the angle formed between the transmitted radiation RT and the incident radiation RI.
- a facet 220i inclined at an angle ⁇ with respect to the front face 210 thus makes it possible to impose a deflection of the transmitted radiation RT with respect to to incident radiation.
- This deflection varies in particular as a function of the angle of incidence ⁇ i of the incident radiation RI.
- figure 5 and 6 are graphical representations of the angles ⁇ t and ⁇ r as a function of the angle of incidence ⁇ i.
- the angle of incidence ⁇ i varies between 50° and 70°
- the deflection ⁇ t of the transmitted radiation RT varies by 10°
- the angle ⁇ r varies by 40°.
- the angle of incidence ⁇ i varies between 50° and 70°
- the deflection ⁇ t of the transmitted radiation RT varies by 10°
- the angle ⁇ r varies by 40°.
- the rotation of the mirror 200 around the first pivot axis XX′ allows the reflected radiation RR and the transmitted radiation RT to scan two distinct zones at an angle, which may optionally present an overlap.
- the mirror 200 can also be pivotally mounted around a second pivot axis YY′ perpendicular to the first pivot axis XX′ and parallel to a second direction of the plane formed by the front face 210.
- the reflected radiation RR and transmitted RT can, by rotation of the mirror around one and the other of the first and the second pivot axis, each scan a surface.
- the reflected and transmitted beams scan the YZ plane
- the reflected beam scans a plane XRR0
- the transmitted beam scans a plane XRT0, RR0 and RT0 being directions of the reflected beams RR and transmitted beams RT when the angle of rotation around the axis YY' is zero, ie when the incident ray is in the plane OYZ.
- the prism has the shape of a cylinder, in particular a right cylinder with faces 701, 702 which are parallel to each other.
- a prism with non-parallel faces 701, 702 may alternatively be provided.
- the optical scanner 100 can comprise a first and/or a second actuator intended to control the rotation of the mirror 200 around, respectively, the first pivot axis XX' and the second pivot axis YY'.
- the first and the second actuator can comprise at least one of the elements chosen from: an electrostatic actuator, a magnetic actuator, a piezoelectric actuator, a thermal actuator.
- the structuring of the rear face 220 comprises a plurality of facets 220i arranged in a row.
- the facets 220i can be arranged so as to form a periodic sawtooth profile.
- the interval li between two teeth of the sawtooth profile is between 50 ⁇ m and 100 ⁇ m, and the depth pi of the teeth is between 5 ⁇ m and 10 ⁇ m.
- the rear face 220 may have a concave shape which thus makes it possible to increase the scanning angle ⁇ t.
- the angle between the entry and exit faces varies according to the position on the axis OY' of the orthogonal reference [O; X';Y';Z'] given on the figure 11 .
- the angle of incidence of the beam on the entrance face is low, for example less than 10°, and the point of impact of the beam on the entrance face is close to the point where the two faces are parallel, the deviation of the transmitted beam is very low, even zero if the angle of incidence is zero and the beam falls on the top of the concave shape.
- the mirror is rotated around the axis OX', the angle of incidence of the beam on the front face increases and the beam transmitted by the front face arrives on the rear face at a position which moves away from the point where the two faces are parallel.
- the angle of incidence on the rear face increases and the deviation increases. This makes it possible to increase the angular range scanned in transmission.
- the invention also relates to a method of manufacturing the optical scanner and more particularly the mirror 200.
- the method includes providing a substrate 800 having a front face 810 and a back face 820 ( figure 9a ).
- a triangular or sawtooth waveform pattern is then formed from the front face 810.
- the formation of this pattern may involve the implementation of a grayscale mask 900 ( figure 10a ).
- the triangular profile 830 of the front face 810 results from a dry etching followed by a resin removal step.
- the triangular profile can have a period I of between 50 ⁇ m and 100 ⁇ m, and a depth p of between 5 ⁇ m and 10 ⁇ m.
- the formation of the structuring is followed by a step of formation of a layer of SiO 2 by PECVD and of a planarization of said layer 840 ( figures 9b and 9c ).
- This layer has in particular at the end of the planarization a thickness greater than the depth p.
- the substrate 800 is then assembled with a receiver substrate 850 by bringing the layer of SiO 2 840 into contact with a main face of the receiver substrate 850 ( figure 9d ).
- This assembly may include molecular bonding followed by heat treatment intended to reinforce the bonding interface.
- the assembly is then followed by a step of thinning, in particular mechanical thinning, of the substrate 800 ( figure 9d ).
- the second manufacturing method also comprises steps of forming electrodes 710 and trenches 700 delimiting in particular the mirror 200 ( figure 9e ).
- the second manufacturing method includes a step of etching via an exposed main face of the receiver substrate 850 intended to release the mirror 200 ( figure 9f ).
- This etching step can be performed by DRIE (for "Deep Reactive Ion Etching” or deep reactive ion etching) so as to retain the structuring on the rear face of the mirror 200.
- the layer of SiO 2 can also be removed from the mirror 200.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Facsimile Scanning Arrangements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mechanical Optical Scanning Systems (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR2103742A FR3121757B1 (fr) | 2021-04-12 | 2021-04-12 | Scanner optique |
Publications (2)
Publication Number | Publication Date |
---|---|
EP4075182A1 true EP4075182A1 (de) | 2022-10-19 |
EP4075182B1 EP4075182B1 (de) | 2023-11-15 |
Family
ID=76807732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP22165973.3A Active EP4075182B1 (de) | 2021-04-12 | 2022-03-31 | Optischer scanner |
Country Status (3)
Country | Link |
---|---|
US (1) | US20220326419A1 (de) |
EP (1) | EP4075182B1 (de) |
FR (1) | FR3121757B1 (de) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3055702A1 (fr) * | 2016-09-07 | 2018-03-09 | Robert Bosch Gmbh | Dispositif et procede pour determiner l'etat de la surface d'une chaussee |
US20190107622A1 (en) * | 2017-10-11 | 2019-04-11 | Veoneer Us, Inc. | Scanning LiDAR System and Method with Source Laser Beam Splitting Apparatus and Method |
EP3489716A1 (de) * | 2017-11-28 | 2019-05-29 | Aptiv Technologies Limited | Vielflächige mems-spiegelvorrichtung für fahrzeug-lidar |
-
2021
- 2021-04-12 FR FR2103742A patent/FR3121757B1/fr active Active
-
2022
- 2022-03-31 EP EP22165973.3A patent/EP4075182B1/de active Active
- 2022-04-01 US US17/657,656 patent/US20220326419A1/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3055702A1 (fr) * | 2016-09-07 | 2018-03-09 | Robert Bosch Gmbh | Dispositif et procede pour determiner l'etat de la surface d'une chaussee |
US20190107622A1 (en) * | 2017-10-11 | 2019-04-11 | Veoneer Us, Inc. | Scanning LiDAR System and Method with Source Laser Beam Splitting Apparatus and Method |
EP3489716A1 (de) * | 2017-11-28 | 2019-05-29 | Aptiv Technologies Limited | Vielflächige mems-spiegelvorrichtung für fahrzeug-lidar |
Non-Patent Citations (1)
Title |
---|
SVEN HOLMSTROM ET AL.: "MEMS laser scanners : a review", JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, April 2014 (2014-04-01) |
Also Published As
Publication number | Publication date |
---|---|
US20220326419A1 (en) | 2022-10-13 |
FR3121757A1 (fr) | 2022-10-14 |
FR3121757B1 (fr) | 2023-04-14 |
EP4075182B1 (de) | 2023-11-15 |
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