EP3465352A1 - Composant optique de sécurité et procédé de fabrication d'un tel composant - Google Patents
Composant optique de sécurité et procédé de fabrication d'un tel composantInfo
- Publication number
- EP3465352A1 EP3465352A1 EP17729408.9A EP17729408A EP3465352A1 EP 3465352 A1 EP3465352 A1 EP 3465352A1 EP 17729408 A EP17729408 A EP 17729408A EP 3465352 A1 EP3465352 A1 EP 3465352A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- pattern
- optical security
- security component
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H1/0011—Adaptation of holography to specific applications for security or authentication
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/324—Reliefs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/41—Marking using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/45—Associating two or more layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0252—Laminate comprising a hologram layer
- G03H1/0256—Laminate comprising a hologram layer having specific functional layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/24—Processes or apparatus for obtaining an optical image from holograms using white light, e.g. rainbow holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
- G03H2001/187—Trimming process, i.e. macroscopically patterning the hologram
- G03H2001/188—Demetallisation, i.e. removing the enhancing metallic layer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2202—Reconstruction geometries or arrangements
- G03H2001/2223—Particular relationship between light source, hologram and observer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
- G03H2001/2263—Multicoloured holobject
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
- G03H2001/2273—Pseudo-dynamic holobject, e.g. due to angle multiplexing and viewer motion
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2210/00—Object characteristics
- G03H2210/30—3D object
- G03H2210/33—3D/2D, i.e. the object is formed of stratified 2D planes, e.g. tomographic data
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/10—Laminate comprising a hologram layer arranged to be transferred onto a carrier body
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/34—Colour layer
Definitions
- the present disclosure relates to an optical security component and a method of manufacturing such a component.
- the optical security component according to the present description applies in particular to the security marking for securing and authenticating valuable objects.
- DOE diffractive optical element
- HSO computer-generated hologram
- the data of the DOE can be determined by calculating an inverse Fast Fourier Transform (or FFT inverse, FFT being the abbreviation of "Fast Fourier Transform") of the desired reconstruction, that is to say of the desired intensity pattern in the far field or in the reconstruction plane.
- a diffractive optical element can operate in transmission (transmissive DOE) or in reflection (reflective DOE).
- a reflective layer can be applied to the micro structure encoding the complex phase and amplitude data.
- FIGS. 1A and 1B thus represent a document of value 1, for example an identity document, comprising a security optical component 2 with a diffractive optical element of DOE type (respectively reflective and transmissive), as described in the art prior.
- the beam 3 represents the lighting beam; it is for example derived from a point source or a laser.
- the beam 4 represents the reflected beam (FIG 1A) or transmitted (FIG 1B) by the security optical component 2.
- the data are calculated so that when the DOE is illuminated by a beam of light from a point source, a light intensity diagram 6 appears in a reconstruction plane 5.
- a difficulty in using this type of optical security components comes from the difficulty of producing elaborate color images. Indeed, when one illuminates this type of diffractive optical elements in polychromatic light, for example with a point white light, one generally obtains a white image with colored iridescence even if a DOE is calculated for a maximum efficiency with a length of d given wave.
- DOE diffractive optical element
- the present description presents an optical security component with a computer-generated hologram-type element, enabling the reconstruction of high quality colored images under spatially coherent polychromatic lighting, such as point or quasi-point white source and therefore without requiring a specific lighting device using multiple sources or filters.
- an optical security component intended to be authenticated in the visible spectrum, in spatially coherent polychromatic light, comprising:
- a first layer of dielectric material at least partially structured on one face, and having a first refractive index
- a second layer deposited on the at least partially structured face of said first layer in at least a first region, and having a spectral band of reflection in the visible;
- said first layer has in the first region at least a first structure formed by a first pattern modulated by a second pattern, such as:
- the first pattern is adapted to form a first computer-synthesized hologram diffractive element (HSO), calculated to generate, under spatially coherent illumination, at least a first recognizable image in at least a first given reconstruction plane,
- HSO computer-synthesized hologram diffractive element
- the second unit is a periodical network having a period of between 100 nm and 700 nm, determined to produce, after deposition of the second layer and encapsulation of said first structure by the third layer, a resonant filter in a first spectral band.
- the resonant filter is for example a resonant filter of DID type (for
- Diffractive identification Device which allows the excitation of guided modes within a region of the second layer of dielectric material, or a resonant filter plasmonic type obtained through a region of the second layer of metallic material which forms with the first and / or third layer of dielectric material a metal / dielectric interface or dielectric / metal / dielectric interfaces, or any other resonant filter having a spectral band of resonance in the visible.
- one and / or the other of the first and third layers of dielectric material is transparent in the visible spectral band.
- a layer is said to be transparent in a spectral band according to the present description if for each wavelength of said spectral band, at least 70% of a radiation at said wavelength is transmitted, preferably at least 80% and more preferably at least 90%.
- a thin layer is a layer of thickness between 10 nm and 200 nm.
- the period of the periodic network is between 200 nm and 500 nm.
- the network is a subwavelength network, that is to say having a wavelength less than the minimum wavelength of the wavelength range.
- a polychromatic light source for authenticating the component or the range of wavelength in which the authentication control is performed for example the range of wavelengths visible by the eye.
- HSO for "computer-synthesized hologram” is a diffractive optical element comprising complex phase and amplitude data physically encoded in a microstructure, these data being calculated so that, when the HSO is illuminated by a substantially collimated light beam, a two-dimensional light intensity diagram (for example a recognizable image) is generated in the far field or in a finite distance reconstruction plane of the component.
- the data of the HSO can be determined in a known manner by calculating a fast inverse Fourier Transform (or inverse FFT, FFT being the Anglo-Saxon abbreviation of "Fast Fourier Transform") of the desired reconstruction, that is, that is, the desired two-dimensional intensity pattern in the far field or in the reconstruction plane.
- HSOs are also known in the state of the art as "DOE” for "Diffractive Optical Element” or "CHG” for "Computer-Generated Holograms".
- an HSO must not be confused with a diffractive structure whose only spatial contour makes it possible, under illumination, to form a recognizable image.
- the applicant has shown that the modulation of the diffractive optical element with a sub-wavelength grating adapted to form a resonant filter made it possible to considerably increase the wavelength selectivity of the diffractive optical element.
- the periodic network is a one-dimensional network, defined by a network vector.
- This type of network makes it possible to show variable color effects as a function of the azimuth, for non-zero angles of incidence, and as a function of the angle of incidence for a given azimuth (for example in so-called "collinear" illumination ).
- the periodic network is a two-dimensional network defined by two network vectors of substantially perpendicular directions.
- the periods in each of the directions may be identical, in which case the first image has a stable color in azimuth and a low variation depending on the incidence, or the periods may be different, in which case variable color effects may be observed depending on the azimuth, for non-zero angles of incidence.
- the periodic network has a structure depth of between 10 nm and 350 nm.
- the second layer comprises in at least a first region a thin layer of dielectric material, of thickness preferably between 20 nm and 200 nm and preferably between 60 nm and 150 nm, having a second index of refraction such that the second refractive index differs from the first refractive index and the third refractive index by at least 0.3.
- the second pattern of at least one structure of said first region is adapted to produce a DID type wavelength subtractive filter, forming a resonant bandpass filter in reflection.
- the second layer comprises, in at least one second region, a thin layer of metallic material, continuous, advantageously greater than 40 nm in thickness, for example between 40 nm and 200 nm; the second pattern of at least one structure of said second region forms a resonant band-resonant filter in reflection, of plasmon filter type in reflection, called "R'plasmon" in the following description.
- said thin layer of metallic material is sufficiently thick to present in the visible spectral band a residual maximum transmission as a function of the wavelength of 2%.
- the second pattern forms a sinusoidal or quasi-sinusoidal profile network, that is to say continuously variable, this type of profile allowing a better propagation of plasmonic modes while being compatible with photo lithography manufacturing methods.
- the depth of the network is between 10% and 50% of the period, and preferably between 10% and 40% of the period.
- the second pattern forms a two-dimensional network.
- the second layer comprises in at least a third region a thin layer of metallic material, preferably between 10 nm and 60 nm thick; the second pattern of at least one structure of said third region is adapted to produce a band-pass resonance filter in transmission, of plasmonic filter type in transmission, called "T'plasmon" in the following description.
- the thin layer of metallic material is continuous; the second pattern forms a sinusoidal or quasi-sinusoidal profile network, that is to say continuously variable, this type of profile allowing a better propagation of plasmonic modes while being compatible with photo lithography manufacturing methods.
- the depth of the network is between 10%> and 53% of the period, which increases the efficiency of plasmonic transmission.
- the second pattern forms a two-dimensional network.
- the second layer is discontinuous; the second layer may also have, in one or more first regions, a thin layer of dielectric material, to form DID type filters, and / or in one or more second regions, a thin layer of metal material for example having a thickness greater than 40 nm to form R'Plasmon type filters (metal / dielectric interface) and / or in one or more third regions a thin layer of metal material for example with a thickness of between 10 nm and 60 nm to form filters of the type T'Plasmon (dielectric / metal / dielectric interface).
- the first pattern is adapted to form a first diffractive element of Hologram type synthesized by reflective computer.
- the first pattern has a depth of between 100 nm and 500 nm, according to one example.
- the first pattern is adapted to form a first diffractive element of the following type: transmissive computer synthesized hologram.
- the refractive indices of the first and third layers of dielectric material then differ by at least 0.1, according to one example, and the first pattern has a depth of between 100 nm and 1 ⁇ , according to one example.
- the first layer of dielectric material is transparent.
- the first computer-synthesized hologram diffractive element is calculated to exhibit optimum efficiency at a wavelength in the resonance spectral resonant band.
- the first computer-synthesized hologram diffractive element is calculated to exhibit optimum efficiency at a wavelength located outside of said resonance spectral resonant band.
- the first layer further has in the first region at least a second structure formed by a first pattern modulated by a second pattern, such as:
- the first pattern is adapted to form a second computer-synthesized hologram diffractive element calculated to generate, under spatially coherent illumination, at least a second recognizable image in a given second reconstruction plane,
- the second pattern is a periodic grating with a period of between 100 nm and 700 nm, determined to produce, after deposition of the second layer and encapsulation of said second structure by the third layer, a resonant filter in a second spectral band.
- the at least first and second structures are arranged in zones that are interlaced with one another. This makes it possible to generate more complex images, and in particular multi-color images in the same reconstruction plane.
- the at least first and second structures are arranged in adjacent zones, the successive illumination of each zone making it possible to simulate a motion effect of an image and / or transformation. We can thus generate a colored animation.
- the optical security component includes other layers as needed for the final application; for example, the security optical component may further comprise active layers for forming the HSO and the resonant filter, a support film carrying one of said layers of dielectric material and / or an adhesive layer disposed on one of said layers of dielectric material .
- active layers for forming the HSO and the resonant filter, a support film carrying one of said layers of dielectric material and / or an adhesive layer disposed on one of said layers of dielectric material .
- These layers are neutral for the HSO and / or the resonant filter because they do not alter or influence the interfaces between the second layer and the first and third layers, respectively. They make it easier to adhere to the object to be secured and / or implemented industrially.
- the first layer further comprises regions structured according to the present description, planar regions and / or other structured regions, encapsulated between the first and second layers of dielectric material, the other structured regions being adapted to form other visual effects.
- the present description relates to a secure object comprising a support and a security optical component according to the first aspect, the security optical component being fixed on said support or integrated in the support.
- the secure object is for example a valuable document, such as a bank note, a travel document (passports, identity card or other identification document), a label for the authentication of a product.
- a valuable document such as a bank note, a travel document (passports, identity card or other identification document), a label for the authentication of a product.
- the secure object can be easily authenticated by observation in transmission or reflection, under coherent polychromatic lighting, thanks to the optical security component according to the present description; Moreover, its resistance to counterfeiting is high because of the technology implemented.
- the present description relates to a method of manufacturing a security optical component according to the first aspect.
- the method comprises:
- the first layer of dielectric material, partially structured is obtained by molding and UV curing a stamping varnish from a matrix carrying all of the structures.
- FIGS. 1A and 1B two examples of secure objects integrating a security optical component with an HSO-type diffractive element according to the prior art
- FIG. 2 a sectional view of an exemplary optical security component according to the present description
- FIGS. 3A, 3B, 3C diagrams illustrating an example of a first pattern adapted to form a first diffractive element type HSO, an example of a second pattern adapted to form a resonant filter and an example of structure resulting from the modulation of the first pattern with the second pattern;
- FIG. 4A to 4E diagrams showing different exemplary embodiments are a resonant filter associated with a reflective or transmissive HSO;
- FIGS. 5A to 5D diagrams illustrating the dependence of the resonant filter resonant wavelength as a function of angle of incidence, collinear incidence (FIGS, 5A and 5C) and conical incidence (FIGS., 5B, 5D). );
- FIGS. 6A and 6B examples of secure objects incorporating an example of an optical security component according to the present description with an off-axis off-axis type diffractive element in reflection and a 1D resonant filter, for a non-zero incidence angle and for two values azimuth;
- FIG. 7A a first example of an optical security component comprising a matrix of pixels, a first part of the pixels comprising a first structure formed of a first pattern adapted to form a first reflection-type diffractive element HSO, modulated by a second pattern, and a second portion of the pixels comprising a second structure formed of a first pattern adapted to form a second reflecting diffractive element HSO, modulated by a second pattern;
- FIGS. 7B to 7D examples of secure objects incorporating a security optical component of the type of FIG. 7A for different incidence and azimuth values
- FIG. 8 a second example of an optical security component comprising a matrix of pixels in the form of bands and images obtained by successive illumination of the different bands;
- FIG. 9 an example of a secure object integrating a first optical component of security and a second optical security component, adapted for scopic stereo vision
- FIGS. 10A-10B, 11A-11B examples of secure objects integrating examples of optical security components with structures adapted for the formation of HSO-type diffractive elements
- FIG. 2 is a sectional view of an exemplary security optical component 20 according to the present description.
- the component 20 shown in FIG. 2 represents an example of an optical security component intended to be transferred to a document or a product for the purpose of securing it. It comprises, as a variant, a support film 24, for example a film made of a polymer material, for example a film of polyethylene terephthalate (PET) of a few tens of micrometers, typically 5 to 50 ⁇ m, as well as an optional release layer 25, for example in natural or synthetic wax.
- PET polyethylene terephthalate
- the release layer makes it possible to remove the polymer support film 24 after attachment of the optical component to the product or document to be secured.
- the optical security component 20 further comprises a set of layers 21 - 23 for performing the optical function of the component and which will be described in more detail below, as well as an adhesive layer 26, for example a layer of heat-reactive adhesive, for fixing the optical security component on the product or document.
- an adhesive layer 26 for example a layer of heat-reactive adhesive, for fixing the optical security component on the product or document.
- the security optical component can be manufactured by stacking the layers on the support film 24, then the component is fixed on a document / product to be secured by the adhesive layer 26. If necessary for the application, the support film 24 can then be detached, for example by means of the detachment layer 25.
- the set of layers 21 - 23 comprises in the example of FIG. 2, a first layer 23 of dielectric material, structured at least partially on one side, having a first refractive index n 3 ; a second layer 22, comprising in at least a first region a layer of dielectric material or metal material, as will be detailed hereinafter, or comprising one or more regions with a layer of metallic material and one or more regions with a layer of material dielectric, deposited on the at least partially structured face of the first layer and having in each region a spectral band of reflection in the visible; a third layer 21 of dielectric material, having a third refractive index 3 ⁇ 4, encapsulating the at least partially structured first layer coated with the second layer.
- the first layer 23 has in at least a first region at least a first structure S.
- FIG. 3C schematically shows an example of a first structure S, formed by a first pattern Si modulated by a second pattern S 2 .
- the first pattern (FIG 3A) is adapted to form a first reflective or transmissive computer-synthesized hologram (HSO) diffractive element calculated to generate, in spatially coherent polychromatic illumination, at least a first recognizable image in a given reconstruction plane.
- the second pattern (FIG 3B) is a periodical lattice of period between 100 nm and 700 nm, for example sub wavelength, determined to produce, after deposition of the second layer and encapsulation of said first structure, a filter resonant in a spectral band centered on a first wavelength in the visible.
- the first pattern codes according to the known prior art, complex phase and amplitude data calculated so that, when the diffractive element is illuminated by a beam of light, a desired light intensity diagram appears either in far field, either in a finite distance reconstruction plan.
- the first pattern can form a multi-level (Si) structure, as shown in FIG. 3A or binary.
- a multi-level structure has at least 3 different height planes along the z axis perpendicular to the plane of the component, while a binary structure has only two level heights.
- a multi-level structure makes it possible to form non-symmetrical images with respect to the zero order, that is to say different on either side of the zero order, the zero order designating the specular reflection.
- the depth of the first pattern determines the introduced phase and the "zero order" proportion, that is, the amount of incident light reflected in direct reflection or transmitted without deviation (near refraction).
- the depth of the first pattern chosen is between 80 nm and 2 ⁇ , advantageously between 100 nm and 1 ⁇ .
- the first pattern can be calculated to form an image on the axis (diffracted order (s) centered on the zero or off-axis order (order (s) diffracted around the zero order ). Moreover, the first pattern can be computed in a known manner for a restitution of the image in a finite distance reconstruction plane, or for a restitution of the so-called "infinite" image, that is to say say a restitution of the image in far field.
- a Fourier HSO can be formed of a single element whose dimensions can be up to 30 mm x 30 mm, dimensions beyond which the computing times with current computers are very long, or from identical unit elements, for example of dimensions between 2 ⁇ x 2 ⁇ and 2048 ⁇ x 2048 ⁇ which are subsequently repeated in X and Y either mechanically at the time of the etching, or computeratically before etching, in order to obtain a large HSO (or observation window) with dimensions up to 60 mm x 60 mm for example.
- Fresnel HSOs are known for example.
- Each point of the first pattern in the case of a Fresnel HSO contributes to forming the image in the reconstruction plane.
- an HSO of dimensions typically up to 30 mm ⁇ 30 mm is directly coded.
- a suitable projection optical system makes it possible, for example, to project the image onto a screen.
- HSO design software for example IFTA (for "Iterative Fourier Transform Algorithm"
- IFTA for "Iterative Fourier Transform Algorithm”
- FIGs. 4A to 4E illustrate diagrams showing nonlimiting examples of embodiment of a resonant filter associated with a refective or transmissive HSO, in order to increase the spectral selectivity thereof.
- a polychromatic source PS implemented for the authentication of the component.
- Spatially coherent polychromatic lighting can be obtained by a point or quasi-point polychromatic source, for example a white LED, the flash of a mobile phone, a luminous torch, and generally a non-extended light source. More precisely, it will be considered that a source is quasi-point or not extended if the ratio between the distance with the component and the largest dimension of the source is greater than 100.
- the lighting surface of the component and the face of the component opposite to the lighting face 41 are denoted 41.
- the layer of dielectric material 23 arranged on the side of the illumination face 41 is transparent and preferably colorless.
- the layer of dielectric material 21 arranged on the side of the face 42 opposite the lighting face may be transparent or not, depending on the applications.
- the first pattern is calculated to form an HSO which generates in a reconstruction plane 5 a recognizable image, this image being visible by an observer, either directly, or by means of a projection device (not shown), or on the side of the lighting face (case of a refective HSO), or the opposite side (case of a transmissive HSO).
- the second layer 22 comprises a layer of dielectric material and the resonant filter is a subtractive filter wavelength of DID type (for "Diffractive Identity Device").
- the second pattern forms a subwavelength network, with one or two dimensions, adapted to allow the excitation of guided modes within the second layer 22, forming a band resonant filter in reflection, including the resonance spectral band ⁇ is centered on a first wavelength ⁇ .
- the second layer 22 comprises a thin layer, preferably of thickness between 20 nm and 200 nm and preferably between 60 nm and 150 nm.
- said thin layer of dielectric material is a so-called high refractive index ("HRI") material having a refractive index of between 1.8 and 2.9, advantageously between 2.0 and 2.4 and the first and third layers of dielectric material, on either side of the second layer, are so-called "low index" refractive index layers, having refractive indices between 1.3 and 1.8, advantageously between 1.4 and 1.7.
- the first layer of dielectric material 23 arranged on the side of the lighting face of the component is transparent in the visible.
- the first pattern is adapted to form a first diffractive element of the reflective HSO type.
- the first pattern is calculated to exhibit optimum efficiency at a wavelength in the spectral band ⁇ of the resonant reflection filter, for example a wavelength close to ⁇ .
- the first image, observed by the observer located on the side of the illumination face 41 has an increased spectral selectivity at the wavelength ⁇ for a given azimuth and angle of incidence and observation.
- the first pattern is adapted to form a first transmissive HSO diffractive element.
- the first pattern is calculated to exhibit optimal efficiency at a wavelength outside the spectral band of the DID type resonant resonant filter.
- the spectral band transmitted by the resonant filter corresponds to the spectral band of the illumination light ⁇ to which the resonant spectral band ⁇ is subtracted.
- the first and third refractive indices have a difference greater than 0.1 for the formation of the transmissive HSO.
- the first image, observed by the observer located on the side of the face 42 of the component opposite to the illumination face 41 has a lower selectivity than in the previous example; however, the color of the HSO is improved due to the rejection of a part of the spectral band.
- the second layer 22 comprises a thin layer of metal material, preferably with a thickness greater than 40 nm.
- the second pattern forms a subwavelength network, with one or two dimensions, adapted to allow the formation of a reflection-band resonant filter, of the "R'plasmon" reflection plasmonic filter type, as described for example in the patent application FR 2982038 Al.
- the second metal layer 22 is sufficiently thick to have a residual maximum transmission as a function of the wavelength of 2%.
- the first pattern is adapted to produce a first diffractive reflective HSO-type element calculated to exhibit optimal efficiency at a wavelength outside the spectral band of the resonant reflection filter for azimuth and angle. of incidence and observation given.
- the layer 22 comprises a thin layer of metallic material, preferably between 10 nm and 60 nm thick, and the second pattern is adapted to produce a transmission band-pass resonance filter, of plasmonic filter type in transmission " T'Plasmon ", as described for example in the patent application FR 2973917 and having a resonance spectral band ⁇ centered on a first wavelength ⁇ for an azimuth and a given angle of incidence and observation.
- the first pattern is adapted to form a first diffractive element of the transmissive HSO type.
- the first pattern is calculated to exhibit optimum efficiency at a wavelength in the spectral band ⁇ of the resonant transmission filter, for example a wavelength close to X ⁇ .
- the first and second reduction indices advantageously have a difference greater than 0.1.
- the user placed on the side of the face 42 can observe under a spatially coherent polychromatic illumination ⁇ a colored image ⁇ in transmission.
- the first pattern is adapted to form a first reflective element of the reflective HSO type.
- the first pattern is calculated to exhibit optimal efficiency at a wavelength outside the spectral band of the T'Plasmon type resonant transmission filter.
- the spectral band ⁇ - ⁇ reflected by the resonant filter corresponds to the spectral band of the illumination light ⁇ which is subtracted the resonant spectral band ⁇ .
- the wavelengths of the excited resonances depend on the polarization and it can be shown that at non-zero incidence of the illumination beam, the reflected (or transmitted) spectral band will be modified by changing the the orientation of the component, obtained by azimuthal rotation thereof, except in the case of a two-dimensional network of equal periods.
- FIGS. 5A to 5D illustrate these effects in the case where the first pattern forms a one-dimensional network characterized by a grating vector k g , the direction of which is perpendicular to the lines of the grating (symbolized by lines in FIGs 5A and 5B) and the standard is inversely proportional to the period of the network.
- the plane ⁇ corresponds to the plane in which the lighting beam is located.
- FIG. 5C represents the spectra calculated in reflection for a so-called "collinear" incidence (configuration 5A: lighting beam in a plane ⁇ perpendicular to the surface of the component and parallel to the direction of the grating vector) and an angle of incidence of the beam of The illumination measured relative to the component normal of 0 ° (curve 51) and 20 ° (curve 52).
- FIG. 5D represents the spectra calculated in reflection for a so-called "conical" incidence (configuration 5B): lighting beam in a plane ⁇ perpendicular to the surface of the component and perpendicular to the direction of the grating vector) and an angle of incidence of the beam of illumination measured with respect to the component normal of 0 ° (curve 53) and 20 ° (curve 54).
- the curves are calculated by assuming a DID with a pitch of 360 nm, a depth of 130 nm structuring a layer of zinc sulphate (ZnS) of 100 nm thick and encapsulated between two identical layers of polystyrene.
- ZnS zinc sulphate
- Collinear incidence is observed to rapidly change the spectral band of resonance with the angle of incidence while the modification is much slower in conical incidence. This effect makes it possible to further strengthen the authentication of the component by showing variable color effects as a function of the azimuth.
- FIGS. 5C and 5D are calculated in the case of a resonant filter of the DID type, but similar transmission curves would be observed in the case of a T'Plasmon type resonant filter. In the case of a R'Plasmon type resonant filter, absorption curves would show the same dependence with the azimuth and the angle of incidence.
- FIG. 6A and 6B schematically show a secure object 1, for example an identity document type document, comprising an exemplary security optical component 60 according to the present description with an off-axis off-axis reflection diffractive element in reflection and a resonant filter 1D, for a non-zero angle of incidence and for two azimuth values;
- the beam 3 represents the lighting beam; it is for example derived from a point or quasi-point polychromatic source, for example a white LED source.
- the beam 4 represents the beam reflected by the optical security component 60.
- the data are calculated so that, when the HSO is illuminated by a beam of divergent, convergent or collimated light, a light intensity diagram appears in FIG. a reconstruction plan 5 that can be infinite.
- the intensity diagram comprises an image 66 formed of two off-axis objects 61, 62. A residue 63 of the beam transmitted on the axis is also visible.
- the rotation of the component in azimuth causes a color change of the image 66 with non-zero incidence of the illumination beam.
- this example provides an additional means of authentication of the security optical component, thanks to a variable color effect according to the azimuth.
- FIG. 7A schematically represents a first example of a security optical component 70 comprising a pixel matrix.
- a first portion of the pixels 71 form a first zone. They comprise a first structure formed of a first pattern adapted to form a first reflection-type diffractive element HSO, modulated by a second pattern.
- a second portion of the pixels 72 form a second zone. They comprise a second structure formed of a first pattern adapted to form a second reflection-type diffractive element HSO, modulated by a second pattern.
- the first and second zones occupy for example a comparable surface.
- the first pattern of the first structure arranged in the first zone (pixels 71) is a multi-level HSO making it possible to form the image " ⁇ " in far field off the axis.
- the second pattern of the first structure makes it possible to form a one-dimensional array adapted to form a resonant filter with a spectral resonance band.
- the network is arranged so that with an azimuth of 0 °, the variability of the resonant spectrum is low as a function of the angle of incidence of the beam lighting (as in FIG 5B).
- the far-field variability of the resonance spectral band for the first region becomes strong.
- the first pattern of the second structure arranged in the second zone (pixels 72) is a multilevel HSO making it possible to form the "a" image in the far field off the axis.
- the second pattern of the second structure makes it possible to form a one-dimensional network similar to that of the second pattern of the first structure.
- the grating is arranged substantially perpendicular to that of the second pattern of the first structure so that with an azimuth of 0 °, the variability of the resonant spectrum is high as a function of the angle of incidence of the beam of illumination and that by 90 ° azimuth rotation of the component 70, the far-field variability of the resonance spectral band for the second region, depending on the angle of incidence, is low.
- FIG. 7B shows an illumination of a secure object 1 equipped with an optical security component 70 as shown in FIG. 7A at an incidence of 0 °. Thanks to the matrixing of the pixels, we obtain the two images " ⁇ " and "a” simultaneously. The incidence of 0 ° does not make it possible to differentiate in color the 2 images.
- FIG. 7C illustrates a lighting of the secure object 1 with an angle of incidence of 20 °.
- the incidence of 20 ° makes it possible to differentiate in color the two images " ⁇ " and "a".
- FIG. 7D shows a lighting of the secure object 1 with an angle of incidence of
- the "colors" are presented here as examples. We could have second patterns for the first and second structures such that the initial colors of the first and second images are different for an incidence of 0 ° and have spectral variation behaviors as a function of the same or different incidence angle.
- FIG. 8 schematically shows a second example of an optical security component 80 comprising a matrix of pixels in the form of bands (81 - 84) and images obtained by successive illumination of the different bands.
- Each band of width L greater than 500 ⁇ , for example, forms a region.
- the first patterns of each of the regions are adapted to form off-axis HSOs having the same object (an arrow) but at a different position and orientation in the observation plane (see images Imi - ⁇ 3 ⁇ 4).
- the second pattern is for example identical for each of the regions so that the object (the arrow) is the same color on each image.
- the illumination in coherent polychromatic light on each band then makes it possible to reveal only one image separately from the other bands.
- the successive lighting of the different regions makes it possible to simulate the effects of movements.
- the first image of the first zone may have a defined shape that evolves in each successive zone to simulate a movement and / or a transformation of the shape.
- each zone of each first pattern may have a second pattern different in terms of period, network orientation and / or network depth to change the color of each of the areas.
- FIG. 9 represents an example of a secure object integrating a first security optical component and a second security optical component, adapted for human scopic stereo vision or by video players or stereoscopic images;
- two optical security components according to the present description 90 L and 90 R are arranged on a secure object 1 at a given distance from each other, so that for a given illumination 3, 3 'respectively on the 90 L and 90 R components , each eye / sensor sees an image independently.
- the left eye can only see the image 91, 92 from the security component 90 L
- the right eye can see only the image 93, 94 from the security component 90 R.
- each of the components 90 L and 90 R may have structures for generating HSOs with specific or identical colors related to resonant filtering.
- the mental reconstruction of the image allows the observation of the image on a virtual plane, the virtual plane being positioned at a median distance from the two images from each of the components 90 L and 90 R.
- FIGS. 10A and 10B and 11A-11B show other examples of secure objects integrating examples of optical security components with suitable structures for the formation of HSO-type diffractive elements, for example in the near field.
- the security optical component 100 comprises a first structure arranged on a zone 101 and a second structure arranged on an area 102, the zones 101 and 102 being formed of alternating pixels with one another. others to form a checkerboard (intertwined areas).
- the first structure 101 comprises a first pattern modulated with a second pattern, so as to form a Fresnel HSO, for generating a given color image 103 in a finite-distance reconstruction plane (HSO in the near field). ), the reconstruction plane 5 being behind the secure object 1 relative to the position of the lighting source.
- the second structure 102 comprises a first pattern modulated with a second pattern, so as to form a Fresnel HSO, making it possible to generate an image 104 of given color, for example different from the color of the object 103, in a plane of 5 'reconstruction at a finite distance (HSO in the near field), the reconstruction plane 5' being in front of the secure object 1 with respect to the position of the lighting source.
- the security optical component 110 comprises a first structure arranged on an area 111, a second structure arranged on an area 112 and a third structure arranged on an area 113.
- the areas 111 - 113 are formed of pixels alternated with each other to form a checkerboard (intertwined areas).
- the first structure 111 includes a first pattern modulated with a second pattern, such as to form an HSO, for generating a given color image 114 in a finite distance reconstruction plane.
- the second structure 112 comprises a first pattern modulated with a second pattern, so as to form an HSO, for generating an image 115 of a given color, for example different from the color of the object 114, in the same reconstruction plane 5.
- the third structure 113 comprises a first pattern modulated with a second pattern, so as to form an HSO, making it possible to generate an image 116 of a given color, for example different from the color of the object 114 and the color of the object. object 115, in the same reconstruction plane 5.
- the images 114, 115, 116 complement each other to form a recognizable object, for example here a rectangular parallelepiped.
- the security components as described above can be implemented according to one or more exemplary embodiments as follows.
- the different optical structures of the different regions are previously recorded by photo lithography or electron beam lithography on a photosensitive medium or "photoresist” according to the Anglo-Saxon expression.
- An electroplating step makes it possible to postpone these optical structures in a resistant material, for example based on nickel, to produce the matrix or "master”, see for example the reference work “diffraction handbook grating” and more particularly chapter 5 "Replicated Grating "(Christopher Plamer, Sixth Edition, Newport 2006).
- a stamping (or “embossing”) can then be performed from the matrix thus produced to form the first layer of dielectric material at least partially structured.
- the first layer of dielectric material 23 is a stamping varnish of a few microns thick carried by a support film 24 of 5 ⁇ to 50 ⁇ of polymeric material, for example PET (polyethylene terephthalate) .
- the stamping can be done by hot pressing of the dielectric material ("hot embossing") or by molding and UV curing ("UV casting"), but preferably by UV molding and crosslinking due to the depth of the structures (typically between 80 nm and 1 ⁇ ).
- the refractive index of the layer formed by the stamping varnish is typically close to 1.5 for visible light.
- the second layer 22 may be a metal layer, deposited by thermal evaporation, for example under vacuum, in a perfectly controlled manner in thickness, with at least one for example of the following metals: silver, aluminum, gold, chromium, copper, nickel, etc. .
- the second layer may be a layer of dielectric material, for example zinc sulphide, titanium oxide.
- the second layer may comprise metal regions and regions of dielectric material, as described below.
- a closed layer of controlled refractive index is then applied, for example by evaporation in the case of a thin film or by a coating process.
- this layer may be the adhesive layer.
- the closure layer, which forms the third layer dielectric material 21 may have, depending on the application, a refractive index substantially identical to that of the layer 23, around 1.5, or may have a refractive index different from that of the layer 23.
- the closure layer 21 may have a thickness greater than or equal to one micron, for example a few microns.
- an adhesive layer 26 may be applied to the closure layer.
- the second layer 22 may comprise in one or more regions a dielectric material and / or may comprise in one or more regions a metallic material and / or may be discontinuous.
- a first partial demetallization process consists in applying a protective varnish to the regions where it is desired that the metal layer be preserved.
- This varnish has for example a refractive index substantially identical to that of the first layer 23, for example around 1.5, with a thickness for example of the order of one micron.
- a chemical bathing step makes it possible to destroy the unprotected metal parts.
- another metallic material or a dielectric material is deposited in one or more of the demetallized regions to form the second layer 22.
- the third layer or closure layer 21 is applied to the entire component.
- Another partial demetallization method consists in applying a soluble ink to the pattern on the stamped or UV-cured layer with a given pattern. When depositing the metal, it is applied uniformly on the layer but remains only on the areas where the ink is not located when the ink is removed.
- a second layer 22 with one or more regions of dielectric material and one or more regions of metallic material by applying one or more dielectric materials before the metallization step.
- a soluble ink on the stamped layer or crosslinked with UV.
- a first thin layer deposition makes it possible to uniformly apply a dielectric material to the whole of the stamped layer or UV and ink-cured; the dielectric material remains only in the areas where the ink is not located when the ink is removed.
- a metallization step which can be selective, is performed. If the metallization is selective, it will also include a preliminary step of printing soluble ink for selecting the application areas of the metal or the printing of a protective ink after deposition of the metal.
- a security optical component comprising one or more components as described above and one or more other types of optical security components, for example of the holographic type.
- a matrix is produced by recording the different patterns corresponding to the various optical security components on the photoresist support and then, as previously, an electroplating step makes it possible to transfer the optical structure of the photoresist to a solid support to form the matrix.
- the stamping or molding followed by the UV crosslinking can then be carried out from the matrix to transfer the various micro-structures to the film of polymer material.
- the security optical component according to the invention and the method of manufacturing said component comprise various variants, modifications and improvements which will be obvious to those skilled in the art. it being understood that these various variants, modifications and improvements fall within the scope of the invention as defined by the following claims.
- those skilled in the art will advantageously combine the optical properties of the many known optical security components with the properties of the optical security component according to the invention.
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Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR1654587A FR3051565B1 (fr) | 2016-05-23 | 2016-05-23 | Composant optique de securite et procede de fabrication d'un tel composant |
PCT/EP2017/062465 WO2017202866A1 (fr) | 2016-05-23 | 2017-05-23 | Composant optique de sécurité et procédé de fabrication d'un tel composant |
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EP3465352A1 true EP3465352A1 (fr) | 2019-04-10 |
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EP17729408.9A Pending EP3465352A1 (fr) | 2016-05-23 | 2017-05-23 | Composant optique de sécurité et procédé de fabrication d'un tel composant |
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AU (1) | AU2017270014B2 (fr) |
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WO2019121798A1 (fr) * | 2017-12-19 | 2019-06-27 | Surys | Composant optique de securite visible en reflexion, fabrication d'un tel composant et document securisé equipé d'un tel composant |
FR3095981B1 (fr) | 2019-05-13 | 2021-06-04 | Surys | Composant optique de sécurité à effet plasmonique, fabrication d’un tel composant et objet sécurisé équipé d’un tel composant |
DE102020212367A1 (de) | 2020-09-30 | 2022-03-31 | Carl Zeiss Smt Gmbh | Optische Komponente |
DE102021002600A1 (de) | 2021-05-18 | 2022-11-24 | Giesecke+Devrient Currency Technology Gmbh | Wertdokument und Verfahren zur Herstellung eines Wertdokuments |
DE102022207545A1 (de) | 2022-07-25 | 2023-04-27 | Carl Zeiss Smt Gmbh | Optische Komponente |
DE102022003230A1 (de) * | 2022-09-02 | 2024-03-07 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit farberzeugenden Nanostrukturen und Herstellverfahren dafür |
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Publication number | Priority date | Publication date | Assignee | Title |
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GB9929752D0 (en) * | 1999-12-17 | 2000-02-09 | Secr Defence | Textured surface |
DE10157534C1 (de) * | 2001-11-23 | 2003-05-15 | Ovd Kinegram Ag Zug | Sicherheitselement mit Beugungsstrukturen |
DE102004042136B4 (de) * | 2004-08-30 | 2006-11-09 | Ovd Kinegram Ag | Metallisiertes Sicherheitselement |
FR2973917B1 (fr) | 2011-04-08 | 2014-01-10 | Hologram Ind | Composant optique de securite a effet transmissif, fabrication d'un tel composant et document securise equipe d'un tel composant |
FR2979435B1 (fr) * | 2011-08-24 | 2016-11-11 | Hologram Ind | Composant optique de securite, fabrication d'un tel composant et produit securise equipe d'un tel composant |
FR2982038B1 (fr) | 2011-10-28 | 2013-11-15 | Hologram Ind | Composant optique de securite a effet reflectif, fabrication d'un tel composant et document securise equipe d'un tel composant |
AU2011101567B4 (en) | 2011-11-30 | 2012-08-09 | Innovia Security Pty Ltd | Diffractive device |
FR3019496A1 (fr) * | 2014-04-07 | 2015-10-09 | Hologram Ind | Composant optique de securite a effet reflectif, fabrication d'un tel composant et document securise equipe d'un tel composant |
-
2016
- 2016-05-23 FR FR1654587A patent/FR3051565B1/fr active Active
-
2017
- 2017-05-23 AU AU2017270014A patent/AU2017270014B2/en active Active
- 2017-05-23 WO PCT/EP2017/062465 patent/WO2017202866A1/fr unknown
- 2017-05-23 EP EP17729408.9A patent/EP3465352A1/fr active Pending
Also Published As
Publication number | Publication date |
---|---|
AU2017270014B2 (en) | 2022-05-05 |
WO2017202866A1 (fr) | 2017-11-30 |
AU2017270014A1 (en) | 2019-01-17 |
FR3051565A1 (fr) | 2017-11-24 |
FR3051565B1 (fr) | 2019-06-21 |
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