EP3033308A1 - Optical fiber preform and method for manufacturing such optical fiber preform from a primary preform - Google Patents
Optical fiber preform and method for manufacturing such optical fiber preform from a primary preformInfo
- Publication number
- EP3033308A1 EP3033308A1 EP13815562.7A EP13815562A EP3033308A1 EP 3033308 A1 EP3033308 A1 EP 3033308A1 EP 13815562 A EP13815562 A EP 13815562A EP 3033308 A1 EP3033308 A1 EP 3033308A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- preform
- optical fiber
- silica
- concentration
- lithium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 121
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 58
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 45
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 37
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000004411 aluminium Substances 0.000 claims abstract description 31
- 238000000151 deposition Methods 0.000 claims description 19
- 238000002347 injection Methods 0.000 claims description 19
- 239000007924 injection Substances 0.000 claims description 19
- 239000000843 powder Substances 0.000 claims description 5
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 3
- 239000000835 fiber Substances 0.000 description 25
- 229910052739 hydrogen Inorganic materials 0.000 description 23
- 239000001257 hydrogen Substances 0.000 description 23
- 239000007789 gas Substances 0.000 description 22
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 20
- 230000032683 aging Effects 0.000 description 17
- 239000003513 alkali Substances 0.000 description 16
- 229910018503 SF6 Inorganic materials 0.000 description 12
- 238000000746 purification Methods 0.000 description 12
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 12
- 230000008021 deposition Effects 0.000 description 11
- 238000011109 contamination Methods 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 229910052708 sodium Inorganic materials 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000012681 fiber drawing Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- KLMCZVJOEAUDNE-UHFFFAOYSA-N francium atom Chemical compound [Fr] KLMCZVJOEAUDNE-UHFFFAOYSA-N 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/0128—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass
- C03B37/01291—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass by progressive melting, e.g. melting glass powder during delivery to and adhering the so-formed melt to a target or preform, e.g. the Plasma Oxidation Deposition [POD] process
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C13/00—Fibre or filament compositions
- C03C13/04—Fibre optics, e.g. core and clad fibre compositions
- C03C13/045—Silica-containing oxide glass compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/1065—Multiple coatings
- C03C25/1068—Inorganic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/32—Doped silica-based glasses containing metals containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
Definitions
- the field of the invention is that of the design and manufacture of optical fibers.
- the invention is applicable to the manufacture of optical fiber preforms, in particular for the manufacture of single-mode fibers.
- the invention relates to an optical fiber preform and method for manufacturing such optical fiber preform from a primary preform.
- the invention applies particularly to the technique of manufacture of optical fiber perform using plasma outside deposition.
- the steps of optical fiber fabrication include obtaining an primary preform (or core rod), overcladding the primary preform to form an optical fiber preform and drawing the optical fiber preform into a fiber.
- VAD Vapor Axial Deposition
- CVD Chemical Vapor Deposition
- ODD Outside Vapor Deposition
- AVD Advanced Plasma and Vapor Deposition
- an primary preform can be obtained by chemical vapor deposition of doped and/or undoped silica glass layers inside a tube mounted on a glass working lathe, and which is after chemical vapor deposition subjected to a collapsing operation to form a solid primary preform (or core rod).
- Advanced plasma and vapor deposition process consists in depositing silica powder through a plasma torch onto the primary preform (i.e. a glass core rod) and growing silica layer by layer.
- the primary preform is rod-shaped and is rotated around a rotation axis in front of the torch whose plasma is fed with grains of silica.
- the grains of silica are melted by means of the torch, then projected and vitrified onto the primary preform.
- the preform diameter obtained after deposition operation is a function of the number of silica layers coated on the primary preform.
- alkali elements are present in fiber glass structure, its attenuation can be degraded when it is put under an atmosphere containing hydrogen (H 2 ).
- Fiber sensitivity to exposure to hydrogen (H 2 ) is evaluated through accelerated ageing tests using high temperature (70°C for example) and high pressure of hydrogen (10 bar for example) during a short period of time (72 hours for example). These tests enable to estimate fiber behavior after several tens of year of utilization under usual conditions.
- Si-OH or Ge-OH chemical defects are appearing in the glass structure.
- Such bonds are absorbent at certain wavelengths, thereby increasing the attenuation losses of the optical fiber at said wavelengths.
- alkali metals or alkali elements metals of the group I in the periodic table consisting of: lithium (Li), sodium (Na), potassium (K), rubidium (Rb), caesium (Cs), francium (Fr).
- a known solution to decrease quantity of Alkali elements present in the silica layers deposited on the primary preform consists in purifying natural silica by introducing into the plasma (which is the seat of the chemical reaction) a fluorine (F) or chlorine (CI) compound mixed with a carrier gas during the preform overcladding step.
- F fluorine
- CI chlorine
- Lithium (Li) or sodium (Na) contained in the grains of silica reacts with the fluorine or chlorine compound, causing fluorides NaF or LiF or chlorides NaCI or LiCI to be given off in gaseous form.
- the purifying elements used can be SF 6 -based gas (fluorine), C 2 F 6 -based gas (fluorine) Cl 2 -based gas (chlorine). While such a solution enables reducing the concentration of lithium (Li) or sodium (Na) in the deposited silica, however it does not give, for given operating conditions, sufficient stable fiber properties between different production batches of natural silica used for the deposition. This leads to a reproducibility problem of operations. Especially, for single-mode optical fibers obtained from that known technique, the attenuation measured at wavelength of 1550nm (i.e. amount of light lost between input and output of the fiber) and durability against hydrogen ageing can be out of the desired range (specifications). A low concentration of Li or Na in the deposited silica improves durability against hydrogen ageing but degrades the attenuation of optical fiber. Such a known solution is therefore not optimal.
- the invention in at least one embodiment, is aimed especially at overcoming these different drawbacks of the prior art.
- a particular embodiment of the invention proposes an optical fiber preform comprising a primary preform and at least one purified silica-based overclad layer surrounding said primary preform, said at least one purified silica-based overclad layer comprising lithium and aluminium, and a ratio between lithium concentration [Li] and aluminium concentration [Al] satisfying the following inequality:
- the general principle is to propose an optical fiber preform that includes one or several purified silica-based overclad layers exhibiting a purification ratio playing both on lithium concentration and aluminium concentration.
- An optical fiber obtained from the optical fiber preform according to the invention offers an adequate trade-off of optical properties, particularly between fiber attenuation and durability against hydrogen ageing.
- the present invention relies on a wholly novel and inventive approach taking advantage of a particular ratio between the lithium concentration and the concentration of aluminium, which does not belong to the alkali elements (group I in the periodic table).
- the ratio between lithium concentration [Li] and aluminium concentration [Al] satisfies the following inequality:
- the fiber attenuation is thus further reduced while keeping a good durability against hydrogen ageing.
- the ratio between lithium concentration [Li] and aluminium concentration [Al] satisfies the following inequality:
- optical fiber made from the aforesaid optical fiber preform in any of its different implementation.
- said method being characterized in that it further comprises a step of adjusting at least one purifying gas injection parameter such that said at least one silica-based overclad layer deposited on the primary preform has a ratio between lithium concentration [Li] and aluminium concentration [Al] satisfying the following inequality:
- At least one purifying gas injection parameter is tuned to obtain an purified optical fibre preform that gives stable optical fiber proprieties, regardless the natural silica batches used for deposition.
- the method according to the invention guarantees a better reproducibility and ensures a good trade-off between fiber attenuation and durability against hydrogen ageing.
- the ratio between lithium concentration [Li] and aluminium concentration [Al] satisfies the following inequality:
- the method further comprises a step of controlling lithium concentration [Li] and aluminium concentration [Al] in said at least one silica-based overclad layer deposited on the primary preform, said step of adjusting at least one purifying gas injection parameter being carried out as a function of the result of said controlling step.
- This step of controlling can be carried performed by means of a measurement sensor for example capable of measuring in real time the concentration of alkali elements contained in the silica layers deposited on the primary preform.
- the method further comprises a step of injecting in the plasma a quantity of lithium adjusted as a function of the result of said controlling step.
- the lithium contamination leads to decrease fiber attenuation.
- the quantity of lithium can be adjusted by means of a controlled injection of the purifying gas into the plasma (e.g. as a function of the purifying gas flow rate) so that the ratio satisfies at least one of the aforesaid above inequalities. This can be achieved by means of a dedicated additional injection duct or an addition of lithium in the raw silica.
- the method further comprises a step of injecting in the plasma a quantity of aluminum adjusted as a function of the result of said controlling step.
- said at least one purifying gas injection parameter comprises a purifying gas flow rate.
- said purifying gas flow rate is set between 0 and 5000 standard cubic centimeters per minute and more particularly between 0 and 800 standard cubic centimeters per minute.
- said purifying gas belonging to the group comprising: SF 6 , C 2 F 6 , Cl 2 , CF 4 , NF 3 , CF 3 CI, C 2 CI 3 CF 3 .
- FIG. 1 provides a schematic illustration of an example of an optical fiber preform that has manufactured in application of the invention
- Figure 2 provides a schema illustrating the implementation of a method of manufacturing an optical fiber preform accord ing to a particular embodiment of the invention
- FIG. 3 graphically depicts a purification yield for alkali elements as a function of purifying compound flow rate
- Figure 4 graphically depicts the ageing at a wavelength of 1385 nm of an optical fiber after being exposed under a pressure of 10 bar of pure hydrogen during 72 hours and at a temperature of 70°C, as a function of [Li]/[AI] ratio in an overclad material for G652d single-mode fiber.
- optical fiber preform 20 that has been overcladded in application of the invention.
- the optical fiber preform 20 illustrated here is ready to be draw into a fiber.
- the optical fiber preform 20 comprises a primary preform 21 of rod-shaped and an overclad layer 22 surrounding said primary preform 21.
- the overclad layer 22 is a purified silica-based layer obtained by means of a method of purifying synthetic or natural silica implementing during the silica deposition operation on the primary preform 21. The principle of such a method is explained in greater detail below in relation with Figure 2.
- the deposition operation serves to increase the d iameter of the primary preform 21, to enable a fiber to be drawn therefrom that is several hundreds of kilometers long.
- the optical fiber preform 20 can comprise one or several overclad layers 22 (illustrated in dashed lines on Figure 1).
- the method of purifying silica according to the invention makes possible to deposit one or more layers of silica that contain an optimized amount of impurities (where the prior art only aims at minimizing amounts of alkali elements), so as to confer on the future optical fiber an adequate trade-off between fiber attenuation and good durability against hydrogen ageing.
- the optical fiber preform 20 comprises a purified silica-based overclad layer 22 having a ratio between lithium concentration [Li] and aluminium concentration [Al] comprised between 1.10 "3 and 20.10 ⁇ 3 . Concentrations are expressed in weight ppm.
- the purified silica-based overclad layer 22 exhibits a purification ratio between lithium concentration and aluminium concentration of about 5. 10 ⁇ 3 .
- the inventors have discovered that, by depositing silica-based overclad layers 22 exhibiting a ratio between lithium concentration [Li] and aluminium concentration [Al] which is comprised between 1.10 "3 and 20.10 3 , more particularly between 4.10 "3 and 10.10 3 , and even more particularly between 4.10 "3 and 6.10 "3 , the optical fiber preform thus obtained allows the future fiber (after drawing) to exhibit a good tradeoff between attenuation at wavelength of 1550nm and durability against hydrogen ageing and therefore to meet the required fiber specifications.
- the method aims at manufacturing an optical fiber preform 20 from a primary preform 21.
- the method comprises a step of depositing several silica-based overclad layers 22 on the primary preform 21.
- This step consists in injecting a powder of synthetic or natural silica 11 into a plasma 4 provided by a plasma torch 3.
- the primary preform 21 extends along a longitudinal axis (referenced as L) and is set into rotation around said longitudinal axis L in the direction indicated by arrow 7.
- the preform is moving in a back-and-forth motion along said longitudinal axis in front of the plasma source 3 that provides the plasma 4 in front of the primary preform 21 substantially perpendicular to said longitudinal axis L.
- the step of depositing is carried out by means of an injection duct 9 which delivers grains of silica 11 into the plasma 4.
- These grains are the result, for example, of grinding up coarse blocks of natural quartz or of the extraction of quartz grain from granite stone using the proper purification process.
- the injection is here performed merely by gravity.
- a valve (not shown) cooperates with the injection duct 9 to allow the injection rate to be adjusted.
- the method further comprises a step of purifying of the silica deposited on the primary preform 21. It consists in injecting, into the plasma 4, a purifying gas 15 containing, fluorine or chlorine element to neutralize alkali elements contained in the powder of silica which is depositing on the primary preform 21. This step is carried out by means of an injection duct 13 which feeds the plasma with the purifying gas 15.
- the purifying gas 15 is, for example, sulfur hexafluoride SF 6 .
- the deposition and purifying steps are carried out as the primary 21 preform is rotating and moving in front of the plasma plume.
- the method further comprises a step of adjusting the purifying gas flow such that the silica-based overclad layer 22 which are depositing on the primary preform 21 have a ratio between lithium concentration [Li] and aluminium concentration [Al] satisfying the following ine
- the purified silica-based overclad layer 2 exhibits a purification ratio of about 5. 10 ⁇ 3 .
- a valve (not shown) is connected to a gas supply (not shown) cooperating with the injection duct 13 to adjust the purifying gas flow rate. It defines the SF 6 fluorine flow rate.
- the silica flow rate is set between 0,5 and 6 Kg/hour, with grain average size between 50 and 400 ⁇ .
- the Plasma power is set between 60 and 140 KW.
- the SF6 flow rate is set between 0 and 1000 seem.
- the core rod is translated at a rate of 5 to 80 mm/min in front of the plasma flame.
- the temperature of the plasma lies in the range 5 000° C to 10 000° C, causing the silica grains to melt.
- the fluorine SF 6 reacts with the alkali elements that are present in the natural silica so as to neutralize so that the overclad layers meeting to the above criteria.
- the SF 6 flow rate can be adjusted to obtain the desired lithium and aluminium concentration in the overclad layers (i.e. after purification), which depends content of lithium and aluminium contained in the raw silica batch (before i.e. purification).
- Figure 3 graphically depicts the purification yield (l-[Alkali] a fter purification) / [Alkali] before purification as a function of SF 6 flow rate, for given APVD conditions.
- the curve shows that, when SF6 flow rate is chosen between 0 and 800 seem ("standard cubic centimeters per minute"), purification yield ranges between 0% and 85%. Lithium contamination in preform's overclad can be set at the required target by choosing the right flow. More generally, SF6 flow rate can be set between 0 and 5000 seem.
- Figure 4 depicts the ageing at a wavelength of 1385 nm measured after an exposure of an optical fiber under a pressure of 10 bar of pure hydrogen during 72 hours and at a temperature of 70°C, as a function of [Li]/[AI] ratio in the overclad material for G652d single-mode fiber.
- Attenuation at wavelengths of 1310 nm and 1550 nm, for G652d preform type with usual draw configuration, are lower than 0,32 and 0,19 dB/km respectively while keeping a reasonable resistance of fibers when exposed to an hydrogen atmosphere.
- the degradation under a pressure of 10 bar of pure hydrogen at a temperature of 70°C will not exceed 0,6 dB/km at 1385 nm after 72 hours.
- the quantity of aluminum can be adjusted in the raw natural silica prior deposition, using an adequate procedure, in order to satisfy the targeted range of lithium and aluminum concentrations.
- This variant is of particular interest in case of highly contaminated silica that can't be purified during the overclad step down to satisfying purities.
- a purifying gas injected in the plasma through duct 13 could also be used.
- the method further comprises a step of controlling lithium concentration [Li] and aluminium concentration [Al] in real time of the silica-based overclad layers 22 deposited on the primary preform 21. Then, the step of adjusting the carrier gas injection parameters is carried out as a function of the result of said controlling step.
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- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
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PCT/IB2013/002235 WO2015022562A1 (en) | 2013-08-13 | 2013-08-13 | Optical fiber preform and method for manufacturing such optical fiber preform from a primary preform |
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EP3033308A1 true EP3033308A1 (en) | 2016-06-22 |
EP3033308B1 EP3033308B1 (en) | 2018-10-03 |
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US (1) | US11046608B2 (en) |
EP (1) | EP3033308B1 (en) |
CN (1) | CN105636917B (en) |
BR (1) | BR112016002895B1 (en) |
DK (1) | DK3033308T3 (en) |
ES (1) | ES2699819T3 (en) |
WO (1) | WO2015022562A1 (en) |
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CA2989533C (en) * | 2015-06-17 | 2024-01-16 | Baker Hughes, A Ge Company, Llc | Filter and method and distributed temperature sensor system |
WO2017078859A1 (en) * | 2015-11-04 | 2017-05-11 | Unimin Corporation | Purified quartz powder modified for cladding optic fiber cable |
DK3423419T3 (en) * | 2016-03-03 | 2022-06-07 | Prysmian Spa | Method for manufacturing a preform for optical fibers |
US11161767B2 (en) * | 2018-01-25 | 2021-11-02 | Ofs Fitel, Llc | Viscocity-reducing dopants in optical fibers |
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US5063179A (en) * | 1990-03-02 | 1991-11-05 | Cabot Corporation | Process for making non-porous micron-sized high purity silica |
FR2760449B1 (en) * | 1997-03-06 | 1999-04-16 | Alcatel Fibres Optiques | PROCESS FOR PURIFYING NATURAL OR SYNTHETIC SILICA AND APPLICATION TO THE DEPOSITION OF PURIFIED NATURAL OR SYNTHETIC SILICA ON AN OPTICAL FIBER PREFORM |
US6269663B1 (en) * | 1998-03-05 | 2001-08-07 | Alcatel | Method of purifying silica and depositing on an optical fiber preform |
FR2782316B1 (en) * | 1998-08-17 | 2001-01-05 | Alsthom Cge Alkatel | PROCESS FOR PURIFYING NATURAL OR SYNTHETIC SILICA AND APPLICATION TO THE DEPOSITION OF PURIFIED NATURAL OR SYNTHETIC SILICA ON AN OPTICAL FIBER PREFORM |
US6269633B1 (en) | 2000-03-08 | 2001-08-07 | Ford Global Technologies, Inc. | Emission control system |
US20030140657A1 (en) * | 2001-10-30 | 2003-07-31 | Monika Oswald | Method of producing glass of optical quality |
DE10211958A1 (en) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | High-purity silica powder, process and device for its production |
FR2863605B1 (en) * | 2003-12-15 | 2006-04-28 | Cit Alcatel | PLASMA RECHARGING METHOD AROUND A FLUORINE DOPED TUBE |
EP1700832A1 (en) | 2005-03-09 | 2006-09-13 | Degussa AG | A method of producing glass of optical quality |
FR2902962B1 (en) * | 2006-06-27 | 2008-08-22 | Draka Comteq France Sa | PLASMA TORCH FOR FIBER OPTIC RECHARGE. |
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2013
- 2013-08-13 DK DK13815562.7T patent/DK3033308T3/en active
- 2013-08-13 WO PCT/IB2013/002235 patent/WO2015022562A1/en active Application Filing
- 2013-08-13 US US14/911,522 patent/US11046608B2/en active Active
- 2013-08-13 BR BR112016002895-3A patent/BR112016002895B1/en active IP Right Grant
- 2013-08-13 EP EP13815562.7A patent/EP3033308B1/en active Active
- 2013-08-13 ES ES13815562T patent/ES2699819T3/en active Active
- 2013-08-13 CN CN201380080197.8A patent/CN105636917B/en active Active
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CN105636917B (en) | 2018-11-02 |
EP3033308B1 (en) | 2018-10-03 |
DK3033308T3 (en) | 2019-01-14 |
WO2015022562A1 (en) | 2015-02-19 |
ES2699819T3 (en) | 2019-02-12 |
BR112016002895A2 (en) | 2017-08-01 |
BR112016002895B1 (en) | 2021-06-08 |
CN105636917A (en) | 2016-06-01 |
US11046608B2 (en) | 2021-06-29 |
US20160185649A1 (en) | 2016-06-30 |
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