EP4073139A1 - Light-fixation and moisture-cured masses based on epoxy resins and thiols - Google Patents
Light-fixation and moisture-cured masses based on epoxy resins and thiolsInfo
- Publication number
- EP4073139A1 EP4073139A1 EP20820354.7A EP20820354A EP4073139A1 EP 4073139 A1 EP4073139 A1 EP 4073139A1 EP 20820354 A EP20820354 A EP 20820354A EP 4073139 A1 EP4073139 A1 EP 4073139A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- moisture
- thiol
- mass
- weight
- difunctional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000003573 thiols Chemical class 0.000 title claims abstract description 59
- 229920000647 polyepoxide Polymers 0.000 title description 15
- 239000003822 epoxy resin Substances 0.000 title description 13
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 title description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 63
- 239000004593 Epoxy Substances 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 230000005855 radiation Effects 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 150000007514 bases Chemical class 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims description 91
- -1 oxazolidine compound Chemical class 0.000 claims description 15
- 238000003860 storage Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 8
- 150000002917 oxazolidines Chemical class 0.000 claims description 8
- 238000005304 joining Methods 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 6
- 229920006295 polythiol Polymers 0.000 claims description 6
- HNHFTARXTMQRCF-UHFFFAOYSA-N 1,3,5-tris(3-sulfanylpropyl)-1,3,5-triazinane-2,4,6-trione Chemical compound SCCCN1C(=O)N(CCCS)C(=O)N(CCCS)C1=O HNHFTARXTMQRCF-UHFFFAOYSA-N 0.000 claims description 5
- 150000002081 enamines Chemical class 0.000 claims description 5
- 150000004658 ketimines Chemical class 0.000 claims description 5
- 125000000160 oxazolidinyl group Chemical group 0.000 claims description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 4
- 150000004705 aldimines Chemical class 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 claims description 4
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 claims description 3
- 238000005266 casting Methods 0.000 claims description 3
- QEBJRRFIWCWPMA-UHFFFAOYSA-N diethyl-bis(sulfanyl)-$l^{4}-sulfane Chemical compound CCS(S)(S)CC QEBJRRFIWCWPMA-UHFFFAOYSA-N 0.000 claims description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 3
- 229920000570 polyether Polymers 0.000 claims description 3
- IMQFZQVZKBIPCQ-UHFFFAOYSA-N 2,2-bis(3-sulfanylpropanoyloxymethyl)butyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(CC)(COC(=O)CCS)COC(=O)CCS IMQFZQVZKBIPCQ-UHFFFAOYSA-N 0.000 claims description 2
- CEUQYYYUSUCFKP-UHFFFAOYSA-N 2,3-bis(2-sulfanylethylsulfanyl)propane-1-thiol Chemical compound SCCSCC(CS)SCCS CEUQYYYUSUCFKP-UHFFFAOYSA-N 0.000 claims description 2
- CFKONAWMNQERAG-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis[2-(3-sulfanylpropanoyloxy)ethyl]-1,3,5-triazinan-1-yl]ethyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCCN1C(=O)N(CCOC(=O)CCS)C(=O)N(CCOC(=O)CCS)C1=O CFKONAWMNQERAG-UHFFFAOYSA-N 0.000 claims description 2
- HCZMHWVFVZAHCR-UHFFFAOYSA-N 2-[2-(2-sulfanylethoxy)ethoxy]ethanethiol Chemical compound SCCOCCOCCS HCZMHWVFVZAHCR-UHFFFAOYSA-N 0.000 claims description 2
- NTYQWXQLHWROSQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2,2,2-tris(sulfanyl)acetic acid Chemical compound OC(=O)C(S)(S)S.CCC(CO)(CO)CO NTYQWXQLHWROSQ-UHFFFAOYSA-N 0.000 claims description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-M 3-mercaptopropionate Chemical compound [O-]C(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-M 0.000 claims description 2
- DFPOZTRSOAQFIK-UHFFFAOYSA-N S,S-dimethyl-beta-propiothetin Chemical compound C[S+](C)CCC([O-])=O DFPOZTRSOAQFIK-UHFFFAOYSA-N 0.000 claims description 2
- 150000001241 acetals Chemical class 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- FFHWGQQFANVOHV-UHFFFAOYSA-N dimethyldioxirane Chemical compound CC1(C)OO1 FFHWGQQFANVOHV-UHFFFAOYSA-N 0.000 claims description 2
- 230000007717 exclusion Effects 0.000 claims description 2
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 claims description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 2
- 239000005077 polysulfide Substances 0.000 claims description 2
- 229920001021 polysulfide Polymers 0.000 claims description 2
- 150000008117 polysulfides Polymers 0.000 claims description 2
- 150000003568 thioethers Chemical class 0.000 claims description 2
- 150000003673 urethanes Chemical class 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims 1
- 239000000853 adhesive Substances 0.000 abstract description 6
- 230000001070 adhesive effect Effects 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 4
- 239000000565 sealant Substances 0.000 abstract description 3
- 238000007789 sealing Methods 0.000 abstract description 3
- 238000000465 moulding Methods 0.000 abstract 1
- 238000003847 radiation curing Methods 0.000 description 15
- 238000001723 curing Methods 0.000 description 11
- 238000009472 formulation Methods 0.000 description 10
- 239000004848 polyfunctional curative Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000013008 moisture curing Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000004026 adhesive bonding Methods 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000004382 potting Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- LMRKVKPRHROQRR-UHFFFAOYSA-N 4-butylmorpholine Chemical compound CCCCN1CCOCC1 LMRKVKPRHROQRR-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910017464 nitrogen compound Inorganic materials 0.000 description 3
- 150000002830 nitrogen compounds Chemical class 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 150000001414 amino alcohols Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000004849 latent hardener Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- 150000003672 ureas Chemical class 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- PCLLJCFJFOBGDE-UHFFFAOYSA-N (5-bromo-2-chlorophenyl)methanamine Chemical compound NCC1=CC(Br)=CC=C1Cl PCLLJCFJFOBGDE-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- YDIZFUMZDHUHSH-UHFFFAOYSA-N 1,7-bis(ethenyl)-3,8-dioxatricyclo[5.1.0.02,4]oct-5-ene Chemical compound C12OC2C=CC2(C=C)C1(C=C)O2 YDIZFUMZDHUHSH-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- SXWDYSVCBQYACT-UHFFFAOYSA-N 1-(cyclohexen-1-ylmethyl)cyclohexane-1-carboxylic acid Chemical compound C=1CCCCC=1CC1(C(=O)O)CCCCC1 SXWDYSVCBQYACT-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 1
- STFXXRRQKFUYEU-UHFFFAOYSA-N 16-methylheptadecyl prop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C=C STFXXRRQKFUYEU-UHFFFAOYSA-N 0.000 description 1
- RROZRFLLVCBVQB-UHFFFAOYSA-N 2,4-dihydroxy-2,4-dimethyl-1,5-bis(4-propan-2-ylphenyl)pentan-3-one Chemical compound C1=CC(C(C)C)=CC=C1CC(C)(O)C(=O)C(C)(O)CC1=CC=C(C(C)C)C=C1 RROZRFLLVCBVQB-UHFFFAOYSA-N 0.000 description 1
- ASUQXIDYMVXFKU-UHFFFAOYSA-N 2,6-dibromo-9,9-dimethylfluorene Chemical compound C1=C(Br)C=C2C(C)(C)C3=CC=C(Br)C=C3C2=C1 ASUQXIDYMVXFKU-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- AZMMSEASPQHHTC-UHFFFAOYSA-N 2-[1,1-bis(2-hydroxyphenyl)ethyl]phenol Chemical compound C=1C=CC=C(O)C=1C(C=1C(=CC=CC=1)O)(C)C1=CC=CC=C1O AZMMSEASPQHHTC-UHFFFAOYSA-N 0.000 description 1
- OGRULRAOMCDCBO-UHFFFAOYSA-N 2-[[1-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC1=CC=C2C=CC=CC2=C1OCC1CO1 OGRULRAOMCDCBO-UHFFFAOYSA-N 0.000 description 1
- CRSDMXKCMBHKCS-UHFFFAOYSA-N 2-[[2-(oxiran-2-ylmethoxy)phenyl]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1CC1CO1 CRSDMXKCMBHKCS-UHFFFAOYSA-N 0.000 description 1
- LJBWJFWNFUKAGS-UHFFFAOYSA-N 2-[bis(2-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC=C1C(C=1C(=CC=CC=1)O)C1=CC=CC=C1O LJBWJFWNFUKAGS-UHFFFAOYSA-N 0.000 description 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 1
- OTMMWFBAUBABTM-UHFFFAOYSA-N 2-benzyl-1-(3,4-dimethoxyphenyl)-2-(dimethylamino)butan-1-one Chemical compound C=1C=C(OC)C(OC)=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 OTMMWFBAUBABTM-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- JMWGZSWSTCGVLX-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CCC(CO)(CO)CO JMWGZSWSTCGVLX-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- BIWBFFZTZOHCRG-UHFFFAOYSA-N 4-(2-nitrophenyl)-1,2-dihydropyridine Chemical compound [O-][N+](=O)C1=CC=CC=C1C1=CCNC=C1 BIWBFFZTZOHCRG-UHFFFAOYSA-N 0.000 description 1
- DGUJJOYLOCXENZ-UHFFFAOYSA-N 4-[2-[4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenol Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 DGUJJOYLOCXENZ-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- BMVWCPGVLSILMU-UHFFFAOYSA-N 5,6-dihydrodibenzo[2,1-b:2',1'-f][7]annulen-11-one Chemical compound C1CC2=CC=CC=C2C(=O)C2=CC=CC=C21 BMVWCPGVLSILMU-UHFFFAOYSA-N 0.000 description 1
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- MKEWYGIHZQYQAH-UHFFFAOYSA-N C1=CC(NCC)(NCC)CC=C1C(=O)C1=CC=CC=C1 Chemical compound C1=CC(NCC)(NCC)CC=C1C(=O)C1=CC=CC=C1 MKEWYGIHZQYQAH-UHFFFAOYSA-N 0.000 description 1
- 229920003344 Epilox® Polymers 0.000 description 1
- ZMDDERVSCYEKPQ-UHFFFAOYSA-N Ethyl (mesitylcarbonyl)phenylphosphinate Chemical compound C=1C=CC=CC=1P(=O)(OCC)C(=O)C1=C(C)C=C(C)C=C1C ZMDDERVSCYEKPQ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical class ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 1
- VEBCLRKUSAGCDF-UHFFFAOYSA-N ac1mi23b Chemical compound C1C2C3C(COC(=O)C=C)CCC3C1C(COC(=O)C=C)C2 VEBCLRKUSAGCDF-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 125000002009 alkene group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000002355 alkine group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910001038 basic metal oxide Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- ZNAAXKXXDQLJIX-UHFFFAOYSA-N bis(2-cyclohexyl-3-hydroxyphenyl)methanone Chemical compound C1CCCCC1C=1C(O)=CC=CC=1C(=O)C1=CC=CC(O)=C1C1CCCCC1 ZNAAXKXXDQLJIX-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- BQQUFAMSJAKLNB-UHFFFAOYSA-N dicyclopentadiene diepoxide Chemical compound C12C(C3OC33)CC3C2CC2C1O2 BQQUFAMSJAKLNB-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- VLXBWPOEOIIREY-UHFFFAOYSA-N dimethyl diselenide Natural products C[Se][Se]C VLXBWPOEOIIREY-UHFFFAOYSA-N 0.000 description 1
- WQOXQRCZOLPYPM-UHFFFAOYSA-N dimethyl disulfide Chemical compound CSSC WQOXQRCZOLPYPM-UHFFFAOYSA-N 0.000 description 1
- KHAYCTOSKLIHEP-UHFFFAOYSA-N docosyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCCCCCOC(=O)C=C KHAYCTOSKLIHEP-UHFFFAOYSA-N 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000001046 glycoluril group Chemical group [H]C12N(*)C(=O)N(*)C1([H])N(*)C(=O)N2* 0.000 description 1
- OXHDYFKENBXUEM-UHFFFAOYSA-N glyphosine Chemical compound OC(=O)CN(CP(O)(O)=O)CP(O)(O)=O OXHDYFKENBXUEM-UHFFFAOYSA-N 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000006025 oxidative dimerization reaction Methods 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical class NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000962 poly(amidoamine) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035935 pregnancy Effects 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical class S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003555 thioacetals Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- XOALFFJGWSCQEO-UHFFFAOYSA-N tridecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C=C XOALFFJGWSCQEO-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/66—Mercaptans
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
Definitions
- the present invention relates to a one-component material based on epoxy resins and thiols which is liquid at room temperature and which can be fixed by radiation and cured by the action of moisture.
- the invention also relates to a method for joining, coating or potting substrates using the one-component compound.
- Epoxy compositions with thiol-based hardeners are disclosed, for example, in US Pat. No. 6,153,719 A and are distinguished by high reactivity and a short processing time at room temperature. For this reason, the compositions described are preferably provided as two-component systems in which the epoxy component is packaged and stored separately from the reactive hardener component.
- compositions based on epoxy compounds with hardeners based on thiols which have a limited storage stability and a short processing time at room temperature. It is known from US Pat. No. 5,430,112 that the stability of thiol-containing epoxy compositions at room temperature can be improved by adding a latent accelerator for epoxy curing which is obtained by reacting a primary or secondary amine with an isocyanate-containing compound to form a urea derivative. In addition, the use of solid amine compounds, which are sparingly soluble in the epoxy matrix at room temperature, as accelerators is described. The known epoxy compounds can only be activated thermally. US Pat. No. 6,232,426 B1 and US Pat. No.
- 7,479,534 B2 disclose thiol-containing epoxy compositions which contain a sparingly soluble nitrogen compound as a latent accelerator and additionally a Lewis acidic compound from the group of titanates and / or borates as a stabilizer to improve storage stability.
- Epoxy compositions suitable for electronic and optical applications should not only have a low curing temperature. Rather, the hardened masses should also have a high level of stability with respect to the effects of temperature and moisture.
- WO 2015/060439 A1 describes the use of a special ester-free thiol as a hardener for an epoxy resin in order to increase the moisture resistance of the hardened mass.
- An epoxy resin composition with an ester-free thiol based on a glycoluril structure is known from WO 2016/143815 A1.
- US 2007/0096056 A1 discloses a one-component material which, in addition to an epoxy resin, a latent curing accelerator and an at least difunctional thiol, additionally comprises a radiation-curable compound based on a (meth) acrylate and a photoinitiator.
- a radiation-curable compound based on a (meth) acrylate and a photoinitiator Through the combination of two hardening mechanisms, the masses should harden safely even in shadow areas.
- the proportion of the difunctional thiol is limited to a maximum of 5% by weight in order to achieve a sufficient processing time at room temperature. Higher proportions of the thiol are undesirable because they have a negative impact on the stability of the compositions.
- the limitation of the thiol content restricts the freedom of formulation. Moisture-induced hardening of the masses is not described.
- US Pat. No. 5,837,785 A1 describes a moisture-curable epoxy composition with high storage stability.
- the hardener used in the mass is selected from the group of nitrogen-heterocyclic reaction products of ketones with hydroxyamines and epoxides.
- the hardening of the epoxy compound takes place through the release of amines after exposure to moisture.
- the use of thiols and an option for light fixation are not described.
- No. 6,803,445 A1 describes moisture-curable polyurethane and / or epoxy compositions.
- the moisture-latent hardener is selected from the group of oxazolidines, ketimines, enamines and silyl mercaptans. Upon contact with moisture, these release primary or secondary amino or thiol groups. A dual-curing formulation or the use of hardeners with free thiol groups is not described.
- oxazolidines in particular polyoxazolidines, as latent hardeners for polyisocyanates, polyepoxides or polyacrylates has been known for a long time and is described, inter alia, in US Pat. No. 5,219,979 A1, US Pat. No. 3,743,626 A1 or EP 0228 935 A1.
- the invention is based on the object of avoiding the disadvantages of the compositions known from the prior art and of providing one-component, storage-stable compositions which can be fixed by irradiation and hardened by the action of moisture.
- the masses should have a high strength after moisture curing and should be completely curable within 14 days, preferably within 7 days.
- composition according to the invention are specified in the subclaims, which can optionally be combined with one another.
- the invention also relates to a method for joining, coating or potting substrates using the composition according to the invention.
- the mass applied to a substrate can be converted into a dimensionally stable state and optionally processed in subsequent process steps at a separate time.
- the irradiated mass can then be hardened by the ingress of moisture.
- the invention also relates to the use of the composition according to the invention as an adhesive or sealant for gluing, potting, sealing or coating substrates, in particular optical and / or electronic components.
- the one-component composition according to the invention is liquid at room temperature and can be fixed by radiation and hardened by moisture.
- the composition comprises at least the following components: (A) an at least difunctional epoxy-containing compound; (B) an at least difunctional thiol; (C) a radiation curable compound; (D) a photoinitiator and (E) a moisture-latent organic accelerator which generates a basic compound when exposed to moisture.
- the one-component composition according to the invention has sufficient processability at room temperature of preferably at least 24 hours, particularly preferably at least 72 hours, and can be converted into a dimensionally stable state by exposure to actinic radiation.
- One-component or “one-component compound” means in the context of the invention that the named components of the compound are present together in a common formulation, that is, are not stored separately from one another.
- Liquid in the sense of the invention means that at 23 ° C the loss modulus G ”determined by viscosity measurement is greater than the storage modulus G‘ of the mass in question.
- the masses are considered to be “storage-stable” and / or “processable” if the viscosity of the respective mass increases by less than 100% during storage at room temperature over a period of at least 24 hours, preferably at least 72 hours.
- At least difunctional means that two or more units of the functional group mentioned are contained per molecule.
- the at least difunctional epoxy compound (A) is not restricted in its chemical structure and includes aromatic or aliphatic compounds with at least two epoxy groups in the molecule, such as, for example, aliphatic and cycloaliphatic epoxides, glycidyl ethers, glycidylamines and mixtures thereof.
- Di- or higher-functional cycloaliphatic epoxy compounds are known in the prior art and include compounds which carry both a cycloaliphatic group and at least two oxirane rings.
- Exemplary representatives are 3-cyclohexenylmethyl-3-cyclohexylcarboxylate diepoxide, 3,4-epoxycyclohexylalkyl-3 ', 4'-epoxy-cyclohexane carboxylate, 3,4-epoxy-6-methylcyclohexylmethyl-3', 4'-epoxy-6-methyl-cyclohexane carboxylate , Vinylcyclohexene dioxide, bis (3,4-
- Epoxycyclohexylmethyl) adipate dicyclopentadiene dioxide, 1,2-epoxy-6- (2,3-epoxypropoxy) hexahydro-4,7-methanindane.
- Aromatic epoxy compounds can also be used in the compositions of the invention.
- aromatic epoxy compounds are bisphenol A epoxy resins, bisphenol F epoxy resins, phenol novolak epoxy resins, cresol novolak epoxy resins, biphenyl epoxy resins, 4,4‘-biphenyl epoxy resins, divinylbenzene dioxide, 2-glycidylphenyl glycidyl ether,
- all fully or partially hydrogenated analogs of aromatic epoxy compounds can also be used.
- Low-halogen or halogen-free bisphenol A and bisphenol F epoxy resins are preferred.
- Isocyanurates substituted with epoxy-containing groups and other heterocyclic compounds can also be used as component (A) in the compositions according to the invention.
- Triglycidyl isocyanurate and monoallyl diglycidyl isocyanurate may be mentioned by way of example.
- Suitable epoxy-containing compounds (A) are available under the trade names CELLOXIDE TM 2021 P, CELLOXIDE TM 8000 from Daicel Corporation, Japan, or EPIKOTE TM RESIN 828 LVEL, EPIKOTE TM RESIN 166, EPIKOTE TM RESIN 169 from Momentive Specialty Chemicals BV, The Netherlands, or Epilox TM resins of the product series A, T and AF from Leuna Harze, Germany, or EPICLON TM 840, 840-S, 850, 850-S, EXA850CRP, 850-LC from DIC KK, Japan, are commercially available .
- Component (A) is present in the composition according to the invention in a proportion of 5 to 70% by weight, based on the total weight of components (A) to (E).
- the at least difunctional thiol (B) serves as a hardener in the composition according to the invention and comprises compounds with at least two thiol groups (-SH) in the molecule.
- component (B) is not restricted further and preferably comprises aromatic and aliphatic thiols and combinations thereof.
- the at least difunctional thiol is preferably selected from the group consisting of ester-based thiols, polyethers with reactive thiol groups, polythioethers, polythioether acetals, polythioether thioacetals, polysulfides, thiol-terminated urethanes, thiol derivatives of isocyanurates and glycoluril and combinations thereof.
- ester-based thiols based on 2-mercaptoacetic acid include trimethylolpropane-trimercaptoacetate,
- Pentaerythritol tetramercaptoacetate and glycol dimercaptoacetate which are available from Bruno Bock under the brand names Thiocure TM TMPMA, PETMA and GDMA.
- ester-based thiols include trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutylate), glycol di (3-mercaptopropionate) and tris [2- (3-mercaptopropionyloxy) ethyl] isocyanurate available under the brand names Thiocure TM TMPMP, PETMP, GDMP and TEMPIC from Bruno Bock.
- thioethers examples include DMDO (1,8-dimercapto-3,6-dioxaoctane) available from Arkema SA, DMDS (dimercaptodiethyl sulfide) and DMPT (2,3-di ((2-mercaptoethyl) thio) -1 propanethiol), both available from Bruno Bock.
- ester-free thiols are particularly preferred with regard to increased resistance of the cured masses to temperature and moisture.
- Examples of ester-free thiols can be found in JP 2012 153 794 A, which is incorporated into the description by reference.
- TMPI tris (3-mercaptopropyl) isocyanurate
- the at least difunctional thiol of component (B) therefore comprises tris (3-mercaptopropyl) isocyanurate, alone or in a mixture with other at least difunctional thiols.
- Ester-free thiols based on a glycoluril compound are known from EP 3 075 736 A1. These can also be used as component (B) in the compositions according to the invention, alone or in a mixture with other at least difunctional thiols.
- Thiols of higher functionality which are obtainable, for example, by oxidative dimerization processes of at least difunctional thiols, can also be used in component (B).
- the at least difunctional thiol is preferably present in the composition according to the invention in a proportion of 10 to 80, preferably 15 to 70% by weight, based on the total weight of components (A) to (E).
- the radiation-curing compounds used in the compositions according to the invention are those with groups which can be polymerized by free radicals.
- the free-radically polymerizable groups are alkene or alkyne groups, preferably terminal alkene groups and particularly preferably (meth) acrylate groups.
- Their chemical structure is not restricted any further. For example, both aliphatic and aromatic (meth) acrylates can be used.
- the radiation-curing compound is preferably at least difunctional.
- the following radiation-curing compounds are suitable: isobornyl acrylate, stearyl acrylate, tetrahydrofurfuryl acrylate, cyclohexyl acrylate,
- Tricyclodecane dimethanol diacrylate dipropylene glycol diacrylate
- TMPTA trimethylolpropane triacrylate
- DPHA dipentaerythritol hexaacrylate
- Highly functional acrylates derived from multiply branched or dendrimeric alcohols can also be used advantageously.
- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, commercially available as TAICROS ®.
- unhydrogenated polybutadienes with free double bonds such as the Poly BD ® grades can be used as a radiation curing compound (C) become.
- the use of vinyl ethers is also possible, as is the use of unsaturated polyester resins.
- Urethane acrylates based on polyesters, polyethers, polycarbonate diols and / or fully or partially hydrogenated, (meth) acrylate-functionalized polybutadiene diols can also be used as component (C) as the higher molecular weight radiation-curing compound.
- Examples of commercially available radiation curing compounds are CN9001, CN9002, CN925, CN981, CN9165A and CN9163 available from Sartomer, as well as SHIKOH UV-3700B, UV-3200B, UV-3300B, UV-3310B, UV-7600B, UV-7630B, UV -7510B available from Nippon Gohsei.
- hybrid compounds can also be used as component (C).
- these also contain an addition-crosslinking group.
- epoxy (meth) acrylate hybrid compounds are within the meaning of the invention.
- a combination of several radiation-curing compounds is also within the meaning of the invention.
- the radiation-curing compound can comprise a mixture of a monofunctional radiation-curing compound and an at least difunctional radiation-curing compound.
- the monofunctional radiation-curing compound can be present in a proportion of 0 to 10% by weight, based on the total weight of components (A) to (E).
- the radiation-curing compound is preferably present in the one-component composition according to the invention in a proportion of 1 to 70% by weight, particularly preferably in a proportion of 10 to 50% by weight.
- compositions according to the invention preferably contain at least 15% by weight of an at least difunctional, radiation-curing compound as component (C), based on the total weight of components (A) to (E).
- the at least difunctional radiation-curing compound is preferably present in the composition according to the invention in a proportion of 5 to 50, preferably 15 to 40% by weight.
- compositions also contain at least one photoinitiator (D) for free-radical polymerization.
- photoinitiators such as a-hydroxyketone, benzophenone, a, a'-diethoxyacetophenone, 4,4-diethylaminobenzophenone, 2,2-dimethoxy-2-phenyl-acetophenone, 4-isopropylphenyl- 2-hydroxy-2-propyl ketone, 1-
- the IRGACURE TM types from BASF SE can be used as UV photoinitiators, for example the types IRGACURE 184, IRGACURE 500, IRGACURE 1179, IRGACURE 2959, IRGACURE 745, IRGACURE 651, IRGACURE 369, IRGACURE 907, IRGACURE 1300, IRGACURE 819 , IRGACURE 819DW, IRGACURE 2022, IRGACURE 2100, IRGACURE 784, IRGACURE 250, IRGACURE TPO, IRGACURE TPO-L.
- the DAROCUR TM types from BASF SE can also be used, for example the types DAROCUR MBF, DAROCUR 1173, DAROCUR TPO and DAROCUR 4265.
- the photoinitiator used as component (D) in the compositions according to the invention can preferably be activated by actinic radiation with a wavelength of 200 to 600 nm, particularly preferably from 320 to 480 nm. If necessary, the photoinitiator can be combined with a suitable sensitizer.
- the photoinitiator (D) is preferably present in the compositions according to the invention in a proportion of 0.01 to 5% by weight, based on the total weight of components (A) to (E).
- compositions according to the invention contain a moisture-latent organic accelerator as an essential feature. This is not structurally restricted and is characterized in that the accelerator generates at least one basic compound under the action of moisture by hydrolysis. These are preferably nitrogen-containing compounds.
- Base here means a compound with a pH value greater than 7, preferably a pH value of 8 or more.
- the moisture-latent accelerator (E) preferably has a molar mass of greater than 200 g / mol, particularly preferably greater than 300 g / mol.
- Compounds selected from the group of the oxazolidines, ketimines, aldimines and enamines are particularly preferably used as moisture-latent accelerators.
- Oxazolidine compounds according to formula 1 are very particularly preferably used as moisture-latent accelerators.
- R 1 and R 2 are independently a monovalent organic radical, preferably an aliphatic, cycloaliphatic or aromatic radical with 1 to 500 carbon atoms, which can optionally be interrupted by heteroatoms and / or carry heteroatom-containing substituents, for example substituents with one or more epoxy groups, (meth) acrylate groups and / or further oxazolidine groups.
- the oxazolidine functionality of the accelerator is preferably difunctional or higher, that is to say the accelerator is an oxazolidine compound which has two or more oxazolidine groups.
- the preparation of oxazolidines can be found in US 4002601 A, US 4 002 637 or DE 3 019 356 A1, for example.
- the moisture-latent accelerator acts in the masses in such a way that hydrolysis takes place when moisture penetrates, during which a nitrogen-containing compound and, optionally, other cleavage products are released.
- the oxazolidine of formula 1 breaks down under the action of moisture into a carbonyl compound and an amino alcohol.
- the released amino alcohol can subsequently deprotonate the at least difunctional thiol (B) and thus cause a hardening reaction in the mass.
- the moisture-latent accelerator (E) is preferably present in the compositions according to the invention in a proportion of 1 to 25% by weight, based on the total weight of components (A) to (E), and particularly preferably in a proportion of 4 to 20% .
- compositions according to the invention can contain further additives (F).
- Preferred additives (F) are toughness modifiers such as core-shell particles or block copolymers, dyes, pigments, fluorescent agents, thixotropic agents, thickeners, stabilizers, antioxidants, plasticizers, tackifiers, fillers, flame retardants, drying agents, corrosion inhibitors, inert and reactive diluents, including of monofunctional epoxies, leveling and wetting additives, adhesion promoters and other accelerators, as well as combinations thereof.
- a heat-latent accelerator can be used as a further accelerator (F2), which is preferably in solid form dispersed in the composition at room temperature and melts when heated.
- heat-latent, liquid accelerators can also be used, in particular liquid accelerators with blocked amine groups, which are converted into the free amine compound when heated.
- the further accelerator is preferably a nitrogen-containing compound, particularly preferably one from the group of amines, ureas, imidazoles, Triazine derivatives, polyamidoamines and / or guanidines selected compound.
- the melting point of the nitrogen-containing compound is preferably equal to or greater than 60.degree.
- adducts and / or reaction products of epoxides or isocyanates with the nitrogen compounds mentioned can be used as accelerators, in particular reaction products with amines, as already described in US Pat. No. 5,430,112.
- Examples of commercially available accelerators are Ajicure PN-H, Ajicure MY-24, Ajicure MY-25, Ajicure PN-23 (available from Ajinomoto Co., Inc., Tokyo, Japan); Fujicure FXR1081, FXR1020, FXR1030 (available from Sanho Chemical Co. Ltd); Aradur 9506 (available from Huntsman International LLC.) And Curezol (available from Shikoku Chemicals Corporation).
- the accelerators can also be present in encapsulated form.
- Examples of commercially available products are Technicure ® LC-80 and Technicure ® LC-100 called the company ACCI Specialty Materials.
- photolatent bases as a further accelerator (F3) is also possible.
- substance classes are 4- (ortho-nitrophenyl) -dihydropyridine, quaternary organoboron compounds, alpha-amino-acetophenones or amines blocked with photolatent groups. These can release basic compounds through actinic radiation and thus also act as accelerators.
- inorganic basic accelerators can also be used to accelerate the hardening process. These are preferably in solid form in the masses.
- basic metal oxides such as calcium oxide, magnesium oxide and strontium oxide can be used as inorganic accelerators.
- a formulation of the one-component compositions according to the invention preferably comprises the following components, each based on the total weight of components (A) to (E): (A) 5-70% by weight of an at least difunctional epoxy-containing compound;
- the formulation consists of the components (A) to (E) mentioned and optionally (F).
- compositions according to the invention can be stored at room temperature and, as long as there is no ingress of moisture, can be processed without restriction over a period of up to 3 days, particularly preferably up to 7 days and very particularly preferably up to 14 days.
- compositions according to the invention can be fixed by exposure to actinic radiation.
- fixation denotes the build-up of a strength from which the mass can no longer flow at room temperature, or a degree of strength from which joined parts can be handled in subsequent processes without destroying the adhesive bond comes.
- compositions according to the invention are suitable, despite slow moisture curing, for fast industrial processes with short cycle times, in which at the same time the lowest possible thermal load on the components involved is required.
- the invention therefore also relates to the use of the compositions according to the invention as an adhesive or sealant for gluing, potting, sealing or coating substrates.
- Optical and / or electronic components are preferably used as substrates.
- compositions applied to the components and fixed by exposure to actinic radiation are preferably cured by the action of moisture at room temperature.
- the hardening reaction can be accelerated either by heating or by increased humidity.
- compositions according to the invention are not necessarily have to be heated to a temperature of over 40 ° C., preferably not over 30 ° C., after light fixation for complete curing.
- compositions according to the invention offer the further advantage that, in joining processes, the components can be fixed in their position relative to one another by exposure to actinic radiation.
- a corresponding method for gluing, casting or coating substrates using the compositions according to the invention preferably comprises the following steps: a) metering the composition onto a first substrate; b) fixing the mass by exposure to actinic radiation; and c) optionally supplying a second substrate before or after step b), with the formation of a substrate composite, the second substrate being brought into contact with the mass; d) Allowing moisture to act on the fixed mass until the final strength is built up
- the masses reach their final strength within 14 days, preferably within 7 days.
- the length of time until complete curing is determined by the layer thickness to be cured and the access options for moisture, which is determined, for example, by the geometry of the components to be joined and their moisture permeability.
- the masses which have been light-fixed by irradiation have sufficient strength if a shear strength of at least 4 N die-shear strength is achieved immediately after exposure, for example after exposure to 200 mW / cm 2 for 10 seconds.
- the shear strength of the light-fixed material is preferably at least 8 N.
- compositions according to the invention also have short light fixing times and can be fixed in layer thicknesses of 100 ⁇ m at radiation intensities of 200 mW / mm 2 in a maximum of 15 s, preferably in a maximum of 10 s, particularly preferably in a maximum of 5 s with the required shear strength. With the compositions according to the invention, light fixation times of down to 0.5 s can be achieved.
- composition according to the invention is preferably brought into contact with a second substrate before the light fixation and joined to form the substrate composite.
- the compositions according to the invention are, however, also distinguished by the fact that the composition applied to a substrate can be converted into a so-called B-stage state by irradiation. In this state, the mass has sufficient shape and contour stability and can therefore be processed in downstream processes without flowing. In particular, the mass can be processed in a pressure-sensitively adhesive B-stage state by joining to the second substrate to form a substrate composite. Measurement methods and definitions used
- compositions according to the invention were irradiated with LED lamps of the DELOLUX series from DELO Industrie Klebstoffe GmbH & Co. KGaA with a wavelength of 400 nm at an intensity of 200 ⁇ 20 mW / cm 2 .
- Crosslinking or “curing” are defined as a polymerization or addition reaction beyond the gel point.
- the gel point is the point at which the storage modulus G ‘becomes equal to the loss modulus G ′′.
- three drops of the mass were applied to each slide. The slide was then stored at 23 ° C and 50% r.h. stored. A plastic spatula was used to check at periodic intervals when the drop was no longer liquid.
- Room temperature is defined as 23 ⁇ 2 ° C.
- the viscosity was measured with a Physica MCR302 rheometer from Anton Paar with a standardized PP20 measuring cone at 23 ° C. with a 200 ⁇ m gap and determined at a shear rate of 10 / second. To assess the storage stability at room temperature, the viscosity measurement was repeated periodically.
- the Shear Strength After Light Fixation The light fixation strength was determined using the Dage Series 4000 bond tester, available from Nordson. For this purpose, a 4 x 4 x 4 mm glass cube was glued to a 20 x 20 x 5 mm FR4 test specimen (layer thickness 100 ⁇ m), and the gluing was carried out for 10.0 seconds with radiation at a wavelength of 400 nm and an intensity of 200 ⁇ 20 mW / cm 2 exposed. Subsequently, after 1 hour of storage in the dark at room temperature, the shear strength was determined with the aid of the bond tester.
- the strength after light fixation and moisture curing was determined analogously by a DieShear test, with a waiting time of 14 days before the measurement due to storage at room temperature and a relative humidity of 50% r.h. was adhered to.
- test specimens dimension 20 mm * 20 mm * 5 mm
- a bead from the mass was applied to the first test specimen and spread thinly.
- a second test specimen was then joined.
- the adhesive layer thickness of 0.1 mm and the overlap were set using spacer wires and an adhesive device.
- the joined samples were dark at 23 ° C and 50% r.h. before the test. stored for 14 days.
- Strengths of less than six MPa are insufficient (-)
- strengths of six to eight MPa are unsatisfactory (-)
- strengths of 8 to 10 MPa are sufficient (o)
- strengths of 10 MPa to 12 MPa are good (+) and strengths above 12 MPa are very good (++)
- the production of the hardenable compositions used in the following examples is preferably carried out at a relative humidity of less than 20% less than 10%.
- the production can take place in a glove box in which there is a dry (inert) atmosphere.
- the liquid components are mixed and then the fillers and optionally other solids are incorporated using a laboratory stirrer, laboratory dissolver or a speed mixer (Hauschild) until a homogeneous mass is created.
- Compositions which contain photoinitiators and which are sensitive to visible light must accordingly be produced under light outside the excitation wavelength of the photoinitiators or sensitizers.
- Component (A) At least difunctional epoxy-containing compound
- Component (C) Radiation-non-curable compound
- Irgacure TPO-L ethyl (2,4,6-trimethylbenzoyl) phenylphosphinate, available from IGM Resins
- Incozol EH (urethane bridged bisoxazolidine, available from Incorez)
- Incozol LV (carbonate-bridged bisoxazolidine, available from Incorez)
- Component (F) Additives F1-1: Pyrogallol, available from Sigma Aldrich.
- compositions according to the invention of Examples 1-5 all cure within 7 days due to moisture.
- Comparative example 1 which does not contain any moisture-latent accelerator (E), remains liquid even after 14 days in the presence of moisture.
- the compositions according to the invention remain liquid for at least 7 days when the ingress of moisture is prevented.
- examples 1 to 5 show on the basis of the change in viscosity that these remain processable even over a period of up to 14 days at room temperature in the absence of moisture.
- the compositions according to the invention of Examples 1 to 5 can be fixed with light. These materials then build up high strengths even in unexposed areas after moisture curing.
Abstract
Description
Claims
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DE102019133694.5A DE102019133694A1 (en) | 2019-12-10 | 2019-12-10 | Light-fixable and moisture-curing compounds based on epoxy resins and thiols |
PCT/EP2020/084296 WO2021115881A1 (en) | 2019-12-10 | 2020-12-02 | Light-fixation and moisture-cured masses based on epoxy resins and thiols |
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JP4652235B2 (en) | 2003-11-26 | 2011-03-16 | 三井化学株式会社 | One-component curable resin composition for combined use of light and heat and use thereof |
KR101005532B1 (en) | 2004-01-22 | 2011-01-04 | 아지노모토 가부시키가이샤 | One-component epoxy resin composition |
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KR102217397B1 (en) | 2013-10-25 | 2021-02-22 | 아지노모토 가부시키가이샤 | Flexible epoxy resin composition |
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JP2017501265A (en) * | 2013-12-18 | 2017-01-12 | ダウ グローバル テクノロジーズ エルエルシー | Curable composition |
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DE102017126215A1 (en) * | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | A process for producing opaque coatings, bonds and potting and curable composition for use in the process |
DE102017129780A1 (en) * | 2017-12-13 | 2019-06-13 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Light-fixable and thermosetting compounds based on epoxy resins and thiols |
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