EP3700618A1 - Optical sensor - Google Patents
Optical sensorInfo
- Publication number
- EP3700618A1 EP3700618A1 EP18788782.3A EP18788782A EP3700618A1 EP 3700618 A1 EP3700618 A1 EP 3700618A1 EP 18788782 A EP18788782 A EP 18788782A EP 3700618 A1 EP3700618 A1 EP 3700618A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- transistor
- photodiode
- transistors
- sensor
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 28
- 230000010354 integration Effects 0.000 claims abstract description 70
- 239000003990 capacitor Substances 0.000 claims abstract description 35
- 210000001525 retina Anatomy 0.000 claims abstract description 14
- 210000002569 neuron Anatomy 0.000 claims description 64
- 210000004027 cell Anatomy 0.000 claims description 56
- 230000004913 activation Effects 0.000 claims description 31
- 230000009849 deactivation Effects 0.000 claims description 27
- 230000000946 synaptic effect Effects 0.000 claims description 19
- 239000011159 matrix material Substances 0.000 claims description 6
- 239000012190 activator Substances 0.000 claims description 3
- 210000000225 synapse Anatomy 0.000 description 28
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- 230000002102 hyperpolarization Effects 0.000 description 2
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Classifications
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/02—Details
- A61N1/04—Electrodes
- A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
- A61N1/0526—Head electrodes
- A61N1/0543—Retinal electrodes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
- A61F9/00—Methods or devices for treatment of the eyes; Devices for putting-in contact lenses; Devices to correct squinting; Apparatus to guide the blind; Protective devices for the eyes, carried on the body or in the hand
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/18—Applying electric currents by contact electrodes
- A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
- A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
- A61N1/36046—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation of the eye
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/18—Applying electric currents by contact electrodes
- A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
- A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
- A61N1/3605—Implantable neurostimulators for stimulating central or peripheral nerve system
- A61N1/36125—Details of circuitry or electric components
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N1/00—Electrotherapy; Circuits therefor
- A61N1/18—Applying electric currents by contact electrodes
- A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
- A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
- A61N1/3605—Implantable neurostimulators for stimulating central or peripheral nerve system
- A61N1/36128—Control systems
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J1/46—Electric circuits using a capacitor
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
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- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
- G06N3/049—Temporal neural networks, e.g. delay elements, oscillating neurons or pulsed inputs
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/06—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons
- G06N3/063—Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
- H04N25/75—Circuitry for providing, modifying or processing image signals from the pixel array
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/771—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/772—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/78—Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/4446—Type of detector
- G01J2001/446—Photodiode
Definitions
- the present invention relates to a circuit with low energy consumption, which can reproduce certain behaviors of a biological retina, and used in particular in bio-inspired architectures.
- the application FR 2 953 394 discloses an artificial retina comprising a substrate, a first layer disposed thereon comprising portions of photovoltaic material separated by a portion of insulating material and a second layer disposed on the first and comprising portions of conductive material. separated by a portion of insulating material.
- the system described in US Pat. No. 5,865,839 is small enough to be implantable in the human eye, and comprises a set of artificial retinas each of which has a detector element and an optical fiber for directing the incident light to the detector element. .
- the latter emits an output signal depending on the intensity of the incident light.
- a coupler couples this output signal to the human retina.
- US Patent 5,024,223 discloses an implant having a matrix of photodiodes implanted between the inner and outer layers of a human retina.
- the photoactive surface of each photodiode points to the incident light.
- the implant produces an amplitude-modulated current to electrically stimulate the inner layer of the retina.
- US Patent 6,046,444 discloses a pixel structure having a photodiode operating in photo-ampere mode where it is reverse biased, its anode being grounded and its cathode to the gate of an NMOS transistor configured in source-follower mode.
- the invention aims to further improve the optical sensors and retinal implants in particular, in particular to have a powerful sensor, extremely low power consumption and able to simulate to some extent the behavior of the retina.
- the invention thus has, according to a first aspect, an optical sensor, in particular an artificial retina, with at least one photosensitive cell, each cell comprising:
- At least one MOS transistor operating below the threshold the source drain current of which influences the load of the integration capacitor
- At least one photodiode operating in photovoltaic mode connected to the gate of this transistor, such that the source drain current of the MOS transistor depends on the optical power received by the photodiode.
- the operation of the transistor below the threshold corresponds to the existence of a drain-source current varying exponentially with the gate control voltage in the so-called weak inversion region of the transistor ('weak-inversion region' or 'subthreshold region' in English) where the gate-source voltage is below the threshold voltage for which the inversion zone appears, that is, creates a conduction channel between the drain and the source.
- the open-circuit voltage of the photodiode, V co , resulting from the photoelectric conversion, is applied to the gate of the transistor. Since the relation between the photocurrent and the photovoltaic voltage V oc of the photodiode is logarithmic, the result is an electrical drain current substantially proportional to the photoelectric current, and therefore to the optical power. This is a remarkable result and allows the cell to present a substantially linear response depending on the illumination.
- the invention also allows a large scale integration of the optical sensor, thanks to the possibility of using a standard industrial CMOS technology.
- the MOS transistor may be arranged within the cell, either to load the integration capacitor or to discharge it, depending on how the reading circuit behaves with the charge level of this capacitance and the desired behavior. for the cell according to the illumination received.
- the aforementioned MOS transistor may be an activation transistor arranged to charge the integration capacitance when the photodiode connected to its gate is illuminated.
- the activation transistor is preferably of the PMOS type.
- the MOS transistor may be a deactivation transistor arranged to discharge the integration capacitance when the photodiode connected to its gate is illuminated.
- the deactivation transistor is preferably of the NMOS type.
- the cell may comprise a plurality of activation transistors connected in parallel and each controlled by a photodiode connected to a respective gate, operating in photovoltaic mode, each activation transistor being arranged to charge the integration capacitance when the photodiode is illuminated, the currents adding algebraically to the same node.
- the cell may also comprise a plurality of deactivation transistors connected in parallel and each controlled by a photodiode connected to a respective gate, operating in photovoltaic mode, each deactivation transistor being arranged to discharge the integration capacitance when the photodiode is illuminated, the currents adding algebraically to the same node.
- the cell comprises: at least one activation MOS transistor, operating below the threshold, the source drain current of which influences the load of the integration capacitor,
- the activation transistor being arranged to charge the capacitance of integration when the photodiode is illuminated, at least one deactivating MOS transistor, operating below the threshold, the source drain current of which influences the load of the integration capacitor,
- At least one photodiode operating in photovoltaic mode connected to the gate of this deactivation transistor, such that the source drain current depends on the optical power received by the photodiode, the deactivation transistor being arranged to discharge the integration capacitance when the photodiode is illuminated.
- the neurons of the different layers of the retina each cover a region of our visual field.
- This region of space where the presence of a suitable stimulus modifies the nerve activity of a neuron is called the receptor field of this neuron.
- the receptor fields of bipolar and ganglion cells are circular in shape. Their center and periphery, however, work in opposition: a ray of light that strikes the
- FIRE I LLE OF REM PLACEM ENT (RULE 26) center of the field will have the opposite effect when it falls on the periphery.
- bipolar cells There are two types according to the response of their receptor field. If a light stimulus on the center has an excitatory effect on the bipolar cell, it undergoes a depolarization. It is said that it is of type "ON". A ray of light falling only on the periphery of the field of this cell will have the opposite effect, that is, a hyperpolarization of the membrane.
- Other bipolar cells, of the "OFF" type will show exactly the opposite behavior: the light on the center produces a hyperpolarization while a luminous stimulus on the periphery has an excitatory effect.
- the interest of the ON and OFF cells is to detect either an optical power value at a point but a contrast between the center and the periphery of a zone.
- the cell may be of the "ON" type, comprising a plurality of deactivation transistors and associated photodiodes, the photodiode associated with the activation transistor being surrounded by the photodiodes associated with the deactivation transistors.
- the cell may be of the "OFF" type, comprising a plurality of activation transistors and associated photodiodes, the photodiode associated with the deactivation transistor being surrounded by the photodiodes associated with the activation transistors.
- the photodiodes associated with the deactivation transistors in the case of an "ON" cell or the photodiodes associated with the activation transistors in the case of an "OFF” cell may be arranged in a polygonal mesh, with in particular at least four photodiodes and corresponding transistors of the deactivator type, respectively activator, within the cell.
- the power supply of the sensor can be done in various ways.
- the optical sensor preferably comprises a source of autonomous electrical energy, preferably photovoltaic. It may thus comprise one or more photodiodes of the same type as the photosensitive cell or cells dedicated to feeding the sensor, preferably several photodiodes connected in series, so as to increase the voltage supplied.
- the arrangement of the photodiodes of power supply can be various.
- the source of autonomous electrical energy comprises several photodiodes arranged around a matrix of photosensitive cells or distributed between the photosensitive cells.
- the reading circuit can be realized in various ways. It must be sensitive to a weak synaptic current, hence the use of transistor (s) operating below the threshold at the cell.
- the read circuit itself may consist of any current measuring circuit, without specific constraint of operation in current or voltage.
- the read circuit comprises at least one artificial neuron.
- the artificial neuron may be spikes (impulses) of Axon-Hillock type, Morris-Lecar type, etc.
- the photodiode can then correspond to a cone or rod, the transistor associated with one or more horizontal cells, bipolar and amacrine, and the artificial neuron to a ganglion cell generating pulses.
- the artificial neuron is arranged to generate pulses at a frequency which depends on the charge level of the integration capacitor and therefore on the optical power received by at least one photodiode.
- the artificial neuron is at very low power consumption, and uses transistors operating below the threshold, so as to operate with a reduced supply voltage (V d d ⁇ Vt).
- At least the impulse circuit of the artificial neuron is powered by a power supply (VN, Vp) for which the negative voltage (VN) is between -200 mV and 0 mV and the positive voltage (Vp) included between 0 mV and +200 mV.
- VN, Vp negative voltage
- Vp positive voltage
- Vth being the threshold voltage of all the MOS transistors of the artificial neuron.
- V p Vdd is preferably chosen.
- the artificial neuron comprises:
- a feedback pulse circuit comprising:
- FIRE I LLE OF REM PLACEM ENT (RULE 26) a bridge with PMOS and NMOS transistors in series and connected in their drains by a midpoint to the integration capacity, this midpoint defining the output of the artificial neuron,
- CMOS inverters each consisting of two transistors, the input of the first inverter being connected to the integration capacitor and its output to the input of the second inverter and to the gate of one of the transistors of the bridge the output of the second inverter being connected to the gate of the other transistor of the bridge, or
- CMOS inverters including two inverters are in cascade, each consisting of two transistors, the input of the first inverter being connected to the integration capacitor and its output to the input of the second inverter, the output of the second inverter being connected at the gate of one of the transistors of said bridge, the input of the third CMOS inverter being connected to the integration capacitor and the output of the third CMOS inverter being connected to the gate of the other transistor of said bridge.
- All the transistors of the artificial neuron preferably operate below the threshold, thus generating a low power consumption.
- the subject of the invention is also, independently or in combination with the foregoing, the variants as defined below:
- FIRE I LLE OF REM PLACEM ENT at least two CMOS inverters between the integration capacitance and the gates of the transistors of said bridge so as to cause the transistors of the bridge to change state as a function of the voltage of the integration capacitor and to allow the pulse circuit to generate at least one pulse when the voltage of the integration capacitance crosses a predefined threshold, with load of the integration capacitor by one of the transistors of the bridge and discharged by the other transistor.
- a feedback pulse circuit comprising:
- CMOS inverters between the integration capacitance and the gates of the transistors of said bridge so as to cause the transistors of the bridge to change state as a function of the voltage of the integration capacitor and to allow the pulse circuit to generate at least one pulse when the voltage of the integration capacitance crosses a predefined threshold, with loading of the integration capacitor by one of the transistors of the bridge and discharge by the other transistor, said neuron being remarkable in that the delay capacitance connected to the NMOS transistor is greater than the integration capacitance.
- a feedback pulse circuit comprising:
- CMOS inverters between the integration capacitance and the gates of the transistors of said bridge so as to cause the transistors of the bridge to change state as a function of the voltage of the integration capacitor and to allow the pulse circuit to generate at least one pulse when the voltage of the integration capacitance crosses a predefined threshold, with loading of the integration capacitor by one of the transistors of the bridge and discharge by the other transistor, said neuron being remarkable in that it comprises two cascaded CMOS inverters, the input of the first inverter being connected to the membrane capacitance (Cm) and its output to the input of the second inverter, the output of the second inverter being connected to the gate of one of the transistors of said bridge, and a third CMOS inverter whose input is connected to the membrane capacitance (Cm) and the output to the gate of the other transistor of said bridge.
- the read circuit comprises a neural network.
- this neuronal network comprises at least two artificial neurons called pre-neuron and post-neuron neurons, connected together by a synaptic circuit in the form of an excitatory or inhibitory synapse.
- Excitatory synapses favoring the creation of an action potential by postneuron, depolarize the post-neuron membrane (ie increase its potential) and have a role similar to that of sodium channels in biology.
- Inhibitory synapses which are detrimental to the creation of an action potential by the postneurone, hyper-polarize the post-neuron membrane (ie decrease its potential) and have a role similar to that of the potassium channels in biology.
- said neuron network implements transistor neurons operating below the threshold.
- an excitatory synapse may be represented by two series transistors connected between the positive supply Vp and the post-neuron membrane:
- FIRE I LLE OF REM PLACEM ENT (RULE 26) A MOS transistor (N or P) whose gate is connected to a control voltage VI which makes it possible to control the charge current of the post-neuron membrane.
- an inhibitory synapse can be represented by two series transistors connected between the post-neuron membrane and the negative VN supply:
- An NMOS transistor whose gate is connected to the output of two cascaded inverters whose input is the membrane voltage of the pre-neuron. This signal can be collected at the output of a couple of suitable cascade inverters (belonging to the artificial neuron or not), the source being at the potential VN.
- a MOS transistor (N or P) whose gate is connected to a control voltage VI which makes it possible to control the discharge current of the post-neuron membrane.
- each photosensitive cell advantageously comprises several photodiodes and associated transistors, constituting as many pixels of the sensor, and a single reading circuit per cell.
- the pixels can be of the same size, having the same photodiode surface. Otherwise, the pixels may be of different size, as is the case for logarithmic sensors, for example.
- this synapse plays no role and the neuron can be made very sensitive.
- the current generated in the inhibitory synapse the membrane reduces its sensitivity.
- FIGS. 1 and 2 are diagrammatic representations of a sensor according to the invention.
- FIG. 3 illustrates an example of adjustment of the synaptic weight in the case of a photodiode associated with a transistor operating under the threshold as an excitatory synapse
- FIG. 4 represents an elementary association of an activating transistor and a deactivating transistor within a sensor according to the invention
- FIGS. 5 and 6 respectively illustrate the implementation of an ON cell and an OFF cell
- FIGS. 7 and 8 are matrix representations of an ON or OFF cell from a central pixel and its neighbors, respectively according to a rectangular network and hexagonal network distribution,
- FIG. 9 illustrates an example of control of the frequency of the pulses as a function of the optical power received over a certain number of pixels
- FIGS. 10 and 11 respectively represent the arrangement of an external photovoltaic power supply or integrated into the sensor
- Fig. 12 illustrates an example of an integrated photovoltaic power supply
- Figs. 13 and 14 show exemplary structures of an artificial neuron with two inverters and three inverters, respectively.
- FIGS. 1 and 2 show diagrammatically an optical sensor 1 according to the invention.
- a sensor may comprise, as illustrated, a PMOS transistor 3, a photodiode 2, an integration capacitor C m and a read circuit 10.
- the photodiode 2 is connected to the gate of the transistor 3 by its cathode, its anode being connected to the supply voltage Vdd.
- the drain of the transistor 3 is connected to a terminal of the integration capacitor C m also constituting an input-output of the reading circuit 10.
- the photodiode 2 operates in photovoltaic open circuit mode where the voltage at its terminals is strictly positive, V co > 0, and the current flowing through it is zero. In this mode, the photodiode is able to generate energy, contrary to the usual mode (receiver mode) in which the photodiode is reverse biased.
- the transistor 3 operates below the threshold, and the drain current in it varies exponentially with the gate-source voltage, and therefore with the open circuit voltage of the
- Transistor 3 operating below the threshold is comparable to an excitatory synapse.
- G p is the conductance of the transistor
- ⁇ the ideality coefficient of the current-voltage characteristic Ids (V gs ) of the transistor and V m the voltage across the capacitor as shown.
- the cathode of the photodiode is connected to the gate of the PMOS transistor. This leads de facto that the total current I of the photodiode, whose expression is the following, is zero:
- Vt kT / q is the thermal potential
- I s the saturation current of the PN junction constituting the photodiode
- I p h the photo-current generated by the photodiode defined by: QPppt
- q is the charge of the electron
- h is the Planck constant
- v is the frequency of the optical signal
- Q is the quantum efficiency
- P op t is the optical power
- V co nV t . Ln (l + - ') m with n the ideality coefficient of the voltage-current characteristic of the photodiode.
- a substantially linear relationship is thus obtained between the drain-source current and the photocurrent and thus between the drain-source current and the optical power received.
- the photodiode 2 is connected to the gate of the transistor 3 by its anode, its cathode being connected to the supply voltage V ss .
- the drain of the transistor 3 is connected to a terminal of the integration capacitor C m also constituting an input-output of the reading circuit 10.
- the transistor 3 operating below the threshold is comparable to an inhibitory synapse.
- this drain-source current can be called synaptic current.
- the 'weight' of the synapse can be adjusted for example:
- Adjustment transistor 4 is placed between the drain of transistor 3 operating below the threshold and the integrating capacitance C m , as shown in FIG. 3).
- the global synaptic current can excite or inhibit the artificial neuron, among others depending on the role of transistor 3 operating under the threshold (respectively excitatory or inhibitory synapse).
- the neuron can be easily connected to neighboring photovoltaic cells to create contrast-sensitive cells, such as in a biological retina.
- FIG. 4 illustrates an example of elementary connection of the photodiodes in an excitation or inhibition configuration.
- the neuron 10 can be stable (does not generate pulses) or unstable (low frequency pulse generation).
- the photodiode 21 is connected to a PMOS transistor 31 equivalent to an excitatory synapse of the artificial neuron 10. It tends to promote the generation of pulses by the neuron 10 or to increase the frequency thereof.
- the photodiode 22 is connected to an NMOS transistor 32 equivalent to an inhibitory synapse. It tends to reduce the aforementioned frequency. Since photodiodes operate in an open circuit, the same photodiode can be connected to different synapses without modifying its properties.
- activation and deactivation transistors Any combination of activation and deactivation transistors is possible because all the currents will be added algebraically to the same node constituting the input-output of the neuron. For example, the equivalent of the ON and OFF cells of the biological retina can be created.
- FIG. 5 represents an artificial implementation of an ON cell with a photodiode 21 associated with an activator transistor 31 acting as excitatory synapse at the center and a plurality of photodiodes 22 associated with deactivating transistors 32 connected in parallel and acting as inhibitory synapses at the periphery .
- the number of photodiodes 22 associated with the deactivating transistors 32 will be chosen according to the application and the targeted characteristics.
- FIG. 6 represents an artificial implementation of an OFF cell with a photodiode 22 associated with a deactivating transistor 32 acting as an inhibitory synapse in the center and several photodiodes 21 associated with activating transistors 31 connected in parallel and acting as excitatory synapses at the periphery .
- FIG. 7 describes an elementary association by considering a "square" (square or rectangular) type matrix of pixels 40, among which we can consider sub-assemblies consisting of central pixels 50 and peripheral pixels 55. If we operate a corresponding to FIG. 5 (diagram representing an ON cell), the pixel 50 in the center of FIG. 7 corresponds to the photodiode whose cathode is connected to the gate of the activating transistor PMOS (excitatory synapse), whereas the four peripheral pixels 55 surrounding the pixel of the center 50 have their cathode connected to ground and their anode connected to the gate of an NMOS deactivator transistor (synapse inhibitor).
- the artificial neuron will have a relatively low pulse frequency, or even zero.
- the global excitation current on the neuron membrane will increase and the pulse frequency too.
- the sum of the inhibition currents will be greater than the excitation current and the neuron will generate no more pulses (or very little, that is to say that the pulse frequency is relatively low, even zero as in case of uniform illumination).
- FIG. 7 An architecture dual to that of the circuit of FIG. 7 can also be used in order to obtain an OFF cell as shown in FIG. 6 where the center pixel 50 is associated with an inhibitory synapse (photodiode connected to a deactivating transistor) and the four peripheral pixels 55 of the periphery are associated with excitatory synapses (photodiodes connected to activating transistors).
- the center pixel 50 is associated with an inhibitory synapse (photodiode connected to a deactivating transistor) and the four peripheral pixels 55 of the periphery are associated with excitatory synapses (photodiodes connected to activating transistors).
- the topology organized into a "square" type matrix can be changed to a hexagonal configuration like that presented in FIG. 8. Any polygonal topology is of course possible.
- the total synaptic current I to t applied to the neuron is expressed as follows:
- the conductances G eX c, i and Ginhj of the transistors may be adjusted by the parameters of the transistors (length and gate width, for example) as a function of the application.
- an artificial vision system As the human eye does very well, it is desirable for an artificial vision system to be able to adapt to the average luminance of the scene and to be able to detect outlines and shapes in both low and high brightness.
- the neuron will be hyperpolarized by a strong current in the deactivating transistors 32, which creates a leak which discharges the capacitance integration, and in case of low light, the neuron will be depolarized by reduction or cancellation of this leakage current.
- FIGS. 10 and 11 show two ways of producing the energy required to operate an optical sensor 1.
- photovoltaic supply cells 100 are placed around the pixels, and in FIG. arranged in rows alternating with those of the pixels.
- two or more diodes 25 may be put in series, as illustrated in FIG.
- FIG. 13 schematically illustrates an exemplary embodiment of the artificial neuron 10.
- the artificial neuron 10 comprises two inverters 5 and 6 connected in cascade, the output of the first being connected to the input of the second.
- the output of the first inverter 5 is connected to the gate of a PMOS transistor 8.
- the output of the second inverter is connected to the gate of an NMOS transistor 7.
- Transistors 7 and 8 are electrically connected in series and form a bridge between supply voltage Vdd and ground.
- the mid-point 9, defining the connection of the drains of the transistors of the bridge, is connected to a terminal of the integration capacitor C m .
- the other terminal of the integration capacitance C m is connected to ground.
- a capacitance Ck is connected between the ground and the gate of the NMOS transistor 7.
- a capacitance C na is connected between Vdd and the gate of the PMOS transistor 8.
- Iex denotes the external excitation current, which charges or discharges the integration capacitance C m and which originates from the activation or deactivation transistor or transistors.
- the integration capacitance C m When the potential at the terminals of the integration capacitance C m reaches the threshold voltage of the first inverter 5, a corresponding potential is then transmitted after a first inversion by the inverter 5 to the gate of the PMOS transistor 8, activating the latter after a delay defined by the capacity C na .
- the integration capacitance C m is charged by the open conduction channel of the PMOS transistor 8. This charge corresponds to the rising edge of the output action potential.
- the threshold voltage of the second inverter 6 When the threshold voltage of the second inverter 6 is reached, a corresponding potential is transmitted to the gate of the NMOS transistor 7, activating the latter after a delay defined by the delay capacitance Ck, which is in the example considered longer than the PMOS activation time, due to the choice of Ck> C na .
- the integration capacitance C m After having had time to load, the integration capacitance C m begins to discharge at the opening of the conduction channel of the NMOS transistor 7.
- FIG. 14 schematically shows an artificial neuron 10 according to another embodiment, which differs from that of FIG. 13 by the addition of a third inverter 12, the first inverter 13 transmitting the output potential after inversion to the gate of the PMOS transistor 8 of the bridge and the two other inverters 11 and 12, connected in cascade, transmitting the output potential to the gate of the NMOS transistor 7.
- the inputs of the inverters 13 and 11 are connected to the midpoint 9 of the bridge and the integration capacitor, and the input of the inverter 12 is connected to the output of the inverter 11.
- the addition of the third inverter makes it possible to independently optimize the controls of the transistors of the bridge, by independently adjusting the threshold voltages of the inverters.
- the threshold voltage of the neuron that produces the action potential is the threshold voltage of the inverter supplying the PMOS transistor of the bridge.
- the number of inverters used can be defined according to objectives of speed or energy consumption.
- the reading circuit no longer comprises a single transistor neuron operating below the threshold but a network of transistor neurons operating below the threshold
- the synaptic circuit has two inputs and comprises two transistors. connected in series by their drains, at least one of said transistors being of NMOS type controlled by a gate potential corresponding to the first input of the synaptic circuit, the gate of the second transistor corresponding to the second input of the synaptic circuit, the output of the synaptic circuit corresponding to the source of the NMOS transistor being connected to the output potential of the post-neuron.
- said synaptic circuit may correspond to:
- An excitatory synapse where the second input of the synaptic circuit is connected to the output of an inverter (preferably the first inverter of the preneurone) having as input the membrane potential of the pre-neuron, in particular at the gate of the PMOS transistor of the bridge of the pre-neuron, or
- An inhibitory synapse where the second input of the synaptic circuit is connected to the output of two inverters in series (preferentially the two cascaded inverters of the pre-neuron) whose input of the first is subjected to the membrane potential of the pre-neuron, or
- An inhibitory synapse where the second input of the synaptic circuit is connected to the gate of the NMOS transistor of the pre-neuron bridge.
- the invention is particularly applicable to retinal implants, but nevertheless covers a broad application spectrum. It can for example be used in robotics, home automation, image and video processing, etc.
- the architecture of the artificial neuron associated with a cell of the optical sensor according to the invention may be other than those described above.
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PCT/EP2018/079119 WO2019081562A1 (en) | 2017-10-25 | 2018-10-24 | Optical sensor |
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US11521994B2 (en) * | 2017-12-06 | 2022-12-06 | Ohio State Innovation Foundation | Open circuit voltage photodetector |
WO2021081533A1 (en) * | 2019-10-25 | 2021-04-29 | Nanovision Biosciences, Inc. | Retinal prostheses |
US12028629B2 (en) * | 2019-12-02 | 2024-07-02 | Sony Semiconductor Solutions Corporation | Solid-state imaging device and electronic device |
US11521997B2 (en) * | 2020-04-16 | 2022-12-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-protrusion transfer gate structure |
EP4113520A1 (en) * | 2021-07-02 | 2023-01-04 | Nxp B.V. | Storage device and method of producing the same |
TWI792797B (en) * | 2021-12-22 | 2023-02-11 | 大陸商北京集創北方科技股份有限公司 | Strong light afterimage removal circuit, under-screen fingerprint recognition device, image sensing device, and information processing device |
FR3143195A1 (en) | 2022-12-08 | 2024-06-14 | Université de Lille | Optical sensor |
CN116387336B (en) * | 2023-06-01 | 2023-08-22 | 之江实验室 | Contour enhancement sensor based on TFT backboard, array layout and design method |
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US4988891A (en) * | 1989-05-09 | 1991-01-29 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor neural network including photosensitive coupling elements |
US5024223A (en) | 1989-08-08 | 1991-06-18 | Chow Alan Y | Artificial retina device |
US5865839A (en) | 1996-12-30 | 1999-02-02 | Doorish; John F. | Artificial retina |
US6046444A (en) * | 1997-12-08 | 2000-04-04 | Intel Corporation | High sensitivity active pixel with electronic shutter |
DE19921399C2 (en) * | 1999-05-07 | 2003-12-18 | Univ Eberhard Karls | Retinal implant |
US6999122B1 (en) * | 1999-07-22 | 2006-02-14 | Minolta Co., Ltd. | Solid-state logarithmic image sensing device |
US6647297B2 (en) * | 2000-08-09 | 2003-11-11 | The United States Of America As Represented By The Secretary Of The Navy | Permanent retinal implant device |
WO2003061537A1 (en) * | 2002-01-17 | 2003-07-31 | Masachusetts Eye And Ear Infirmary | Minimally invasive retinal prosthesis |
US7388183B2 (en) * | 2002-08-23 | 2008-06-17 | Micron Technology, Inc. | Low dark current pixel with a guard drive active photodiode |
US7408577B2 (en) * | 2003-04-09 | 2008-08-05 | Micron Technology, Inc. | Biasing scheme for large format CMOS active pixel sensors |
US8702503B2 (en) * | 2005-03-23 | 2014-04-22 | Hewlett-Packard Development Company, L.P. | Token configured to interact |
TW200701169A (en) * | 2005-05-19 | 2007-01-01 | Koninkl Philips Electronics Nv | Electroluminescent display devices |
JP5012188B2 (en) * | 2007-05-14 | 2012-08-29 | コニカミノルタホールディングス株式会社 | Solid-state imaging device |
US8203111B2 (en) * | 2009-03-23 | 2012-06-19 | Tower Semiconductor Ltd. | CMOS image sensor pixel with an NMOS charge amplifier |
FR2953394B1 (en) * | 2009-12-08 | 2012-09-07 | Centre Nat Rech Scient | ARTIFICIAL RETINA COMPRISING A LAYER OF PHOTOVOLTAIC MATERIAL COMPRISING A TITANIUM SEMICONDUCTOR |
KR101822112B1 (en) * | 2010-10-27 | 2018-01-25 | 이리듐 메디칼 테크놀로지 컴퍼니 리미티드 | Flexible artificial retina devices |
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CN104135632B (en) * | 2014-08-18 | 2017-06-30 | 北京思比科微电子技术股份有限公司 | Non-linear cmos image sensor pixel and its method of work |
FR3050050B1 (en) * | 2016-04-11 | 2021-10-15 | Univ De Lille 1 | ARTIFICIAL NEURONE |
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