EP3641980B1 - Procédé de mesure de la distance dans un dispositif d'usinage laser et dispositif d'usinage laser - Google Patents

Procédé de mesure de la distance dans un dispositif d'usinage laser et dispositif d'usinage laser Download PDF

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Publication number
EP3641980B1
EP3641980B1 EP18734179.7A EP18734179A EP3641980B1 EP 3641980 B1 EP3641980 B1 EP 3641980B1 EP 18734179 A EP18734179 A EP 18734179A EP 3641980 B1 EP3641980 B1 EP 3641980B1
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EP
European Patent Office
Prior art keywords
optical element
transmissive optical
optical
transmissive
lens
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EP18734179.7A
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German (de)
English (en)
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EP3641980A1 (fr
Inventor
Rüdiger MOSER
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Precitec GmbH and Co KG
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Precitec GmbH and Co KG
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/046—Automatically focusing the laser beam
    • B23K26/048—Automatically focusing the laser beam by controlling the distance between laser head and workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B23K26/24—Seam welding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • B23K26/705—Beam measuring device
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/0037—Measuring of dimensions of welds
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G01B9/02091—Tomographic interferometers, e.g. based on optical coherence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements

Definitions

  • the present disclosure relates to a distance measurement apparatus and method for a laser processing system, and relates to a laser processing system.
  • the present disclosure relates in particular to a laser welding head with an optical coherence tomograph.
  • a vapor capillary also known as a "keyhole" is created during a welding process along the beam axis of the processing beam and is surrounded by liquid melt.
  • the depth of the vapor capillary is related to the depth of the weld or weld depth. Welding depth is an important parameter, as too little depth can result in a lack of strength in the welded joint. Conversely, too great a depth can cause weld through, revealing the weld on the back side.
  • a measuring beam directed into the vapor capillary can be used to determine the depth of the vapor capillary or the penetration depth. Both the size or the diameter of the measuring beam on the workpiece surface and the lateral impact position are decisive for an error-free measurement of the depth of the vapor capillary or the welding depth.
  • the impact position of the measurement beam can be adjusted by deflecting the measurement beam. Since the measuring beam no longer runs on the optical axis when the beam is deflected, the measuring beam experiences aberrations that increase the diameter of the measuring beam in the area of the focus. Thus, the measurement of the depth of the vapor capillary or the welding depth can be inaccurate and subject to errors.
  • Mirror optics for example galvo scanners
  • mirrors When positioning the measuring beam on the vapor capillary, mirrors have two disadvantages. On the one hand, small changes in the angle of the mirror cause large changes in the position of the measuring beam due to the law of reflection. On the other hand, a plane mirror does not affect the measuring beam, apart from changes in direction. In other words, imaging errors that occur, for example, in the focusing optics when the measuring beam does not pass through axially, cannot be compensated for by the plane mirror.
  • F-Theta lenses can be used as focusing optics, which ensure that the measuring beam always has the same diameter regardless of the deflection.
  • these lenses are expensive and usually only optimized for one wavelength.
  • the high-energy processing beam and the measuring beam often have different wavelengths.
  • the exit/entry surface of the optical waveguide can be displaced transversely to its optical axis in relation to the collimating lens. This requires drives with high precision.
  • U.S. 2016/0202045 A1 shows a laser processing apparatus with a negative lens and a positive lens.
  • the measuring device comprises a displaceable collimation lens which is arranged between the transport fiber of a measuring arm and a workpiece in the measuring arm.
  • US2013/1489925 discloses a laser system with a translation device having collimating and focusing lenses and a translation lens capable of lateral translation of a laser beam.
  • U.S. 2005/0259306 A1 discloses a two-dimensional optical scanning system capable of scanning an optical beam over a predetermined area to produce a two-dimensional display.
  • U.S. 2015/283613 A1 discloses a method of welding a workpiece using a high energy beam, which may be a laser beam, and an apparatus implementing the method.
  • a distance measurement device for a laser processing system comprises collimating optics defining an optical axis and arranged to collimate an optical beam, deflection optics, the deflection optics comprising at least one transmissive optical element displaceable with respect to the optical axis in order to deflect the collimated optical beam from the optical axis.
  • the device includes focusing optics that are set up to focus the deflected optical beam onto a workpiece.
  • the optical beam is an optical measurement beam.
  • the device according to the invention for measuring distances for a laser processing system comprises: collimator optics which define an optical axis (201) and are set up to collimate an optical measurement beam; and a deflection optic, the deflection optic comprising at least one transmissive optical element that is translatable with respect to the optical axis in order to deflect the collimated optical measurement beam from the optical axis; the deflection optics being arranged in the beam path in front of a focusing optics which is set up to focus the deflected optical measuring beam onto a workpiece. can be arranged in the beam path in front of the focusing optics for focusing the deflected optical measuring beam onto the workpiece.
  • the focusing optics can be part of the device or part of the laser processing system.
  • the at least one displaceable transmissive optical element can be displaceable essentially transversely or perpendicularly to the optical axis.
  • the deflection optics can additionally comprise at least one fixed transmissive optical element.
  • the at least one transmissive optical element can comprise or be a plano-concave lens and/or a plano-convex lens and/or an aspherical or spherical lens.
  • the at least one transmissive optical element comprises a first transmissive optical element and a second transmissive optical element. In this case, the first transmissive optical element can be arranged in the beam path in front of the second transmissive element.
  • the first transmissive optical element can be a plano-concave lens and the second transmissive optical element can be a plano-convex lens.
  • the first transmissive optical element can be a plano-convex lens and the second transmissive optical element can be a plano-concave lens.
  • the plano-concave lens may have a first radius and the plano-convex lens may have a second radius, the first radius and the second radius being substantially the same.
  • the first radius and/or the second radius can be in the range of 20 to 2000 mm, in particular the first radius and/or the second radius can be approximately 200 mm.
  • the transmissive optical elements can either consist of the same optical material or of different optical materials.
  • the first transmissive optical element and the second transmissive optical element can be shiftable with respect to each other.
  • the first or the second transmissive optical element can be displaceable with respect to the optical axis.
  • the other of the first and second transmissive optical elements may be substantially stationary with respect to the optical axis.
  • both the first transmissive optical element and the second transmissive optical element can also be displaceable with respect to the optical axis.
  • the deflection optics or the at least one transmissive optical element can be set up to compensate for imaging errors of the optical measuring beam on the workpiece.
  • the deflection optics or the at least one transmissive optical element can be set up to compensate for an imaging error of a focusing optics.
  • the device comprises a coherence interferometer or an optical coherence tomograph.
  • a laser processing system includes a laser device for generating a processing beam, wherein the laser device is set up to direct the processing beam onto a processing area of a workpiece, and the device for distance measurement according to the embodiments described here.
  • the laser device can include collimator optics for collimating the processing beam and/or focusing optics for focusing the processing beam onto the workpiece.
  • the focusing optics can also be set up to focus the deflected measuring beam onto the workpiece.
  • the optical axis of the device for distance measurement or the deflection optics can match an optical axis of the laser device.
  • the processing beam and the optical measuring beam can be coaxial at least in sections.
  • the processing beam and the optical measuring beam can be superimposed coaxially at least in sections.
  • the device can be set up to position the optical measuring beam with respect to a processing direction or feed direction of the processing beam on the workpiece in front of the processing beam, i.e. on an area of the workpiece that is still to be processed, after the processing beam, i.e. on an area of the workpiece that has already been processed, or on Provide location of the processing beam.
  • a method for distance measurement for a laser processing system includes collimating an optical measurement beam, deflecting the collimated optical measurement beam by displacing at least one transmissive optical element, and focusing the deflected optical measurement beam onto a workpiece.
  • the method includes: determining a depth or a depth profile of a vapor capillary on the workpiece and/or a topography of the workpiece using the measuring beam reflected by the workpiece.
  • At least one transmissive optical element is inserted into the collimated beam path of the optical measuring beam, which allows the collimated optical measuring beam to be deflected from its optical axis and at the same time to compensate for the imaging errors that occur, for example, in the focusing optics.
  • the divergence of the optical measuring beam is not or only slightly affected.
  • the optical measurement beam therefore also runs collimated after the transmissive optical element for beam deflection. This allows the measuring beam, which runs through the focus lens of the high-energy processing beam, to be deflected laterally without imaging errors occurring in the area of the workpiece surface.
  • the precision or positioning accuracy with which the beam can be deflected can be increased.
  • a distance measurement such as a depth measurement of the vapor capillary, can take place with high precession.
  • figure 1 12 shows a schematic sectional view of a workpiece (top) and a top view of the workpiece (bottom) to show a vapor capillary and a measuring beam during welding according to embodiments of the present disclosure.
  • a vapor capillary 11 which is also referred to as a keyhole, and which is surrounded by liquid melt 12, is formed during a welding process in the deep laser welding process along the beam axis of the processing beam 10.
  • the depth Td of the vapor capillary also referred to below as the keyhole depth, is related to the weld seam or weld depth Te. Seen in the feed direction behind the liquid melt 12 is the solidified melt 14.
  • the measuring beam 13 of an optical coherence tomograph can be superimposed coaxially with the processing beam 10 and focused into the opening of the vapor capillary 11.
  • the incident light strikes the bottom or the end of the vapor capillary 11, is partially reflected there and returns to the optical coherence tomograph, with the aid of which the depth Td of the vapor capillary 11 can be measured with high precision.
  • the measuring beam 13 (the measuring light) is reflected only very poorly at its lower end. Furthermore, the opening of the vapor capillary 11 has a small diameter into which the measuring beam 13 has to be focused. Typical focus diameters of the high-energy processing beam 10 are in the range from 100 to 1000 ⁇ m. The opening diameter of the vapor capillary 11 can have a smaller diameter. It is therefore desirable to focus the measuring beam 13 on a diameter that is smaller than the opening of the vapor capillary 11 and to also align it laterally so that it completely hits the opening of the vapor capillary 11 and spreads out to its bottom or end can.
  • the measuring beam 13 can be positioned in the wake, particularly at higher feed rates. If the lateral impingement position of the measurement beam 13 is not ideal, then only a small amount of data from the bottom of the vapor capillary 11 is recorded. Instead, distance information is provided from a higher position on the side wall of the vapor capillary 11 or even from the surface of the workpiece. This makes it more difficult or no longer possible to determine the depth Td of the vapor capillary 11 . For this reason, both the size of the measuring beam 13 on the workpiece surface and the lateral impact position are decisive for an error-free and precise measurement of the depth Td of the vapor capillary 11.
  • the measuring beam 13 can be laterally displaced in its position during a processing operation in an area around the impingement position of the high-energy processing beam 10.
  • the displacement of the measuring beam 13 is carried out by deflection elements in the beam path of the measuring beam 13.
  • the deflection of the measuring beam 13 can take place before the coaxial superposition of the measuring beam 13 and the processing beam 10, so that the high-energy processing beam 10 remains unaffected by the deflection. In other words, a relative movement between the processing beam 10 and the measuring beam 13 should take place. So that the lateral position of the measuring beam 13 changes in the processing plane, the measuring beam 13 is deflected from its optical axis before impinging on the focus lens.
  • the measuring beam 13 and the optical axis then assume an angle of greater than 0°.
  • the relative movement between the processing beam 10 and the measuring beam 13 can also be achieved by deflecting the processing beam 10 .
  • the deflection optics 220 can be arranged in the beam path of the collimated processing beam 10 in front of the focusing optics 130 .
  • deflecting elements can be integrated into the beam path after the collimation unit, such as deflection mirrors (galvo scanners) attached to galvanometer motors, in order to change the deflection angle.
  • the measuring beam of the coherence tomograph will run obliquely through the focusing optics, resulting in imaging errors.
  • the diameter of the measuring beam on the component surface increases with increasing deflection due to imaging errors. If the ideal position for depth measurement is not on the optical axis, the measuring beam may no longer be fully focused in the vapor capillary (cf. figure 4 above).
  • At least one displaceable transmissive optical element is inserted into the collimated beam path of the optical measuring beam 13, which allows the collimated optical measuring beam to be deflected from its optical axis and at the same time the aberrations that occur, for example, at the focusing Optics arise to compensate.
  • the divergence of the optical measuring beam 13 is not affected or is only slightly affected.
  • the optical measuring beam 13 therefore also runs essentially collimated after the optical elements for beam deflection.
  • the size of the measuring beam 13 on the workpiece surface and the lateral impingement position can be adjusted precisely, as a result of which an error-free and precise measurement of the depth Td of the vapor capillary 11 is possible.
  • FIG 2 10 shows a schematic representation of a laser processing system 100 according to embodiments of the present disclosure.
  • the laser processing system 100 can include a laser welding head 101, and in particular a laser welding head for deep laser welding.
  • the laser processing system 100 comprises a laser device 110 for generating a processing beam 10 (also referred to as "laser beam” or “processing laser beam”) and the device 200 for distance measurement according to the embodiments described here.
  • the laser device 110 is set up to direct the processing beam 10 onto a processing area of a workpiece 1 .
  • the laser device 110 can have a collimator lens 120 for collimating the processing beam 10 .
  • the laser device 110 has focusing optics 130 for focusing the processing beam 10 on the workpiece 1 .
  • the device 200 for distance measurement comprises a collimator optics 210, which is set up to collimate an optical measuring beam 13, and a deflection optics 220, the deflection optics 220 comprising at least one transmissive optical element that can be displaced with respect to the optical axis is to deflect the collimated optical measurement beam 13 from the optical axis.
  • the optical axis is defined here by an optical fiber for the optical measuring beam 13 or by the collimator optics 210 .
  • the focusing optics 130 of the laser device 10 can be used to focus the deflected optical measurement beam 13 on the workpiece 1 .
  • the device 200 for distance measurement can also include an additional focusing optics 230 (see FIG figure 3 ).
  • the device 200 may comprise a coherence interferometer or an optical coherence tomograph or be a coherence interferometer or optical coherence tomograph.
  • a method for distance measurement for a laser processing system can include collimating an optical measurement beam, deflecting the collimated optical measurement beam by displacing at least one transmissive optical element, and focusing the deflected optical measurement beam onto a workpiece.
  • the method can be implemented by the distance measurement device disclosed herein.
  • the processing beam 10 and the optical measuring beam 13 can be at least partially coaxial, and can in particular be superimposed at least partially coaxially.
  • the device 200 be set up to couple the optical measuring beam 13 into a beam path of the laser device 110 .
  • the optical measurement beam 13 and the processing beam 10 can be combined after the deflection optics 220 and before the focusing optics 130 .
  • the collimator optics 210, the deflection optics 220 and the focusing optics 130 or 230 are integrated into the welding head 101.
  • the weld head 101 may include a collimator module 102 that is integrated into the weld head 101 or mounted on the weld head 101 .
  • the collimator module 102 may include the collimator optics 210 and the deflection optics 220 .
  • the focusing optics 130 can be common focusing optics, such as a focus lens, for the processing beam 10 and the measuring beam 13 .
  • the laser processing system 100 or parts thereof, such as the welding head 101, can be movable along a processing direction 20 according to embodiments.
  • the processing direction 20 can be a welding direction and/or a direction of movement of the laser processing system 100, such as the welding head 101, with respect to the workpiece 1.
  • the processing direction 20 can be a horizontal direction.
  • the processing direction 20 can also be referred to as the “feed direction”.
  • the real-time determination or measurement of the depth of the vapor capillary is based on the principle of optical coherence tomography, which uses the coherence properties of light with the aid of an interferometer.
  • the device 200 can comprise a coherence interferometer or an optical coherence tomograph.
  • the device 200 can include an evaluation unit 240 with a broadband light source (for example a superluminescence diode, SLD), which couples the measurement light into an optical waveguide 242 .
  • a beam splitter 244 which preferably has a fiber coupler, the measuring light is split into a reference arm 246 and a measuring arm, which leads into the welding head 101 via an optical waveguide 248.
  • the collimator optics 210 serves to collimate the measuring light (optical measuring beam 13) emerging from the optical waveguide 248.
  • the optical measurement beam 13 in the welding head 101 can be coaxially superimposed with the processing beam 10 .
  • the processing laser beam 10 and the optical measuring beam 13 can then be focused onto the workpiece 1 by the focusing optics 130, which can be a common lens or focusing lens.
  • the impact position of the optical measuring beam 13 can be set by the deflection optics 220 in such a way that the measuring light is directed into the vapor capillary.
  • the measuring light reflected back from the vapor capillary is imaged by the focusing optics 130 onto the exit/entry surface of the optical waveguide 248, superimposed in the fiber coupler 244 with the light reflected back from the reference arm 246 and then directed back into the evaluation unit 240.
  • the superimposed light contains information about the difference in path length between the reference arm 246 and the measuring arm. This information is evaluated in the evaluation unit 240, giving the user information about the distance between the bottom of the vapor capillary and the welding head 101, for example.
  • the device 200 can be set up to use the optical measuring beam 10 to measure a distance from the workpiece 1, for example in relation to a reference point defined by the device 200.
  • the device 200 can be set up to measure a change in distance while the welding head 101 is moving along the processing direction 20 .
  • a depth profile of the vapor capillary can be created.
  • the topography of the workpiece 1, for example the weld seam can be measured.
  • the topography measurement can be used for error detection and/or control of one or more process input variables.
  • the process input variables can include, for example, a processing speed, a laser power, a laser focus, and/or operating parameters of the laser device.
  • a topography measurement can be performed in the area around the processing position.
  • the optical measuring beam 13 can be shifted laterally and height information can be recorded at the same time. This creates a height profile.
  • interesting height profiles in laser processing can be, for example, topographies in advance transverse to the feed direction, for example to identify a joint geometry that is to be welded.
  • a topography running transversely to the feed direction can be measured in the wake in order to record the height profile of the seam upper bead that occurs during the welding process.
  • the size of the optical measuring beam 13 on the component surface determines the lateral resolution in the topography measurement. If the optical measuring beam 13 experiences imaging errors as a result of the deflection, then on the one hand the lateral resolution decreases and on the other hand the measuring spot size and thus the resolution does not remain constant during a scan through the optical axis. This can be prevented by the deflection optics 220 according to the invention.
  • the device 200 is an optical distance measuring device for a laser processing system for carrying out distance measurements, for example before, during and after the laser processing.
  • the laser processing is carried out by the processing beam, which can be a high-energy processing beam.
  • the measurement system which can be designed as an optical coherence tomograph, is connected to the processing system and/or at least partially integrated into the processing system.
  • the optical measuring beam which can be a low-energy measuring beam, can be fed to the processing head via a light guide, collimated and then coaxially superimposed on the high-energy processing beam and focused on the workpiece to be processed by a common focus optics.
  • the device 200 contains one or more displaceable transmissive optical elements, with the help of which the lateral impingement position of the measuring beam on the workpiece 1 can be shifted in an area around the high-energy processing beam. This allows a distance measurement, such as a depth measurement of the vapor capillary, with high precession.
  • FIG. 2 shows a schematic representation of a device 200 for distance measurement for a laser processing system according to embodiments of the present disclosure.
  • spherical or aspheric focus lenses are often used. If the measuring light does not hit the focus lens vertically but at an angle, imaging errors occur. The dominant error that contributes significantly to the enlargement of the measuring spot in the processing plane is the coma aberration.
  • the obliquely incident rays are not all refracted evenly, which is why they do not reunite at one point in the focal plane. Instead, it creates a dot with a tail directed toward the edge, away from the optical axis.
  • the optical deflection system 220 with the at least one transmissive optical element is inserted into the beam path of the collimated optical measuring beam 13 .
  • the deflection optics 220 can be set up to compensate for imaging errors of the optical measuring beam 13 on the workpiece 1 .
  • the deflection optics 220 can be set up to compensate for an imaging error of the focusing optics 230 .
  • the divergence of the optical measuring beam 13 is not affected or is only slightly affected. The optical measuring beam 13 therefore also runs almost collimated after the at least one transmissive optical element for beam deflection.
  • the entire optical measuring beam can run in one axis from exiting the light guide to striking the workpiece or component.
  • the entire system becomes more compact.
  • Conventional galvanometer scanners deflect the measuring beam at each mirror so that the setup takes up more volume. Additional space along the optical axis can be saved by the linear movement of a displacement, instead of a tilting, rotation or the like.
  • the at least one transmissive optical element is a plano-concave lens (diverging lens) or a plano-convex lens (converging lens). Such lenses have a simple design and are inexpensive to produce.
  • the at least one transmissive optical element comprises a first transmissive optical element 222 and a second transmissive 224 optical element.
  • the first transmissive optical element 222 can be a plano-convex lens and the second transmissive optical element 224 can be a plano-concave lens, as in the example of FIG figure 3 is shown.
  • the first transmissive optical element can be a plano-concave lens and the second transmissive optical element can be a plano-convex lens.
  • the order of the lenses in the beam path of the measuring beam can be arbitrary.
  • the flat (planar) surfaces of the plano-concave lens and the plano-convex lens face each other.
  • the curved surfaces that is, the concavely curved surface of the plano-concave lens and the convexly curved surface of the plano-convex lens, are on the modified sides of the lenses.
  • the plano-concave lens can have a first radius and the plano-convex lens can have a second radius.
  • the first radius and the second radius are essentially the same.
  • the first radius and the second radius can be in the range of 20 to 2000 mm.
  • the first radius and the second radius are about 200mm.
  • the radii of the two lenses can be identical or nearly identical, but have an inverse Sign (converging lens and negative lens). If the focal lengths are large enough, their effects cancel each other out.
  • the lens radius of the plano-concave and plano-convex lens affects the extent to which aberrations are compensated. Furthermore, the radius influences how far the collimated optical measuring beam is deflected for a given deflection of the lens.
  • the "transmission ratio" between the mechanical deflection of the lens and the beam deflection on the workpiece surface can also be influenced via the lens radius. This allows the beam deflection and thus also the precision and reproducibility to be adapted to the respective circumstances.
  • the device according to the invention has a significantly lower adjustment sensitivity, which means that the precision for alignment to the ideal position for measuring the depth of the vapor capillary is significantly improved. Inexpensive drives with less precision can thus be used for the lateral displacement of the plano-concave lens, for example, without the necessary positioning accuracy of the optical measuring beam being lost.
  • At least one transmissive optical element of the deflection optics 220 can be displaced with respect to the optical axis 201 in order to deflect the collimated optical measuring beam 13 from the optical axis 201 .
  • the transmissive optical element can be displaceable laterally and/or essentially perpendicular to the optical axis 201 .
  • the term "displaceable" means translation or displacement of the transmissive optical element, as distinguished from rotation or tilting.
  • the device 200 includes at least one actuator (not shown), which is set up to move the at least one optical element with respect to the optical axis 201.
  • the first transmissive optical element 222 and the second transmissive optical element 224 can be displaced relative to one another.
  • the first transmissive optical element 222 can be displaceable with respect to the optical axis 201 and the second transmissive optical element 224 can be essentially stationary with respect to the optical axis 201.
  • the second transmissive optical element 224 can be displaceable with respect to the optical axis 201 and the first transmissive optical element 222 may be substantially stationary with respect to the optical axis 201.
  • both the first transmissive optical element 222 and the second transmissive optical element 224 can be displaceable with respect to the optical axis 201 .
  • the collimated optical measuring beam 13 can be deflected by an angle and a direction, as a result of which the optical measuring beam can be displaced in the processing plane.
  • the individual beams In addition to the deflection of the collimated beam, the individual beams also experience non-uniform refraction. Rays that are refracted to a lesser extent in the focus lens due to the oblique incidence and cause the tail or coma are refracted in the plano-concave lens in such a way that the weaker refraction of the focus lens is canceled out and the rays in the focal plane (workpiece surface) realign into hit a point. This leads to diffraction limited imaging. The aberrations of the focus lens can thus be compensated by the plano-concave lens. The measuring beam diameter can remain almost unchanged in the processing plane, regardless of the deflection (see figure 5 ).
  • the measuring beam can be shifted in its impingement position during the laser processing.
  • the device 200 can be set up to provide the measuring beam with respect to a processing direction 20 of the processing beam on the workpiece 1 before the processing beam, after the processing beam, or at the location of the processing beam.
  • Possible measurement positions include, for example: in front of the processing, in the processing area and behind the processing, seen in the feed direction of the high-energy processing beam.
  • the optical measuring beam 13 can be shifted during processing transversely and longitudinally to the feed direction through the impact point of the high-energy processing beam. In this way, depth profiles of the vapor capillaries occurring during processing with a high-energy processing beam can be created.
  • the device 200 can be configured to measure a distance to an area of the workpiece 10 that is adjacent to the processing area.
  • the area can be an unmachined surface of the workpiece 1 .
  • a topography measurement in advance e.g. a z-position of the workpiece surface
  • process control e.g. a z-position of the workpiece surface
  • figure 4 shows measurement signals of a coherence tomograph.
  • the energy of the high-energy machining beam is increased, which is why the depth of the vapor capillary increases.
  • the optical measuring beam has aberrations, which means that distance signals can be obtained from the surface of the workpiece, from the lowest point of the vapor capillary, but also from higher positions.
  • the coherence tomograph no longer supplies any measurement data from the bottom of the vapor capillary.
  • the optical measuring beam is focused on the workpiece surface without imaging errors. However, it does not hit the ideal lateral position, which is why not enough distance signals from the bottom of the vapor capillary are recorded, especially with large penetration depths.
  • a measurement at a non-ideal lateral position can occur if the measuring beam cannot be positioned precisely enough.
  • the optical measuring beam is focused onto the workpiece surface without imaging errors and is in the ideal position for detecting distance signals from the bottom of the vapor capillary.
  • the depth of the vapor capillary can be measured to great depths.
  • figure 5 shows a comparison of the diameter of the optical measuring beam on the workpiece surface of a conventional deflection device (left side) and the device according to the invention (right side).
  • FIG. 5 a schematic representation of a deflection device is shown by mirror optics and by the transmissive optical elements according to the invention for compensating for aberrations and increasing the positioning accuracy.
  • a simulated beam diameter (ray tracing) on the workpiece surface in the center of the scan field (optical measuring beam runs along the optical axis) is shown in the middle.
  • the circle marks the diffraction limit (theoretically minimum possible diameter of the optical measuring beam for the given image). Due to the diffraction limit, both deflection concepts have the same beam diameter.
  • a simulated beam diameter on the workpiece surface with a deflected optical measuring beam is shown below.
  • the optical measuring beam In the case of deflection by mirror optics, the optical measuring beam is no longer diffraction-limited and is given an elliptical shape. In the case of the transmissive optical elements for beam deflection according to the invention, the optical measurement beam remains diffraction-limited despite beam deflection. In the center and when deflected, the size of the optical measuring beam on the component surface remains unchanged.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Laser Beam Processing (AREA)

Claims (9)

  1. Système d'usinage au laser (100), comportant :
    un dispositif à laser (110) qui est configuré pour diriger un faisceau d'usinage (10) sur une zone d'usinage d'une pièce (1) ; et
    un dispositif (200) de mesure de distance, le dispositif (200) comportant :
    une optique de collimation (110, 210) qui définit un axe optique (201) et est conçue pour collimater un faisceau de mesure optique (13) d'un interféromètre à cohérence ou d'un tomographe à cohérence optique ;
    une optique de déviation (220) comportant au moins un élément optique transmissif (222, 224), qui peut être déplacé par rapport à l'axe optique (201) afin de dévier le faisceau de mesure optique collimaté (13) de l'axe optique (201) ; et
    une optique de focalisation (130, 230) qui est conçue pour focaliser le faisceau de mesure optique dévié (13') et le faisceau d'usinage (10) sur une pièce (1) ;
    dans lequel l'optique de déviation (220) est agencée dans le trajet de faisceau avant l'optique de focalisation (130, 230) ;
    dans lequel l'optique de déviation (220) comporte un premier élément optique transmissif (222) et un second élément optique transmissif (224) qui sont agencés l'un derrière l'autre dans le trajet de faisceau et dont au moins un peut être déplacé,
    dans lequel le premier élément optique transmissif (222) est une lentille concave plane et le second élément optique transmissif (224) est une lentille convexe plane, ou dans lequel le premier élément optique transmissif (222) est une lentille convexe plane et le second élément optique transmissif (224) est une lentille concave plane,
    dans lequel la lentille concave plane a un premier rayon et la lentille convexe plane a un second rayon, dans lequel la valeur absolue du premier rayon et la valeur absolue du second rayon sont sensiblement égales.
  2. Système d'usinage au laser (100) selon la revendication 1, dans lequel le au moins un élément optique transmissif (222, 224) peut être déplacé de manière sensiblement perpendiculaire à l'axe optique (201).
  3. Système d'usinage au laser (100) selon l'une des revendications précédentes, dans lequel le au moins un élément optique transmissif (222, 224) comporte une lentille sphérique et/ou une lentille asphérique.
  4. Système d'usinage au laser (100) selon l'une des revendications précédentes, dans lequel le premier élément optique transmissif (222) et le second élément optique transmissif (224) peuvent être déplacés l'un par rapport à l'autre.
  5. Système d'usinage au laser (100) selon l'une des revendications précédentes, dans lequel le premier élément optique transmissif (222) peut être déplacé par rapport à l'axe optique (201) et le second élément optique transmissif (224) est sensiblement fixe par rapport à l'axe optique (201), ou dans lequel le second élément optique transmissif (224) peut être déplacé par rapport à l'axe optique (201) et le premier élément optique transmissif (222) est sensiblement fixe par rapport à l'axe optique (201), ou dans lequel le premier élément optique transmissif (222) et le second élément optique transmissif (224) peuvent être déplacés par rapport à l'axe optique (201).
  6. Dispositif (200) selon l'une des revendications précédentes, dans lequel l'optique de déviation (220) est conçue pour compenser des aberrations du faisceau de mesure optique (13) sur la pièce (1).
  7. Système d'usinage au laser (100) selon l'une des revendications précédentes, dans lequel le faisceau d'usinage (10) et le faisceau de mesure optique (13) sont superposés coaxialement au moins dans certaines portions.
  8. Système d'usinage au laser (100) selon l'une des revendications précédentes, dans lequel le dispositif (200) est conçu pour délivrer le faisceau de mesure optique (13), par rapport à une direction d'usinage (20) du faisceau d'usinage (10) sur la pièce (1), avant le faisceau d'usinage (10), après le faisceau d'usinage (10) ou à l'emplacement du faisceau d'usinage (10).
  9. Procédé de mesure de distance pour un système d'usinage au laser (100), comportant les étapes consistant à :
    collimater un faisceau de mesure optique (13) d'un interféromètre à cohérence ou d'un tomographe à cohérence optique ;
    dévier le faisceau de mesure optique collimaté (13) en déplaçant au moins un élément optique transmissif (222, 224) d'une optique de déviation (220) ; et
    focaliser le faisceau optique dévié (13') et le faisceau d'usinage (10) sur une pièce (1) au moyen d'une optique de focalisation (130, 230), et
    déterminer une profondeur ou un profil de profondeur d'un capillaire de vapeur (11) sur la pièce (1) et/ou une topographie de la pièce (1) en utilisant un faisceau de mesure optique (13) réfléchi par la pièce (1),
    dans lequel l'optique de déviation (220) comporte un premier élément optique transmissif (222) et un second élément optique transmissif (224) qui sont agencés l'un derrière l'autre dans le trajet de faisceau et dont au moins un peut être déplacé ;
    dans lequel le premier élément optique transmissif (222) est une lentille concave plane et le second élément optique transmissif (224) est une lentille convexe plane, ou dans lequel le premier élément optique transmissif (222) est une lentille convexe plane et le second élément optique transmissif (224) est une lentille concave plane ;
    dans lequel la lentille concave plane a un premier rayon et la lentille convexe plane a un second rayon, dans lequel la valeur absolue du premier rayon et la valeur absolue du second rayon sont sensiblement égales.
EP18734179.7A 2017-06-23 2018-06-21 Procédé de mesure de la distance dans un dispositif d'usinage laser et dispositif d'usinage laser Active EP3641980B1 (fr)

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DE102017114033.6A DE102017114033B4 (de) 2017-06-23 2017-06-23 Vorrichtung und Verfahren zur Abstandsmessung für ein Laserbearbeitungssystem, und Laserbearbeitungssystem
PCT/EP2018/066658 WO2018234500A1 (fr) 2017-06-23 2018-06-21 Dispositif et procédé de mesure de distance pour un système de traitement au laser et système de traitement au laser

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EP3641980A1 (fr) 2020-04-29
US20180372483A1 (en) 2018-12-27
DE102017114033A1 (de) 2018-12-27
WO2018234500A1 (fr) 2018-12-27
DE102017114033B4 (de) 2021-11-25
US10422632B2 (en) 2019-09-24

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