EP3028311A1 - Procédé de réalisation d'une jonction pn dans une cellule photovoltaïque à base de czts et cellule photovoltaïque en configuration superstrat et à base de czts - Google Patents
Procédé de réalisation d'une jonction pn dans une cellule photovoltaïque à base de czts et cellule photovoltaïque en configuration superstrat et à base de cztsInfo
- Publication number
- EP3028311A1 EP3028311A1 EP14767116.8A EP14767116A EP3028311A1 EP 3028311 A1 EP3028311 A1 EP 3028311A1 EP 14767116 A EP14767116 A EP 14767116A EP 3028311 A1 EP3028311 A1 EP 3028311A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- czts
- electrode
- zinc
- photovoltaic cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000011701 zinc Substances 0.000 claims abstract description 38
- 239000011669 selenium Substances 0.000 claims abstract description 32
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 28
- 238000000151 deposition Methods 0.000 claims abstract description 27
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000002243 precursor Substances 0.000 claims abstract description 22
- 239000010949 copper Substances 0.000 claims abstract description 20
- 239000011135 tin Substances 0.000 claims abstract description 19
- 238000000137 annealing Methods 0.000 claims abstract description 16
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 16
- 229910052718 tin Inorganic materials 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 11
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000002250 absorbent Substances 0.000 claims description 19
- 230000002745 absorbent Effects 0.000 claims description 19
- 230000008021 deposition Effects 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 18
- 239000011777 magnesium Substances 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 8
- 239000011593 sulfur Substances 0.000 claims description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 86
- 238000004519 manufacturing process Methods 0.000 description 11
- 150000001787 chalcogens Chemical class 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052798 chalcogen Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002680 magnesium Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 229960005486 vaccine Drugs 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Classifications
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
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- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0328—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032
- H01L31/0336—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032 in different semiconductor regions, e.g. Cu2X/CdX hetero- junctions, X being an element of Group VI of the Periodic Table
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Definitions
- the invention relates to the field of photovoltaic solar energy and more particularly to thin-film photovoltaic cells that make it possible to directly convert sunlight into electricity, by using the electronic properties of suitable materials.
- Thin layer a layer having a thickness of less than 5 pm, or even 3 pm.
- the manufacture of a photovoltaic cell requires the formation of a p-n junction between a p-type or n-type semiconductor, in which the light is absorbed, and an n-type or p-type semiconductor.
- a solar cell may have a substrate or superstrate type structure.
- the manufacture of the solar cell begins with the formation, on a substrate for example of glass or polyamide, of a metal layer, for example molybdenum, forming the lower electrode.
- a metal layer for example molybdenum
- This absorbent layer for example of the p type, is then produced.
- This absorbent layer may in particular be made of CZTS, corresponding to the general formula Cu 2 ZnSn (S 1-x Se x ) 4 with 0 x x 1 1, or in CIGS.
- a buffer layer is then deposited on the absorbent layer.
- This buffer layer is made of an n-type semiconductor material, for example CdS. ZnS 1-x Se x with 0 x x 1 1 (hereinafter referred to as ZnS) or ln 2 Se 3 . This deposit is generally carried out by chemical bath.
- the cell is terminated by the formation of a conductive transparent electrode.
- This electrode is obtained by depositing a layer of a conductive and transparent oxide, such as AZO, ITO or SnO 2 : F, in particular deposited by sputtering.
- the same stack of layers can also be obtained by depositing the layers in the opposite direction, so as to obtain a superstrate type structure. With such a structure, the incident light passes through the transparent substrate before reaching the absorbent layer.
- the manufacture of a superstrate solar cell begins with the deposition of a conductive transparent electrode on a transparent substrate.
- a n-type or p-type buffer layer is then deposited on this conductive transparent electrode, with a p-type or n-type absorber layer being formed on the buffer layer.
- the manufacture of the solar cell ends with the production of a conductive (for example metallic) layer forming a rear electrode.
- the cells in the superstrate configuration are typically made with an absorbent CdTe layer.
- the conventional methods do not make it possible to obtain a solar cell in a superstrate configuration comprising an absorbent layer made of CZTS.
- the buffer layer is made of CdS or In 2 Se 3
- CZTS CZTS precursors
- cadmium or indium diffuses into the absorbent layer. This is due to the fact that the annealing is carried out at high temperature, that is to say at a temperature between 500 and 600 ° C.
- the diffusion of cadmium or indium occurs as soon as the temperature reaches 350 ° C.
- the buffer layer is made of ZnS
- diffusion of zinc, sulfur and / or selenium in the photovoltaic material is not observed.
- the ZnS layer is deposited by chemical bath, it contains numerous defects due to the inclusion of oxygen or hydrogen atoms, for example. These atoms are, on the other hand, capable of diffusing into the CZTS layer during the annealing step.
- the object of the invention is to overcome these drawbacks by proposing a method for producing solar cells based on CZTS and in a superstrate configuration, this method being moreover simplified compared to that conventionally used to obtain a solar cell based on CZTS. in substrate configuration.
- the invention firstly relates to a method for producing a pn junction in a thin-film photovoltaic cell based on CZTS, comprising:
- x Se x with x between 0 and 1.
- step a) selenium and / or sulfur are deposited in elemental form or in compounds.
- magnesium and / or oxygen are also deposited, the buffer layer obtained being then in Zn1.x gxOyS 2 Se1.y 2 with x and (y + 2) between 0 and 1.
- the first step is the deposition of a layer of zinc and then the deposition of a layer containing zinc, tin and copper, in the amounts necessary for ( a) formation of CZTS.
- magnesium and / or oxygen is also deposited magnesium and / or oxygen.
- the invention also relates to a method for producing a solar cell based on CZTS and in a superstrate configuration, comprising the following steps:
- a transparent substrate comprising a conductive and transparent electrode
- the buffer layer in ZnSi. x Se x with x between 0 and 1 being obtained between the transparent electrode and the absorbent layer in CZTS and
- the invention also relates to a photovoltaic cell in thin layers and in a superstrate configuration comprising successively:
- the invention also relates to a photovoltaic cell in thin layers and in a superstrate configuration comprising successively:
- the backside electrode is a molybdenum layer.
- FIG. 1 is a sectional view illustrating a substrate with a transparent and conductive electrode
- FIG. 2 is a sectional view of a stack of layers obtained after the precursor deposition step of the process according to the invention
- FIG. 3 is a sectional view of the stack illustrated in FIG. after the annealing step
- FIG. 4 illustrates a solar cell obtained with the process according to the invention.
- the method of producing a photovoltaic cell according to the invention consists first of all in obtaining a transparent substrate 1 on which a transparent and conductive electrode 10 has been formed. It will be referred to as the electrode on the front face, the incident light being intended to pass through the substrate 1.
- This substrate may in particular be made of glass, or of another transparent material in the range 300 nm - 1500 nm.
- substrates provided by the glass industry and on which a transparent electrode is already present, are used.
- FIG. 2 illustrates another stage in which a layer 20 of zinc is deposited on the electrode 10 and then a layer 21 of precursors containing zinc, tin and copper in the quantities necessary for the formation. of CZTS.
- the ratios of elements Cu, Zn and Sn are conventionally chosen such that: 0.75 ⁇ Cu (Zn + Sn) ⁇ 0.95 and 1.05 ⁇ ; Zn / Sn ⁇ 1.35 to obtain a layer of CZTS.
- This deposition step may also be carried out by depositing a single layer of precursors containing zinc, tin and copper, the amount of zinc then being greater than that necessary to transform the precursors into a photovoltaic material of the CZTS type.
- the ratios of elements Cu, Zn and Sn are chosen so that 0.6 Cu Cu / (Zn + Sn) s 0.9 and 1.3 s Zn / Sn 1.9 1.9.
- the amount of zinc will be expected in excess of about 5 to 35% over the amount of tin given by the nominal stoichiometry of the CZTS and the amount of copper will be expected to be about 5 to 25% less than the quantity given by the nominal stoichiometry.
- the precursors may be deposited under vacuum, in particular by cathodic sputtering or by evaporation, or else by a liquid route, in particular by electro-deposition.
- these deposits can be made at room temperature or at high temperature up to 600 ° C.
- the stack is subjected to an annealing step under an atmosphere of sulfur and / or selenium.
- This annealing step is performed at temperatures between 300 and 700 e C and typically of the order of 500 e C.
- This step lasts between 1 and 90 minutes. This duration is typically of the order of ten minutes.
- the stack is placed in an inert gas (argon or nitrogen), at a pressure close to atmospheric pressure, typically between 1 mbar and 10 bar.
- the chalcogen (S and / or Se) can be provided in the form of elemental gas or in the form of H 2 S or H 2 Se type gas.
- Figure 3 illustrates a stack that is obtained at the end of the annealing step.
- a buffer layer 3 On the transparent electrode 10, is formed a buffer layer 3 and, on this layer 3, an absorbent layer 4.
- Layer 3 is formed of a material of general formula
- this material is designated by ZnS.
- the layer 4 is formed in CZTS.
- the annealing step leads to pushing zinc towards the transparent electrode 10 to form the ZnS material.
- the precursors may be deposited as compounds with a chalcogen (S and / or Se), for example Cu (S and / or Se) or Zn (S and / or Se).
- a chalcogen S and / or Se
- the chalcogen (s) may also be deposited in elemental form.
- magnesium and / or oxygen can also be deposited with the precursors.
- Magnesium and / or oxygen may be deposited by elemental deposition or by reactive deposition in an oxygen atmosphere of certain precursors.
- the buffer layer obtained is of a material represented by the general formula (Mg) Zn (O) S.
- This formula corresponds to materials of the type Zn V) ⁇ Mg x 0yS z Se fy . .With 2 x between 0 and 1 and (y + z). y and z being especially such that 0 y y + z ⁇ 1.
- This magnesium and / or oxygen supply can be realized whether the precursors are deposited simultaneously or sequentially, as illustrated in FIG. 2.
- the substrate 1 is made from soda-lime glass including a transparent electrode Sn0 2 : F.
- the layer 20 has a thickness of between 10 and 100 nm when it comprises only zinc and it typically has a thickness of 30 nm.
- the layer comprises zinc and a chalcogen, it has a thickness of between 20 and 200 nm and which is typically equal to 50 nm.
- the layer 21 comprises for example a ZnS layer5 whose thickness is 340 nm, a copper layer whose thickness is 110 nm. and a tin layer whose thickness is 160 nm.
- the values indicated correspond to a layer thickness of 30 nm (Zn) or 50 nm (ZnS).
- a ZnS buffer layer having a thickness of approximately 50 nm and a CZTS layer 4 whose thickness is about 1000 nm. It is also possible to deposit on the electrode 10, a ZnS layer whose thickness is about 400 nm. This deposit is typically made by sputtering.
- the stack obtained is then subjected to a selenization annealing step. It is performed at a temperature between 450 and 700X and typically equal to 570 e C for a time between 1 and 120 min IO and typically equal to 30 min, under a nitrogen pressure of 10 mBar and 3 atm and in particular under atmospheric pressure and under a partial pressure of selenium of between 0.01 mbar and 100 mbar and especially 1 mbar.
- the partial pressure of Se can come from the evaporation of elemental Se or H 2 Se.
- the amount of zinc required for forming the photovoltaic material CZTS is present in the ZnS layer, which therefore has a greater thickness than in the preceding example (340 nm).
- the deposition and annealing steps make it possible to produce a buffer layer 3 and an absorbent layer 4, with a pn junction at the interface between these two layers.
- the typical thicknesses are 50 nm for the buffer layer and 1000 nm for the absorbent layer.
- FIG. 4 illustrates the last step of the method, in which a back-face electrode 5 is made.
- This step consists of producing a metal layer.
- This layer can be obtained by a simple deposition of conductive metal, in particular Au, Cu, Mo or Ti.
- This metal deposition may be preceded by a chemical cleaning of the surface of the layer 4 or a doping step near the surface of the layer 4. In both cases, these preliminary steps are intended to improve the electrical contact between layers 4 and 5.
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Abstract
Description
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1357660A FR3009434B1 (fr) | 2013-08-01 | 2013-08-01 | Procede de realisation d'une jonction pn dans une cellule photovoltaique a base de czts et cellule photovoltaique en configuration superstrat et a base de czts |
PCT/IB2014/063305 WO2015015367A1 (fr) | 2013-08-01 | 2014-07-22 | Procédé de réalisation d'une jonction pn dans une cellule photovoltaïque à base de czts et cellule photovoltaïque en configuration superstrat et à base de czts |
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EP3028311A1 true EP3028311A1 (fr) | 2016-06-08 |
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EP14767116.8A Withdrawn EP3028311A1 (fr) | 2013-08-01 | 2014-07-22 | Procédé de réalisation d'une jonction pn dans une cellule photovoltaïque à base de czts et cellule photovoltaïque en configuration superstrat et à base de czts |
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US (1) | US20160163896A1 (fr) |
EP (1) | EP3028311A1 (fr) |
FR (1) | FR3009434B1 (fr) |
WO (1) | WO2015015367A1 (fr) |
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US8426241B2 (en) * | 2010-09-09 | 2013-04-23 | International Business Machines Corporation | Structure and method of fabricating a CZTS photovoltaic device by electrodeposition |
US20130056054A1 (en) * | 2011-09-06 | 2013-03-07 | Intermolecular, Inc. | High work function low resistivity back contact for thin film solar cells |
US20130164885A1 (en) * | 2011-12-21 | 2013-06-27 | Intermolecular, Inc. | Absorbers For High-Efficiency Thin-Film PV |
-
2013
- 2013-08-01 FR FR1357660A patent/FR3009434B1/fr not_active Expired - Fee Related
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2014
- 2014-07-22 WO PCT/IB2014/063305 patent/WO2015015367A1/fr active Application Filing
- 2014-07-22 US US14/908,932 patent/US20160163896A1/en not_active Abandoned
- 2014-07-22 EP EP14767116.8A patent/EP3028311A1/fr not_active Withdrawn
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Publication number | Publication date |
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US20160163896A1 (en) | 2016-06-09 |
WO2015015367A1 (fr) | 2015-02-05 |
FR3009434A1 (fr) | 2015-02-06 |
FR3009434B1 (fr) | 2016-12-23 |
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