EP3087760A1 - Micro-electromechanical sound transducer with sound energy-reflecting interlayer - Google Patents
Micro-electromechanical sound transducer with sound energy-reflecting interlayerInfo
- Publication number
- EP3087760A1 EP3087760A1 EP14820823.4A EP14820823A EP3087760A1 EP 3087760 A1 EP3087760 A1 EP 3087760A1 EP 14820823 A EP14820823 A EP 14820823A EP 3087760 A1 EP3087760 A1 EP 3087760A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- membrane structure
- carrier substrate
- mems sound
- sound transducer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011229 interlayer Substances 0.000 title abstract description 5
- 239000012528 membrane Substances 0.000 claims abstract description 126
- 239000000758 substrate Substances 0.000 claims abstract description 67
- 238000001228 spectrum Methods 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 6
- 229920005591 polysilicon Polymers 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 199
- 230000003014 reinforcing effect Effects 0.000 description 17
- 230000000694 effects Effects 0.000 description 9
- 238000002161 passivation Methods 0.000 description 9
- 238000009413 insulation Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
- H04R7/04—Plane diaphragms
- H04R7/06—Plane diaphragms comprising a plurality of sections or layers
- H04R7/10—Plane diaphragms comprising a plurality of sections or layers comprising superposed layers in contact
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R17/00—Piezoelectric transducers; Electrostrictive transducers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R17/00—Piezoelectric transducers; Electrostrictive transducers
- H04R17/005—Piezoelectric transducers; Electrostrictive transducers using a piezoelectric polymer
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R3/00—Circuits for transducers, loudspeakers or microphones
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2201/00—Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
- H04R2201/003—Mems transducers or their use
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2400/00—Loudspeakers
- H04R2400/01—Transducers used as a loudspeaker to generate sound aswell as a microphone to detect sound
Definitions
- Microelectromechanical transducer with sound-reflecting intermediate layer is Microelectromechanical transducer with sound-reflecting intermediate layer
- the present invention relates to a MEMS sound transducer for generating and / or detecting sound waves in the audible wavelength spectrum with a carrier substrate, a formed in the carrier substrate cavity having at least one opening, and a multilayer piezoelectric membrane structure which spans the opening of the cavity and in its edge region is connected to the carrier substrate, so that it is able to vibrate relative to the carrier substrate for generating and / or detecting sound energy, wherein the membrane structure comprises a first and a second piezoelectric layer in cross-section at least in regions.
- the invention relates to a chip, in particular a silicon chip, for generating and / or detecting sound waves in the audible wavelength spectrum with a plurality of array-like arranged and / or separately controllable MEMS sound transducers.
- MEMS microelectromechanical systems
- MEMS sound transducers can be designed as microphones and / or speakers.
- the sound generation or sound detection takes place via a swingably mounted membrane of the MEMS sound transducer.
- the diaphragm can be vibrated via piezoelectric actuators to produce a sound wave.
- Such a microspeaker usually has to generate a high air volume shift in order to achieve a significant sound pressure level.
- Such a microspeaker is known, for example, from DE 10 2012 220 819 A1.
- the MEMS transducer can also be designed as a microphone, in which case the acoustic excitation of the membrane via the piezoelectric elements are converted into electrical signals.
- ME MS microphone is known for example from DE 10 2005 008 51 1 A1.
- Object of the present invention is to provide a MEMS transducer and a chip with such a MEMS sound transducer, by means of which the piezoelectric effect can be amplified.
- a MEMS sound transducer for generating and / or detecting sound waves in the audible wavelength spectrum.
- the MEMS sound transducer is thus preferably designed as a MEMS loudspeaker and / or MEMS microphone.
- the MEMS transducer comprises a carrier substrate having a cavity.
- the cavity has at least one opening.
- the cavity preferably has two openings, in particular openings formed on two opposite sides of the carrier substrate.
- the carrier substrate is designed in particular as a, preferably closed, frame.
- the MEMS transducer further comprises a multilayer piezoelectric diaphragm structure.
- the membrane structure has a plurality of firmly interconnected layers, of which at least one layer has piezoelectric properties.
- the membrane structure spans the opening of the cavity.
- the membrane structure is connected in its edge region to the carrier substrate, so that it is able to oscillate for generating and / or detecting sound energy relative to the carrier substrate, in particular the frame.
- the membrane structure comprises at least in regions - that is, not necessarily extending over its entire surface in a plan view - in cross-section a first and a second piezoelectric layer spaced therefrom, in particular in the vertical direction.
- the second piezoelectric layer is preferably arranged in side view above the first piezoelectric layer, so that the second piezoelectric layer is preferred over the first piezoelectric layer. is located in the region of the side of the first piezoelectric layer which is remote from the carrier substrate.
- an intermediate layer is arranged in the area between the two piezoelectric layers. At least one of the two piezo layers can abut directly on the intermediate layer or, alternatively, be spaced apart from the intermediate layer by further layers.
- the intermediate layer is designed such that by means of it sound energy, which was previously reflected due to the acoustic impedance at an interface of the membrane structure formed between the membrane structure and the adjacent air, can be reflected again in the direction of this interface. As a result, the piezoelectric effect of the membrane structure is enhanced.
- the intermediate layer is accordingly designed to be sound-reflecting and / or reinforcing the piezoelectric effect of the membrane structure.
- the acoustic impedance value of the intermediate layer with respect to at least one of the two piezoelectric layers is selected such that the sound energy reflected back at the interface with the air is reflected by the intermediate layer again in the direction of the interface.
- the membrane structure a larger sound energy is transmitted to the air.
- the intermediate layer and / or at least one of the piezoelectric layers has a large impedance difference to one another.
- the intermediate layer has a lower density compared to at least one of the two piezo layers. In this way, advantageously, the impedance difference between the intermediate layer and at least one of the two piezoelectric layers can be increased, so that more sound energy can be reflected by the intermediate layer.
- An enhancement of the piezoelectric effect of the membrane structure can be achieved, in particular, if the intermediate layer is made of silicon oxide, silicon nitride and / or polysilicon. These materials have a lower density compared to the known piezoelectric materials, so that the sound energy reflection properties of the intermediate layer can be increased.
- At least one of the two piezoelectric layers is produced from lead zirconate titanate and / or aluminum nitride.
- the two piezoelectric layers are each embedded between a lower and an upper electrode layer.
- the membrane structure thus advantageously has, starting from the carrier substrate, a first lower electrode layer, a first piezo layer, a first upper electrode layer, an intermediate layer, a second lower electrode layer, a second piezo layer and a second upper electrode layer.
- the membrane structure is at least partially coated with a passivation layer on its side facing away from the carrier substrate.
- the carrier substrate is preferably made of silicon and thus electrically conductive, it is advantageous if an electrical insulating layer, in particular of silicon oxide, is arranged in the region between the carrier substrate and the lowermost electrode layer of the membrane structure.
- the membrane structure comprises a membrane layer, in particular of polysilicon.
- the membrane layer preferably extends over the entire opening of the cavity formed in the carrier substrate.
- the membrane layer is set in vibration by the sound energy arriving from the outside.
- the membrane layer is vibrated to produce sound waves in the audible wavelength spectrum by means of the appropriately controlled piezoelectric layers.
- the membrane layer is preferably in the region below the first piezoelectric layer - d. H. in particular between the carrier substrate and the lower first electrode layer - or in the region above the second piezoelectric layer - d. H. in particular on the uppermost electrode layer of the second piezoelectric layer adjacent - is arranged.
- the membrane structure has on its side facing away from the carrier substrate a plurality of and / or contact recesses formed to different depths.
- the contact recesses in the cross-sectional view extend from the top of the membrane structure up to each different electrode layers.
- the two piezoelectric layers can be excited via the respective lower and upper electrode layer and / or electrical signals can be tapped.
- electrical connection elements are arranged in the contact recesses. These are preferably electrically connected to the respective electrode layer to which they extend. Additionally or alternatively, in the cross-sectional view, the electrical connection elements extend from the region of the top side of the membrane structure over at least one of the two side walls of the contact depression to the bottom thereof.
- the carrier substrate in the plan view forms a, in particular closed, frame.
- the cavity of the carrier substrate thus has in each case an opening on two opposite sides, whereby the frame shape of the carrier substrate is formed.
- the membrane structure in particular in the interior of the frame and / or on its side facing away from the carrier substrate, has at least one recess. In the region of this recess, at least the two piezoelectric layers are preferably removed.
- the membrane structure thus has, in plan view, at least one active piezoelectric region and at least one passive region, in particular formed by the recess. Only the active region is thus piezoelectrically excitable. In contrast, the passive area is only passively movable with the associated active area.
- the at least one piezoelectric active region and the at least one passive region form a plan view of the membrane structure, in particular a meandering, bar-shaped, n-bar-shaped and / or spiral pattern.
- the piezoelectric active region is preferably designed in such a way that, in the case of a MEMS sound transducer designed as a loudspeaker, it can excite the membrane structure to vibrate.
- the passive region which is no longer piezoelectrically excitable on account of the abraded piezo layers, is, on the other hand, only moved along via the adjacent piezoelectric active region.
- the recess is designed in such a way that the piezoelectric active region has at least one anchor end connected to the frame in the plan view and / or at least one free end which can be oscillated in the z direction.
- the free end can thus perform a particularly large stroke relative to the armature end in the z-direction of the MEMS transducer.
- the active region has at least one, in particular beam-shaped, deflection section in plan view. Additionally or alternatively, it is advantageous if, in the cross-sectional view of the deflection region, in the case of at least one of the two piezo layers, at least one of the two electrode layers is arranged asymmetrically with respect to the piezo layer corresponding therewith. As a result of this asymmetrical arrangement of the electrode layer relative to the piezo layer corresponding therewith, the deflection section or the active region can twist about its longitudinal axis when a voltage is applied. In this way, advantageously, the stroke of the active region in the z direction of the MEMS sound transducer can be increased.
- the z-stroke of the membrane structure can furthermore be increased if the active region in plan view has at least one first deflection section, one second deflection section and / or one between these two having formed deflection.
- the armature end is preferably formed at the end of the first deflection section facing away from the deflection section and the free end is formed at the end of the second deflection section facing away from the deflection area. Due to the deflection section, the free end of the active region can thus advantageously be deflected by a greater length in the z direction of the MEMS sound transducer.
- the deflecting section In order to be able to form the length of the active region as long as possible between its armature end and its free end, it is advantageous for the deflecting section to cover the two deflecting sections in plan view in an angular range of 1 ° to 270 °, in particular by 90 ° or 180 ° , diverts.
- the membrane structure in the plan view of several, in particular separately controllable, transducer regions.
- These transducer regions of the one-piece membrane structure preferably have mutually different sizes and / or different patterns.
- the different sized transducer areas can be designed as a high or woofer.
- the carrier substrate has at least one support element, in particular in the interior of the frame, in plan view. This is thus preferably arranged to support the membrane structure between two adjacent transducer regions. If one of the two transducer regions is excited to oscillate, the connection region between the two transducer regions is supported by the support element, so that the adjacent transducer region does not or only partially vibrates with it. The wide This prevents tearing of a very large membrane structure.
- the two mutually adjacent transducer regions can very effectively be decoupled from one another by vibration when the support element with its end facing the membrane structure is fixedly connected to the membrane structure.
- the support element, with its end facing the membrane structure it may also be advantageous for the support element, with its end facing the membrane structure, to lie loosely against the membrane structure or to be spaced therefrom in the z-direction of the MEMS acoustic transducer.
- the support element is designed as a wall which preferably divides the cavity into at least two cavity regions.
- a chip in particular a silicon chip, for generating and / or detecting sound waves in the audible wavelength spectrum is proposed, which has a plurality of MEMS sound transducers arranged in an array-like manner and / or controllable separately from one another. At least one of these MEMS sound transducers is designed according to the preceding description, wherein said features may be present individually or in any desired combination.
- FIG. 2 shows a cross-sectional view of a second exemplary embodiment of a MEMS sound transducer with a passivation layer acting as a membrane layer
- FIG. 3 shows a cross-sectional view of a third exemplary embodiment of a MEMS sound transducer with a reinforcing layer, which is formed from a lower insulating layer and / or extends only partially over an opening of the carrier substrate in the vertical direction,
- FIG. 4 shows a cross-sectional view of a fourth exemplary embodiment of a MEMS sound transducer with a reinforcing layer, which is formed from an upper insulating layer and / or extends in a vertical direction over the entire opening of the cavity, FIG.
- FIG. 5 shows a cross-sectional view of a fifth exemplary embodiment of a MEMS sound transducer with a reinforcing layer, which is formed from an upper insulating layer and / or extends only partially over the opening of the cavity in the vertical direction, FIG.
- FIGS. 6a-6f show the individual method steps for producing a
- FIGS. 7 and 8 show two different exemplary embodiments of a MEMS sound transducer in a perspective view;
- FIG. 9 shows a cross section through an active region of the exemplary embodiments illustrated in FIGS. 7 and / or 8,
- FIG. 10 shows a plan view of a plurality of MEMS sound transducers arranged in the manner of an array in accordance with the exemplary embodiment shown in FIG. 8 and FIG. 10
- FIG. 11 shows a cross-sectional view of a further exemplary embodiment of a MEMS sound transducer with a one-part membrane structure which has a plurality of transducer regions which are supported in particular in the z direction via at least one support element.
- FIG. 1 shows a detail of a MEMS sound transducer 1 in cross-section, in particular in the connection region between a membrane structure 5 and a carrier substrate 2 of the MEMS sound transducer 1 designed as a frame.
- the MEMS sound transducer is designed to generate and / or detect sound waves in the audible wavelength spectrum.
- the MEMS sound transducer 1 is thus designed as a MEMS loudspeaker and / or MEMS microphone.
- the MEMS sound transducer 1 comprises a carrier substrate 2, in particular made of silicon.
- the carrier substrate 2 is - as for example in the embodiment shown in Figure 2 - as, in particular closed, frame formed.
- the carrier substrate 2 accordingly comprises a cavity 3, which is only partially shown in FIG. 1, or a cavity.
- the cavity 3 comprises a first opening 4, which is spanned by a membrane structure 5.
- the cavity 3 On its side facing away from the membrane structure 5, the cavity 3 has a second opening 6.
- the cavity 3 widens, at least in a region starting from the first opening 4, in the direction of the second opening 6.
- the membrane structure 5 according to FIG. 1 comprises a plurality of layers which are firmly connected to one another. In its edge region 7, the membrane structure 5 is firmly connected to the carrier substrate 2 on its side facing the carrier substrate 2. The membrane structure 5 can thus be compared with the stationary carrier substrate 2 for generating and / or detecting sound energy in the z direction of the MEMS sound transducer 1, i. according to the orientation shown in Figure 1 in the vertical direction, swing.
- the membrane structure 5 is formed as a multilayer piezoelectric membrane structure. Accordingly, according to the cross-sectional view illustrated in FIG. 1, the membrane structure 5 comprises a first piezo layer 8 and a second piezo layer 9.
- the two piezo layers 8, 9 do not necessarily have to be formed continuously over the entire surface of the membrane structure 5. Age- natively, these can also have interruptions, which are explained in more detail in the following embodiments.
- the two piezo layers 8, 9 are preferably made of lead zirconate titanate (PZT) and / or aluminum nitride (ALN).
- PZT lead zirconate titanate
- APN aluminum nitride
- the two piezo layers 8, 9 are each between two electrode layers 10, 1 1, 12, 13 embedded.
- the first piezoelectric layer 8 has on its side facing the carrier substrate 2 a first lower electrode layer 10 and on its side remote from the carrier substrate 2 a first upper electrode layer 11.
- a second lower electrode layer 12 is arranged on the second piezoelectric layer 9 on its side facing the carrier substrate 2 and a second upper electrode layer 13 on its side remote from the carrier substrate 2.
- the membrane structure 5 may comprise a membrane layer 14.
- the membrane layer 14 gives the membrane structure 5 a higher rigidity and / or strength.
- the membrane layer 14 is excited by the two piezo layers 8, 9 to oscillate.
- the membrane layer 14 is preferably made of polysilicon and / or according to the embodiment shown in Figure 1 below the first piezoelectric layer 8, in particular in the region between the first lower electrode layer 10 and the carrier substrate 2, respectively.
- the membrane layer 14 is thus located in the region between the carrier substrate 2 and the lower first piezoelectric layer 8.
- the membrane layer 14 may also be arranged above the second piezoelectric layer 9.
- the Membrane structure 5 completely dispensed with such a membrane layer 14.
- the carrier substrate 2 shown in FIG. 1 is preferably made of silicon, and is accordingly electrically conductive, it is advantageous if the carrier substrate 2 has an insulating layer 15, in particular of silicon oxide, on its side facing the membrane structure 5. As a result, the first lower electrode layer 10 can be electrically insulated from the carrier substrate 2.
- this has, on its side facing away from the carrier substrate 2, a, in particular uppermost, passivation layer 16.
- the multilayer piezoelectric diaphragm structure 5 described above has a first interface 17 adjacent to the surrounding air. This is located on the side facing away from the carrier substrate 2 side of the membrane structure 5. Furthermore, the membrane structure 5 comprises on its the carrier substrate 2 side facing a second interface 18. Due to the fact that the membrane structure 5, in particular in the region of the two interfaces 17, 18, im Compared to the adjacent air has a very different impedance, a large part of the sound energy to be transmitted at the interface 17, 18 is reflected. As a result, the piezoelectric effect of the MEMS sound transducer 1 is reduced.
- the membrane structure 5 is first vibrated in the z direction via electrical excitation of the two piezo layers 8, 9.
- a sound wave in the audible wavelength spectrum is generated at the first interface 17.
- the sound energy generating sound energy is not completely transferred to the air. Instead, part of the sound energy is due to the large impedance difference between the membrane structure 5 and the adjacent air at the first interface 17 back again, ie in the direction of the carrier substrate 2, reflected. In known from the prior art membrane structure 5, this sound energy is lost, whereby the piezoelectric effect of the membrane structure 5 is reduced.
- the membrane structure 5 therefore has a sound energy-reflecting intermediate layer 19 according to FIG.
- the intermediate layer 19 is arranged in the region between the two piezoelectric layers 8, 9 according to the cross-sectional view shown in FIG. In this case, the intermediate layer 19 directly adjoins the first upper electrode layer 11 and the second lower electrode layer 12.
- the intermediate layer 19 has a lower density compared to at least one of the two piezo layers 8, 9. As a result, the intermediate layer 19 and at least one of the two piezo layers 8, 9 have a mutually different impedance. Due to this difference in impedance, the intermediate layer 19 has a sound-reflecting effect. Due to this, the sound application that was previously reflected back at the first interface 17 is reflected by the intermediate layer 19 again in the direction of the first interface 17 using the example of the loudspeaker application. As a result, this sound energy is not lost, but is used again at the interface 17 to generate a sound wave. As a result, the piezoelectric effect of the membrane structure 5 is enhanced.
- the sound energy-reflecting properties of the intermediate layer 19 are particularly pronounced when the intermediate layer 19 consists of silicon oxide, silicon nitride and / or polysilicon.
- the intermediate layer 19 acts on a MEMS sound transducer 1 acting as a microphone.
- the intermediate layer 19 is not only sound-reflecting but also additionally formed dielectrically. As a result, the first upper electrode layer 11 and the second lower electrode layer 12 are electrically mutually distinct isolated. As a result, additional insulation layers can advantageously be saved.
- FIGS. 2, 3, 4 and 5 each show different embodiments of the MEMS sound transducer 1.
- each of these exemplary embodiments has two piezo layers 8, 9 which are spaced apart from one another in the z-direction and which are each sandwiched between two electrode layers 10, 11, 12, 13. Furthermore, between these two piezoelectric layers 8, 9 a to the first embodiment identically formed and identically acting intermediate layer 19 is arranged.
- the above-mentioned layer combination constitutes the basis for the exemplary embodiments described below. In the following description of these exemplary embodiments, the same reference numerals are used for identical features in comparison to the exemplary embodiment illustrated in FIG. Unless these are explained again in detail, their design and mode of action corresponds to the features already described above.
- the membrane structure 5 does not have a separate membrane layer 14. Its effect is instead taken over by the passivation layer 1 6, which thus acts as a membrane layer 14.
- the passivation layer 16 extends in the horizontal direction over the entire first opening 4.
- the membrane structure 5 In order to be able to actively activate the two piezo layers 8, 9 via the respectively associated electrode layers 10, 11, 12, 13 in the case of a loudspeaker application and / or in the case of a microphone application to be able to pick up the electrical signals generated by the two piezo layers 8, 9 , the membrane structure 5 according to FIG. 2 has a plurality of contact recesses 20a, 20b, 20c, 20d on its side facing away from the carrier substrate 2.
- the contact recesses 20a, 20b, 20c, 20d extend from the side of the membrane structure 5 facing away from the carrier substrate 2 up to in each case one of the electrode layers 10, 1 1, 12, 13.
- an electrical connection element 21, in particular an electrical contact is arranged in each of the contact recesses 20a, 20b, 20c, 20d.
- the connecting element 21 is provided in the embodiment shown in Figure 2 only in one of the contact recesses 20a, 20b, 20c, 20d with a reference numeral.
- connection elements 21 are each electrically connected to their associated electrode layer 10, 1 1, 12, 13. According to the cross-sectional view shown in FIG. 2, the connection elements 21 each extend from the region of the upper side of the membrane structure 5 over the side walls 22 of the respective contact recesses 20a, 20b, 20c, 20d to their base 23. To ensure that the respective connection elements 21 are exclusively with a single electrode layers 10, 1 1, 12, 12 is electrically connected, in the region between the connecting element 21 and the side wall 22, an additional insulating layer 15 b is arranged.
- the membrane structure 5 has a plurality of recesses 24a, 24b, 24c, 24d.
- the recesses 24a, 24b, 24c, 24d extend from the top of the membrane structure 5 in the direction of the carrier substrate 2.
- the two piezo layers 8, 9 are removed.
- the membrane structure 5 thus has piezoelectric active regions 25 - in which both piezoelectric layers 8, 9 are still present - and piezoelectric passive regions - in which the two piezoelectric layers 8, 9 are removed - (see also FIGS. 7 and 8).
- these active areas 25 and passive areas 26 is provided with a reference numeral in the exemplary embodiment shown in FIG.
- the two piezo layers 8, 9, the intermediate layer 19 and all the electrode layers 10, 11, 12, 13 are removed.
- the membrane structure 5 thus exclusively the passivation layer 1 6 on.
- the passivation layer 1 6 thus acts as a membrane layer 14.
- the membrane structure 5 has a reinforcing layer 27 in the region of the first opening 4.
- the first insulating layer 15a is not completely removed in the region of the first opening 4.
- the reinforcing layer 27 is removed in its region near the support substrate.
- the reinforcing layer 27 thus has a spacing in the horizontal direction to the carrier substrate 2, in particular as a frame.
- the distance is at least such that at least one of the passive regions 26 is formed in the edge region without this reinforcing layer 27.
- the insulating layer 15a arranged in the interior of the carrier substrate 2 designed as a frame thus acts as a reinforcing layer 27.
- the membrane structure 7 is made more stable and / or stiffer.
- the membrane structure 5 is in contrast softer and / or more flexible.
- the reinforcing layer 27 may also be formed by means of the second insulating layer 15b.
- the reinforcing layer 27 or the second insulating layer 15b extends in the horizontal direction over the entire width of the first opening 4.
- the second insulation layer 15b acting as reinforcing layer 27 according to FIG. 5 can also be used in the edge region, comparable to the embodiment shown in FIG. example - be removed.
- the membrane structure 5 has a higher rigidity and / or strength caused by the reinforcing layer 27 only in the inner region.
- the edge region adjoining the carrier substrate 2 is made more flexible and / or softer in comparison since it has no reinforcing layer 27 or second insulating layer 15b.
- FIGS. 6a to 6f illustrate the manufacturing process of the MEMS sound transducer 1 on the embodiment shown in FIG.
- a carrier substrate 2 made of silicon is provided with an insulation layer 15a arranged on the upper side.
- the membrane structure 5 is applied to the upper side of the insulating layer 15a.
- the first lower electrode layer 10, the first piezoelectric layer 8, the first upper electrode layer 11, the intermediate layer 19, the second lower electrode layer 12, the second piezoelectric layer 9 and the second upper electrode layer 13 are preferably applied one after the other.
- a subsequent method step according to FIG.
- the contact recesses 20 b, 20 c, 20 d and the recesses 24 a, 24 b, 24 c, 24 d are introduced into the membrane structure 5 from the side facing away from the carrier substrate 2.
- the second insulation layer 15b is applied in the contact recesses 20b, 20c, 20d and the two inner recesses 24b, 24c.
- the entire membrane structure 5 according to FIG. 6e is coated with the passivation layer 16.
- the cavity 3 is formed from the underside, so that the carrier substrate 2 now has a frame shape, against which the membrane structure 5 can oscillate in the z-direction.
- FIGS. 7 and 8 each show two different embodiments of the MEMS sound transducer 1 in a perspective view.
- the Cavity or the cavity 3 is located in this perspective view shown in Figure 7 and 8 on the back of the MEMS transducer 1 and is therefore not visible.
- the membrane structure 5 and / or the cavity 3, which is not visible here, is circular in plan view. Furthermore, it can be seen in the perspective view that the recesses 24 - of which only one is provided with a reference numeral for the sake of clarity - form a pattern 28.
- the pattern 28 is formed by the piezoelectric active regions 25a, 25b, 25c, 25d and the piezoelectric passive regions 26a, 26b, 26c, 26d, 26e.
- the active region 25a has a rigid and / or firmly clamped first and second armature end 29, 30 connected to the frame or the carrier substrate 2. Furthermore, the active region 25a comprises a free end 31 opposite the two armature ends 29, 30 in the z-direction of deflection. In the region between the respective anchor end 29, 30 and the free end 31, the active region 25a is at least partially substantially meander-shaped.
- the active region 25a starting from the respective armature end 29, 30, has a respective first deflection section 32, a respective second deflection section 33 - only one of which is provided with a reference numeral - and a common third deflection section 34.
- the deflection sections 32, 33, 34 are bar-shaped in the two exemplary embodiments illustrated in FIGS. 7 and 8. In each case two mutually adjacent deflection sections 32, 33, 34 are connected to each other by means of a deflection section 35a, 35b. In the present exemplary embodiment, each of the deflection section 35a, 35b deflects the two mutually adjacent deflection sections 32, 33, 34 relative to one another 180 ° around.
- the free ends 31 of the active regions 25a, 25b, 25c, 25d have a spacing relative to one another and to a centrally located central point 36 in plan view.
- FIG. 8 shows an alternative exemplary embodiment of the MEMS sound transducer 1 in perspective view, wherein identical designations are used for identical features in comparison to the exemplary embodiment explained above in FIG. Unless these are explained again in detail, their design and mode of action corresponds to the features already described above.
- the membrane structure 5 is not circular but square. Furthermore, the free ends 31 of the respective active regions 25a, 25b, 25c, 25d lie directly against one another in the central point 36. Additionally or alternatively, however, the free ends 31 can also be connected to one another and / or formed integrally with one another.
- FIG. 9 shows a cross section through an active region 25, in particular through a beam-shaped deflection section 32, 33, 34 and / or deflection section 35a, 35b of one of the exemplary embodiments illustrated in FIG. 7 and / or FIG.
- the second upper electrode layer 13 is arranged asymmetrically with respect to the second piezo layer 9.
- the active region 25 is twisted around its longitudinal axis, as a result of which the maximum lifting height in the z direction of the MEMS sound transducer 1 can be increased.
- This torsion is indicated in Figure 9 with an arrow.
- too Further or all electrode layers 10, 1 1, 12, 1 3 with respect to their respective associated piezoelectric layer 8, 9 may be arranged asymmetrically.
- the MEMS sound transducers 1 can be arranged in an array 37 according to FIG. According to the exemplary embodiment illustrated in FIG. 10, all MEMS sound transducers 1 have the same shape and size. Furthermore, their active region 25 each has the same pattern 28. In an alternative embodiment not shown here, these MEMS sound transducers 1 arranged in the manner of an array may also have different sizes relative to one another. As a result, high and woofers can be formed. Furthermore, the MEMS sound transducers 1 may have different patterns 28 and membrane structure shapes from each other.
- the MEMS sound transducer 1 comprises at least two transducer regions 38, 39 that can be controlled separately from one another.
- the transducer regions 38, 39 of the one-piece membrane structure 5 can have different sizes and / or different patterns.
- the MEMS sound transducer 1 has at least one support element 40 in the interior of the frame or the carrier substrate 2.
- the support member 40 is formed as a wall and divides the cavity 3 in a first and second cavity portion 41, 42.
- the support member 40 may be spaced with its the diaphragm structure 5 facing support member end 43 in the z direction thereof.
- the support member 40 with its Stützelementendet 43 directly, in particular loosely, rests against the underside of the membrane structure 5 and / or is firmly connected thereto.
- the MEMS sound transducer 1 shown in FIG. 11, which has a plurality of transducer regions 38, 39, may also have an array-like manner in the sense of the embodiment shown in FIG. For example, be arranged with another identically or differently formed MEMS sound transducers 1.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102013114826.3A DE102013114826A1 (en) | 2013-12-23 | 2013-12-23 | Microelectromechanical sound transducer with sound energy-reflecting intermediate layer |
PCT/EP2014/078220 WO2015097035A1 (en) | 2013-12-23 | 2014-12-17 | Micro-electromechanical sound transducer with sound energy-reflecting interlayer |
Publications (2)
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EP3087760A1 true EP3087760A1 (en) | 2016-11-02 |
EP3087760B1 EP3087760B1 (en) | 2019-03-13 |
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EP14820823.4A Active EP3087760B1 (en) | 2013-12-23 | 2014-12-17 | Micro-electromechanical sound transducer with sound energy-reflecting interlayer |
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EP (1) | EP3087760B1 (en) |
KR (1) | KR102208617B1 (en) |
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AU (1) | AU2014372721B2 (en) |
CA (1) | CA2934994A1 (en) |
DE (1) | DE102013114826A1 (en) |
MY (1) | MY177541A (en) |
SG (1) | SG11201605179XA (en) |
WO (1) | WO2015097035A1 (en) |
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DE102015114242A1 (en) * | 2015-08-27 | 2017-03-02 | USound GmbH | MEMS speaker with position sensor |
DE102015116640A1 (en) | 2015-10-01 | 2017-04-06 | USound GmbH | MEMS printed circuit board module with integrated piezoelectric structure and sound transducer arrangement |
DE102015116707A1 (en) * | 2015-10-01 | 2017-04-06 | USound GmbH | Flexible MEMS printed circuit board unit and sound transducer arrangement |
JP7067891B2 (en) | 2017-10-18 | 2022-05-16 | Mmiセミコンダクター株式会社 | Transducer |
EP3676025A4 (en) * | 2017-11-16 | 2021-04-07 | Chirp Microsystems, Inc. | Piezoelectric micromachined ultrasonic transducer with a patterned membrane structure |
US11256818B2 (en) | 2017-12-28 | 2022-02-22 | Corlina, Inc. | System and method for enabling and verifying the trustworthiness of a hardware system |
WO2019152521A1 (en) | 2018-01-30 | 2019-08-08 | Corlina, Inc. | User and device onboarding |
DE102018203812A1 (en) | 2018-03-13 | 2019-09-19 | Christian-Albrechts-Universität Zu Kiel | FERROELECTRIC MATERIAL, MEMS COMPONENT WITH A FERROELECTRIC MATERIAL, MEMS DEVICE WITH A FIRST MEMS COMPONENT, METHOD FOR PRODUCING A MEMS COMPONENT, AND METHOD FOR PRODUCING A CMOS COMPATIBLE MEMS COMPONENT |
EP3620429A1 (en) * | 2018-09-06 | 2020-03-11 | Infineon Technologies AG | Mems membrane transducer and method for producing same |
CN112423210A (en) * | 2019-08-21 | 2021-02-26 | 新科实业有限公司 | MEMS transducer, MEMS microphone and method of manufacturing MEMS transducer |
KR102367922B1 (en) | 2019-11-29 | 2022-02-25 | 국방과학연구소 | Piezoelectric Micro-Electro Mechanical Systems vector hydrophone equipment and Method for manufacturing the same |
US20230232159A1 (en) | 2022-01-18 | 2023-07-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Top notch slit profile for mems device |
EP4236367A1 (en) * | 2022-02-28 | 2023-08-30 | Hahn-Schickard-Gesellschaft für angewandte Forschung e.V. | Corrugations or weakened areas on anchoring structures of vertical mems transducer membranes |
WO2023161469A1 (en) | 2022-02-28 | 2023-08-31 | Hahn-Schickard-Gesellschaft Für Angewandte Forschung E. V. | Corrugations or weakened regions on armature structures of vertical mems converter membranes |
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US4861420A (en) * | 1984-06-04 | 1989-08-29 | Tactile Perceptions, Inc. | Method of making a semiconductor transducer |
US5650685A (en) * | 1992-01-30 | 1997-07-22 | The United States Of America As Represented By The Secretary Of The Army | Microcircuit package with integrated acoustic isolator |
WO1997039464A1 (en) * | 1996-04-18 | 1997-10-23 | California Institute Of Technology | Thin film electret microphone |
DE102005008514B4 (en) * | 2005-02-24 | 2019-05-16 | Tdk Corporation | Microphone membrane and microphone with the microphone membrane |
DE102005008512B4 (en) * | 2005-02-24 | 2016-06-23 | Epcos Ag | Electrical module with a MEMS microphone |
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JP2009010559A (en) * | 2007-06-27 | 2009-01-15 | Nippon Dempa Kogyo Co Ltd | Piezoelectric component and method of manufacturing the same |
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-
2013
- 2013-12-23 DE DE102013114826.3A patent/DE102013114826A1/en active Pending
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2014
- 2014-12-17 CA CA2934994A patent/CA2934994A1/en not_active Abandoned
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- 2014-12-17 MY MYPI2016702313A patent/MY177541A/en unknown
- 2014-12-17 SG SG11201605179XA patent/SG11201605179XA/en unknown
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- 2014-12-17 WO PCT/EP2014/078220 patent/WO2015097035A1/en active Application Filing
- 2014-12-17 KR KR1020167019823A patent/KR102208617B1/en active IP Right Grant
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CN106416295A (en) | 2017-02-15 |
WO2015097035A1 (en) | 2015-07-02 |
AU2014372721B2 (en) | 2018-11-08 |
SG11201605179XA (en) | 2016-08-30 |
US20170006381A1 (en) | 2017-01-05 |
KR102208617B1 (en) | 2021-01-28 |
EP3087760B1 (en) | 2019-03-13 |
KR20160114068A (en) | 2016-10-04 |
CN106416295B (en) | 2020-01-03 |
CA2934994A1 (en) | 2015-07-02 |
US10045125B2 (en) | 2018-08-07 |
AU2014372721A1 (en) | 2016-07-28 |
DE102013114826A1 (en) | 2015-06-25 |
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