EP3247552A1 - Method for exposing a three-dimensional region - Google Patents
Method for exposing a three-dimensional regionInfo
- Publication number
- EP3247552A1 EP3247552A1 EP16700227.8A EP16700227A EP3247552A1 EP 3247552 A1 EP3247552 A1 EP 3247552A1 EP 16700227 A EP16700227 A EP 16700227A EP 3247552 A1 EP3247552 A1 EP 3247552A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- exposure
- intensity
- overlapping
- subregions
- areas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/141—Processes of additive manufacturing using only solid materials
- B29C64/153—Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y50/00—Data acquisition or data processing for additive manufacturing
Definitions
- the invention relates to a method for exposing a three-dimensional area.
- So-called 3D printing methods are known from the state of the art for forming a dimensionally stable object by exposure of a three-dimensional region of a non-dimensionally stable mass.
- a powdery or liquid substance is selectively cured by the action of light or heat radiation in a three-dimensional region, thereby forming a solid body.
- the three-dimensional area is subdivided into at least two adjoining layers, which are exposed in time sequence with a predetermined exposure intensity. The exposure hardens the substance and becomes dimensionally stable, so that one layer after the other can be exposed.
- Exposure field is limited by the optical exposure system used and the resolution used. In order to be able to expose areas which are larger than the optical exposure field at a given resolution, it is known to coat each individual layer in at least two exposure fields with adjacent ones
- the entire layer information is generated by temporally successive exposure of several sub-areas.
- the object of the present invention is to provide a method in which this false exposure (over-, under- or unexposure) is avoided, and which makes it possible to easily expose three-dimensional areas which are larger than the available exposure field are to avoid the formation of seam and break points at the boundaries of the sub-areas.
- the object according to the invention is initially achieved by overlapping adjacent exposure fields in individual subregions. This avoids gaps being created between the exposure fields in which there is no or one
- Subregions takes place an overlap of two sections at the edges, and an overlap of four sections at the corners.
- the shape and design of the overlapping subregions can be arbitrary according to the invention.
- the overlapping partial regions can in particular assume rectangular, triangular or other geometric shapes.
- the use of non-rectangular overlapping portions can be provided according to the invention, the use of non-rectangular overlapping portions.
- the extent of the overlapping partial regions can be added
- pixel-based exposure depending on the resolution used and may preferably be at least one to five pixels.
- the mean exposure intensity in the overlapping partial areas is lower than in the non-overlapping partial areas.
- the mean exposure intensity in the overlapping partial areas is lower than in the non-overlapping partial areas.
- in each case for example, only half the exposure energy and / or half are used in the overlapping partial areas
- Exposure time of the predetermined target value exposed In total, this results in the overlapping partial areas of the target value of the exposure intensity.
- overlapping partial areas by means of pulse width modulation, or by using a partial gray level in the overlapping area.
- a plurality of overlapping regions may be provided and thus several partial intensity values per individual image may be necessary.
- the exposure intensity in these areas is reduced accordingly to the
- corresponding fraction of the exposure intensity in the non-overlapping partial area can be reduced in order to achieve the target value of the exposure intensity in total in the overlapping partial areas.
- the exposure intensity in the overlapping subregions of adjacent layers is different.
- the exposure intensity in the overlapping subregions of adjacent layers is different.
- Subareas varies from layer to layer. This has the advantage that, even if the resulting intensity and the exact shape of the overlapping area can not be adjusted accurately, no seam that passes through the entire formed object is produced, which would subsequently appear as a breakage point or a geometrical inaccuracy.
- the exposure intensity in the overlapping partial regions varies in one or two spatial coordinates of the layer, so that the exposure intensity in these regions is location-dependent.
- an arbitrary energy curve can be realized in the overlapping partial regions of the exposure field. This can be achieved in particular that, for example, in the interior of the object to be exposed another
- Exposure intensity or a different course of the exposure intensity is achieved than at the edge of the object to be exposed.
- a locally constant exposure intensity is provided in individual overlapping partial regions, and a spatially variable illumination intensity is provided in other overlapping partial regions.
- a spatially variable illumination intensity is provided in other overlapping partial regions.
- Exposure intensity may be provided, where x and y are the two-dimensional
- the exposure intensity can also vary in this two-dimensional area around the respective target value of the intensity.
- the exposure intensity in the overlapping subareas at a point of the exposure field ie a fixed x and y coordinate, varies along successive layers by a slice-dependent target value.
- the variation around the slice-dependent target value amounts to at least 5%, preferably at least 10%, of the target value.
- the exposure fields are exposed simultaneously. According to the invention can also be provided that the exposure fields are exposed simultaneously. According to the invention can also be provided that the exposure fields are exposed simultaneously. According to the invention can also be provided that the
- Exposure fields are exposed in chronological order.
- a plurality of exposures of the same or different intensity are performed in chronological order.
- the exposure takes place continuously, by passing an exposure field in constant or variable speed over the area to be exposed, wherein the projected exposure pattern is changed continuously.
- the exposure pattern may be played in the form of a continuous projection or a video, and that
- Exposure field to be moved in a coordinated speed Exposure field to be moved in a coordinated speed.
- Fig. 1 shows a schematic representation of the area to be exposed and a section of a layer to be exposed
- Fig. 2 shows a schematic representation of four overlapping exposure fields and a single exposure field with a plurality of partial regions
- FIG. 3 shows a two-dimensional representation of an exposure field and courses of the exposure intensity along given interfaces
- FIGS. 5a-5c show further schematic representations of a device according to the invention
- FIG. 1 shows a schematic representation of the three-dimensional region 1 to be exposed. This is subdivided along the z-axis into successive layers 2, which are designated by way of example as a, b, c. During exposure, the layers are processed in sequence and the object to be exposed 5 is generated layer by layer.
- a layer 2 to be exposed is shown schematically.
- the layer 2 comprises four rectangular exposure fields 3 arranged in a rectangle lying adjacent to one another, which are indicated by broken lines.
- the object 5 to be developed is located inside the layer 2.
- geometrically exactly matched exposure fields form the schematically represented seams 6, the avoidance of which represents one of the objects of the present invention.
- Fig. 2 shows a representation of the four exposure fields 3, which overlap in their edge regions.
- One of the exposure fields is highlighted by way of example and shown in the right part of FIG. 2.
- the exposure field 3 comprises first, second and third subregions 4, 4 ', 4 ", wherein the first subregion 4 does not overlap with other exposure fields, the second subregion 4' overlaps with another exposure field, and the third subregion 4" with three other exposure fields overlaps. Accordingly, the exposure intensity in the first, second and third subregions 4, 4 ', 4 "is different in each case.
- FIG. 3 shows a schematic representation of an exposure field 3 and the course of the exposure intensity I along the x-coordinate in the layers a, b and c at the y-coordinates y1 and y2. Also indicated is the profile of the object 5 to be exposed, the exposure intensity outside of this object 5 generally falling to zero.
- the course of the exposure intensity I in layer a is shown.
- the exposure intensity is initially 0.25 along the y-coordinate y1, since four exposure fields overlap in the sub-area 4 ", the intensity increases to 0.5 since the x-coordinate xa, since two exposure fields overlap in the sub-area 4 '.
- Coordinate y2 the exposure intensity is initially 0.5, since two exposure fields overlap in the subarea 4 'From the x coordinate xa, the intensity increases to 1, since no exposure fields overlap in the subarea 4.
- the intensity in the x direction can increase linearly, nonlinearly or in a composite manner up to the coordinate xa with a different gradient, as shown for layer b.
- the intensity may also initially be high, and then linearly, nonlinearly or exponentially decay in the x direction, as exemplified for layer c.
- a linear or non-linear course of the intensity in the y-direction can also be provided according to the invention.
- the respectively selected courses of the intensity depend on the respective task.
- Exposure field 3 The exposure intensity 11, 12 is selected such that it varies by the respectively required target value at this point, so that even with incorrectly set overlap of the partial areas 4 ', 4 "the formation of seam lines is avoided, and on average along the layers the exposure intensity is correct at this point.
- Fig. 5a shows a schematic representation of an inventive
- Part 4 The local course of the exposure intensity in the layers a, b, c and d is denoted by la, Ib, Ic and Id and follows in each case essentially a bell-shaped or Gaussian profile, wherein according to the invention also any other courses can be provided.
- the Gaussian shape in each layer is shifted with respect to the adjacent layers.
- Fig. 5b shows the same layer arrangement, wherein in each layer with a point the maximum of the intensity is indicated. Since the maxima in adjacent layers always come to rest at different x-positions, the formation of a straight seam is avoided, so that the joining together of the adjoining partial regions 4 and the superimposed layers a, b, c, d
- Fig. 5c shows a further schematic representation of an inventive
- Exposure intensity results. According to the invention, any other courses of the exposure intensity can also be provided.
- the invention is not limited to the present embodiments but includes all methods within the scope of the following claims.
- the invention also extends to the three-dimensional objects generated by using the method.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATA50038/2015A AT516769B1 (en) | 2015-01-22 | 2015-01-22 | Method for exposing a three-dimensional area |
PCT/EP2016/050409 WO2016116320A1 (en) | 2015-01-22 | 2016-01-12 | Method for exposing a three-dimensional region |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3247552A1 true EP3247552A1 (en) | 2017-11-29 |
Family
ID=55077531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16700227.8A Withdrawn EP3247552A1 (en) | 2015-01-22 | 2016-01-12 | Method for exposing a three-dimensional region |
Country Status (5)
Country | Link |
---|---|
US (1) | US20180001562A1 (en) |
EP (1) | EP3247552A1 (en) |
AT (1) | AT516769B1 (en) |
CA (1) | CA2973174A1 (en) |
WO (1) | WO2016116320A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110722799B (en) * | 2019-11-09 | 2021-12-10 | 苏州大学 | Large-format DLP type 3D printer dislocation shared seam eliminating method and system |
CN112590199B (en) * | 2021-03-02 | 2021-06-25 | 源秩科技(上海)有限公司 | Photocuring three-dimensional printing method |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1077125A1 (en) * | 1999-08-19 | 2001-02-21 | British Aerospace Public Limited Company | Article with regions of different densities, and stereolithographic method of manufacturing |
US6777170B1 (en) * | 2000-08-04 | 2004-08-17 | Massachusetts Institute Of Technology | Stereolithographic patterning by variable dose light delivery |
WO2003039844A1 (en) * | 2001-10-30 | 2003-05-15 | Concept Laser Gmbh | Method for the production of three-dimensional sintered workpieces |
SE524439C2 (en) * | 2002-12-19 | 2004-08-10 | Arcam Ab | Apparatus and method for making a three-dimensional product |
EP1666235B1 (en) * | 2003-09-11 | 2012-11-07 | Nabtesco Corporation | Devices for forming optical 3-dimensional object and methods using them |
JP4525424B2 (en) * | 2005-03-30 | 2010-08-18 | Jsr株式会社 | Stereolithography method |
US7706910B2 (en) * | 2007-01-17 | 2010-04-27 | 3D Systems, Inc. | Imager assembly and method for solid imaging |
JP5234315B2 (en) * | 2007-12-03 | 2013-07-10 | ソニー株式会社 | Stereolithography apparatus and stereolithography method |
FR2993805B1 (en) * | 2012-07-27 | 2014-09-12 | Phenix Systems | DEVICE FOR MANUFACTURING THREE-DIMENSIONAL OBJECTS WITH SUPERIMPOSED LAYERS AND METHOD OF MANUFACTURING THE SAME |
JP2015199195A (en) * | 2014-04-04 | 2015-11-12 | 株式会社松浦機械製作所 | Three-dimensional object molding device |
-
2015
- 2015-01-22 AT ATA50038/2015A patent/AT516769B1/en active
-
2016
- 2016-01-12 WO PCT/EP2016/050409 patent/WO2016116320A1/en active Application Filing
- 2016-01-12 US US15/545,699 patent/US20180001562A1/en not_active Abandoned
- 2016-01-12 EP EP16700227.8A patent/EP3247552A1/en not_active Withdrawn
- 2016-01-12 CA CA2973174A patent/CA2973174A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20180001562A1 (en) | 2018-01-04 |
AT516769A1 (en) | 2016-08-15 |
AT516769B1 (en) | 2017-12-15 |
CA2973174A1 (en) | 2016-07-28 |
WO2016116320A1 (en) | 2016-07-28 |
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