EP3788180A2

EP3788180A2 - Device for coating a substrate with a carbon-containing coating

Info

Publication number: EP3788180A2
Application number: EP19720882.0A
Authority: EP
Inventors: Alexandre Jouvray
Original assignee: Aixtron SE
Current assignee: Aixtron SE
Priority date: 2018-04-30
Filing date: 2019-04-30
Publication date: 2021-03-10
Also published as: WO2019211280A3; WO2019211280A2; JP7406503B2; KR20210002675A; JP2021523979A; CN112567068B; US20210189565A1; CN112567068A

Abstract

The invention relates to a device for depositing graphene, carbon nano-tubes or other, in particular carbon-contained coatings on a strip-shaped substrate which enters a reactor housing through an inlet opening (12) and is guided through an outlet opening (12') which emerges from the reactor housing (1) and which is transported in a transport direction from the inlet opening (12) through a process area (5) tempered by a tempering device (8) and arranged in the reactor housing (1). According to the invention, heat-transport-inhibiting means (14, 15, 16, 17) are arranged between the process area (5) and the inlet opening and/or the outlet opening (12') by means of which a heat transport from the process area (5) is reduced from the inlet opening (12) or the outlet opening (12') is reduced. Also guide elements (11) are provided in order to guide the substrate (2) into regions directly adjacent to the openings (12, 12').

Description

description

Apparatus for coating a substrate with a carbonaceous coating

Field of engineering

[0001] The invention relates to a device for depositing graphene, carbon nanotubes or other coatings, in particular carbon, on a strip-shaped substrate which enters into a reactor housing through an inlet opening and emerges from the reactor housing through an outlet opening a transport direction from the inlet opening through a arranged in the reactor housing, in particular tempered by at least one heating process zone, in which a gas inlet of a gas supply line opens, is transported to the outlet opening.

State of the art

Apparatus for the deposition of carbonaceous coatings, such as graphene or carbon nanotubes (CNT) are described in a US 9,227,171 B2. The device described therein has a reactor extending in a horizontal direction with a plurality of zones lying next to one another in the horizontal direction, through which an endless substrate is transported.

A device for the production of graphene with several in a transport direction of a substrate successively arranged processing zones shows the US 2016/0031712 Al. In the process zones, heaters are provided to bring the substrate to a process temperature.

[0004] Devices for the treatment of substrates with heat shields are known from US 2017/0314134 A1. The state of the art further includes US 2018/0209044 A1, JP 202-166991 A, DE 103 22 935 A1, DE 10 2014 106 451 A1 and DE 10 2015 013 799 A1.

Summary of the invention

[0006] The invention is based on the object of advantageously further developing the device described above and, in particular, of providing means for improving the coating result.

[0007] A device according to the invention for depositing graphene or carbon nanotubes (carbon nanotubes) or other coatings containing in particular carbon has a reactor housing which has two openings lying opposite each other. A, in particular slit-shaped opening forms an inlet opening for a substrate. A second opening forms an exit opening for the substrate. The substrate is preferably a strip-shaped metal sheet, which is drawn off from a first winding and is passed continuously through a process zone of the reactor, in order to leave it again through the outlet opening. Behind the outlet opening there is a second winding on which the substrate is wound up. In the process zone, a gas inlet may open, which may be the end of a tubular gas line with which a process gas, for example CH ₄ or another carbon-containing gas is introduced into the process zone. On the opposite side there may be a gas outlet with which gaseous components can be pumped out of the process zones. The introduction of the process gas is preferably carried out with a carrier gas, which does not react with the process gas. Measures must be taken to prevent oxygen from entering the reactor from outside the reactor. For this purpose, the inlet opening and / or the outlet opening can be flushed with an inert gas, so that forms a diffusion barrier. It is envisaged that the gap width of an entrance slit or an exit slit in the region of the wall of the reactor can be set gap-widthwise. Within the reactor is a temperature control device, with which the substrate or an atmosphere surrounding the substrate can be tempered. In particular, the tempering device is a heating device, with which the process gas can be heated, so that, in particular, carbon is formed by a pyrolytic decomposition, which is deposited on the substrate in the form of graphene or carbon nanotubes. The areas of the wall of the reactor surrounding the inlet opening and the outlet opening can be cooled by suitable means. The invention provides means to inhibit heat transfer from the heated process zone to the inlet orifice.

[0008] The means provided by the invention are provided, in particular, in an inlet region or an outlet region of the cavity of the reactor, wherein the inlet region between the process zone and the inlet opening and the outlet region between the process zone and the outlet opening are arranged. The heat transport-inhibiting means are in particular arranged directly adjacent to a closure plate which has the inlet opening or outlet opening and which closes the preferably cylindrical reactor at its end faces. In a variant, it is provided that the heat transport-inhibiting means form one or more heat radiation shields. These can be formed by reflectors. It is further contemplated that the heat transport inhibiting means are formed by flat bodies. The flat bodies can be sheet metal parts. They can extend transversely or obliquely to the transport direction of the substrate. It is further contemplated that the heat transport inhibiting means may have a cross-sectional area of the entrance region or the exit region of at least 75 percent, preferably at least 80 percent or 90 percent fills. The inlet region and the outlet region preferably have a circular disk-shaped free cross-sectional area. This free cross-sectional area is for the most part filled by the heat-transport-inhibiting agent, where, preferably, a gap zone extending diametrically through the free cross-section and a ring zone surrounding the heat-transport-inhibiting means remain free. In a further development of the invention, it is provided that the heat-transport-inhibiting means, in particular made of sheet metal, have slots. They may be narrow slots open to an edge of the heat transport inhibiting agent. The slots may have a slot width which corresponds approximately to the material thickness of the made of sheet, heat transport inhibiting agent. The heat-transport-inhibiting means may in particular have an outline contour extending on a circular arc line. At least the entry area and / or the exit area also have a circular outline contour. The entry region and the exit region are preferably formed by an end section of an inner tube (liner tube) which extends through the entire cavity of the reactor and in which the process zone is formed in its central region. The latter may be surrounded by a heating device which is formed by a heating coil. The means for inhibiting the transport of heat arranged in the entry region or the exit region can also be surrounded by a heating coil. Alternatively, these means may also be surrounded by a cooling coil. In a development of the invention, it is provided that the heat-transport-inhibiting means form through-holes for rods or pipes. They can be displaced on rods or pipes. At least one of the tubes may be a tube of a gas inlet and / or a tube of a gas outlet. A heat-transport-inhibiting means can be designed in two parts, with a gap remaining between the two, preferably semicircular, means by which the substrate is conveyed. In one development of the invention, it is provided that a plurality, at least two, preferably three or four heat transport inhibiting Mende means are arranged in the transport direction one behind the other. Such means of heat transport inhibition, formed in particular by sheet metal reflectors, can be kept at a distance from one another by means of spacers, for example spacer sleeves. The spacers can be arranged on the tubes. However, the spacers can also be arranged on rods on which the heat transport-inhibiting means are arranged displaceably in the reactor. Furthermore, it can be provided that the heat-transport-inhibiting means have differently sized surface extents and fill in particular differently sized cross-sectional areas of the inlet area or of the outlet area, wherein at least one heat transport-inhibiting means with a smaller cross-section at that of the inlet opening or the outlet opening is located farthest point. It may be provided that a heat transport-inhibiting agent has a cross-shaped shape. The cross-shaped heat transport inhibiting member preferably has four portions which protrude in a radial direction from a center of the heat transport inhibiting agent. The center is formed by a center line which extends transversely to the transport direction. From this center line can protrude on a broad side V-shaped two flat body. On the opposite broad side of a center line can also protrude two flat body V-shaped. In particular, two flat bodies protrude obliquely in the transport direction and two against the transport direction. The means for inhibiting the transport of heat can be a part consisting of two interconnected flat bodies. It can be provided that two flat bodies, each bent around a crest line, are connected to one another at the crest lines. The apex lines delimit a gap for the penetration of the substrate. It is further provided that two flat bodies are connected to one another by means of connecting webs, wherein the connecting webs delimit the gap for the passage of the substrate. In a development of the invention, which has an independent meaning, are guide elements provided, which are located within the reactor housing and which preferably connect directly to the inlet opening or the outlet opening. These can be bars that are aligned parallel to the transport direction. The rods can leave a guide gap between them through which the substrate passes. On each side of the substrate can be arranged several, preferably three bars. The rods can consist of a ceramic material. In a preferred embodiment of the invention, the guide elements are held by the heat transport-inhibiting agent. For this purpose, the heat transport-inhibiting means may have bores or the like, which support the guide elements. Provision can be made for a last means, which is remote from the inlet opening or the outlet opening in particular, to inhibit the transport of heat, forming a stop surface, in front of which there is a front end of the guide element. One of the pioneering second front end of the guide element can be supported on another, preferably first means for inhibiting the heat transfer or on a closure plate. In a further development of the invention, it is provided that the zone of the inlet region or the outlet region, which adjoins the closure plate directly, is flushed by an inert gas. This measure is intended to prevent the process gas from escaping to a significant extent from the inlet opening or the outlet opening. In a further development, it is provided that the reactor is operated in a vertical arrangement. The inlet opening and the outlet opening are vertically spaced apart from one another in this variant, so that the substrate is transported continuously in the vertical direction through the reactor housing. It is preferably introduced into the reactor from below and led out of the reactor from above. This can be done by means of pulleys. The gas inlet is also preferably from below, so that the gas outlet is provided at the top of the reactor. The gas flow within the reactor thus takes place parallel to the conveying direction of the substrate, which can be coated on one side or on both sides. A first aspect of the invention relates to the design of the heat-transport-inhibiting means as reflectors in the form of flat bodies. A second aspect relates to the slots arranged in the sheet metal heat-transport-inhibiting means and / or the bores through which rods or tubes can pass. A third aspect of the invention relates to the arrangement of a plurality of heat-transport-inhibiting means in the transport direction one behind the other and at a distance from each other. A fourth aspect of the invention relates to the design of the heat transport inhibiting agent as a cruciform flat body. A further aspect of the invention provides that guide elements for guiding a substrate are arranged in an outlet region directly adjacent to the outlet opening within the reactor housing and these guide elements are formed by rods or tubes which extend in the transport direction of the substrate. These rods can be arranged directly next to a gap between two parts of a heat transport-inhibiting agent.

[0010] Another aspect of the invention relates to a device for introducing or removing a substrate into or out of a substrate treatment device by a gap extending between a first gap boundary body and a second gap boundary body. In order to further hinder the penetration of oxygen into the process chamber, a device for introducing or removing a substrate into or out of a substrate treatment device through a gap is proposed. The gap width of the gap is determined by a distance between two gap limiting bodies. Among other things, it is essential that the two gap limiting bodies abut one another on inclined surfaces and are displaceable in the direction of the oblique surfaces to adjust the gap width, wherein the displacement in the direction of the surface extension of the substrate and in particular in a direction of the transport direction of the substrate he follows. Brief description of the drawings

Embodiments of the invention will be explained below with reference to accompanying drawings. Show it:

Fig. 1 in a sectional view of a reactor, in particular

CVD reactor with a housing 1, which is arranged in a vertical direction, and into which a strip-shaped substrate 2 drawn off from a first wedge 3 is introduced in a bottom-side inlet opening 12 and from an upper-side opening 12 '. is pulled out to be on a second winding 3 'to be wound on ge, Fig. 2 enlarged, the cutout II in Figure 1,

3 is a bottom view of the device shown in Figure 1,

4 shows in a first perspective representation heat transport-inhibiting means 14, 15, 16, 17, which are fastened to a closure plate 13,

Fig. 5 is an exploded view of the heat transport inhibiting

Means 14, 15, 16, 17,

6 shows the section according to the Finie VI-VI in Figure 2,

7 shows a representation similar to FIG. 1, but with heat transport-inhibiting means of a second exemplary embodiment, 8 is a perspective view of the second embodiment,

9 is a perspective view of a single heat transport-restraining means of the second embodiment,

10 is a view according to arrow X in Figure 9,

11 is the view according to arrow XI in Figure 10,

12 is the view according to arrow XII in Figure 10,

13 shows the section along the line XIII-XIII in Figure 10,

14 shows the section according to the line XIV-XIV in Figure 11,

Fig. 15 in an exploded view two gap-limiting body

10, 11,

Fig. 16 is a front view the two mutually assembled gap restricting body 10, 11 tellung facing toward the gap 12 in a first distance _S,

17 shows two pairs of gap limiting bodies 10, 11, 105, 115, which can be arranged together on the inlet side as well as on the outlet side on the housing of the substrate treatment device 1, 18 shows a plan view of the pairwise arrangement of the gap limiting bodies 10, 10 ', 11, 11' shown in FIG. 17,

19 is a section along the line XIX-XIX in Figure 18,

FIG. 20 shows a section according to the line XX-XX in FIG. 18 with a minimum gap width w, FIG.

Fig. 21 the same section, but with a maximum gap width w and

Fig. 22 shows a second embodiment of Spaltbegrenzkörpern

10, 11.

DESCRIPTION OF EMBODIMENTS [0012] FIG. 1 shows a reactor, in particular a CVD reactor, which has an elongate, cylindrical shape, the axis of the cylindrical housing 1 extending in the vertical direction. The two end faces of the reactor housing 1 pointing downwards or upwards are closed by closing plates 13. In the closure plates Gaszulei- lines 6 'and gas discharges lead 7'. The gas supply line 6 'continues into a tube whose open end forms a gas inlet 6. The gas discharge 7 'continues into a tube whose open end forms a gas outlet 7. The gas supply line 6 'is connected to a gas supply system, with which in particular CEL is provided. The gas discharge line 7 'is connected to a vacuum pump with which the internal pressure within the reactor housing can be regulated to approximately atmospheric pressure. Between the two closure plates 13 extends an inner tube 9, which is a liner tube. The cylindrical space delimited by the inner tube 9 forms an entry region 5 'adjacent to the lower closure plate 13 and an exit region 5 "adjacent to the upper closure plate 13. The entry region 5' and the exit region 5" are each formed by a helical tempering body 8 'surrounded, with which the area 5, 5' can be heated or cooled.

[0014] A process zone 5, which is surrounded by a heating coil 8, extends in order to heat the process zone 5 to a process temperature between the inlet region 5 'and the outlet region 5 ".

The lower closure plate 13 and the upper closure plate 13 each have a gap 12, through which a strip-shaped endless substrate 2 can be transported into the reactor housing cavity and transported out again. Outside the closure plate 13 there is a diffusion barrier 10. This consists of a plurality of gap limiting bodies, with which the gap width of the gap can be adjusted, by means of which the substrate 2 can be transported into or out of the reactor housing. In addition, the diffusion barrier 10 has gas inlet openings with which a purge gas can be introduced into the gap between the two gap limiting bodies.

On the inner side of each of the two closure plates 13 facing the process zone 5 there are a plurality of heat-transport-inhibiting means 14, 15, 16, 17 and a plurality of guide elements 11 for guiding the substrate 2. In the exemplary embodiment, the means 14, 15, 16, 17 which inhibit the heat transfer from the process zone 5 to the closure plates 3 are formed by reflector plates 14, 15, 16, 17.

In the first exemplary embodiment illustrated in FIGS. 2 to 6, the reflector plates 14, 15, 16, 17 are formed by thin sheet-metal plates which have a substantially circular outline and which are arranged in the inlet region 5 'or outlet region 5 ", The reflector plates 14, 15, 16, 17 are spaced apart from each other by means of spacer sleeves 18. Each reflector plate 14, 15, 16, 17 has a two-part design, each being semicircular parts, which leave a gap 19 therebetween through which the substrate 2 can be conveyed, at a first distance a first reflector plate 17 is spaced from the closure plate 13 by means of several spacer sleeves 18. A second reflector plate 16 is provided by means of spacer sleeves 18 spaced apart from the first reflector plate 17. A third reflector plate 15 is provided by means of distance h solve te 18 16 spaced from the second Reflektorplat-. A fourth reflector plate 14 is spaced from the third reflector plate 15 with spacers 18. While the first and the second reflector plate 16, 17 have a diameter which essentially corresponds to the inner diameter of the inner tube 9, the third reflector plate 15 has a smaller diameter. The distance between the third reflector plate 15 and the second reflector plate 16 is also smaller than the distance of the second reflector plate 16 from the first reflector plate 17, which corresponds approximately to the distance between the first reflector plate 17 and the closure plate 13. The distance between the fourth reflector plate 14 and the third reflector plate 15 is again smaller than the distance of the third reflector plate 15 from the second reflector plate 16. In the embodiment, all the reflector plates 14, 15,

16, 17 radial slots 20. The slot width of these radial slots 20 corresponds approximately to the material thickness of the reflector plates 14, 15, 16, 17th

Moreover, in each reflector plate 14, 15, 16, 17 there are first bores 22, through which rods or tubes can pass, on which the reflector plates 14, 15, 16, 17 are fastened. The tubes may be the tubes with which the gas inlet 6 is fed or which are connected to the gas outlet 7. But it may also be guide rods, which only have the task to guide the reflector plates 14, 15, 16, 17.

Second bores 21 are provided, which are immediately adjacent to a straight edge edge of each part of a reflector plate 14, 15, 16, 17. These second bores 21 serve to receive the guide elements 11 already mentioned above, which have the form of rods. The rods are made of a ceramic material. The rods can be supported on the one hand on the closure plate 13 with their front sides and on the other hand on the fourth reflector plate 14. In particular, three guide elements 11 arranged in pairs opposite each other are provided. Two guide elements 11 are each arranged on the two edges of the substrate 2. A third pair of guide elements 11 is arranged in the center of the substrate, centrally between the marginal edges.

The reflector plates 14, 15, 16, 17 may be in identical shape and shield plates. With the reflector plates 14, 15, 16, 17 or shield plates, the heat transfer from the process zone 5 to the inlet opening 12 or to the outlet opening 12 'is inhibited. Figures 7 to 14 show a second embodiment of a shield plate 14, 15 or a reflector plate 14, 15. The heat transfer from the process zone 5 to the inlet region 5 'or to the outlet region 5 "inhibiting means are in particular reflection elements 14, 15 or Shield elements 14, 15. A heat-transport-inhibiting means of the second exemplary embodiment consists of two sheets 14, 15 which are bent at an apex line 14 ', 15' approximately at an angle of 90 degrees, the two sheets 14, 15 are on For this purpose, connection webs 24 are provided which hold the apex lines 14 ', 15' at a distance from one another such that a gap 19 forms between the apex lines 14 ', 15' the substrate 2 can be transported.

The interconnected reflector or shield plates 14, 15 form a heat transport inhibiting element which essentially fills the cross-sectional area of the inner tube 9. The two legs of each reflector or shield plate 14, 15 are connected to spacers 18 with each other. The ends of the sleeves may be fixedly connected to one of the legs. Through the sleeves grip rods or tubes, where the heat transport inhibiting agent is displaced or position fix the heat transport inhibiting agent. FIG. 7 also shows a rod 25 which extends between the opposing closure plates 13 and which rests in a recess 23 of the heat-transport-inhibiting agent.

The inlet region 5 'and / or the outlet region 5 "can each be provided with exactly one heat transport-inhibiting agent. The winding 3, 3 'can be operated by an electric motor. For deflecting the introduced into the reactor 1 substrate 2 is a first order directing roller 4 and for deflecting the emerging from the reactor housing 1 substrate 2, a second guide roller 4 'is provided. A gas-purged zone 26 is located directly adjacent to the closure plate 13 in the inlet region 5 and in the outlet region 5. In this zone, an inert gas is introduced into the cavity of the reactor housing by means of a gas inlet (not shown).

Figures 15 to 22 relate to a further aspect of the invention. [0031] The cavity of the substrate treatment device 1 is in each case closed by a closure plate 113, 113 'in the inlet soapy and outflow soapy.

The closure plate 113, 113 'has a gap opening, through which the substrate 2 is passed. On its respective outer sides, the closure plate 113, 113 'carries an arrangement of two gap-limiting bodies 110, 1105 H1115. The gap-limiting bodies 110, 1105 H11 "have gap-limiting surfaces or gap walls 115, 1155 which point towards each other 5 mm apart, the gap width w is preferably 2 mm at the maximum.

On the inlet side and on the outlet side in each case two arrangements, each consisting of two gap limiting bodies HO, 111, are arranged one behind the other in the transport direction of the gap, so that the substrate, when entering the substrate treatment device 1, passes through two of these Arrangements and the exit from the substrate treatment device 1 must also pass through two of these arrangements. With regard to Design of the arrangements of gap-limiting bodies 110, 111 is referenced to Figures 15 to 21.

Each arrangement of gap-limiting bodies 110, 111 has two gap-limiting bodies 110, 111, which are designed to be equal to one another.

They have, in the assembled state, mutually facing gap limiting walls 115, 115 ', between which the gap 112 extends. The gap-limiting walls 115, 115 'are formed by a base body 114, 114' made of steel, in particular stainless steel. The exemplary embodiment involves elongate base bodies 114, 114 'whose direction of extension is directed transversely to the transport direction of the substrate 2.

The rear side of the main body 114, 114 'opposite the gap delimiting walls 115, 115' has a trough-shaped recess, which forms a gas distribution chamber 117, 117 'in each case. The bottom of the gas distribution chambers 117, 117 ', which runs parallel to the gap delimiting wall 115, 115', has a multiplicity of regularly arranged bores which form gas outlet openings 116, 116 ', which open into the gap delimiting wall 115, so that they open Gas outlet surface forms. The opening of the gas distribution chamber 117 forming recess is surrounded by an annular groove 119, 119 'in which a sealing cord 118, 1185, for example, an O-ring, rests, the gas distribution chambers 117, 117' with a cover 120, 120th 'To be able to cover, which is fastened by means of fastening screws on the base body 114, 114'. By means of a with the cover 120, 120 'connected gas supply line 124, 124', a purge gas in the gas distribution chamber 117 can be fed.

The gap limiting wall 115, 115 'forms a gas outlet surface. The gas outlet surface has an elongated shape, wherein the direction of extension of the gas outlet surface 115, 115 'transversely to the transport direction of the substrate. tes 2 runs. At two opposite ends of the gas outlet surface 115, 1155 in the exemplary embodiment, the narrow-side ends of the gas outlet surface 15, 155 are followed by rectilinear oblique surfaces 121, 1215 122, 122 '. While the first inclined surface 121, 121 'is inclined upwards by about 10 degrees, the second inclined surface 122, 122' is inclined downwards by about 10 degrees. The two inclined surfaces 121, 1215 122, 122 'extend in a parallel plane to each other.

The two gap delimiting bodies 110, 111 are placed on one another such that a first oblique surface 121 'of a second gap delimiting body 111 rests on a second oblique surface 122 of a first gap delimiting body 110 and a second gap delimiting surface 122' of the second gap delimiting body 111 a first inclined surface 121 of the first gap-limiting body 110 rests. By a shift in a direction indicated by S in FIG. 21, the inclined surfaces 121, 1215 122, 122 'can slide along one another and be displaced relative to one another. Along with this, the two gap delimiting bodies 110, 111 shift not only in a direction lying in the gap plane, but also in a direction transverse thereto, so that the gap width w changes from a minimum gap width w shown in FIG up to a maximum gap width w 'shown in FIG. 21 can change. The direction of displacement, in which a gap-limiting body 110 moves against the other gap-limiting body 111, is directed obliquely to the surface normal of the gap-limiting wall 115, 115 'or to the gap plane.

For the sensitive adjustment of the gap width w, w ', adjusting screws 123 are provided, which are screwed into threaded bores 128, 128' in each case one broad side of the gap-limiting body 110, 111. The heads of the adjusting screws 123 act on a side wall of a different gap. Boundary body 111, so that by a rotational adjustment of the adjusting screw 123, the gap width w, w 'can be adjusted. Two setscrews 123 are preferably arranged on both narrow sides of the main body 114, 114 ', with which not only an adjustment of the gap width w, w', but also a fixation of the gap width w, w 'is possible, since opposite screws act in the opposite direction.

Within the first inclined surface 121, 121 'is a threaded bore 127, 127'. The axis of the threaded bore 127, 127 'extends in the direction of the surface normal of the gap wall 115, 115'. In the second inclined surface 122, 122 'there is a catching hole 126 for the passage of a fastening screw 125, 125', which can be screwed into the internal thread 127, 127 ', around the two gap surfaces 121, 122, 1215 122' against each other to relax.

The reference numerals 130, 130 'designate coupling members with which two pairs of gap-limiting bodies 110, 111, 1105 H "can be coupled to one another in such a way that the gaps 112 of the respective pairs are aligned with one another.

The above explanations serve to explain the inventions as a whole, which at least individually further develop the state of the art, at least by the following combinations of features, whereby two, several or all of these feature combinations can also be combined namely:

A device which is characterized in that between the process zone 5 and the inlet opening 12 and / or the outlet opening 12 'heat transport inhibiting means 14, 15, 16, 17 are arranged, with which a Heat transfer from the process zone 5 to the inlet opening 12 or the outlet opening 12 'is reduced.

[0042] A device characterized in that the heat-transport-inhibiting means 14, 15, 16, 17 are one or more heat-radiation shields and / or reflectors and / or are formed by flat bodies extending transversely or extend obliquely to the transport direction, and / or have a cross-sectional area which is more than 75 percent, preferably more than 80 percent or more than 90 percent of the free cross section of an inlet region 5 'or exit region 5 adjoining the process zone 5 in which the heat transport inhibiting means 14, 15, 16, 17 are arranged to fill.

A device which is characterized in that the made of a sheet heat transport inhibiting means 14, 15, 16, 17 slots 20 and / or through holes 22 for rods 11 or pipes 6, 7 and / or formed on rods 11 or pipes 6, 7 is slidably mounted and / or penetrated by a pipe of a gas inlet 6 or a pipe of a gas outlet 7 and / or consists of two between them a gap 19 for the passage of the substrate 2 left parts.

[0044] A device which is characterized in that a plurality of heat-transporting means 14, 15, 16, 17 are arranged one after the other in the transport direction and / or are kept at a distance from one another by spacer means and / or of different sizes Have reflective surfaces.

[0045] A device characterized in that one or more heat transport inhibiting means 14, 15, 16, 17 is a circular shaped, is one-piece or multi-part flat body and / or is a flat body designed into a cross-shaped shape and / or is formed by two flat bodies 14, 15 bent around a crest line 14/15 ', which flat bodies 14, 15 at the crests 14/15 'are connected to one another to form a gap 19 for the passage of the substrate 2 and / or that two flat bodies 14, 15 are connected to form a gap 19 for the passage of the substrate 2 with connecting webs 24.

A device which is characterized in that, in an inlet region 5 'directly adjoining the inlet opening 12 and / or in an outlet zone 5 "directly adjacent to the outlet opening 12', inside the reactor housing 1 are guide elements 11 Guide the substrate 2 are arranged.

A device which is characterized by guide elements 11 arranged in an entry region 5 'and / or an exit region 5 "within the housing 1 for guiding the substrate 2 and / or guide elements 11 for guiding the substrate 2 immediately adjacent to the inlet opening 12 or outlet opening 12 'extend into the cavity of the housing 1 s.

A device, characterized in that guide elements 11 for guiding the substrate 2 are formed by rods which extend in the transport direction and directly to the gap 19 between two parts of a heat transport-inhibiting means 14, 15, 16, 17 are arranged and / or by heat transport inhibiting means 14, 15, 16, 17 are supported and / or pass through holes 21 of the heat transport inhibiting means 14, 15, 16, 17. [0049] A device which is characterized in that the gap-shaped inlet opening 12 and / or the gap-shaped outlet opening 12 ', by the unwound from a first winding 3 and on a second winding 3' wound and continuously transported through the process zone 5 Substrate 2 passes, is purged by an inert gas and / or that the reactor housing 1 has a circular cylindrical shape and the inlet opening 12 and / or the outlet opening 12 'at one of the end sides of the reactor housing 1 is arranged.

[0050] A device which is characterized in that the transport direction of the substrate 2 through the reactor housing 1 is a vertical direction and / or that the substrate 2 is introduced into the reactor housing 1 through an inlet opening 12 arranged on the underside of the reactor housing 1 enters and / or exits at a top of the reactor housing 1 arranged outlet opening 12 'from the reactor housing 1 and / or that a gas inlet 6 and a gas outlet 7 in such an inlet region 5' and / or an exit region. 5 "The cavity of the reactor housing 1 are arranged so that the gas flow is directed from bottom to top through the process chamber 5.

A device which is characterized in that the distance of the two gap delimiting bodies 110, 110/111, IIP determining a gap width w is adjustable.

A device which is characterized in that the first and the second gap-limiting body 110, 110/111, 111 'are designed to be identical to each other.

A device characterized in that surfaces 115,

115 'in each case of a basic body 114, 114' of the gap-bounding body 110, 110 '; 111, 11 ', which form boundary walls of the gap 112, have gas outlet openings 116, 116' which open into the gap 112, wherein it is provided in particular that the gas outlet openings 116, 116 'are formed by bores, those in the gap limiting body 110 , 110 '; 111, 111 'arranged gas distribution volume 117, 117' with the gap 112 connect, wherein it is provided in particular that a plurality of gas outlet openings 116, 16 'in a regular arrangement in the form of a shower head on the surface 115, 115' are distributed, which is provided in particular the gas outlet openings 116, 116 'are arranged in a plurality, in particular at least four, rows lying next to one another in the transport direction.

A device, characterized in that in each case two pairs of gap-limiting body 110, 110 '; 111, 111 'in a transport direction of the particular flat, belt-shaped substrate 2 are behind one another.

A device, which is characterized in that a first gap-limiting body 110, 110 'has a first inclined surface 121, which abuts a second inclined surface 122' of a second gap-limiting body 111, 111 'and / or that a first Gap limiting body 110, 110 'has a second inclined surface 122, which abut against a first inclined surface 121' of the second gap delimiting body 111, 111 ', wherein the Spaltbegrenzungskör- per 110, 110/111, 111' for adjusting the gap width w in a Spalterstre- ckungsrichtung S, are displaceable, in particular transversely to a transport direction of the substrate 2, in order to change the gap width w by successive sliding of the first and second inclined surfaces 121, 121/122, 122 '.

A device which is characterized by an adjusting screw 123 for adjusting the gap width w, wherein in particular perpendicular to the Gap limiting surfaces 115, 115 'extending side walls internal thread 128, 128', in the threaded shafts of the adjusting screws 123 are turned, the heads on side walls of a respective other Spaltbegrrenz- zungskörper 110, 110 '; 111, 111 'rest.

[0057] A device characterized in that base bodies 114, 114 'of gap-limiting bodies 110, 110'; 111, 111 'elongated holes 126, 126', through which fastening screws 125, 125 'engage, which are screwed into the internal thread 127, 127' of a respective other gap-limiting body 110, 1103 111 HG around the abutting inclined surfaces 121, 1215 122nd , 122 'press against each other, in particular provision is made that the slot 126 and / or internal thread 127, 127' each in the region of an inclined surface 121, 1215 122, 122 'is arranged.

A device which is characterized in that the gap width w is steplessly adjustable within a range of 0 to 5 mm and / or that the angle of the inclined surface 121, 1215 122, 122 'to the splitter extension direction or splitter extension plane is in the range between 5 and 40 degrees or 5 and 20 degrees, preferably in a range between 9 and 11 degrees.

A use of a device according to one of the preceding claims on a substrate treatment apparatus 1 in each case on two sides of the substrate treatment device 1 facing away from one another, wherein a substrate 2 drawn off from a first winding 3 by a first arrangement of at least two gap delimiting bodies 110, 1105 111 H1 in a process chamber 5 of the substrate treatment device 1, in which it is coated with graphene, carbon nano-tubes or another coating, from a second arrangement of at least two gap-limiting devices. pern 110, 110 '; 111, 111 'terminates and is wound on a second winding 3'.

All disclosed features are essential to the invention (individually, but also in combination with one another). The disclosure content of the associated / attached priority documents (copy of the prior application) is hereby also incorporated in full in the disclosure of the application, also for the purpose of including features of these documents in claims of this application. The subclaims characterize, even without the features of a claimed claim, with their features independent inventive developments of the prior art, in particular to make on the basis of these claims divisional applications. The invention specified in each claim may additionally have one or more of the features described in the preceding description, in particular with reference numerals and / or given in the reference numerals. The invention also relates to design forms in which individual features mentioned in the above description are not realized, in particular insofar as they are identifiable for the respective intended use or can be replaced by other technically equivalent means.

List of reference numbers

1 substrate treatment device 16 second reflector plate

tion, reactor housing 17 first reflector plate

2 substrate 18 spacer sleeve

3 wraps 19 gap

3 'wrap 20 slot

4 pulley 21 hole

4 'pulley 22 bore, through hole

5 process zone 23 recess

5 'entry area 24 connecting web

5 "exit area 25 bar

6 gas inlet 26 gas-purged zone

6 'gas supply line 110 gap limiting body

7 Gas outlet HO 'gap limiting body

7 'gas discharge 111 gap limiting body

8 heating coil 111 'gap limiting body 8' heating coil 112 gap

9 liner pipe 113 closure plate

10 diffusion barrier 113 'closure plate

11 guide element 114 basic body

12 inlet opening, gap 114 'body

12 'outlet opening, gap 115 gap wall (gas outlet area)

13 closure plate 115 'gap wall (gas outlet surface)

14 fourth reflector plate, disc 116 Gas outlet opening

Telelement 116 'gas outlet opening

14 'crest line 117 gas distribution chamber

15 third reflector plate, disk 117 'gas distribution chamber

telelement 118 sealing cord

15 'crest line 118' sealing cord Ring groove 130 coupling member

'Annular groove 130' coupling member

cover

'Cover

Inclined surface w gap width

'Bevel w' gap width

sloping surface

'Inclined surface

Adjusting screw S Splitter extension direction Gas supply

'Gas supply

fixing screw

'Fixing screw

Long hole

' Long hole

Threaded hole, internal thread

'Threaded hole, internal thread

Threaded hole, internal thread

'Threaded hole, internal thread

recess

Claims

claims

1. An apparatus for depositing graphene, carbon nanotubes or other coatings, in particular carbon, on a through a inlet opening (12) in a reactor housing (1) and entering through an outlet opening (12 ') from the reactor housing (1) emerging strip-shaped endless substrate (2) which is transported in a transport direction from the inlet opening (12) through an in the reactor housing (1), tempered by a tempering device (8) process zone (5) to an outlet opening (12 ') , characterized in that between the process zone (5) and the inlet opening (12) and / or the outlet opening (12 ') heat transport inhibiting means (14, 15, 16, 17) are arranged, with which a heat transfer from the process zone (5) towards the inlet opening (12) or the outlet opening (12 ') is reduced.

2. Device according to claim 1, characterized in that the heat transport inhibiting means (14, 15, 16, 17) are reflectors which have the shape of a flat body.

3. Device according to one of the preceding claims, character- ized in that the heat transport inhibiting means (14, 15, 16, 17) are made of sheet metal and slots (20) and / or holes (22) have, through the rods (11) or tubes (6, 7) pass through.

4. Device according to one of the preceding claims, characterized in that the heat transport-inhibiting means (14, 15, 16, 17) form flat bodies which extend transversely or obliquely to the transport direction, and / or have a cross-sectional area which more than

75 percent, preferably more than 80 percent or more than 90 percent, of the free cross-section of an inlet following the process zone (5). step area (5 ') or outlet area (5 "), in which the heat transport-inhibiting means (14, 15, 16, 17) are arranged to fill.

5. Device according to one of the preceding claims, characterized in that the slots (20) and / or through holes (22) are formed such that the heat transport inhibiting means (14, 15, 16,

17) is displaceably mounted on the rods (11) or the tubes (6, 7) and / or penetrated by a tube of a gas inlet (6) or a tube of a gas outlet (7) and / or of two between them Gap (19) for the passage of the substrate (2) left parts consists. 6. Device according to one of the preceding claims, character- ized in that a plurality of heat transport-inhibiting means (14, 15, 16, 17) are arranged one behind the other in the transport direction and / or held by spacer means at a distance from each other and / or from each other different sizes Reflecting surfaces have. 7. Device according to one of the preceding claims, character- ized in that one or more heat transport inhibiting means (14, 15, 16, 17) is a circular shaped, one- or multi-part flat body and / or one to a cross shape is designed flat body and / or of two around a crest line (14/15 ') bent Flachkör- pern (14, 15) is formed, which flat body (14, 15) on the crest lines (14/15') to form a Gap (19) for the passage of the substrate (2) are connected to one another and / or that two flat bodies (14, 15) for forming a gap (19) for the passage of the substrate (2) with connecting webs (24) connected to each other. 8. Device for depositing graphene, carbon nanotubes or other, in particular carbon-containing coatings on a entering through a inlet opening (12) in a reactor housing (1) and through an outlet opening (12 ') from the reactor housing (1) exiting strip-shaped endless substrate (2) in a transport direction from the inlet opening (12) by a in Reactor housing (1) arranged, by a tempering device (8) tempered process zone (5) is transported to an outlet opening (12 '), characterized in that in an immediately adjacent to the inlet opening (12) inlet region (5') and / or guide elements (11) for guiding the substrate (2) are arranged in an outlet region (5 ") directly adjoining the outlet opening (12 ') within the reactor housing (1).

9. Device according to one of claims 1 to 8, characterized by in an inlet region (5 ') and / or an outlet region (5 ") within the housing (1) arranged guide elements (11) for guiding the substrate (2) and / or that guide elements (11) for guiding the substrate (2) extend directly adjacent to the inlet opening (12) or outlet opening (12 ') into the cavity of the housing (1).

10. Device according to one of the preceding claims, characterized in that guide elements (11) for guiding the substrate (2) are formed by rods which extend in the transport direction and directly to the gap (19) between two parts of a heat transfer. port-inhibiting means (14, 15, 16, 17) are arranged and / or by heat transport inhibiting means (14, 15, 16, 17) are worn

and / or through holes (21) of the heat transport inhibiting means (14, 15, 16, 17).

11. Device according to one of the preceding claims, characterized in that the gap-shaped inlet opening (12) and / or the gap-shaped outlet opening (12 '), by which of a first winding (3) unwound and wound on a second roll (3 ') and continuously through the process zone (5) transported substrate (2) passes, is purged by an inert gas and / or that the reactor housing (1) has a circular cylindrical shape and the Inlet opening (12) and / or the outlet opening (12 ') on one of the end sides of the reactor housing (1) is arranged.

12. Device according to one of the preceding claims, characterized in that the transport direction of the substrate (2) through the reactor housing (1) is a vertical direction and / or that the substrate (2) by a at the bottom of the reactor housing ( 1) enters the reactor housing (1) and / or exits from the reactor housing (1) at an outlet opening (12 ') arranged on the upper side of the reactor housing (1) and / or in that a gas inlet (6 ) and a gas outlet (7) are arranged in an inlet region (5 ') and / or an outlet region (5 ") of the cavity of the reactor housing (1) such that the gas flow is directed from bottom to top through the process chamber (5) is.

13. Device for introducing or removing a substrate (2) into or out of a substrate treatment device (1) through a gap (112) whose adjustable gap width (w) is determined by a distance between two gap limiting bodies (110, HO '), characterized in that the two gap-limiting bodies (110, HO ') abut one another on inclined surfaces (121, 122) and are displaceable in the direction of the diagonals of the inclined surfaces (121, 122) in order to adjust the gap width (w).

14. The device according to claim 13, characterized in that the gap limiting bodies (110, HO ', 111, 111') are identical to one another.

15. Device according to one of claims 13 or 14, characterized marked, that surfaces (115, 115 ') respectively of a base body (114, 114') of the gap limiting body (110, 110 ', 111, 111'), which boundary walls of Forming gap (112), in the gap (112) opening Gasaustrittsöff- openings (116, 116 '), wherein it is provided in particular that the gas outlet openings (116, 116') are formed by bores, which in a Spaltbegrenzungskörper (110, 110 ', 111') arranged gas distribution volume (117, 117 ') connect to the gap (112), wherein it is provided in particular that a plurality of gas outlet openings (116, 116') in a regular arrangement in the form of a shower head on the surface (115, 115 ') are distributed, wherein in particular it is provided that the gas outlet openings (116, 116') in several, in particular at least four in the transport direction adjacent rows are arranged.

16. Use of a device according to claims 13 to 15 on a substrate treatment device (1) on two sides away from each other transmitting sides of the substrate treatment device (1), wherein one of a first winding (3) subtracted substrate (2) by a first Arrangement of at least two gap-limiting bodies (110, 1103 111 UV) in a process chamber (5) of the substrate treatment device (1), in which it is coated with graphene, carbon nanotubes or another coating, from a second Arrangement of at least two gap limiting bodies (110, 1103 111 Hl ") expires and on a second winding (3 ') is wound.

17. Device or use, characterized by one or more of the characterizing features of one of the preceding claims.