EP3800062A1 - Security element comprising an optical effect layer formed as a thin film element - Google Patents

Abstract

The invention relates to a security element (1) with increased protection against forgery, which has at least a first area (2) with structures (4). The structures (4) reflect an image motif (5) in different spatial areas, so that a movement image is created for the viewer when a light source (6) moves accordingly and / or when an angle of observation is changed. When the light source (6) moves and / or the viewing angle changes, the image motif (5) moves at the same time. Furthermore, an optical effect layer (7) is provided which defines a second area (3). The optical effect layer (7) is designed as a thin-film element, the structures (4) being completely or partially covered by the optical effect layer (7).

Description

The invention relates to a security element, in particular for securities, security paper or security objects such as bank notes, ID cards, credit cards, ATM cards, tickets.

Security elements of the type mentioned above are usually used to increase the security against forgery of securities or security papers, such as bank notes, ID cards, credit cards, ATM cards, tickets, etc.

The object of the present invention is to create a security element with increased security against forgery.

• dass eine optische Effektschicht vorgesehen ist, welche optische Effektschicht zumindest einen zweiten Bereich definiert,
• dass die optische Effektschicht als Dünnschichtelement ausgebildet ist, und
• dass die Strukturen vollflächig oder partiell von der optischen Effektschicht abgedeckt sind.

This object is achieved by a security element of the type mentioned according to the invention in that the security element has at least a first area with structures, and the structures reflect an image motif into different spatial areas, so that for the viewer when a light source is moved accordingly and / or when one changes Observation angle creates a movement image, with movement of the light source and / or change in the observation angle at the same time a movement of the image motif occurs, and is further provided

• that an optical effect layer is provided, which optical effect layer defines at least a second area,
• that the optical effect layer is designed as a thin-film element, and
• that the structures are completely or partially covered by the optical effect layer.

The advantage achieved in this way is that such an overlapping position of the first area to form the image motif designed as a moving image and of the second area to form at least one optical appearance or one optical effect creates a great variety of combinations and designs. This increases the security against forgery of the security element designed in this way even further. In this way, the movement image formed by the structures is combined directly with the optical effect generated or caused by the optical effect layer to form an overall image. One viewer of the security element can thus quickly and reliably determine its authenticity through a purely visual inspection without the aid of aids.

Furthermore, it can be advantageous if the optical effect layer embodied as a thin-layer element comprises at least one absorber layer and at least one spacer layer.

Another possible embodiment has the features that the at least one spacer layer is applied to the structures, in particular printed and / or vapor-deposited. At this point it should be pointed out that the term a layer is applied to something is to be understood in such a way that the layer can be applied directly, or that there is one or more between the applied layer and that to which the layer is applied Interlayers can be located.

In addition, the absorber layer can be applied to the structures, in particular printed and / or vapor-deposited.

According to an advantageous development of the invention, the spacer layer and the absorber layer can be applied to the structures in the sequence absorber layer - spacer layer or spacer layer-absorber layer.

Another embodiment provides that at least one absorber layer is arranged on both sides of the at least one spacer layer and that the at least one absorber layer is applied to the structures, in particular printed and / or vapor-deposited. Another embodiment is characterized in that the optical effect layer designed as a thin-film element further comprises at least one reflective layer, the at least one spacer layer being arranged between the at least one absorber layer and the at least one reflective layer.

Another preferred embodiment is characterized in that the reflective layer is applied to the structures, in particular printed and / or vapor-deposited.

Furthermore, it can be advantageous if the at least one absorber layer is applied to the structures, in particular printed and / or vapor-deposited.

Another embodiment provides that when the light source is moved and / or the viewing angle is changed in the optical effect layer designed as a color-shifting layer or in the color-shifting layer, a color shifting effect is created.

Another embodiment is characterized in that, in addition to the thin-film element, the security element contains metallic pigments and / or magnetic pigments and / or fluorescent pigments and / or fluorescent substances and / or colored pigments and / or dyes.

Another preferred embodiment is characterized in that this comprises a carrier layer made of a plastic, the plastic in particular being formed from a translucent and / or thermoplastic plastic, and that the carrier layer preferably includes at least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone ( PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinylcholride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride ( PVDF) and ethylene-tetrafluoroethylene-hexafluoropropylene-fluoroterpolymer (EFEP) and / or mixtures and / or copolymers of these materials or is made from at least one of these materials.

It can furthermore be advantageous if the carrier layer has a thickness with a thickness value which comes from a thickness value range whose lower limit is 5 μm, preferably 10 μm, and whose upper limit is 1000 μm, preferably 50 μm.

Another embodiment is characterized in that the at least one absorber layer has at least one metallic material, in particular selected from the group of Nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials comprises or is made from at least one of these materials.

Another embodiment is characterized in that the at least one spacer layer is formed from a dielectric material.

Another possible embodiment has the features that the at least one spacer layer has at least one low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group aluminum oxide (Al ₂ O ₃ ), metal fluorides, for example magnesium fluoride (MgF ₂ ), Aluminum fluoride (AlF ₃ ), silicon oxide (SIO _x ), silicon dioxide (SiO ₂ ), cerium fluoride (CeF ₃ ), sodium-aluminum fluoride (e.g. _{Na 3 AlF 6} or Na ₅ Al ₃ F ₁₄ ), neodymium fluoride (NdF ₃ ), Lanthanum fluoride (LaF ₃ ), samarium _{fluoride (SmF 3} ) barium fluoride (BaF ₂ ), calcium fluoride (CaF ₂ ), lithium fluoride (LiF), low-refractive organic monomers and / or low-refractive organic polymers or at least one high-refractive dielectric material with a refractive index greater than 1, 65, in particular selected from the group of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium tin oxide (ITO), tantalum pentoxide (Ta ₂ O ₅ ), Cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II, III) oxide (Fe ₃ O ₄ ) and iron (III) oxide (Fe ₂ O ₃ ), Hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO), neodymium oxide (Nd ₂ O ₃ ), praseodymium _{oxide (Pr 6} O ₁₁ ), samarium oxide (Sm ₂ O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide (SiC), silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ), tungsten trioxide (WO ₃ ) , high refractive index organic monomers and / or high refractive index organic polymers or is made from at least one of these materials.

Another embodiment provides that the at least one reflective layer has at least one metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin, or from nickel, titanium, vanadium, chromium, cobalt and palladium or alloys these materials, in particular cobalt-nickel alloys or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium tin oxide (ITO), tantalum pentoxide (Ta ₂ O ₅ ), cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II, III) oxide (Fe ₃ O ₄ ) and iron (III) oxide (Fe ₂ O ₃ ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO), neodymium oxide (Nd ₂ O ₃ ), praseodymium _{oxide (Pr 6} O ₁₁ ), samarium _{oxide (Sm 2} O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide ( SiC), silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ), tungsten trioxide (WO ₃ ), high refractive index organic monomers and / or high refractive index organic polymers or at least one made of these materials.

Another embodiment is characterized in that the structures are designed as diffractive structures, as micromirrors, as ray-optically effective facets or as achromatic, reflective structures.

Another preferred embodiment is characterized in that the structures are introduced into the carrier layer by means of a molding device, in particular by an embossing process, or that the structures are formed in a layer, in particular an embossing lacquer layer, applied directly or with the interposition of at least one intermediate layer on the carrier layer , are embossed in particular by means of an impression device.

Finally, it can be advantageous if the further layer with the structures formed therein has a layer thickness with a layer thickness value that originates from a layer thickness value range whose lower limit is 0.5 μm, in particular 0.8 μm, preferably 1 μm, and where upper limit is 300 μm, in particular 50 μm, preferably 10 μm.

According to a further development, it is possible for the security element to be equipped with further color-shifting layers, in particular layers with color-shifting pigments or liquid crystals, and / or machine-readable features, the machine-readable features in particular being magnetic codings, electrically conductive layers, electromagnetic waves absorbing and / or re-emitting substances.

Furthermore, it can be expedient if the security element has additional layers, which additional layers comprise in particular colored lacquers, protective lacquers, adhesives, primers and / or foils.

For a better understanding of the invention, it is explained in more detail with reference to the following figures.

Fig. 1

einen Schnitt durch ein mögliches Ausführungsbeispiel des erfindungsgemäßen Sicherheitselements;

Fig. 2

einen Schnitt durch ein anderes Ausführungsbeispiel des erfindungsgemäßen Sicherheitselements;

Fig. 3

einen ersten möglichen Schicht- und/oder Lagenaufbau des Sicherheitselements, in Ansicht und stilisierter Darstellung;

Fig. 4

einen zweiten möglichen Schicht- und/oder Lagenaufbau des Sicherheitselements, in Ansicht und stilisierter Darstellung;

Fig. 5

einen dritten möglichen Schicht- und/oder Lagenaufbau des Sicherheitselements, in Ansicht und stilisierter Darstellung;

Fig. 6

einen vierten möglichen Schicht- und/oder Lagenaufbau des Sicherheitselements, in Ansicht und stilisierter Darstellung;

Fig. 7

einen weiteren möglichen Schichtaufbau der optischen Effektschicht, in Ansicht und stilisierter Darstellung.

They each show in a greatly simplified, schematic representation:

Fig. 1

a section through a possible embodiment of the security element according to the invention;

Fig. 2

a section through another embodiment of the security element according to the invention;

Fig. 3

a first possible layer and / or layer structure of the security element, in view and stylized representation;

Fig. 4

a second possible layer and / or layer structure of the security element, in view and stylized representation;

Fig. 5

a third possible layer and / or layer structure of the security element, in view and stylized representation;

Fig. 6

a fourth possible layer and / or layer structure of the security element, in view and stylized representation;

Fig. 7

Another possible layer structure of the optical effect layer, in view and stylized representation.

By way of introduction, it should be noted that in the differently described embodiments, the same parts are provided with the same reference numerals or the same component designations, the disclosures contained in the entire description correspondingly referring to the same Parts with the same reference numerals or the same component names can be transferred. The position details chosen in the description, such as top, bottom, side, etc., also relate to the figure immediately described and shown and, if there is a change in position, are to be transferred accordingly to the new position.

The term “in particular” is understood below in such a way that it can be a possible more specific design or more detailed specification of an object or a method step, but does not necessarily have to represent a mandatory, preferred embodiment of the same or a mandatory procedure.

The figures are described comprehensively and the same parts or components are always given the same reference numerals. Furthermore, the term “layer” is generally used for a multi-layer, related component assembly. Each of the layers described below can thus also comprise several layers, preferably connected to one another or adhering to one another.

The Fig. 1 shows a security element 1, in particular for securities, banknotes, card applications or security papers, in a strongly stylized and not to scale representation.

The security element 1 has at least one first region 2 and at least one second region 3 covering this at least in regions. The at least one first area 2 is arranged below the second area 3 in the position or position of the security element 1 shown. The two areas 2, 3 or those layers or plies forming them are designed differently from one another and will be described in more detail below.

The at least one first region 2 comprises structures 4 or is formed by them. An image motif 5 is reflected from the structures 4 of the first area 2 into different spatial areas, so that a so-called movement image is created for the viewer when a light source 6 moves accordingly and / or when a viewing angle changes.

In this exemplary embodiment, the second region 3 which at least partially covers or overlays the first region 2 is formed by an optical effect layer 7. The optical effect layer 7 can also be designed as an optically variable layer or be referred to as this.

The optical effect layer 7 can have or form an optically variable effect that is dependent on the viewing angle and / or the illumination angle and / or the type of illumination. The optically variable effect can be, for example, a top / see-through effect and / or a color-changing effect and / or a fluorescence effect or the like.

It should be mentioned here that the structures 4 can be provided partially or over the entire area. This also applies to the optical effect layer 7, which can also be provided partially or over the entire surface. The optical effect layer 7 can also be formed from a plurality of layers or comprise them.

The security element 1 can also comprise a carrier layer 8. The carrier layer 8 can be formed from a plastic material. Furthermore, several layers can also form the carrier layer 8. The plastic can be formed from a translucent and / or thermoplastic plastic material. At least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) Polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA) , Polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinylcholride (PVC), ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF) and ethylene - Tetrafluoroethylene-hexafluoropropylene-fluoroterpolymer (EFEP) and / or mixtures and / or copolymers of these materials comprise or be produced from at least one of these materials.

The carrier layer 8 for its part can have a thickness with a thickness value which originates from a thickness value range whose lower limit is 5 μm, preferably 10 μm, and whose upper limit is 1000 μm, preferably 50 μm.

The structures 4 described above can be designed, for example, as diffractive structures, as micromirrors, as ray-optically effective facets or as achromatic, reflective structures. The formation of the structures 4 as diffractive structures is, for example, from EP2782765B1 and the EP2885135B1 as well as the WO2015107347A1 known. While an embodiment of the structures 4 as micromirrors, for example from the US10189294A1 as well as the EP3362827A1 is familiar to the person skilled in the art. A facet-like shape of the structures 4 is based, for example, on FIG EP2632739A1 emerged. Furthermore, the structures 4 can be or will be introduced into the carrier layer 8 by means of an impression device, in particular by means of an embossing process.

Another alternative possibility would be to provide a separate further layer 9 for forming the structures 4. The further layer 9 can be applied directly to the carrier layer 8. The further layer 9 is indicated with a dashed line. For example, the further layer 9 can be formed by an embossing lacquer, which is reshaped accordingly to form the structures 4. This can in turn take place by means of the molding device or a molding element in an embossing process. In this way, the structures 4 can in turn be shaped. The further layer 9 with the structures 4 formed therein can have a layer thickness with a layer thickness value which originates from a layer thickness value range whose lower limit is 0.5 μm, in particular 0.8 μm, preferably 1 μm, and whose upper limit is 300 μm , in particular 50 µm, preferably 20 µm.

In the Fig. 2 it is also shown that although the structures 4 are formed by the further layer 9, the further layer 9 is not applied directly to the carrier layer 8. For this purpose, an intermediate layer 10 can be provided, which is formed, for example, by an adhesion promoter, a primer, an adhesive or the like.

The structures 4 can be designed, for example, as diffractive structures, as micromirrors, as ray-optically effective facets or as achromatic, reflective structures. The The structures 4 can be formed or introduced directly into the carrier layer 8, for example, by means of a molding device, in particular by means of an embossing process.

If the further layer 9 described above is provided for forming the structures 4, these can be formed in the further layer 9 applied to the carrier layer 8. The further layer 9 can in particular be formed by an embossing lacquer layer. The structures 4 can in turn be molded in or out, for example by means of a molding device, in particular by means of an embossing process.

In the exemplary embodiments shown, the structures 4 form the at least one first area 2 of the security element 1, the at least one first area 2 being covered or overlaid at least in sections by the at least one second area 3. The at least one second region 3 is formed by the optical effect layer 7, which in all exemplary embodiments is designed as a so-called thin-film element, which has a thin-layer structure or can itself be referred to as a thin-layer structure. The layer thickness of the individual layers or plies forming the thin-film element is greatly exaggerated and shown not to scale. The structures 4 can thus be covered over the entire area or partially by the optical effect layer 7.

The optical effect layer 7 embodied as a thin-layer element comprises at least one absorber layer 11 and at least one spacer layer 12. Further possible additional layers or plies of the optical effect layer 7 are described in the following figures.

The at least one absorber layer 11 can comprise or comprise at least one metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials be made of at least one of these materials.

The at least one spacer layer 12 can be formed from a dielectric material, for example. Furthermore, the at least one spacer layer 12 can have at least one low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group aluminum oxide (Al ₂ O ₃ ), metal fluorides, for example magnesium fluoride (MgF ₂ ), aluminum fluoride (AlF ₃ ), silicon oxide (SIO _x ), silicon dioxide (SiO ₂ ), cerium fluoride (CeF ₃ ), sodium-aluminum fluoride (e.g. _{Na 3 AlF 6} or Na ₅ Al ₃ F ₁₄ ), neodymium fluoride (NdF ₃ ), lanthanum fluoride (LaF ₃ ), samarium _{fluoride (SmF 3} ) barium fluoride (BaF ₂ ), calcium fluoride (CaF ₂ ), lithium fluoride (LiF), low-refractive organic monomers and / or low-refractive organic polymers or at least one high-refractive dielectric material with a Refractive index greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium tin oxide (ITO), Tantalum pentoxide (Ta ₂ O ₅ ), cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II, III) oxide (Fe ₃ O ₄ ) and iron ( III) oxide (Fe ₂ O ₃ ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO), neodymium oxide (Nd ₂ O ₃ ), praseodymium oxide (Pr ₆ O _{1 1} ), samarium _{oxide (Sm 2} O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide (SiC), silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ) , Tungsten trioxide (WO ₃ ), high refractive index organic monomers and / or high refractive index organic polymers or be made from at least one of these materials.

The optical effect layer 7 embodied as a thin-layer element is always arranged or applied to the structures 4. It is possible to apply the entire thin-film element as an optical effect layer 7 to the structures 4. However, it would also be possible to apply only individual layers or plies of the optical effect layer 7 one after the other or also in groups. The application of the optical effect layer 7 or individual plies or layers of the same can take place in a wide variety of ways, depending on the material selected. Printing and / or vapor deposition and / or painting are cited as possible examples.

It would also be additionally possible to provide a separate intermediate layer 10, such as an adhesion promoter layer or adhesion promoter layer, a primer layer or primer layer or the like, between the structures 4 forming the first area 2 and the optical effect layer 7 with its second area 3. The optical effect layer 7 can thus be arranged or applied to the structures 4 either directly and / or with the interposition of its own additional intermediate layer 10.

In addition to the optical effect layer 7 embodied as a thin-layer element, further layers can be provided, for example an optically non-linear layer an optically non-linear position. Such a layer or such materials or layers forming this layer are also referred to as an IR upconverter or UV downconverter. These can be materials which, under the influence of electromagnetic radiation outside the visible wavelength range of light, have a visible color. Such materials can be excited to emit visible light under these conditions, for example when irradiated with infrared (IR) (λ> 780 nm) and / or ultraviolet (UV) light (λ <380).

Furthermore, the optical effect layer 7 embodied as a thin-layer element can also be embodied as a color-shifting layer or comprise a color-shifting layer. Any variations of the optical effects are also possible through appropriate combinations of the most varied of layers or layers. This makes it possible, for example, that when the light source 6 is moved and / or the viewing angle is changed in the optical effect layer 7 designed as a color-shifting layer or in the color-shifting position, a color shifting effect is created.

Furthermore, in addition to the optical effect layer 7, metallic pigments and / or magnetic pigments and / or fluorescent pigments and / or fluorescent substances and / or colored pigments and / or dyes can be provided.

The one in the Fig. 1 The embodiment shown, the at least one spacer layer 12 is applied to the structures 4, in particular printed and / or vapor-deposited. As described above, the at least one spacer layer 12 can be applied directly and immediately to the structures 4, or the interposition of its own intermediate layer 10 can be provided.

A protective layer 13 can be applied to the optical effect layer 7 as the uppermost or outermost layer or layer. The protective layer 13 can be provided, but need not be provided. A planar design of the security element 1 can preferably also be achieved by means of the protective layer 13, as indicated by a dashed line in FIG Fig. 1 is indicated.

In the Fig 3 the previously described configuration of the security element 1 is shown in a simplified manner. The direction of view of the security element 1 is indicated by an arrow and takes place through the optical effect layer 7 onto the structures 4.

The structures 4 which define the first area 2 are covered by the second area 3 of the optical effect layer 7. The optical effect layer 7 designed as a thin-layer element comprises the spacer layer 12 facing the structures 4 and the absorber layer 11 located above it. The protective layer 13 is also indicated on the side of the absorber layer 11 facing away from the structures 4 as a possible additional layer or layer. The protective layer 13 can be provided, but need not be provided. The carrier layer 8 is also indicated, wherein the structures 4 can either be formed directly on the carrier layer 8 or the further layer 9 described above can be provided and the structures 4 can be formed thereon.

The Fig. 4 FIG. 4 shows a possible further exemplary embodiment of the security element 1. The security element 1 is designed in its layer structure similar to that previously in FIG Fig. 3 described security element 1. The direction of view of the security element 1 is also indicated by an arrow and takes place through the optical effect layer 7 onto the structures 4.

The structures 4 which define the first area 2 are covered by the second area 3 of the optical effect layer 7. The optical effect layer 7 designed as a thin-layer element comprises the absorber layer 11 facing the structures 4, then the spacer layer 12 and again the absorber layer 11 above it. Thus, at least one absorber layer 11 is arranged or provided on each side of the spacer layer 12. That absorber layer 11 located closer to the structures 4 is thus applied to the structures 4 or arranged on them. This can be done directly or with the interposition of its own intermediate layer 10.

The protective layer 13 is also indicated as a possible additional layer or layer on the side of the outer absorber layer 11 facing away from the structures 4. The protective layer 13 can be provided, but need not be provided. The carrier layer 8 is also indicated, the structures 4 either being formed directly on the carrier layer 8 can or the previously described further layer 9 can be provided and the structures 4 can be formed on this.

In the Fig. 5 Another possible embodiment of the security element 1 with its optical effect layer 7 is shown. The direction of view of the security element 1 is also indicated by an arrow and also takes place here through the optical effect layer 7 onto the structures 4.

The basic structure of the security element 1 corresponds to that in FIG Fig. 1 and 3 has been shown and described. The optical effect layer 7 also comprises at least one reflective layer 14 as an additional layer. The at least one spacer layer 12 is arranged between the at least one absorber layer 11 and the at least one reflective layer 14. The reflective layer 14 is applied or arranged here on the structures 4, and can in particular be printed and / or vapor-deposited thereon.

The at least one reflective layer 14 can be at least one metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin, or from nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt -Nickel alloys or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium tin oxide (ITO), tantalum pentoxide (Ta ₂ O ₅ ), cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II , III) oxide (Fe ₃ O ₄ ) and iron (III) oxide (Fe ₂ O ₃ ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO ), Neodymium oxide (Nd ₂ O ₃ ), praseodymium _{oxide (Pr 6} O ₁₁ ), samarium _{oxide (Sm 2} O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide (SiC), Silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ), tungsten trioxide (WO ₃ ), high refractive index organic monomers and / or high refractive index organic polymers or made from at least one of these materials be. This applies to all of the reflective layers 14 described in the exemplary embodiments.

The structures 4 which define the first area 2 are covered by the second area 3 of the optical effect layer 7. The optical effect layer 7, designed as a thin-film element, here comprises the reflective layer 14 facing the structures 4, then the spacer layer 12 and in turn the absorber layer 11 located above it. By arranging or applying the reflective layer 14 on the structures 4, it can have the spatial shape of the structures 4 Reflect viewing. The reflective layer 14 can be applied to the structures 4 and arranged in a direct manner or else with the interposition of its own intermediate layer 10.

The protective layer 13 is also indicated as a possible additional layer or layer on the side of the outer absorber layer 11 facing away from the structures 4. The protective layer 13 can be provided, but need not be provided. The carrier layer 8 is also indicated, wherein the structures 4 can either be formed directly on the carrier layer 8 or the further layer 9 described above can be provided and the structures 4 can be formed thereon.

In the Fig. 6 Another possible embodiment of the security element 1 with its optical effect layer 7 is shown. The direction of view of the security element 1 is also indicated by an arrow and, in contrast to the exemplary embodiments described above, takes place through the structures 4 onto the optical effect layer 7.

The optical effect layer 7 designed as a thin-layer element comprises, starting from the side facing away from the structures 4 in the direction of the structures 4, at least the reflective layer 14, the spacer layer 12 and then the absorber layer 11. The absorber layer 11 closer to the structures 4 is on the structures 4 applied or arranged on this. This can be done directly or with the interposition of its own additional intermediate layer 10.

The protective layer 13 is also indicated as a possible additional layer or layer on the side of the outer reflective layer 14 facing away from the structures 4. The protective layer 13 can be provided, but need not be provided. The carrier layer 8 is also indicated, the structures 4 either being formed directly on the carrier layer 8 or the above-described further layer 9 can be provided and the structures 4 can be formed on this.

The Fig. 7 FIG. 12 shows only one possible layer structure of the optical effect layer 7 designed as a thin-film element. In this exemplary embodiment, the layer structure of the optical effect layer 7 is similar to that in FIG Fig. 5 elected.

The optical effect layer 7 comprises at least the absorber layer 11, the spacer layer 12, the reflective layer 14, a further spacer layer 12 and finally a further absorber layer 11. The two absorber layers 11 are arranged on opposite sides of the optical effect layer 7. The reflective layer 14 is for its part arranged between the two spacer layers 12. One of the two absorber layers 11 is in turn arranged or applied to the structures 4. For the sake of clarity, the structures 4 and other possible layers or plies are no longer shown in greater detail or are only indicated, but are still described below.

As a possible additional layer or layer, the protective layer 13 can also be arranged or provided on the side of the outer absorber layer 11 facing away from the structures 4. The protective layer 13 can be provided, but need not be provided. The structures 4 can either be formed directly on the carrier layer 8 or the further layer 9 described above can be provided and the structures 4 can be formed on this.

To connect the optical effect layer 7 to the structures 4, the previously described intermediate layer 10, which is indicated in dashed lines, can also be provided. By means of the optical effect layer 7 shown here and embodied as a thin-film element, the security element 1 can again be formed in combination with the structures 4.

The exemplary embodiments show possible design variants, whereby it should be noted at this point that the invention is not restricted to the specifically illustrated design variants of the same, but rather diverse combinations of the individual design variants with one another are possible and this possible variation is possible due to the Teaching for technical action through objective invention lies within the ability of a person skilled in this technical field.

The scope of protection is determined by the claims. However, the description and the drawings are to be used to interpret the claims. Individual features or combinations of features from the different exemplary embodiments shown and described can represent independent inventive solutions. The task on which the independent inventive solutions are based can be found in the description.

All information on value ranges in the present description are to be understood in such a way that they include any and all sub-areas thereof, e.g. the information 1 to 10 is to be understood in such a way that all sub-areas, starting from the lower limit 1 and the upper limit 10, are also included , ie all sub-ranges begin with a lower limit of 1 or greater and end at an upper limit of 10 or less, for example 1 to 1.7, or 3.2 to 8.1, or 5.5 to 10.

For the sake of clarity, it should finally be pointed out that, for a better understanding of the structure, some elements have been shown not to scale and / or enlarged and / or reduced.

List of reference symbols

1

Security element

2

first area

3

second area

4th

structure

5

Motif

6th

Light source

7th

optical effect layer

8th

Carrier layer

9

another layer

10

Intermediate layer

11

Absorber layer

12th

Spacer layer

13th

Protective layer

14th

Reflective layer

Claims (22)

Security element (1), in particular for securities, security paper or security objects such as banknotes, ID cards, credit cards, ATM cards, tickets, the security element (1) having at least a first area (2) with structures (4), and the structures (4) Reflect an image motif (5) in different spatial areas, so that a movement image is created for the viewer when a light source (6) moves accordingly and / or when an observation angle is changed, with movement of the light source (6) and / or change in the observation angle at the same time of the motif (5) is created,
characterized, - That an optical effect layer (7) is provided, which optical effect layer (7) defines at least a second area (3), - That the optical effect layer (7) is designed as a thin-film element, and - That the structures (4) are completely or partially covered by the optical effect layer (7). The security element (1) according to claim 1, characterized in that the optical effect layer (7) designed as a thin-layer element comprises at least one absorber layer (11) and at least one spacer layer (12). The security element (1) according to claim 2, characterized in that the at least one spacer layer (12) and / or the at least one absorber layer is applied to the structures (4), in particular is printed and / or vapor-deposited, so that a sequence of structures (4 ) - spacer layer - absorber layer or a sequence of structures (4) - absorber layer - spacer layer results. The security element (1) according to claim 2, characterized in that at least one absorber layer (11) is arranged on both sides of the at least one spacer layer (12) and that the at least one absorber layer (11) is applied, in particular printed and, to the structures (4) / or is vapor-deposited. The security element (1) according to claim 2, characterized in that the optical effect layer (7) designed as a thin-layer element further comprises at least one reflective layer (14), the at least one spacer layer (12) between the at least one absorber layer (11) and the at least a reflective layer (14) is arranged. The security element (1) according to claim 5, characterized in that the reflective layer (14) is applied to the structures (4), in particular printed and / or vapor-deposited. The security element (1) according to claim 5, characterized in that the at least one absorber layer (11) is applied to the structures (4), in particular is printed and / or vapor-deposited. Security element (1) according to one of the preceding claims, characterized in that there is an optically non-linear layer or an optically non-linear layer in addition to the optical effect layer (7) designed as a thin-layer element. The security element (1) according to any one of the preceding claims, characterized in that the optical effect layer (7) designed as a thin-layer element is designed as a color-shifting layer or comprises a color-shifting layer. The security element (1) according to claim 9, characterized in that when the light source (6) is moved and / or the viewing angle is changed in the optical effect layer (7) designed as a color-changing layer or in the color-changing position, a color-shifting effect occurs. The security element (1) according to any one of the preceding claims, characterized in that it contains metallic pigments and / or magnetic pigments and / or fluorescent pigments and / or fluorescent substances and / or colored pigments and / or dyes in addition to the optical effect layer (7). The security element (1) according to any one of the preceding claims, characterized in that it comprises a carrier layer (8) made of a plastic, the plastic in particular being formed from a translucent and / or thermoplastic plastic, and that the carrier layer (8) preferably at least one the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC ), Polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinylcholride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride ( PVF), polyvinylidene fluoride (PVDF) and ethylene-tetrafluoroethylene-hexafluoropropylene-fluoroterpolymer (EFEP) and / or mixtures and / or copolymers of these materials or is made from at least one of these materials. The security element (1) according to claim 12, characterized in that the carrier layer (8) has a thickness with a thickness value which originates from a thickness value range, the lower limit of which is 5 µm, preferably 10 µm, and the upper limit of which is 1000 µm, preferably of 50 µm. Security element (1) according to one of claims 2 to 13, characterized in that the at least one absorber layer (11) has at least one metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, Molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials comprises or is made from at least one of these materials. Security element (1) according to one of Claims 2 to 14, characterized in that the at least one spacer layer (12) is formed from a dielectric material. Security element (1) according to one of claims 2 to 15, characterized in that the at least one spacer layer (12) has at least one low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group aluminum oxide (Al ₂ O ₃ ) , Metal fluorides, for example magnesium fluoride (MgF ₂ ), aluminum fluoride (AlF ₃ ), silicon oxide (SIO _x ), silicon dioxide (SiO ₂ ), cerium fluoride (CeF ₃ ), sodium-aluminum fluoride (e.g. _{Na 3 AlF 6} or Na ₅ Al ₃ F ₁₄ ), neodymium fluoride (NdF ₃ ), lanthanum fluoride (LaF ₃ ), samarium _{fluoride (SmF 3} ) barium fluoride (BaF ₂ ), calcium fluoride (CaF ₂ ), lithium fluoride (LiF), low-breaking organic monomers and / or low-breaking organic polymers or at least one high-index dielectric material with a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium-tin Oxide (ITO ), Tantalum pentoxide (Ta ₂ O ₅ ), cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II, III) oxide (Fe ₃ O ₄ ) and Iron (III) oxide (Fe ₂ O ₃ ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO), neodymium oxide (Nd ₂ O ₃ ), praseodymium oxide (Pr ₆ O ₁₁ ), samarium _{oxide (Sm 2} O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide (SiC), silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ), tungsten trioxide (WO ₃ ), high refractive index organic monomers and / or high refractive index organic polymers or is made from at least one of these materials. Security element (1) according to one of claims 6 to 16, characterized in that the at least one reflective layer (14) has at least one metallic material, in particular selected from the group silver, copper, aluminum, gold, platinum, niobium, tin, or nickel , Titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys or at least one high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group of zinc sulfide (ZnS), zinc oxide (ZnO ), Titanium dioxide (TiO ₂ ), carbon (C), indium oxide (In ₂ O ₃ ), indium tin oxide (ITO), tantalum pentoxide (Ta ₂ O ₅ ), cerium oxide (CeO ₂ ), yttrium oxide (Y ₂ O ₃ ), Europium oxide (Eu ₂ O ₃ ), iron oxides such as iron (II, III) oxide (Fe ₃ O ₄ ) and iron (III) oxide (Fe ₂ O ₃ ), hafnium nitride (HfN), hafnium carbide (HfC), Hafnium oxide (HfO ₂ ), lanthanum oxide (La ₂ O ₃ ), magnesium oxide (MgO), neodymium oxide (Nd ₂ O ₃ ), praseodymium _{oxide (Pr 6} O ₁₁ ), samarium oxide (Sm ₂ O ₃ ), antimony trioxide (Sb ₂ O ₃ ), silicon carbide (SiC), silicon nitride (Si ₃ N ₄ ), silicon monoxide (SiO), selenium trioxide (Se ₂ O ₃ ), tin oxide (SnO ₂ ), tungsten trioxide (WO ₃ ), high refractive index organic monomers and / or high refractive index organic polymers or is made from at least one of these materials. Security element (1) according to one of the preceding claims, characterized in that the structures (4) are designed as diffractive structures, as micromirrors, as ray-optically effective facets or as achromatic, reflective structures. The security element (1) according to any one of claims 13 to 18, characterized in that the structures (4) are introduced into the carrier layer (8) by means of a molding device, in particular by an embossing process, or that the structures (4) in a directly or under Interposition of at least one intermediate layer (10) on the carrier layer (8) applied layer (9), in particular an embossing lacquer layer, are formed, in particular are embossed by means of a molding device. The security element (1) according to claim 19, characterized in that the further layer (9) with the structures (4) formed therein has a layer thickness with a layer thickness value that originates from a layer thickness value range, the lower limit of which is 0.5 µm, in particular 0.8 μm, preferably 1 μm, and its upper limit is 300 μm, in particular 50 μm, preferably 20 μm. The security element (1) according to any one of the preceding claims, characterized in that the security element (1) is equipped with further color-shifting layers, in particular layers with color-shifting pigments or liquid crystals and / or with machine-readable features, the machine-readable features in particular being Magnetic coding, electrically conductive layers, electromagnetic waves absorbing and / or re-emitting substances. Security element (1) according to one of the preceding claims, characterized in that the security element (1) has additional layers, which additional Layers include in particular protective lacquers, heat-sealing lacquers, adhesives, primers and / or foils.

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